Deposition of SiN&lt;sub&gt;x&lt;/sub&gt; Films with Controlled Residual Stress from SiH&lt;sub&gt;4&lt;/sub&gt;-NH&lt;sub&gt;3&lt;/sub&gt;-He Gaseous Mixture in Inductively Coupled Plasma
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki