Recruitment.

The 48th Reserve Division was relatively mixed, but mostly came from the XI and XVIII Army Corps areas. The 221st and 222nd Reserve Infantry Regiments were raised in the Grand Duchy of Hesse. The 223rd Reserve Infantry Regiment was raised in the Prussian Province of Hesse-Nassau, with one battalion each from the former Electorate of Hesse, Duchy of Nassau, and city of Frankfurt am Main. The 224th Reserve Infantry Regiment was from the Thuringian states and the Prussian Province of Saxony. After the 224th Reserve Infantry Regiment was transferred to the 215th Infantry Division, the 48th Reserve Division became an even more predominantly Hessian formation.

Combat chronicle.

The 48th Reserve Division initially fought on the Western Front, entering the line in October between the Meuse and Moselle. It then moved to the Flanders and Artois regions in the drive northwards known as the Race to the Sea. It fought at Lille in late October and at Ypres into November. At the end of November, the division was transferred to the Eastern Front. It fought in a number of engagements, including the winter 1914 Battle of Łódź, and then participated in the pursuit of the Russians from Carpathia and Austrian Galicia known as the Gorlice-Tarnów Offensive after the major battle at Gorlice and Tarnów. The division remained in positional warfare and various engagements on the Eastern Front thereafter, and faced part of the Brusilov Offensive in 1916. From October 1916 to April 1917, the division was attached to the Austro-Hungarian 3rd Army, and was then attached to the Austro-Hungarian 2nd Army. In May 1917, the division returned to the Western Front, and occupied the line near Verdun, facing the French offensive there in August and September. The division was in the trenches in Lorraine from the end of September to the beginning of December 1917, and then in Upper Alsace until mid-February 1918. It then went into army reserve until April, when it went into the line in the Flanders and Artois regions. It remained in the fighting in the northern part of the Western Front until the end of the war. In 1917, Allied intelligence rated the division as a mediocre division. In 1918 it was rated second class.

Order of battle on formation.

The 48th Reserve Division was initially organized as a square division, with essentially the same organization as the reserve divisions formed on mobilization. The order of battle of the 48th Reserve Division on January 6, 1915, was as follows:

Order of battle on March 31, 1918.

The 48th Reserve Division was triangularized in April 1917. Over the course of the war, other changes took place, including the formation of artillery and signals commands and a pioneer battalion. The order of battle on March 31, 1918, was as follows:

The 48th Reserve Division ("48. Reserve-Division") was a unit of the Imperial German Army in World War I. The division was formed in September 1914 and organized over the next month, arriving in the line in October. It was part of the first wave of new divisions formed at the outset of World War I, which were numbered the 43rd through 54th Reserve Divisions. The division was part of XXIV Reserve Corps. It was disbanded in 1919 during the demobilization of the German Army after World War I.


Life and Christian ministry.

Miss Barber was an Anglican missionary sent by the Church Missionary Society (C.M.S.) to the city of Fuzhou, Fujian, China where she taught in the Tau Su Girls’ High School (a school founded and operated by the Church of England) for seven years. Known as an excellent missionary, her co-missionaries became jealous of her and fabricated a serious charge which caused her to be recalled from the field. Barber was known for her faith. For this reason, Barber decided not to vindicate herself concerning the charges made against her. She remained at home in Great Britain until years later the chairman of the mission board became aware of the case against her and that it was misrepresented. Persuading her to tell the truth, Barber told him the whole story and was fully vindicated before the mission board.  While she remained in England, Barber came into contact with D.M. Panton, the editor of the Christian magazine, "The Dawn." Panton was both a student of the word and one who began to see that denominationalism was evil in the sight of God. During 1907 Miss Barber became a member of Surrey Chapel and was also baptized at Surrey Chapel by full immersion. Through her relationship with Panton, Barber also began to see the denominations as evil in the sight of God.  Before the board could send her back to China, Barber resigned from the mission, considering that it was the right time to do so, even though she felt led by God to return to China. She returned to China in 1909 along with Miss Ballord another congregant member of Surrey Chapel not in connection with any mission, settling in a suburb of Fuzhou, with the spiritual support of Panton and the Surrey Chapel Mission Band, Norwich, where Panton ministered. The two women rented a house in "Pagoda Anchorage" where Barber lived until her death in 1930. Ballord continued to work in Pagoda Anchorage until 1950, when she returned to England.  Barber lived with little traveling and no publicity. Rather, she was content to just remain home and pray. She helped those who sought her counsel in seeking after the Lord, one of whom was Watchman Nee. Furthermore, Barber lived by faith. She was not guaranteed regular funds from the Surrey Chapel Mission Band and had no outward means of support.  One of Barber's well-known characteristics was her anticipation of the second coming of Jesus Christ. This is evident in the many poems she wrote on waiting for Christ's return, some of which were later adapted into hymns. In one account given by Watchman Nee (concerning the eve of 1925):  Barber died in 1930 in Anchorage Pagoda of Crohn's disease. All of her belongings, which included little more than her old Bible with all her notes, were left to Watchman Nee. In the March 1930 issue of Watchman Nee's periodical, ‘’The Present Testimony,’’ Nee made the following remarks concerning Miss Barber’s departure:

Hymns.

Barber did not leave behind any writings other than a small volume of poems (later changed into hymns) that was later published by Miss Ballord (Miss Ballord was her niece) in China. These compositions demonstrate her striving to live "in the Lord’s presence," as well as her eager anticipation of Christ's coming back. A stanza of Barber's poem reads:  <poem> "If the path I travel" "Lead me to the cross," "If the way Thou choosest" "Lead to pain and loss," "Let the compensation" "Daily, hourly, be" "Shadowless communion," "Blessed Lord, with Thee. " </poem

Margaret Emma Barber or M. E. Barber (1866–1930; Chinese: 和受恩; Pinyin: "Hé Shòuēn"; Foochow Romanized: "Huò Sêu-ŏng"), was a British missionary in China. She was born in 1866 in Peasenhall, Suffolk, England, the daughter of Louis (a wheelwright) and Martha (née Gibbs) Barber. The family moved to 59 St Martins Lane Norwich around 1876 and established a Carriage Manufacturing business. The family home in Norwich (see georgeplunkett.co.uk for a view of 59 St Martins Lane) was opposite St Martins Parish church which was intensely evangelical in the 1880 - 90s and must have had an influence on the Barber family. During the course of her life, she lived in China twice to preach the Christian gospel. She left her home and travelled in a lonely way thousands of miles. Barber, who initially went to China as an Anglican, became an independent missionary with informal ties to the Plymouth Brethren. She is best known for her influence on Watchman Nee (Nee Tuo-Sheng).


Plot.

Part 1: Target Peenemünde.

on 5 November 1939, the British consulate in Norway receives the Oslo Report, but the Military Intelligence doubts its veracity. The German research in Peenemünde goes undisturbed from the British. In spite of this, various resistance groups gather information about the site and attempt to hinder the missiles' development, taking great risks.

Part 2: Password Paperclip.

After an Allied bombing wreaks great damage in Peenemünde, the local resistance manages to smuggle V-2 parts to Britain, where they would be analyzed by the Allies' technical intelligence. The Allies decide that the genius of the rockets' creator must be exploited by them. As the end of the war looms near, Peenemünde is abandoned. In Los Alamos, a new, deadlier weapon is being developed.

Production.

The work on "Die Gefrorene Blitze" began already at 1964, and took three years to be completed. Writer Harry Thürk and director János Veiczi conducted extensive research in four countries: the United Kingdom, France, Germany and Poland. The script was mainly based on Julius Mader's documentary report "The Secret of Huntsville—The Real Career of Rocketbaron Wernher von Braun" The producers deemed the film as one that continued the tradition of DEFA's classical antifascist pictures, focusing on the struggle of people from many different countries - including a catholic priest from France, a character whose portrayal as positive was not common in East Germany - to prevent the Nazis from developing long-range missiles. The title was derived from a common sobriquet for the V2 missiles - "Frozen Lightning".

Reception.

The film was screened outside the competition in the 1969 Cannes Film Festival. It won the Golden Apsara Award in the 1969 Phnom Penh International Film Festival.

Die gefrorenen Blitze ("Frozen Lightning"; English-language title: Frozen Flashes; French-language title: Et l'Angleterre sera détruite, "England Shall Be Destroyed") is a two-part 1967 East-German film. The plot revolves around the history of the resistance movement in Peenemünde during the Second World War and its attempt to sabotage the V-2 program.


Plot.

An English bon-vivant osteopath is enchanted with a young exotic dancer and invites her to live with him. He serves as friend and mentor, and through his wide range of contacts and his parties she and her friend meet and date members of the Conservative Party. A scandal develops when her affair with the Minister of War comes to public attention.  In the credits at the end of the film Valerie Hobson is identified only as Mrs. Profumo.

Production.

Development.

Australian screenwriter Michael Thomas and prospective producer Joe Boyd approached the BBC with the idea of a three-part mini-series on the Profumo affair. The BBC agreed to finance scripts for two of the 90-minute episodes, but support dried up when internal memos were found that forbade their production. Channel 4 turned them down on grounds of taste.  Boyd and Thomas joined forces with Palace Pictures who invested nearly £200,000 by 1985; a further £184,319 of development funding was raised from Robert Maxwell. As the prospects for a television mini-series began to fade, Palace Pictures became increasingly interested in making a feature film and estimated the budget requirements at £3.2 million. Co-founders Stephen Woolley and Nik Powell signed up first time director Michael Caton-Jones on a pay-or-play contract and began a marketing campaign to raise the finance. The controversial nature of the story, as well as its sexual content, appealed to Bob and Harvey Weinstein's independent film company, Miramax. The Weinsteins agreed to pay $2.35 million for the North American distribution rights.  The original screenplay was written as a historically detailed mini-series running four to five hours. When it was pared down to film length, it became more of a docudrama, with a chronology that is sometimes unclear. Producer Woolley arranged discreet meetings between Mandy Rice-Davies and Bridget Fonda to help the American actress with her portrayal.

Filming.

