Mécanismes de recuit dans le silicium implanté par faisceau d’ion caractérisés par nanocalorimétrie
We present the fabrication process, characterization and numerical model allowing the optimization of a new device that allows us to perform nanocalorimetry measurements on a silicon single crystals. The thermal properties of this device allows us to perform measurements at temperature higher than 900 C with a resolution better than 16 C. The device is used to study the ion implantation induced defect dynamic in monocrystalline silicon. Two different behaviours regarding the nucleation of the amorphous phase are observed at 10 and 80 keV. These results are confronted to Monte Carlo simulations based on the interstitial vacancy pair model. The comparison between simulations and measurements show that the model is incomplete as it reproduces only qualitatively some features of the experimental observations. Measurements performed from -110 C in monocrystalline and amorphized silicon implanted with light ions revealed clear differences between structural relaxation in amorphous silicon and defect annealing in monocrystalline silicon. Two processes with activation energies of 0.48 and 0.6 eV are observed after implantation performed in monocrystalline silicon while a uniform heat release associated with a continuous spectrum in terms of activation energy is observed in amorphous silicon.
relaxation structurelle surface science defect structural relaxation amorphous silicon