TECHNICAL FIELD

This disclosure relates generally to imprinting technology, particularly for double-sided imprinting.

BACKGROUND

When developing a process and/or a tool for transitioning from creating single sided imprints on a substrate to imprints on both sides from templates, there are a lot of challenges to overcome. The challenges can include: positioning and aligning the substrate and the templates, locating reference features to assist in the alignment, creating the imprints without air entrapment and defects, and holding the substrate without damage.

SUMMARY

The present disclosure describes methods, devices, and systems for double-sided imprinting, which have addressed the challenges mentioned above.

One aspect of the present disclosure features a double-sided imprinting method including: drawing a first web along first rollers and drawing a second web along second rollers, the first web comprising a first template and the second web comprising a second template; aligning reference marks on the first web and the second web, such that the first template and the second template are aligned with each other; drawing the first web along the first rollers in a first direction to expose the first template to a first dispenser and drawing the second web along the second rollers in a second direction to expose the second template to a second dispenser; dispensing first resist on the first template by the first dispenser and dispensing second resist on the second template by the second dispenser; drawing the first web along the first rollers in a direction reverse to the first direction and drawing the second web along the second rollers in a direction reverse to the second direction, such that the first template with the first resist and the second template with the second resist face to each other; inserting a substrate between the first template with the first resist and the second template with the second resist; curing the first resist and the second resist, such that the cured first resist has a first imprinted feature associated with the first template on a first side of the substrate and the cured second resist has a second imprinted feature associated with the second template on a second side of the substrate; and unloading the substrate with the first imprinted feature on the first side and the second imprinted feature on the second side.

In some implementations, the method further includes: after the aligning, clamping the first web and the second web at a location adjacent to the reference marks, such that the clamped first web and second web are moved with the first template and the second template aligned with each other; and after the curing, unclamping the first web and the second web, such that the substrate with the cured first resist and second resist is capable of passing through a gap between the first web and the second web. Clamping the first web and the second web can include actuating a chuck with a clamp, such that the chuck is onto the first web and the clamp is onto the second web. The chuck can include a vacuum chuck configured to chuck onto the first web with vacuum. In some examples, the chuck is configured to be movable along a rail parallel to an axis defined by the first rollers, and the chuck and the clamp are moved together with the first web and the second web after the clamping. The chuck can be positioned on a pair of guides, and each of the guides can be movable on a respective rail connected to a frame. Aligning reference marks on the first web and the second web can include adjusting relative positions of the guides on the respective rails in at least one of x, y, or theta direction.

The first rollers and the second rollers can be arranged such that, after the inserting, the substrate is moved together with the first template and the second template, and the first resist is pressed onto the first side of the substrate and filled into a first imprinting feature on the first template and the second resist is pressed onto the second side of the substrate and filled into a second imprinting feature on the second template.

The method can further include: moving a first squeegee roller on the first web to push the first template into the first resist, such that the first resist fills into a first imprinting feature on the first template; and moving a second squeegee roller on the second web to push the second template into the second resist, such that the second resist fills into a second imprinting feature on the second template. The first squeegee roller and the second squeegee roller can be positioned opposite to each other during moving together the first squeegee and the second squeegee.

In some cases, aligning reference marks on the first web and the second web includes aligning a first reference mark on the first web with a second reference mark on the second web and aligning a third reference mark on the first web with a fourth reference mark on the second web. The first reference mark and the third reference mark can define a range where the substrate is configured to be imprinted with the first template. In some cases, aligning reference marks on the first web and the second web includes moving a z-roller of the first rollers in at least one of x, y, or theta direction. In some cases, aligning reference marks on the first web and the second web includes locating the reference marks by using at least one of a camera system or a laser system.

The first direction can be counter-clockwise direction, and the second direction can be clockwise direction. In some examples, the first rollers include at least one air turn roller configured to float the first web by air pressure. In some examples, the first rollers include at least one air turn roller configured to chuck the first web by vacuum.