Filming began in June 1988. Part of "Scandal" was filmed at Bathurst Mews in Bayswater, London, although Ward's house was actually at Wimpole Mews in Marylebone. The exterior of 29 Francis Street, Victoria, SW1 was used as the Police Station.

Poster.

Christine Keeler took part in a publicity shoot with photographer Lewis Morley for a 1963 film about the Profumo Affair, "The Keeler Affair". Under pressure to pose nude, Keeler agreed to sit straddling the chair with just the back of the chair as a screen. The film was never released in the United Kingdom, but the image became "one of the most famous and most imitated photographs ever published". Joanne Whalley-Kilmer recreated the pose for the theatrical release poster.

US classification.

The Weinsteins had been impressed by the amount of free publicity generated for Alan Parker's "Angel Heart" in 1987 when it was initially given an "X" rating in the United States. Beginning with "Scandal", Harvey Weinstein would routinely help publicise Miramax's films by attacking the integrity of the Classification and Rating Administration (CARA) and X ratings. They encouraged Woolley and Powell to deliver an X rated movie, and in particular to include nude shots of Whalley-Kilmer. The film was awarded an X rating for its orgy scene, but after two appeals and three seconds of edits, it was released with an "R" rating.

Soundtrack.

The soundtrack, and soundtrack album, included a specially written song by the Pet Shop Boys "Nothing Has Been Proved" for Dusty Springfield.

Reception.

The film received positive reviews. At the movie review aggregator Rotten Tomatoes, "Scandal" received an overall approval rating of 91% based on 32 reviews. Roger Ebert awarded it four stars out of four and said the film was "surprisingly wise about the complexities of the human heart". He praised the performance of John Hurt. Following Hurt's death, "The Guardian" film critic Peter Bradshaw said the performance was Hurt's masterpiece.  The film made a comfortable profit.  Commenting on the pain felt by his parents when the film was released, David Profumo said "I never felt sorrier for them in my life".

Scandal is a 1989 British drama film, a fictionalised account of the Profumo affair that rocked the government of British prime minister Harold Macmillan. It stars Joanne Whalley as Christine Keeler and John Hurt as Stephen Ward, personalities at the heart of the affair.


Central Scotland (Scottish Parliament electoral region)

Constituencies and council areas 2011–.

As a result of the First Periodic Review of Scottish Parliament Boundaries the boundaries for the region and constituencies were redrawn for the 2011 Scottish Parliament election.

Constituencies and council areas 1999–2011.

The constituencies were created in 1999 with the names and boundaries of Westminster constituencies, as existing in at that time. They cover all of two council areas, the Falkirk council area and the North Lanarkshire council area, and parts of three others, the East Ayrshire council area, the East Dumbartonshire council area and the South Lanarkshire council area.  The rest of the East Ayrshire council area is within the South of Scotland region, the rest of the East Dunbartonshire council area is within the West of Scotland region, and the rest of the South Lanarkshire council area is within the Glasgow and South of Scotland regions.

Boundary changes.

The Boundary Commission recommended changes to the electoral regions used to elect "list" members of the Scottish Parliament. The new "Central Scotland" region was formed from the constituencies of Airdrie and Shotts; Coatbridge and Chryston; Cumbernauld and Kilsyth; East Kilbride; Falkirk East; Falkirk West; Hamilton, Lanark and Stonehouse; Motherwell and Wishaw; and Uddingston and Bellshill.

Members of the Scottish Parliament.

Regional List MSPs.

N.B. This table is for presentation purposes only

Election results.

2016 Scottish Parliament election.

In the 2016 Scottish Parliament election the region elected MSPs as follows:

Constituency results.

Additional Member results.

2011 Scottish Parliament election.

In the 2011 Scottish Parliament election the region elected MSPs as follows:

Constituency results.

Additional Member results.

2007 Scottish Parliament election.

Constituency results.

Additional member results.

2003 Scottish Parliament election.

In the 2003 Scottish Parliament election the region elected MSPs as follows:

Constituency results.

Additional member results.

1999 Scottish Parliament election.

In the 1999 Scottish Parliament election the region elected MSPs as follows:

Constituency results.

Additional member results.

Central Scotland ("Meadhan-Alba" in Gaelic) is one of the eight electoral regions of the Scottish Parliament which were created in 1999. Nine of the parliament's 73 first past the post constituencies are sub-divisions of the region and it elects seven of the 56 additional-member Members of the Scottish Parliament (MSPs). Thus it elects a total of 16 MSPs.


Early life, education and early career.

al-Nujaifi was born 1956 in Mosul to a wealthy family of landowners and politicians. Both his grandfather Muhammad and his father served as members of parliament during the monarchist era. He grew up racing Arabian horses for his family.  In 1978, al-Nujaifi earned a degree in electrical engineering, from the University of Mosul. Shortly after graduation, he worked in the Iraqi government's electricity ministry for 12 years, involved in building power plants.  Together with his brother Atheel, the later governor of Nineveh, in the early 1990s he took over his family's agricultural company, and particularly started out in the Arabian horse trade.  During the rule of Saddam Hussein, the al-Nujaifi family largely remained out of politics, returning to the public scene following his toppling in 2003. They were however accused of harboring sympathies for Saddam's Baath Party, and were indeed involved in horse trades with Saddam's sons Uday and Qusai.

Political career.

In the Iraqi Transitional Government, al-Nujaifi was appointed Minister of Industry. During his one-year tenure, he privatized most of the state-owned companies which included firms working in sectors from petrochemical and cement to sugar, silk and heavy industry. He campaigned against the ratification of the Constitution of Iraq.  Following the Iraqi legislative election of December 2005, he was nominated by the Iraqi National List to become a member of the Council of Representatives. On 26 January 2006, he survived an assassination attempt, when a roadside bomb detonated close to his convoy near the town of Balad, killing three of his bodyguards. Heading a parliamentary committee to assess the humanitarian situation in Nineveh Governorate, he criticized the conduct of governor Duraid Kashmoula: "We have seen no trace of the huge sums of money said to have been appropriated for the province and could gather no idea on how they were spent."  In September 2006 al-Nujaifi's bodyguard was assassinated. Later that month, al-Nujaifi sparked a walkout by the 55 MPSs of the Kurdistan Alliance when in a parliamentary speech he belittled the historical and current role of Kurds in Mosul area. His speech was seen chauvinist by the Kurds, urging even fellow members of the Iraqi National List to distance themselves from al-Nujaifi's words. al-Nujaifi claimed in October 2008 that the 2008 attacks on Christians in Mosul were carried out by Kurdish peshmerga and intelligence operatives.

Speaker of the Council of Representatives.

The al-Nujaifi brothers' al-Hadba party contested the 2010 parliamentary election as part of the cross-sectarian "Iraqiyya" bloc, which became the largest parliamentary force. "Iraqiyya", however, didn't manage to secure a clear majority to elect its Shiite leader Ayad Allawi to replace current prime minister Nouri al-Maliki. On 11 November 2010, after three days of pressure talk, al-Nujaifi was elected the Speaker of the Council of Representatives, obtaining 227 votes out of 295, with 30 MPs not attending the session. In turn, the power-sharing deal brokered by Kurdish politician Massoud Barzani secured al-Maliki and President Jalal Talabani's posts. In his first parliamentary speech, Nujafi however held al-Maliki's government responsible for the country's "fear, hunger, poverty and corruption," adding that Iraq was considered today "the most corrupt country in the world."  In his first visit to the US as Iraqi parliament speaker, al-Nujaifi refused following protocol, denying to place a wreath on the Arlington Tomb of the Unknowns on the basis that he considered the Americans "an occupying force rather than liberators". When he revisited Washington in early 2014 to discuss the ongoing Sunni insurgency in Al Anbar Governorate, he took a different stance, stressing the importance of the US role in Iraq "to support the political process developed in Iraq." He criticized the treatment of the Sunni Sahwa forces, who fought al-Qaeda in Iraq, though refused to join the Iraqi Army, until they were massively prosecuted by the al-Maliki government. "The policy of exclusion and marginalization of Sunnis and the arrest of thousands of them for illegal reasons provided a suitable ground for the return of al-Qaeda."  Named "the inner circle's new face", Nujaifi by then was the highest-ranking Sunni politician of Iraq, Within the increasingly fragmented "Iraqiyya" national bloc, al-Nujaifi's al-Hadba party shaped the new moderately Sunni "Muttahidoon" coalition, advocating a Sunni federal region in Iraq to contest the 2013 governorate elections. Seen by many as a future presidential prospect, his new coalition however didn't succeed in playing a central role neither in the governorate elections nor in the 2014 parliamentary election. After a weeklong deadlock situation, al-Nujaifi agreed not to seek another term as parliamentary speaker, if al-Maliki also drops his premiership bid. As the prime minister cleared the path, Salim al-Jabouri from the "Muttahidoon"-allied "Diyala is Our Identity" coalition became the new parliamentary speaker.

Vice President.

al-Nujaifi was assigned the post of one of the three Vice Presidents of Iraq, along with the former prime ministers al-Maliki and Allawi on 8 September 2014. On 11 August 2015, these largely ceremonial posts were however altogether abolished as part of prime minister Haider al-Abadi's reform plans. Later, he filed a complaint against the decision, considering it to be against the Constitution. Also Nouri al-Maliki promised to cling to his post. On 10 October 2016, the three posts of Vice Presidents were restored by the Supreme Court of Iraq which termed their abolition as unconstitutional. On 12 May 2017, he announced the establishment of a political party dubbed "United for Iraq" in Erbil.

Osama Abdul Aziz al-Nujaifi or Najifi (; born c. 1956 in Mosul) is an Iraqi politician and served as one of the three Vice Presidents of the country, from 2016 to 2018. As the Speaker of the Council of Representatives, the informal leader of the moderate Sunni al-Hadba party was the highest ranking Sunni politician of Iraq.


History.

In September 1862, the Royal Württemberg State Railways () planned to build a railway from Illingen via Vaihingen an der Enz and Weil der Stadt to Calw. It did not pursue this project for long because the Kingdom of Württemberg had begun negotiations with the Grand Duchy of Baden in order to build the Nagold Valley Railway from Pforzheim. In February 1865, the Baden Government agreed to the construction of this line.  On 13 August 1865, the parliament of Württemberg decided to build the Black Forest Railway from Zuffenhausen via Leonberg to Calw. This line connected Weil der Stadt to the rail network. The State Railways built Weil der Stadt station north of the town. The monumental entrance building has survived but it is now used for other purposes.

