Supramolecular polymers azo-containing : photo-responsive block copolymer elastomers and homopolymers
Much effort in the area of polymer materials involves the development of new functional materials for specific, often highly sophisticated, applications using simplified methods of synthesis and preparation. This thesis focuses on photo-responsive polymers – i.e. functional materials that respond in various ways to light – that are prepared with the aid of supramolecular chemistry – i.e. a preparation method that relies on the spontaneous selfassembly of simpler molecular building blocks via noncovalent interactions to form the final targeted material. Two types of photo-responsive materials were targeted, namely block copolymer thermoplastic elastomers (TPEs) and photo-responsive homopolymer complexes. TPEs are well-known, even commercial, materials that are typically based on triblock copolymers with a highly flexible middle block and rigid outer blocks that phase separate into isolated domains of the hard, outer block phase within a matrix of the soft block phase, and they have the advantage of being recyclable. For the first time, to our knowledge, we have prepared such materials with photo-responsive properties based on supramolecular complexation between a simpler parent triblock copolymer and a small molecule possessing the photo-responsive functionality via an azobenzene group. Specifically, this involved the ionic complexation of the quaternized form of a block copolymer, poly(dimethylaminoethyl methacrylate)-poly(n-butyl acrylate)-poly(dimethylaminoethyl methacrylate) (PDM-PnBAPDM), synthesized by atom transfer radical polymerization (ATRP), with methyl orange (MO), a commercially available SO3 --functionalized azo-containing compound. PnBA has a subambient glass transition (-46 °C) and the MO-complexed PDM outer blocks have a high glass transition (140-180 °C, depending on the molecular weight). Simple elasticity tests show that the complexed block copolymers with hard block weight fractions between about 20 and 30% have elastomeric character. AFM and TEM (atomic force and transmission electron microscopies) of spin-coated films show a correlation between the elastomeric character and morphologies where the hard block forms a dispersed minority phase (spherical and/or short cylindrical domains). A continuous hard phase (inverted morphology) is observed for a hard block content of around 37 wt %, which is much lower than found for neutral block iv copolymers due to ionic interactions. Reversible photoisomerization was demonstrated for these materials in both solution and in film form. The synthesis of the PDM-PnBA-PDM block copolymer was then optimized by using the halogen exchange technique in ATRP, along with other modifications to the polymerization recipe. Monodisperse products were obtained for both the macroiniaitor and the block copolymer. Based on a single parent block copolymer, a series of partially/fully quaternized and complexed block copolymers were prepared. Preliminary stretching tests on the MO-complexed block copolymers showed that their elasticity is correlated with the hard block content, which can be tuned by the degree of quaternization and complexation. Finally, a series of homopolymer complexes self-assembled from PDM and azobenzene derivatives bearing three different groups capable of directed interactions with the amino moiety of PDM (OH, COOH and SO3 -) were prepared, where the azo derivative associates with PDM via hydrogen-bonding interactions, by ionic bonding mixed with hydrogen bonding through proton-transfer (acid-base) interactions, and by purely ionic interactions via ion exchange procedures, respectively. The influence of the azo content and bonding type on surface relief grating (SRG) inscription was investigated. The SRG diffraction efficiencies and grating depths in spin-coated films show that ionic bonding and high azo content leads to more efficient SRG formation.
PDM Supramolecular complexes Block copolymers Azobenzene Optical properties Thermoplastic elastomers (TPEs) PDM Halogen exchange Surface relief gratings (SRG) Photoisomerization