Comparative Study of Al<sub>2</sub>O<sub>3</sub> and HfO<sub>2</sub> for Surface Passivation of Cu(In,Ga)Se<sub>2</sub> Thin Films: An Innovative Al<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub> Multistack Design
Physica status solidi. A, Applications and materials science