State Railway era.

The opening of the second part of the line from Ditzingen to Weil der Stadt took place on 1 December 1869. The difficult section through the Black Forest to Calw, was put into operation by the State Railways on 20 June 1872. The Black Forest Railway lost much of its importance after the completion of the Gäu Railway in September 1879. A planned branch from Weil der Stadt to Pforzheim was never built.  Despite the opening of the railway, Weil der Stadt continued to be dominated by agriculture. It was not until 1893 that a clothes manufacturer built a factory with four looms outside the town walls. The mill later produced Beyerle blankets. The increase in the population and industry was still limited. In 1910, only 1,859 people lived in the town, which was not much more than in previous decades. The inhabitants mostly grew hops and raised sheep.

Reichsbahn era.

Deutsche Reichsbahn reduced services on the Black Forest line. In 1939, it operated only nine trains directly between Stuttgart and Calw on weekdays. Most trains from Stuttgart ended in Leonberg or Renningen. Nevertheless, the Reichsbahn electrified the Black Forest Railway on 18 December 1939 to Weil der Stadt. This gave the town, which still had a population of only 2,200, a connection to Stuttgart's suburban services. The locomotives used to haul through trains from Stuttgart to Calw and vice versa were changed in Weil der Stadt.

Deutsche Bundesbahn era.

In the 1960s, the suburban electrical services were incorporated into the Stuttgart S-Bahn project. Weil der Stadt would be the terminus of a line. On 1 October 1978, Deutsche Bundesbahn launched operations S-Bahn line S 6. This finally ended continuous operations from Stuttgart to Calw. Deutsche Bundesbahn operated Uerdingen railbuses between Weil der Stadt and Calw until 29 May 1983, when passenger services were abandoned. Freight traffic to Althengstett ended after a landslide at Ostelsheim in March 1988.  For years, the Calw district and the Association of the Württemberg Black Forest Railway, Calw–Weil der Stadt ("Verein Württembergische Schwarzwaldbahn Calw–Weil der Stadt") have tried to have the line reactivated, if necessary or appropriate, by extending line S 6 to Calw.

Entrance building.

The station building has a very wide three-storey central block with a shallow hipped roof that is almost atypical of the Royal Württemberg State Railways, which usually used rather slender designs for its stations. Left and right of the central building there are two-storey extensions. The facade of the building is built of red sandstone (Buntsandstein), which is also found in other buildings in Weil der Stadt (e.g. the church and the Rundbogenstil pillars of the town hall). The frames of the windows and doors are made of yellow sandstone and stand in contrast. The station's name is also carved in yellow sandstone on both extensions as WEILDERSTADT.

Rail operations.

The station is served by the S-Bahn Stuttgart. It has two platform tracks. Services of S-Bahn line S 6 start on track 1. Track 2 is no longer used. It is classified by Deutsche Bahn as a category 4 station.

Weil der Stadt station is a station located at the terminus of the Black Forest Railway in the town of Weil der Stadt in the German state of Baden-Württemberg. The section to Calw is disused. The station is the terminus of line S 6 of the S-Bahn. It is classified by Deutsche Bahn as a category 4 station.


Background.

The song was reportedly inspired by a post-season holiday undertaken by Australian Football League (AFL) player Jude Bolton and several of his Sydney Swans teammates to Los Angeles during the 2010 post-season.

Music video.

The music video for the song was uploaded to YouTube on June 8, 2011 and is a continuation of "Party Rock Anthem", this time emulating the movie "Blade", the rave bloodbath scene specifically, instead of "28 DAYS LATER".  The video's introduction is quite similar to "Party Rock Anthem". An opening caption says Redfoo and SkyBlu have become shuffling zombies and are now in search of the perfect party in downtown Transylvania "From Dusk Till Dawn". Redfoo and SkyBlu exit their vehicle in an empty car park and Redfoo opens out a map on the vehicle's hood. While arguing about their next destination, the shufflers are grabbed by an eccentric looking man, who pulls them behind the personalized Kia Soul. This time, they don't take it lightly and start to hit the stranger with the map. The "beating" soon ceases and the assailant is shown in full view. He recognizes the LMFAO crew, calling them the "shuffle guys". While the duo are justifying this nickname, the stranger appears to be day-dreaming yet focusing intensely on the shufflers. He invites them to a party, and after much persistence and also the promise of shots, LMFAO decide to attend this club.  The actual song begins, the video changes to the duo entering the club, and the viewer is shown that the guests are many of the original shufflers (including the Shuffle Bot and also Quest Crew – winners of America's Best Dance Crew, season 3) who are already busy party rocking. LMFAO join the dance-floor and the video alternates between shots of the dancers and shots of Natalia Kills. However, little do Redfoo and Sky Blu know that this party is hosted by a crew of blood-suckers who feast on their guests. This is made evident when one of the women bares her fangs and even more so when Redfoo cuts his finger while trying to open a champagne bottle – this grabs the attention of the vampires who begin to flirt with him. Natalia almost gets seduced by Redfoo, but then throws him to her vampires. The guys are oblivious to the attacking vampires and unknowingly manage to fight them off while dancing. However, they only realize the truth when the vampires form a demonic group behind them.  The next scene involves Redfoo, Sky Blu, the Shuffle Bot and Q running towards the exit. The door suddenly bursts open and Jesus of Hollywood (Kevin Lee Light) strides in wearing Beats by Dr. Dre. He presents the group with crates filled with bottles of "Holy Champagne", and they use these drinks against the vampires, creating a huge champagne shower, referring to the song name. The music video ends with the dancers party rocking in victory and Jesus of Hollywood high-fiving the entire crew.

Critical reception.

Robert Copsey of Digital Spy UK gave the track 2 out of 5 stars, saying, "During our recent interview with LMFAO", the uncle-nephew duo not only described their new single as "the ultimate party song", but insisted that it would "change the way that people view champagne".

"Champagne Showers" is a song performed by American EDM/electro hop recording duo LMFAO, featuring vocals from English singer-songwriter Natalia Kills. It was released as the second single from the album "Sorry for Party Rocking" (2011). This song was an international hit in New Zealand, Australia, France, Ireland and Austria, peaking #8, #9, #12, #15 and #18 respectively. This song was also in the Australian Top 50 for 27 Weeks and in the French Top 200 for 50 weeks.


Situations requiring multiple patterning.

There are a number of situations which lead to multiple patterning being required.

Sub-resolution pitch.

The most obvious case requiring multiple patterning is when the feature pitch is below the resolution limit of the optical projection system. For a system with numerical aperture NA and wavelength λ, any pitch below 0.5 λ/NA would not be resolvable in a single wafer exposure. The resolution limit may also originate from stochastic effects, as in the case of EUV. Consequently, 20 nm linewidth still requires EUV double patterning, due to larger defectivity at larger pitches.

Two-dimensional pattern rounding.

It is well-established that dense two-dimensional patterns, which are formed from the interference of two or three beams along one direction, as in quadrupole or QUASAR illumination, are subject to significant rounding, particularly at bends and corners. The corner rounding radius is larger than the minimum pitch (~0.7 λ/NA). This also contributes to hot spots for feature sizes of ~0.4 λ/NA or smaller. For this reason, it is advantageous to first define line patterns, then cut segments from such lines accordingly. This of course, requires additional exposures. The cut shapes themselves may also be round, which requires tight placement accuracy.

Line tip vs. linewidth tradeoff.

The rounding of line tips naturally leads to a tradeoff between shrinking the line width (i.e., the width of the line tip) and shrinking the gap between opposite facing tips. As the line width shrinks, the tip radius shrinks. When the line tip is already less than the point spread function (k~0.6-0.7), the line tip naturally pulls back, increasing the gap between opposite facing tips. The point spread function likewise limits the resolvable distance between the centers of the line tips (modeled as circles). This leads in turn to a tradeoff between reducing cell width and reducing cell height. The tradeoff is avoided by adding a cut/trim mask (see discussion below). Hence, for the EUV-targeted 7nm node, with an 18 nm metal linewidth (k=0.44 for λ=13.5 nm, NA=0.33), the line tip gap of less than 25 nm (k=0.61) entails EUV single patterning is not sufficient; a second cut exposure is necessary.

Different parts of layout requiring different illuminations.

When patterns include feature sizes near the resolution limit, it is common that different arrangements of such features will require specific illuminations for them to be printed.  The most basic example is horizontal dense lines vs. vertical lines (half-pitch < 0.35 λ/NA), where the former requires a North-South dipole illumination while the latter requires an East-West dipole illumination. If both types are used (also known as cross-quadrupole C-Quad), the inappropriate dipole degrades the image of the respective line orientation. Larger pitches up to λ/NA can have both horizontal and vertical lines accommodated by quadrupole or QUASAR illumination, but diagonally spaced features and elbow features are degraded.  In DRAM, the array and periphery are exposed at different illumination conditions. For example, the array could be exposed with dipole illumination while the periphery could use annular illumination. This situation applies to any set of patterns (half-pitch < 0.5 λ/NA) with different pitches or different feature arrangements, e.g., rectangular arrays vs. staggered arrays. Any of the individual patterns is resolvable, but a single illumination cannot be used simultaneously for all of them.  The inclusion of both isolated and dense features is a well-known instance of multi-pitch patterning. Subresolution assist features (SRAFs) have been designed to enable the patterning of isolated features when using illumination tailored for the dense features. However, not all pitch ranges can be covered. In particular, semi-dense features may not be easy to include.

Specific example: hole arrays.

For the specific case of hole arrays (minimum half-pitch < 0.6 λ/NA), three well-known cases require three entirely different illuminations. A regular array generally requires Quasar illumination, while the same array rotated 45 degrees results in a checkerboard array that requires C-quad illumination. Different from both cases, an array with close to triangular or hexagonal symmetry requires hexapole illumination.

Multi-pitch patterns.

