Self-assembly of PS-PVP block copolymers and their complexes at the air/water interface
Deeper understanding and control of the self-assembly of diblock copolymers and their complexes at the air/water interface allow the formation of nanopatterns with known properties to provide a competitive substitute to nanolithography. In this dissertation, Langmuir and Langmuir-Blodgett (LB) monolayers obtained from polystyrene-poly(4-vinyl pyridine) diblock copolymers (PS-PVP), alone and hydrogen-bonded by various small molecules [particularly, 3-n-pentadecylphenol (PDP)], have been extensively investigated. A major part of the research was devoted to the study of an uncommon monolayer pattern that we term the nanostrand network. LB monolayers consisting of nanostrands have sometimes been reported in the literature, but are often coexistent with other morphologies, which is not useful for potential applications. We have determined the molecular parameters and experimental conditions that control this morphology, making it highly reproducible, and have proposed a novel mechanism for the formation of this morphology. In addition, we have shown that the use of high-boiling spreading solvents, not usually used for Langmuir film preparation, can improve the nanostrand order. By investigation of a wide range of PS-PVP’s with various block ratios and molecular weights, with and without PDP present, we have established the composition dependence of the main LB morphology types (planar, nanostrand, nanodot) and the influence of each type on spreading solution concentration. This led to an extensive discussion concerning the mechanisms of morphology formation, including kinetic, molecular association, and dewetting contributions. We have also shown that the isotherm plateau transition for nanodot-forming PS-PVP/PDP is related to an order–order transition that occurs simultaneously with PDP reorientation, both aspects being clearly observed by AFM. These studies also form the basis for the use of ultrathin PS-PVP/PDP films as templates. The ability to produce well-controlled nanopatterned films on various substrates has been demonstrated, and film stability has been verified. Removal of small molecules from the nanostructures has revealed the appearance of new substructure of interest for further study.
self-assembly nanostructured ultrathin films block copolymers nanostrand network Langmuir and Langmuir-Blodgett monolayers air/water interface supramolecular approach polystyrene-poly(4-vinyl pyridine)