In some examples, the first rollers include two first z-rollers arranged in a vertical direction, and the second rollers include two second z-rollers arranged in the vertical direction. Dispensing first resist on the first template by the first dispenser can include dispensing the first resist on the first template when the first template is in a horizontal direction, and dispensing second resist on the second template by the second dispenser can include dispensing the second resist on the second template when the second template is in the horizontal direction.

In some examples, inserting the substrate includes inserting the substrate by a first holder along an inserting direction. In some cases, unloading the substrate includes moving the substrate with the first and second imprinted features along a direction reverse to the inserting direction and unloading the substrate with the first and second imprinted features by the first holder. In some cases, unloading the substrate includes moving the substrate with the first and second imprinted features along the inserting direction and unloading the substrate with the first and second imprinted features by a second, different holder. The method can further include measuring first tension of the first web by a first tension sensor and measuring second tension of the second web by a second tension sensor. The method can further include controlling at least one of temperature or cleanness of a chamber enclosing at least the first template and the second template.

The method can include: before drawing the first template into an imprinting region and when the first web is static, locating a first reference mark on the first web using a detecting system positioned upstream one of the first rollers. The method can include: locating a first reference mark on the first web with a reference mark on the substrate; aligning the first reference mark on the first web with the reference mark on the substrate; and after the alignment, clamping the first reference mark to move the first web such that the first template is moved to an imprinting start position in synchronization with an imprinting start position of the substrate. The method can further include: aligning reference marks on the first web and the second web includes: measuring an angle of the first web by one or more sensors arranged on an edge of the first web; and repositioning the substrate based on the measured angle of the first web.

Another aspect of the present disclosure features a system for double-sided imprinting, including: first rollers for moving a first web including a first template; second rollers for moving a second web including a second template; an alignment system configured to align reference marks on the first web and the second web such that the first template and the second template are aligned with each other; a first dispenser configured to dispense first resist on the first template; a second dispenser configured to dispense second resist on the second template; a loading system configured to insert a substrate between the first template and the second template; and a light source configured to cure the first resist and the second resist, such that the cured first resist has a first imprinted feature associated with the first template on a first side of the substrate and the cured second resist has a second imprinted feature associated with the second template on a second side of the substrate. In operation, the first web is drawn along the first rollers in a first direction to expose the first template to the first dispenser and the second web is drawn along the second rollers in a second direction to expose the second template to the second dispenser, and then, the first web is drawn along the first rollers in a direction reverse to the first direction and the second web is drawn along the second rollers in a direction reverse to the second direction, such that the first template with the first resist and the second template with the second resist face to each other.

In some implementations, the system further includes an unloading system configured to unload the substrate with the first imprinted feature on the first side and the second imprinted feature on the second side. In some cases, the loading system is configured to unload the substrate when the substrate with the first and second imprinted feature is reversely moved back to the loading system.

In some implementations, the system further includes a clamping system configured to: clamp the first web and the second web at a location adjacent to the reference marks, such that the clamped first web and second web are moved with the first template and the second template aligned with each other; and unclamp the first web and the second web, such that the substrate with the cured first resist and second resist is capable of passing through a gap between the first web and the second web. The clamping system can include: a chuck configured to chuck the first web; and a clamp configured to clamp the second web when actuated with the chuck. The chuck can include a vacuum chuck configured to chuck onto the first web with vacuum. The chuck can be configured to be movable along a rail parallel to an axis defined by the first rollers, and the chuck and the clamp can be moved together with the first web and the second web after clamping the first web and the second web. In some examples, the chuck is positioned on a pair of guides, and each of the guides is movable on a respective rail connected to a frame, and the alignment system is configured to align the reference marks on the first web and the second web by adjusting a relative position of the guides on the respective rails in at least one of x, y, or theta direction.