Sometimes a feature pattern inherently contains more than one pitch, and furthermore, these pitches are incompatible to the extent that no illumination can simultaneously image both pitches satisfactorily. A common example, again from DRAM, is the brick pattern defining the active regions of the array. In addition to the narrow pitch of the active regions, there is also the pitch between the active region separations or breaks, which is double that of the narrow pitch in the same direction. When the narrow pitch is < λ/NA (but still > 0.5 λ/NA), it cannot be imaged simultaneously with the double pitch due to the focus limitations of the latter. Selective etching, along with SADP or SAQP (to be described below), is the current best approach to achieve the simultaneous patterning of both pitches.

Small deviations from 2-beam interference.

A two-beam interference pattern (half-pitch <0.5 λ/NA) forms a set of regularly spaced lines. Breaks in such lines, e.g., brick patterns, are deviations from the interference pattern. Such breaks generally do not dominate the pattern, and are thus small deviations. These deviations are insufficient to completely offset the constructive or destructive interference of the underlying regular line pattern; sidelobes often result. Line end gaps are easily bridged under dipole illumination. Another mask exposure (usually referred as a cut mask) is therefore necessary to break the line pattern more robustly.

Line cutting.

The earliest implementation of multiple patterning involved line cutting. This first occurred for Intel's 45nm node, for 160 nm gate pitch. The use of a second mask to cut lines defined by a first mask does not help increase feature density directly. Instead it allows definition of features, e.g., brick patterns, which are based on lines spaced at a minimum pitch, in particular, when the lines are near the resolution limit and are generated by the two-beam interference mentioned above. The two-beam interference still dominates the diffraction pattern.  When applying the second mask to cut lines, the overlay relative to the first mask needs to be considered; otherwise, edge placement errors (EPE) may result. If the line pitch is already near the resolution limit, the cut pattern itself may have imaging difficulty, from reduced dose or focus window. In this case, more than one cut mask would have to be used, or else the cut has to extend over more than one line. Self-aligned cutting (to be discussed below) may be a preferred option.

Pitch splitting.

The earliest form of multiple patterning involved simply dividing a pattern into two or three parts, each of which may be processed conventionally, with the entire pattern combined at the end in the final layer. This is sometimes called "pitch splitting", since two features separated by one pitch cannot be imaged, so only skipped features can be imaged at once. It is also named more directly as "LELE" (Litho-Etch-Litho-Etch). This approach has been used for the 20 nm and 14 nm nodes. The additional cost of extra exposures was tolerated since only a few critical layers would need them. A more serious concern was the effect of feature-to-feature positioning errors (overlay). Consequently, the self-aligned sidewall imaging approach (described below) has succeeded this approach.  A "brute force" approach for patterning trenches involves a sequence of (at least) two separate exposures and etchings of independent patterns into the same layer. For each exposure, a different photoresist coating is required. When the sequence is completed, the pattern is a composite of the previously etched subpatterns. By interleaving the subpatterns, the pattern density can theoretically be increased indefinitely, the half-pitch being inversely proportional to the number of subpatterns used. For example, a 25 nm half-pitch pattern can be generated from interleaving two 50 nm half-pitch patterns, three 75 nm half-pitch patterns, or four 100 nm half-pitch patterns. The feature size reduction will most likely require the assistance of techniques such as chemical shrinks, thermal reflow, or shrink assist films. This composite pattern can then be transferred down into the final layer.  This is best described by considering a process example. A first exposure of photoresist is transferred to an underlying hardmask layer. After the photoresist is removed following the hardmask pattern transfer, a second layer of photoresist is coated onto the sample and this layer undergoes a second exposure, imaging features in between the features patterned in the hardmask layer. The surface pattern is made up of photoresist features edged between mask features, which can be transferred into the final layer underneath. This allows a doubling of feature density.  A variation on this approach which eliminates the first hardmask etch is "resist freezing", which allows a second resist coating over the first developed resist layer. JSR has demonstrated 32 nm lines and spaces using this method, where the freezing is accomplished by surface hardening of the first resist layer.  In recent years, the scope of the term 'pitch splitting' has gradually been expanded to include techniques involving sidewall spacers.

Sidewall image transfer.

In spacer patterning, a spacer is a film layer formed on the sidewall of a pre-patterned feature. A spacer is formed by deposition or reaction of the film on the previous pattern, followed by etching to remove all the film material on the horizontal surfaces, leaving only the material on the sidewalls. By removing the original patterned feature, only the spacer is left. However, since there are two spacers for every line, the line density has now doubled. This is commonly referred to as self-aligned double patterning (SADP). The spacer technique is applicable for defining narrow gates at half the original lithographic pitch, for example.  As pitch splitting has become more difficult due to possible differences in feature positions between different exposed parts, sidewall image transfer (SIT) has become more recognized as the necessary approach. The SIT approach typically requires a spacer layer to be formed on an etched feature's sidewall. If this spacer corresponds to a conducting feature, then ultimately it must be cut at no less than two locations to separate the feature into two or more conducting lines as typically expected. On the other hand, if the spacer corresponds to a dielectric feature, cutting would not be necessary. The prediction of how many cuts would be needed for advanced logic patterns has been a large technical challenge. Many approaches for spacer patterning have been published (some listed below), all targeting the improved management (and reduction) of the cuts.  As spacer materials are commonly hardmask materials, their post-etch pattern quality tends to be superior compared to photoresist profiles after etch, which are generally plagued by line edge roughness.  The main issues with the spacer approach are whether the spacers can stay in place after the material to which they are attached is removed, whether the spacer profile is acceptable, and whether the underlying material is attacked by the etch removing the material attached to the spacer. Pattern transfer is complicated by the situation where removal of the material adjacent to the spacers also removes a little of the underlying material. This results in higher topography on one side of the spacer than the other. Any misalignment of masks or excursion in pre-patterned feature critical dimension (CD) will cause the pitch between features to alternate, a phenomenon known as pitch walking.  The positioning of the spacer also depends on the pattern to which the spacer is attached. If the pattern is too wide or too narrow, the spacer position is affected. However, this would not be a concern for critical memory feature fabrication processes which are self-aligned.  When SADP is repeated, an additional halving of the pitch is achieved. This is often referred to as self-aligned quadruple patterning (SAQP). With 76 nm being the expected minimum pitch for a single immersion lithography exposure, 19 nm pitch is now accessible with SAQP.

Self-aligned contact/via patterning.

Self-aligned contact and via patterning is an established method for patterning multiple contacts or vias from a single lithographic feature. It makes use of the intersection of an enlarged feature resist mask and underlying trenches which are surrounded by a pre-patterned hardmask layer. This technique is used in DRAM cells and is also used for advanced logic to avoid multiple exposures of pitch-splitting contacts and vias.  Since 32 nm node, Intel has applied the above-mentioned self-aligned via approach, which allows two vias separated by a small enough pitch (112.5 nm for Intel 32 nm metal) to be patterned with one resist opening instead of two separate ones. If the vias were separated by less than the single exposure pitch resolution limit, the minimum required number of masks would be reduced, as two separate masks for the originally separated via pair can now be replaced by a single mask for the same pair.

Spacer-is-dielectric (SID) SADP.

In self-aligned double patterning (SADP), the number of cut/block masks may be reduced or even eliminated in dense patches when the spacer is used to directly pattern inter-metal dielectric instead of metal features. The reason is the cut/block locations in the core/mandrel features are already patterned in the first mask. There are secondary features which emerge from the gaps between spacers after further patterning. The edge between a secondary feature and the spacer is self-aligned with the neighboring core feature.

2D SID spacer patterning.

The use of SID may be applied to 2D arrays, by iteratively adding features equidistant from the previously present features, doubling the density with each iteration. Cuts not requiring tight positioning may be made on this spacer-generated grid.

Triangular spacer (honeycomb structure) patterning.

Samsung recently demonstrated DRAM patterning using a honeycomb structure (HCS) suitable for 20 nm and beyond. Each iteration of spacer patterning triples the density, effectively reducing 2D pitch by a factor of sqrt(3). This is particularly useful for DRAM since the capacitor layer can be fit to a honeycomb structure, making its patterning simpler.

Self-Aligned Quadruple Patterning(SAQP).

SADP may be applied twice in a row to achieve an effective pitch quartering. This is also known as self-aligned quadruple patterning (SAQP). With SAQP, the primary feature critical dimension (CD), as well as the spacing between such features, are each defined by either the first or second spacer.  It is preferred to have the second spacer define non-conducting features for more flexible cutting or trimming options.

Directed self-assembly (DSA).

The number of masks used for sidewall spacer patterning may be reduced with the use of directed self-assembly (DSA) due to the provision of gridded cuts all at once within a printed area, which can then be selected with a final exposure. Alternatively, the cut pattern itself may be generated as a DSA step. Likewise, a split via layout may be recombined in pairs.  Much progress had been reported on the use of PMMA-PS block copolymers to define sub-20 nm patterns by means of self-assembly, guided by surface topography (graphoepitaxy) and/or surface chemical patterning (chemoepitaxy). The key benefit is the relatively simple processing, compared to multiple exposures or multiple depositions and etching. The main drawback of this technique is the relatively limited range of feature sizes and duty cycles for a given process formulation. Typical applications have been regular lines and spaces as well as arrays of closely packed holes or cylinders. However, random, aperiodic patterns may also be generated using carefully defined guiding patterns.  The line edge roughness in block copolymer patterns is strongly dependent on the interface tension between the two phases, which in turn, depends on the Flory "chi" (χ) parameter. A higher value of χ is preferred for reduced roughness; the interfacial width between domains is equal to 2a(6χ), where a is the statistical polymer chain length. Moreover, χN > 10.5 is required for sufficient phase segregation, where N is the degree of polymerization (number of monomer repeats in the chain). On the other hand, the half-pitch is equal to 2(3/π)aNχ. The fluctuations of the pattern widths are actually only weakly (square root) dependent on the logarithm of the half-pitch, so they become more significant relative to smaller half-pitches.  DSA has not yet been implemented in manufacturing, due to defect concerns, where a feature does not appear as expected by the guided self-assembly.

