Daɣ awa allaɣat achrut wen, awa id izjarnen Ultratech, Canon d Nikon, MKS Instruments, Lam Research d Cadence Design Systems ilan iddikud n awatay n hebu n maršin tan win lithography?
Context:ASML itaj photolithographie machines axdamnen daɣ amukin n computer chips Dǎɣ maɗinan wən, əmiktan aqalan atiwagan dǎɣ əmik ən ahanay fal wafer ən siliəon eqalan ayhan fal əmik ən əmik ən əmik atiwazayan fal efew (photoresist). Ašanzi wen eqal ayknan agudiyan fal wafer iyan. Fotorésist eqal darat awen aygan fal igi ən əmik ən éleətronique fal silicium. Akayad ən ahanay wa saməndo ən maršintan win ASML eqal atwətkalən dǎɣ igitan kul ən talilt maqarat izar, ɣor 2011, ASML ila 67% ən təzunawen ən maršintan ən lithographie dǎɣ adunya.  ASML's competition consisted of Ultratech, Canon and Nikon, MKS Instruments, Lam Research and Cadence Design Systems.
A fal ASML ila 67% n mamala tan n maršin tan win lithographie daɣ alɣalim tolas a fal Ultratech, Canon d Nikon, MKS Instruments, Lam Research d Cadence Design Systems eqqal nat a fal ardahan, awen a fal taggayen tin azunan 33% n hebu wa eqqalan