The first rollers and the second rollers can be arranged such that the substrate is moved together with the first template and the second template, and the first resist is pressed onto the first side of the substrate and filled into a first imprinting feature on the first template and the second resist is pressed onto the second side of the substrate and filled into a second imprinting feature on the second template. The alignment system can be configured to align the reference marks on the first web and the second web by moving a z-roller of the first rollers in at least one of x, y, or theta direction. The system can further include a locating system configured to locate the reference marks on the first web and the second web for alignment, and the locating system can include at least one of a camera system or a laser system.

The first direction can be counter-clockwise direction, and the second direction can be clockwise direction. In some examples, the first rollers include at least one air turn roller configured to float the first web by air pressure. In some examples, the first rollers include at least one air turn roller configured to chuck the first web by vacuum. In some examples, the first rollers include two first z-rollers arranged in a vertical direction, and the second rollers include two second z-rollers arranged in the vertical direction, and the first dispenser can be configured to dispense the first resist on the first template when the first template is in a horizontal direction, and the second dispenser is configured to dispense the second resist on the second template when the second template is in the horizontal direction.

The system can further include first and second tension sensors configured to measure tension of the first web and the second web, respectively. The system can further include a chamber configured to enclose the first template and the second template and a controller configured to control at least one of temperature or cleanness of the chamber.

A third aspect of the present disclosure features a double-sided imprinting method including: drawing a first web along first rollers, the first web comprising a first template having a first imprinting feature; dispensing first resist on the first template; loading a substrate onto the first template, such that a first side of the substrate is in contact with the first resist on the first template; clamping the substrate onto the first template, such that the substrate is movable together with the first template; dispensing second resist on a second side of the substrate; aligning a first reference mark on the first web with a second reference mark on a second web that includes a second template having a second imprinting feature, such that the second imprinting feature is aligned with the first imprinting feature; after the aligning, drawing the first web along the first rollers and drawing the second web along second rollers simultaneously at a same rate; curing the first resist and the second resist, such that the cured first resist has a first imprinted feature corresponding to the first imprinting feature on the first side of the substrate and the cured second resist has a second imprinted feature corresponding to the second imprinting feature on the second side of the substrate; and unloading the substrate with the first imprinted feature on the first side and the second imprinted feature on the second side.

The method can further include waiting until the first resist spreads into the first imprinting feature of the first template. The first imprinting feature can include a grating feature, and the grating feature can be configured such that the first resist uniformly fills into the grating feature.

The first reference mark can be positioned ahead of the first imprinting feature on the first web along a direction of drawing the first web, and the second reference mark can be positioned ahead of the second imprinting feature on the second web along the direction. In some examples, the first template includes one or more pre-pattered through holes, and clamping the substrate onto the first web includes holding with vacuum the substrate by a vacuum chuck through the one or more pre-patterned through holes.

In some implementations, the first rollers include two first z-rollers arranged in a horizontal direction, and the second rollers include two second z-rollers arranged in the horizontal direction. The two first z-rollers can define a first moving range for the first web and the two second z-rollers can define a second moving range for the second web, and the first moving range can be larger than the second moving range and can enclose the second moving range. In some cases, the first rollers and the second rollers are arranged to define a vertical distance between the first template and the second template, and the vertical distance can be defined such that the second resist is pressed onto the second side of the substrate and filled into the second imprinting feature on the second template.

The method can further include: before the curing, moving a squeegee roller onto the second web to push the second template into the second resist, such that the second resist fills into the second imprinting feature. The method can further include: after the aligning, moving the second rollers together with the second web to be in contact with the second resist on the second side of the substrate, such that the second template is pressed into the second resist and the second resist fills into the second imprinting feature.

In some examples, unloading the substrate includes: pulling the second web away from one of the second rollers to separate from the substrate; and unclamping the substrate and taking from the first web the substrate.