Other multi-patterning techniques.

There have been numerous concerns that multiple patterning diminishes or even reverses the node-to-node cost reduction expected with Moore's Law. EUV is more expensive than three 193i exposures (i.e., LELELE), considering the throughput. Moreover, EUV is more liable to print smaller mask defects not resolvable by 193i. Some aspects of other considered multi-patterning techniques are discussed below.

Self-aligned triple patterning (SATP).

Self-aligned triple patterning has been considered as a promising successor to SADP, due to its introduction of a second spacer offering additional 2D patterning flexibility and higher density. A total of two masks (mandrel and trim) is sufficient for this approach. The only added cost relative to SADP is that of depositing and etching the second spacer. The main disadvantage of SATP succeeding SADP is that it would only be usable for one node. For this reason, self-aligned quadruple patterning (SAQP) is more often considered. On the other hand, the conventional SID SADP flow may be extended quite naturally to triple patterning, with the second mask dividing the gap into two features.

Tilted ion implantation.

Tilted ion implantation was proposed in 2016 by the University of Berkeley as an alternative method of achieving the same result as spacer patterning. Instead of core or mandrel patterns supporting deposited spacers, an ion masking layer pattern shields an underlying layer from being damaged by ion implantation, which leads to being etched away in a subsequent process. The process requires the use of angled ion beams which penetrate to just the right depth, so as not to damage already processed layers underneath. Also, the ion masking layer must behave ideally, i.e., blocking all ions from passing through, while also not reflecting off the sidewall. The latter phenomenon would be detrimental and defeat the purpose of the ion masking approach. Trenches as small as 9 nm have been achieved with this approach, using 15 keV Ar+ ion implantation at 15-degree angles into a 10 nm thermal SiO masking layer. A fundamental aspect of this approach is the correlation between damage width and damage pitch; both widen at the same time for fixed ion mask height and ion beam angle.

Complementary polarity exposures.

The method of complementary exposures is another way of reducing mask exposures for multiple patterning. Instead of multiple mask exposures for individual vias, cuts or blocks, two exposures of opposing or complementary polarity are used, so that one exposure removes interior portions of the previous exposure pattern. The overlapped regions of two polygons of opposite polarity do not print, while the non-overlapped regions define locations that print according to the polarity. Neither exposure patterns the target features directly. This approach was also implemented by IMEC as two "keep" masks for the M0A layer in their 7nm SRAM cell.

Self-aligned blocking or cutting.

Self-aligned blocking or cutting is currently being targeted for use with SAQP for sub-30 nm pitches. The lines to be cut are divided into two materials, which can be etched selectively. One cut mask only cuts every other line made of one material, while the other cut mask cuts the remaining lines made of the other material. This technique has the advantage of patterning double pitch features over lines at the minimum pitch, without edge placement errors.

EUV Multiple Patterning Possibilities.

Although EUV has been projected to be the next-generation lithography of choice, it could still require more than one lithographic exposure, due to the foreseen need to first print a series of lines and then cut them; a single EUV exposure pattern has difficulty with line end-to-end spacing control. In addition, the line end placement is significantly impacted by photon shot noise.  The existing 0.33 NA EUV tools are challenged below 16 nm half-pitch resolution. Tip-to-tip gaps are problematic for 16 nm dimensions. Consequently, EUV 2D patterning is limited to >32 nm pitch. Recent studies of optimizing the EUV mask features and the illumination shape simultaneously have indicated that different patterns in the same metal layer could require different illuminations. On the other hand, a single exposure only offers a single illumination.  For example, in a cross-pitch source-mask optimization for 7nm node, for 40-48 nm pitch and 32 nm pitch, the quality as determined by the normalized image log slope was insufficient (NILS<2), while only 36 nm pitch was barely satisfactory for bidirectional single exposure.  The underlying situation is that EUV patterns may be split according to different illuminations for different pitches, or different pattern types (e.g., staggered arrays vs. regular arrays). This could apply to line-cutting patterns as well as contact/via layers. It is also likely more than one cut would be needed, even for EUV.  At the 2016 EUVL Workshop, ASML reported that the 0.33 NA NXE EUV tools would not be capable of standard single exposure patterning for the 11-13 nm half-pitch expected at the 5 nm node. A higher NA of 0.55 would allow single exposure EUV patterning of fields which are half the 26 mm x 33 mm standard field size. However, some products, such as NVIDIA's Pascal Tesla P100, will be bisected by the half-field size, and therefore require stitching of two separate exposures. In any case, two half-field scans consume twice as much acceleration/deceleration overhead as a single full-field scan.

Multipatterning Implementations.

Memory patterns are already patterned by quadruple patterning for NAND and crossed quadruple/double patterning for DRAM. These patterning techniques are self-aligned and do not require custom cutting or trim masks. For 2x-nm DRAM and flash, double patterning techniques should be sufficient.  Current EUV throughput is still more than 3x slower than 193 nm immersion lithography, thus allowing the latter to be extended by multiple patterning. Furthermore, the lack of an EUV pellicle is also prohibitive.  As of 2016, Intel was using SADP for its 10 nm node; however, as of 2017, the 36 nm minimum metal pitch is now being achieved by SAQP. Intel is using triple patterning for some critical layers at its 14 nm node, which is the LELELE approach. Triple patterning is already demonstrated in 10 nm tapeout, and is already an integral part of Samsung's 10 nm process. TSMC is deploying 7 nm in 2017 with multiple patterning; specifically, pitch-splitting, down to 40 nm pitch. Beyond the 5 nm node, multiple patterning, even with EUV assistance, would be economically challenging, since the departure from EUV single exposure would drive up the cost even higher. However, at least down to 12 nm half-pitch, LELE followed by SADP (SID) appears to be a promising approach, using only two masks, and also using the most mature double patterning techniques, LELE and SADP.

Patterning costs.

"Ref.: A. Raley et al., Proc. SPIE 9782, 97820F (2016).  Compared to 193i SADP, EUV SADP cost is dominated by the EUV tool exposure, while the 193i SAQP cost difference is from the added depositions and etches. The processing cost and yield loss at a lithographic tool is expected to be highest in the whole integrated process flow due to the need to move the wafer to specific locations at high speed. EUV further suffers from the shot noise limit, which forces the dose to increase going for successive nodes. On the other hand, depositions and etches process entire wafers at once, without the need for wafer stage motion in the process chamber. In fact, multiple layers may be added under the resist layer for anti-reflection or etch hard-mask purposes, just for conventional single exposure.

Leading-edge logic/ASIC multi-patterning practices.

Even with the introduction of EUV technology in some cases, multiple patterning has continued to be implemented in the majority of layers being produced. For example, quadruple patterning continues to be used for 7nm by Samsung. TSMC's 7nm+ process also makes use of EUV in a multi-patterning context. Only a few layers are affected anyway; many remain conventional multi-patterning.

Mask costs.

The mask cost strongly benefits from the use of multiple patterning. The EUV single exposure mask has smaller features which take much longer to write than the immersion mask. Even though mask features are 4x larger than wafer features, the number of shots is exponentially increased for much smaller features. Furthermore, the sub-100 nm features on the mask are also much harder to pattern, with absorber heights ≈70 nm.

Wafer productivity.

"Note: WPM = WPH * # tools * uptime / # passes * 24 hrs/day * 30 days/month. Normalized WPM = WPM/(WPM for EUV 1 pass)"  Multiple patterning with immersion scanners can be expected to have higher wafer productivity than EUV, even with as many as 4 passes per layer, due to faster wafer exposure throughput (WPH), a larger number of tools being available, and higher uptime.

Multiple patterning specific issues.

Multiple patterning entails the use of many processing steps to form a patterned layer, where conventionally only one lithographic exposure, one deposition sequence and one etch sequence would be sufficient. Consequently, there are more sources of variations and possible yield loss in multiple patterning. Where more than one exposure is involved, e.g., LELE or cut exposures for SAQP, the alignment between the exposures must be sufficiently tight. Current overlay capabilities are ≈0.6 nm for exposures of equal density (e.g., LELE) and ≈2.0 nm for dense lines vs. cuts/vias (e.g., SADP or SAQP) on dedicated or matched tools. In addition, each exposure must still meet specified width targets. Where spacers are involved, the width of the spacer is dependent on the initial deposition as well as the subsequent etching duration. Where more than one spacer is involved, each spacer may introduce its own width variation. Cut location overlay error can also distort line ends (leading to arcing) or infringe on an adjacent line.

Mixed patterning methods.

Multiple patterning is evolving toward a combination of multiple exposures, spacer patterning, and/or EUV. Especially with tip-to-tip scaling being difficult in a single exposure on current EUV tools, a line-cutting approach may be necessary. IMEC reported that double patterning is becoming a requirement for EUV.  For line patterning, SADP/SAQP could have the advantage over the EUV exposure, due to cost and maturity of the former approach and stochastic missing or bridging feature issues of the latter. For grid location patterning, a single DUV exposure following grid formation also has the cost and maturity advantages (e.g., immersion lithography may not even be necessary for the spacer patterning in some cases) and no stochastic concerns associated with EUV. Grid location selection has an advantage over direct point cutting because the latter is sensitive to overlay and stochastic edge placement errors, which may distort the line ends.

Industrial adoption.

The evolution of multiple patterning is being considered in parallel with the emergence of EUV lithography. While EUV lithography satisfies 10-20 nm resolution by basic optical considerations, the occurrence of stochastic defects as well as other infrastructure gaps and throughput considerations prevent its adoption currently. Consequently, 7nm tapeouts have largely proceeded without EUV. In other words, the multiple patterning is not prohibitive, but more like a nuisance and growing expense. 5nm may be expected in 2020, with the evolution of multiple patterning and status of EUV considered at that time.

7nm and 5nm FinFETs.

Self-aligned quadruple patterning (SAQP) is already the established process to be used for patterning fins for 7 nm and 5 nm FinFETs. With SAQP, each patterning step gives a critical dimension uniformity (CDU) value in the sub-nanometer range (3 sigma). Among the four logic/foundry manufacturers, only Intel is applying SAQP to the metal layers, as of 2017.

DRAM.

