Formation of Mg&lt;sub&gt;2&lt;/sub&gt;Si&lt;sub&gt;1−&lt;i&gt;x&lt;/i&gt;&lt;/sub&gt;Sn&lt;i&gt;&lt;sub&gt;x&lt;/sub&gt;&lt;/i&gt; Thin Films by Co-sputtering and Investigation of their p-type Electrical Conduction
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