Like NAND Flash, DRAM has also made regular use of multiple patterning. Even though the active areas form a two-dimensional array, one cut mask is sufficient for 20 nm. Furthermore, the cut mask may be simultaneously used for patterning the periphery, and thus would not count as an extra mask. When the active area long pitch is ~3.5 x the short pitch, the breaks in the active area form a hexagonal array, which is amenable to the triangular lattice spacer patterning mentioned above. Samsung has already started manufacturing the 18 nm DRAM.

NAND flash.

Planar NAND flash had several layers which use SADP below 80 nm pitch and SAQP below 40 nm pitch.  3D NAND flash used SADP for some layers. While it does not scale so aggressively laterally, the use of string stacking in 3D NAND would imply the use of multiple patterning (litho-etch style) to pattern the vertical channels.  Typically, for NAND, SADP patterns a set of lines from a core mask, followed by using a trim mask to remove the loop ends, and connecting pads with a third mask.

EUV Multipatterning.

EUV multiple patterning is not ruled out, especially for 5nm node. This is due to the tightening tip-to-tip (T2T) spec, representing the minimum distance between metal line ends. In addition, the distance between cuts must not be too small as to expose portions of lines in between.

Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls (using spacers) would be necessary. Even with single exposure having sufficient resolution, extra masks have been implemented for better patterning quality such as by Intel for line-cutting at its 45nm node or TSMC at its 28nm node.


Football at the 2007 South Pacific Games – Men's tournament

Tournament.

The final accredited athlete list at the SPG website shows 10 entered sides. Papua New Guinea, although listed by FIFA as having applied for the 2010 World Cup, did not enter. Tuvalu did enter (although they were not eligible for the World Cup). The group stage draw, undertaken by Tim Cahill, was held on 12 June 2007 in Auckland, New Zealand.  New Caledonia's captain, Pierre Wajoka scored a ninth-minute penalty against Tahiti in the opening fixture of the games, earning him the distinction of being the scorer of the first goal of the 2010 FIFA World Cup qualification process.

Group seedings.

Notes:

Group stage.

Group A.

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Group B.

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Knockout stage.

Final.

"(Note):" The three medallists, New Caledonia, Fiji, and Vanuatu, advanced to the 2008 OFC Nations Cup (together with automatic qualifier New Zealand).

Advancement questions.

Tuvalu.

There remained some uncertainty as to what procedure would occur to Tuvalu advance - as they were not members of FIFA (and therefore did not enter the 2010 FIFA World Cup). While no explicit ruling was communicated on this matter, comments in the press release for the OFC Second Stage draw referred to "nine eligible nations", suggesting that Tuvalu would not have advanced to the OFC Nations Cup regardless of their performance in the South Pacific Games. Had Tuvalu finished in a medal position, the fourth place team would presumably have qualified for the next round of qualifying with the other two medal winners and New Zealand. Tuvalu's early elimination from the competition put an end to any complication over the qualifying process for the next round.  This was the first time ever that a non-FIFA nation has competed in the World Cup. The closest situation in the past was the case of New Caledonia during the 2006 World Cup qualifiers. However, they were at the time in the process of accession to the organisation, and were eliminated from contention for the finals just days before their final admission to the FIFA family.

Papua New Guinea.

Papua New Guinea, having initially entered the 2010 World Cup and indicated their intention to enter the South Pacific Games, were involved in a dispute with their sporting authorities and failed to meet the official accreditation deadline for the South Pacific Games. This meant they were effectively disqualified from the World Cup.

Goalscorers.

There were 110 goals scored in 24 games, for an average of 4.58 goals per game.  Players in bold advanced to the next round.

The 2007 Pacific Games men's football tournament was held at the Toleafoa J.S. Blatter Complex in Apia, Samoa in from 25 August to 7 September 2007.


Life.

Klug was born into a Hamburg working-class family, the first of his parents' three recorded children. His father, Ernst Klug, had grown up far to the south in Vogtland where he had turned down the opportunity to train as a teacher, preferring an apprenticeship as a butcher because, as he put it, "a butcher can always get enough to eat". As a young man, while travelling, Ernst Klug met Emma Lucht in Hamburg. Her family came from nearby Albersdorf, and after a protracted courtship the couple married and set up their home in the Hamburg quarter of Eimsbüttel. The port facilities at Hamburg were booming during the early years of the twentieth century, and by the time Rudolf Klug was born in 1905 his father was working not as a butcher but as a dock worker. Ernst Klug was also active as a trades unionist.  Before he was 9 the First World War had broken out and his father was called away to join the army. In 1916 his younger brother, Ernst-Otto was born, and with the household budget under pressure Rudolf took work as a part-time errand boy, although his mother had to be persuaded to lie about his age for this to be possible. Meanwhile, he moved on from primary to secondary school, hoping to study to become a teacher. His father believed that the option was unaffordable, but his mother took extra work and as he grew older Rudolf also took every opportunity to work during the vacations in order to fund the necessary courses. In 1923 he embarked on a period as a trainee teacher, while continuing to study for the necessary qualification. His pedagogic studies focused, especially, on psychoanalysis and individual psychology. He qualified in 1927 (which was also the year in which his father died following a work accident at the docks) and took a teaching post at the Secondary School in Hamburg's Telemann Street. The co-educational school was considered a progressive establishment with a moderately socialist ethos. His sister later recalled that he developed excellent relationships with the children he taught and was also popular with parents.  With his younger sister, Kati, he started attending a youth club and his political awareness began to develop. While he was considering the need to broaden the access of working class children to education he became a co-founder of the so-called "Proletarische Volksheim-Jugend" organisation. In 1929 Rudolf and Kati joined the Young Communists and the Communist Party itself. They participated in day trips and evening political discussions organised by the party.  Hamburg city politics during the later 1920s, with the Social Democrats and traditional conservative parties losing out to the Communists on the left and, even more starkly, to the Nazis at the other extreme. Rudolf Klug became involved with the "Interests Community of Opposition Teachers" (""Interessengemeinschaft Oppositioneller Lehrer"" / IOL) which was created in 1931 in order to "oppose the dismantling of social rights and achievements in education and the growing risk of fascism". As a popular young teacher who was also a Communist Party activist Rudolf Klug generated mistrust at an increasingly jittery city hall, both among the Nazis and among the traditional conservatives. An investigation hearing was launched in May 1930 after he had been denounced for "creating squads of school children" to "fight against fascism in schools". The allegation concerned not the school where he worked but a nearby school in Rellinger Street (where he had never had any involvement). While the investigations triggered by the complaint were under way the party selected him as a candidate for the 1931 municipal elections and he was dismissed from the teaching service. Pupils and teachers at his own school in Telemann Street, supported by the governors, protested and the Social Democrat chairman of the governors Fritz Köhne succeeded in having him reinstated, but the supervisory school board nevertheless insisted that he be moved to another school, and asked the police to keep an eye on him.  The Nazis took power nationally in January 1933 and lost little time in converting the German state into a one-party dictatorship. Party political activity (unless in support of the Nazi party) became illegal. Early on Klug spoke out in public against the rapid withdrawal of human rights. Under the provisions of the Law for the Restoration of the Professional Civil Service (""Law for the Restoration of the Professional Civil Service"") which had been in force since 7 April 1933 Klug was identified for permanent exclusion from the schools service on 17 June 1933. The law in question is generally cited as a device for removing Jews from public service, but there was also scope for applying it to other public servants, including teachers, who fell out of official favour for non race-based political reasons. Klug's name appeared in an advertisement in several Hamburg which listed a number of teachers "on leave from the schools service" ("""aus dem Schuldienst beurlaubt""").  Klug had already had his apartment searched by police in May 1933, and been arrested while at school, but he had on that occasion been released for lack of evidence. Towards the end of the summer he was arrested again, and on 4 October 1933 condemned to a year in prison for "preparing high treason" (""Vorbereitung zum Hochverrat""). He was imprisoned at Wolfenbüttel till 11 August 1934, after which he was involved in forced labour at a young persons' holiday camp on the Island of Sylt. By the end of 1934 he was back in Hamburg and had taken work with the little coffee trading business set up near the dockside by the former municipal politician Kurt Adams. Two things he had in common with Adams (and with his fellow employees) were that he needed to support himself financially and that he had been deprived of his chosen career for reasons of politics and / or race. Klug's own work involved making deliveries by bicycle. In order to avoid drawing the interest of the authorities, the left-wing IOL, of which he had been a member earlier in the decade, had by now dissolved itself into a number of small and for most purposes isolated cells, but his delivery work nevertheless enabled Klug to keep in touch with political friends and teachers whom he had known in the IOL, as well as parents whom he had known when he was a teacher at the school in Telemann Street. And although his deliveries were officially only of coffee, he also took the opportunities presented to distribute illegal written materials.  Klug was probably subjected to a further arrest in 1935. In April 1937 he was one of around 100 political dissidents caught up in a Gestapo round-up. They were taken to the concentration camp at Sachsenhausen where Klug was held for three months. 1937 was also the year in which, after two years, his marriage to his wife Ilse broke up. On his release Klug returned to Hamburg, shortly afterwards resuming his illegal political activities and supporting himself with casual work. Later he found work as a credit control book keeper in Hamburg's Lurup quarter with an abrasives producer called Christiansen & Co. In 1938 he was interrogated at the city hall by the Gestapo who invited him to tell them about the illegal activities of teachers.  Participating in a political discussion group that masqueraded as an "emigrants' group", Rudolf Klug got to know the book seller Margaretha Kubicki. They married during 1940 and moved into an address at Barmbeker Street 93. Their daughter Anja was born on 18 April 1942.  In 1940 a communist resistance group coalesced in Hamburg around Bernhard Bästlein, Franz Jacob and Robert Abshagen. Rudolf Klug joined them. By the end of 1944 all four men would have been executed. In the world beyond Hamburg, the German invasion of Poland in September 1939 had triggered a wider war across Europe. Rudolf Klug's criminal record made him officially "unworthy for military service". According to his sister he was persuaded by comrades in the Bästlein-Jacob-Abshagen Group to apply to have his "fitness for military service" restored in order that he might join the army and create political opposition to the Nazis inside it. His wife always insisted that the application in question did not come from Klug at all. Either way, he was conscripted, not into the regular army but into a "Landsturm" (regional militia). Here he was trusted to guard prisoners of war.  Still guarding prisoners of war, Klug's final posting was to Narvik in the north of occupied Norway. Here he made contact with prisoners and with a group of Norwegian resistance movement activists. In the context of preparations for the escape of a group of inmates from the prison camp, Klug returned a Soviet officer's pistol that had been confiscated and was being kept in the office. The absence of the pistol was spotted and on 26 February 1944 Rudolf Klug was detained. He managed to escape from his captors, but was betrayed by members of his unit and re-arrested. On 15 March a military court gave him a double death sentence, finding him guilty of both treason during war and of desertion. On 28 March 1944 the sentence was carried out when Rudolf Klug was shot dead just outside Narvik, at Beisfjord.  The military court notified the widow that Klug had been buried "on the spot." The court ordered Margarete not to publish any death notice or obituary about her husband.

Rudolf Klug (8 October 1905 – 28 March 1944) was a Hamburg school teacher. He became a member of the Communist Party in 1928 and suffered from growing levels of harassment at work. When the Nazi Party took power in Germany at the beginning of 1933 his problems greatly intensified: he had already been dismissed from one teaching post, and participated in (now illegal) resistance to the government.


Life.

Johannes Bünderlin was born in Linz, Upper Austria and studied at the University of Vienna from 1515–1519 where he learned Hebrew, Greek and Latin, but left without taking a degree as he was unable to afford the tuition. He became a Lutheran preacher in the employ of an Austrian nobleman, but in 1526 received adult baptism as an Anabaptist in Augsburg, where he probably met Hans Denck. From Augsburg Bünderlin went first to Nikolsburg where Anabaptist leader Balthasar Hubmaier was arrested and later tortured and burned as a heretic. After two years, the continued persecution of Anabaptists prompted a move to the more free-thinking city of Strasbourg. Bünderlin was expelled from the city of Constance in 1530 because of his religious views.

Belief.

Bünderlin believed in a two-fold revelation of God, as the living Word in the soul of man, and through external signs and events. He believed that through love, one could realize the inward Word, bring the human will to peace and harmony with God's will and become one with the eternal Spirit. The purpose of religion was to awaken the mind and to direct it to the inward Word.  This union with the Spirit, of living upward toward the divine goodness instead of downward toward individual selfhood is an act of free will that results in Salvation.

Works.

Johannes Bünderlin wrote three books:  "Ein gemayne Berechnung über der Heiligen Schrift Inhalt", etc. ("A General Consideration of the Contents of Holy Scripture.") Printed in Strasbourg in 1529.  "Aus was Ursach sich Gott in die nyder gelassen und in Christo vermenschet ist", etc., 1529. ("For what cause God has descended here below and has become incarnate in Christ.")  "Erklärung durch Vergleichung der biblischen Geschrift, doss der Wassertauf sammt andern äusserlichen Gebräuchen in der apostolischen Kirchen geubet, on Gottes Befelch und Zeugniss der Geschrift, von etlichen dieser Zeit wider efert wird", etc., 1530. ("Declaration by comparison of the Biblical Writings that Baptism with Water, together with other External Customs practised in the Apostolic Church, have been reinstated by some at this time without the Command of God or the Witness of the Scriptures.")

Johannes Bünderlin (b. Linz before 1500 – after 1540) was an Austrian Anabaptist. Bünderlin was a humanist Catholic priest who had been attracted to the Reformation in Moravia and was baptised by Johannes Denck. Bünderlin returned to Linz and preached there until forced to leave for Konstanz in 1529 at the invitation of Johannes Zwick, though Zwick soon considered that Bünderlin was too radical in his ideas and Bünderlin set out for Prussia.


Organization.

Before the event.

At the 2008 FEI-General Assembly in Buenos Aires, Argentina, Germany was chosen as the country to host the 2011 European Eventing Championship. Luhmühlen, location of the Luhmühlen Horse Trials, was chosen as the location for the event.  Luhmühlen had held the European Eventing Championships already in the years 1975, 1979, 1987 and 1999.

Event and location.

The European Eventing Championship was opened at the afternoon of Wednesday (August 24, 2011) with the opening ceremony “Ritte des Jahrhunderts” (rides of the century). Also on Wednesday the first horse inspection was held. The sport at the Championship had started on Thursday. On Sunday (August 28, 2011) the event ended with the medal ceremony.  The event was held at the eventing course in the “Westergellerser Heide” near Luhmühlen. Before the 2011 Luhmühlen Horse Trials, two months before the European Championship, the show ground of the course was completely rebuilt.  The main sponsor of the Championship was HSBC. Patroness of the event was German federal minister Ursula von der Leyen.

Competitions.

General.

Unmodified since the first European Eventing Championship (with the exception of the European Championship 1997) two medal rankings are held at the Championships: the individual and the team medal ranking.  Since 2005 the European Championships are held as long format three-day event in the new format without steeplechase: dressage, cross country and show jumping.  Eleven teams and also individual riders started at the 2011 European Eventing Championship, in total 70 riders with their horses started. All teams could start with four riders, also each nation could start two extra individual riders. Germany as host nation could start with one team and eight extra individual riders.

Timetable.

The first part of the competition was the dressage phase, held on Wednesday and on Friday (August 25 and 26, 2011). Before the riders participate at the Championship, a test rider ("guinea pig") rides to test the systems. This task is performed by German eventing rider Anna Siemer with her horse "Charlott".  The second part was the cross country phase on Saturday. The jumping phase, last part of the event, was held on Sunday. The competition was held each day from morning to afternoon.

Results.

Provisional result after dressage.

In the dressage phase Germany was the most successful team. The German team get a team result of 98.70 penalty points - the best dressage result in eventing history.  An important contribution to this result came from Ingrid Klimke with "FRH Butts Abraxxas". With a dressage result of 80.00% (annualised 30.00 penalty points) Klimke get her best ever eventing dressage result. With this result she was the leader of the individual ranking after dressage.  Individual ranking: Team ranking:

Provisional result after cross country.

The cross country day was rainy. The course, built by Mark Phillips was a challenging, but solvable task for the riders: two riders retired at the cross country day, eleven riders was eliminated at the cross country. The Belgian team consisted only of two riders after the cross country and was so no more complete team.  After cross country Germany was still in the lead - despite of the fall of the team rider Andreas Dibowski.  Individual ranking: Team ranking:

Final result.

After the cross country phase, on Sunday morning, the second horse inspection was held. Here the horses of a Spanish and of a Polish team rider were deemed "not fit to compete", so they were eliminated. Because of this the Polish team now consisted only of two riders - not a complete team.  Much changes in the individual ranking result from the show jumping phase. Again the German team was successful, team riders Sandra Auffarth and Michael Jung was clear in the show jumping course. As last rider in the competition Ingrid Klimke start in show jumping phase. Her horse "Abraxxas", who had often faults in show jumping in the past - had six time knocked a rail down in this show jumping course. Klimke, now eleventh in the final ranking, comment time with the words ""Sechs um - so schlecht ist er noch nie gesprungen"" (six down - so bad he had never jumped before).  German rider Michael Jung benefited from this. He hold his result form the dressage phase the whole competition, so he won the individual gold medal. Jung is now the third (after Virginia Leng and Zara Phillips) who is the current world and European eventing champion at the same time. The German team was because of the large gap of penalty points also after the show jumping phase in the lead. So Germany win the 2011 European Eventing team gold medal.  Rank two and three in the final individual ranking are also German eventing riders: young Sandra Auffarth won at their first senior championship individual silver. Bronze was won by Frank Ostholt - he benefited by a refusal of the horse of his wife Sara Algotsson-Ostholt in show jumping.  The riders of the British team had all one obstacle fault in the show jumping phase, so they lost the second place in team ranking. The French team rider had all one faults here, so they won team silver.

The 2011 European Eventing Championship was held from August 25 to August 28, 2011 in Luhmühlen, borough of the Samtgemeinde Salzhausen in Lower Saxony, Germany.


Early life and education.

Born at Englishton Park, near Lexington, Indiana, William was the son of businessman William Hayden English, and his wife Emma Mardulia Jackson. He was given a middle name after his maternal grandmother Mahala Eastin of Kentucky, whose immigrant ancestor was said to be a French Huguenot, D'Estaing, from southwestern France.  The English family moved to Indianapolis in 1865. His father became active in business and politics, and eventually owned substantial parcels of real estate. There the boy attended public and private schools. He was graduated in 1873 from the law department of the Northwestern Christian University (now Butler University) at Indianapolis.

Law practice and politics.

English was admitted to the bar the same year and set up his practice in Indianapolis. He worked at law until 1882, when he ran for Congress.  English was first elected to office in 1880 as a member of the State house of representatives. That year his father turned over to him management of English's Opera House, which he had just built in Indianapolis. The younger English was interested in theater and had just married an actress, Annie Fox.  English successfully contested as a Democrat the election in 1882 of Stanton J. Peelle to the Forty-eighth Congress; English was eventually seated, serving from May 22, 1884, to March 3, 1885.  He declined to be a candidate for renomination in 1884 and resumed his former business pursuits at Indianapolis. He served as delegate to the Democratic National Conventions in 1892 and 1896, and chairman of the committee on rules and order of business in the former. He left the Democratic Party in 1900 and became active in the Republican Party.  In the Spanish–American War (1896–1898), English served as captain and aide-de-camp on the staff of Gen. Joseph Wheeler.  Re-entering politics, English served as delegate to the Republican National Convention in 1912. He was elected in 1916 to the Indiana State senate. He was reelected in 1920 and again in 1924, serving until his death in Indianapolis, Indiana on April 29, 1926.  He was interred in Crown Hill Cemetery.

William Eastin English (November 3, 1850 – April 29, 1926) was an American attorney and politician, a U.S. Representative from Indiana. He was the son of vice-presidential candidate and businessman, William Hayden English, and his wife Emma Mardulia Jackson.


Early life.

Feetham was born in Penrhos, Monmouthshire, the fifth son of the Reverend William and Mary Feetham; he was educated at Marlborough College and New College, Oxford. He read law in Lincolns Inn and was called to the Bar in 1899. He served with the Inns of Court Rifles in the Second Boer War. He was one of the young lawyers selected by Lord Milner to assist him in a policy of reconstruction following the Treaty of Vereeniging, who became known as "Milner's Kindergarten".

Legal career.

Feetham became deputy town clerk of Johannesburg in 1902 and town clerk the following year. In April 1905, he resigned from the Town Council and joined the South African Bar.  Feetham was, apart from other work as a commissioner, also appointed "to enquire into and report upon the facts relating to the tenure by natives of their lots in the Potchefstroom native location" and after he completed this work, its findings were reported in 1906 by the Government Printer, Pretoria. This commission's work was undertaken because of the claims of the residents of the old native location that members of the Town Council (Stadsraad) in 1888 gave them verbal assurances of a perpetual right of occupation of their stands as long as they paid their annual rent.  He was legal adviser to Lord Selborne, the High Commissioner in 1907 and a member of the Legislative Council of the Transvaal from (1907-1910). In 1915 he was elected to the House of Assembly of South Africa for the Parktown constituency in Johannesburg. During World War I, Feetham was an officer in the South African Cape Corps and served in East Africa and Egypt.  He was awarded a CMG in 1923 for his services as legal adviser to the High Commissioner for South Africa.

Judicial career.

Feetham resigned from Parliament in 1923 to become a judge of the Transvaal Division of the Supreme Court. In 1930, he was appointed Judge President of the Natal Provincial Division succeeding Dove Wilson. In this role, Feetham was able to show is "towering intellect" and "outstanding leadership qualities" to bring about a change for the better in the status of the Natal Court.  In 1939, Feetham became Judge of Appeal on the South Africa Court of Appeals in Bloemfontein.

University of the Witwatersrand.

In 1938, Feetham was elected Vice Chancellor of the University of the Witwatersrand, Johannesburg. He became Chancellor in 1949. He opposed legislation prohibiting the admission of Non-White students to White tertiary institutions. He also played a leading role in the conference between senior members of the Universities of Cape Town and the Witwatersrand, Johannesburg, which led to publication of the booklet "The Open Universities in South Africa" (1957). He resigned from the position of Chancellor in 1961 and from the University Council two years later.

Service as commissioner.

Feetham served as an international and local commissioner on a number of high-profile commissions.

Feetham Function Committee.

He was chairman of the Feetham Function Committee on Constitutional Reform in India (1918-1919).

Irish Boundary Commission.

He was Chairman of the Irish Boundary Commission (1924-1925) which decided on the precise delineation of the border between the Irish Free State and Northern Ireland following partition in 1921. Lionel Curtis, Lloyd George's main Irish adviser wrote on the appointment of Feetham:  "Incomparably the best man I know for his purpose is one Richard Feetham KC, legal adviser to the Governor General of South Africa. He is an English trained Barrister and a member of the South African assembly who has been through all our constitutional work since Milner's time. On my advice Montague sent him out to India as chairman of a committee to prepare a scheme for the decentralization of powers of the central government. In four months he solved a problem over which the Government of India had been struggling with for over 20 years."  Despite these glowing references the Boundary Commission's report was completely unacceptable to both Northern Irish and Free State governments, and to Feetham's concern was buried, with neither party even prepared to admit having read it.

Kenya Local Government Commission.

In 1926, he was appointed chairman of a commission to consider the development of local government in Kenya, including the ways in which local government could fund itself.

Feetham Report (Shanghai).

In 1930, Feetham was appointed by the Shanghai Municipal Council to investigate the possibility of the end of extraterritoriality in China and its effect on the Shanghai International Settlement. At the time, the British Government was engaged in negotiations with the Kuomintang government of China to bring an end to extraterritoriality. Feetham proposed that extraterritoriality continue at least in the International Settlement until China could form a united and pacified government with constitutional checks and balances.

Transvaal Asiatic Land Tenure Commission.

Between 1932 and 1935 he chairman of a commission consider the issues around allowing Asians to owning land in the Transvaal. The Transvaal Asiatic Land Tenure Act and its subsequent amendments in 1934, 1935 and 1937 establish statutory segregation of Indians in the Transvaal.

Witwatersrand Land Titles Commission.

Between 1946 and 1949 he was chairman of a commission to consider the ownership of land in Witwatersrand.

Death.

Feetham died on 5 November 1965 in Pietermaritzburg, Natal (now kwaZulu-Natal).

Richard Feetham CMG (1874-1965) was a lawyer, politician and judge in South Africa. He was also the chairman of a number of high-profile international and domestic commissions.


Function.

The interosseous membrane divides the forearm into anterior and posterior compartments, serves as a site of attachment for muscles of the forearm, and transfers loads placed on the forearm.  The interosseous membrane is designed to shift compressive loads (as in doing a hand-stand) from the distal radius to the proximal ulna. The fibers within the interosseous membrane are oriented obliquely so that when force is applied the fibers are drawn taut, shifting more of the load to the ulna. This reduces the wear and tear of placing the whole load on a single joint. The role of the membrane in load shifting is illustrated when the interosseous membrane is cut; the forces on each bone equalize from their natural proportions.  Additionally, as the forearm moves from pronation to supination, the interosseous membrane fibers change from a relaxed state, to a tense state in the neutral position. They once again become relaxed as the forearm enters pronation.  The interosseous membrane is composed of five ligaments:

Injury.

Severe forearm injuries involving separation of the radius and ulna may be due to rupture of the interosseous membrane. Rupture can lead to proximal migration of the radius and an apparent lengthening of the ulna at the wrist. Often interosseous membrane tears are associated with adverse impacts on forearm rotation. MRI-assisted diagnosis has been used for mid-substance tears of the interosseous membrane but is expensive and not widely available. On the contrary, ultrasound has proven useful in diagnosing tears of the tibiofibular interosseous membrane of the leg, and this technique may also be applied to acute cases of membrane tears in the forearm due to its low cost and portability.

The interosseous membrane of the forearm (rarely middle or intermediate radioulnar joint) is a fibrous sheet that connects the interosseous margins of the radius and the ulna. It is the main part of the radio-ulnar syndesmosis, a fibrous joint between the two bones.


History.

Standerton was founded in 1878 on a farm called "Grootverlangen" and named after its owner Commandant Adriaan Henrik Stander. The South African Republic's Volksraad approved the formation of a town at the drift in 1876 and proclaimed two years later. It was granted municipal status in 1903. The crossing over the Vaal River, now bridged, was known as "Stander's Drift" and a hill close to the town was called "Standerskop" were also named after Stander. During the First Boer War (1880–81), a British unit was besieged by the Boer forces who shelled them from the nearby hill, the former holding out until the end of the war in February 1881.

Great Trek memorial controversy.

The town has received nationwide media attention in 2007 and 2008 following the destruction of an important voortrekker memorial. This monument, located near the facade of the municipality building, was constructed by Afrikaners to mark the 150th anniversary of the Great Trek. The Lekwa municipality's mayor Queen Radebe-Khumalo ordered the structure demolished in April 2007. "That piece of thing means nothing to us. It's just a piece of cement with tracks. I do not even know where it comes from", Radebe-Khumalo declared in a statement quoted by the "Beeld" newspaper.  The incident led to widespread condemnation by the local Afrikaans community. Jan Bosman, a spokesperson for the Afrikanerbond, claimed that "actions like these undo the spirit of reconciliation as promoted by former president Nelson Mandela and Archbishop Desmond Tutu". In June 2007, a joint initiative between AfriForum and Solidarity lodged an application to the Pretoria High Court requesting that the mayor offer compensation for damages claimed. A subsequent court order ruled that Radebe-Khumalo and her municipality would pay for the damage and prohibited attempts to remove another statue erected in memory of Anglo-Boer war concentration camp victims.  In May 2010, the memorial was rebuilt on its original site.

Sakhile Township riots.

The township of Sakhile near Standerton was the site of violent, service delivery riots that led to the Lekwa Municipality mayor Juliet Queen Radebe-Khumalo and other senior municipal officials, being recalled by the African National Congress in October 2009. The riots included the burning of tyres and blocking some entries to the town.

Economy.

Agriculture.

The area around the town promotes mixed agriculture with crops such as maize, sunflower seeds, ground nuts and potatoes. Poultry and dairy farming is also conducted in the region.

Education.

Schools.

Standerton Primary School is a school that was officially opened in the year 1959, with its first acting principal being Miss C. Fisher and a total of 153 learners after its initial opening. The school anthem was composed by one Joan Whitington. The new hall is called the Barbara Dunbar Hall. There are three houses called Hawks, Eagles and Falcons. The school motto is ""Sapienta Vincit"" (Latin for "Wisdom Conquers"). The key on the school badge represents unlocking knowledge. The official school colours are blue, red and yellow. The current principal is Mr C. J. van Vuuren.  Khula-Sakhile Secondary School is a school that had been struggling for years with their matriculants' results when finally in the 2013-14 matric group, the school managed to score a 100% pass rate which was seen as a very proud moment for both the Sakhile area as well as the Mpumalanga province as a whole.

Infrastructure.

Dams.

Grootdraai Dam is situated in the upper reaches of the Vaal River less than 10 km upstream of Standerton. It has a catchment area of 8,195 km, a mean annual precipitation of approximately 750 mm, a mean annual potential evaporation at the dam site of 1,400 mm and a natural inflow of 580 million m/a. The full supply capacity of the reservoir is 364 million m. The Grootdraai dam was completed in 1982.

Notable people.

Although Standerton is a rural town surviving mainly on agriculture, it has produced talented people prominent in South African society.

Standerton is a large commercial and agricultural town lying on the banks of the Vaal River in Mpumalanga, South Africa, which specialises in cattle, dairy, maize and poultry farming. The town was established in 1876 and named after Boer leader Commandant A. H. Stander. During the First Boer War a British garrison in the town was besieged by the Boers for three months. General Jan Smuts won this seat during elections and went on to assist in setting up the League of Nations. Standerton is part of the Lekwa Local Municipality.