A fourth aspect of the present disclosure features a system for double-sided imprinting, including: first rollers for moving a first web including a first template having a first imprinting feature; second rollers for moving a second web including a second template having a second imprinting feature; a first dispenser configured to dispense first resist on the first template; a loading system configured to load a substrate onto the first template, such that a first side of the substrate is in contact with the first resist on the first template; a clamping system configured to clamp the substrate onto the first web, such that the substrate is movable together with the first web; a second dispenser configured to dispense second resist on a second side of the substrate; a locating system configured to locate a first reference mark on the first web with a second reference mark on the second web for aligning the first reference mark with the second reference mark; a light source configured to cure the first resist and the second resist, such that the cured first resist has a first imprinted feature corresponding to the first imprinting feature on the first side of the substrate and the cured second resist has a second imprinted feature corresponding to the second imprinting feature on the second side of the substrate; and an unloading system configured to unload the substrate with the first imprinted feature on the first side and the second imprinted feature on the second side. After the first reference mark and the second reference mark are aligned with each other, the first web and the second web are drawn simultaneously at a same rate.

The first imprinting feature of the first template can include a grating feature, and the grating feature can be configured such that the first resist uniformly fills into the grating feature. The first reference mark can be positioned ahead of the first imprinting feature on the first web along a direction of drawing the first web, and the second reference mark is positioned ahead of the second imprinting feature on the second web along the direction. The first template can include one or more pre-pattered through holes, and the clamping system comprises a vacuum chuck configured to hold with vacuum the substrate through the one or more pre-patterned through holes.

In some implementations, the first rollers include two first z-rollers arranged in a horizontal direction, and the second rollers include two second z-rollers arranged in the horizontal direction. The two first z-rollers can define a first moving range for the first web and the two second z-rollers can define a second moving range for the second web, the first moving range being larger than the second moving range and enclosing the second moving range. The first rollers and the second rollers can be arranged to define a vertical distance between the first template and the second template, and the vertical distance can be defined such that the second resist is pressed onto the second side of the substrate and filled into the second imprinting feature on the second template.

The first dispenser, the loading system, the second dispenser, the locating system, the light source, and the unloading system can be arranged sequentially along a direction of drawing the first web along the first rollers. The system can further include a squeegee roller configured to apply pressure onto the second web to push the second template into the second resist, such that the second resist fills into the second imprinting feature of the second template.

The first rollers can include at least one air turn roller configured to float the first web by air pressure. The second rollers can be configured to be movable together with the second web to be in contact with the second resist on the second side of the substrate after the aligning, such that the second template is pressed into the second resist and the second resist fills into the second imprinting feature. In some examples, the loading system can include an equipment front end module (EFEM), and the unloading system can include a second EFEM. In some examples, the locating system includes at least one of a camera system or a laser system. The system can further an alignment system configured to align the first reference mark on the first web with the second reference mark on the second web.

A fifth aspect of the present disclosure features a double-sided imprinting method including: drawing a first web along first rollers and drawing a second web along second rollers until a first template of the first web and a second template of the second web are brought together into an imprinting zone; aligning reference marks for the first template and the second template; dispensing first resist on a first side of a substrate and a second resist on a second side of the substrate; feeding the substrate into the imprinting zone between the first template and the second template; pressing the first template and the second template onto the substrate, such that the first resist fills into a first imprinting feature of the first template on the first side of the substrate and the second resist fills into a second imprinting feature of the second template on the second side of the substrate; curing the first resist and the second resist, such that the cured first resist has a first imprinted feature corresponding to the first imprinting feature on the first side of the substrate and the cured second resist has a second imprinted feature corresponding to the second imprinting feature on the second side of the substrate; and unloading the substrate with the first imprinted feature on the first side and the imprinted feature on the second side.

In some cases, pressing the first template and the second template onto the substrate can include applying a first press dome on the first template. In some cases, pressing the first template and the second template onto the substrate can include applying a second press dome on the second template.

In some implementations, pressing the first template and the second template onto the substrate includes: moving a first squeegee roller onto the first web to push the first template into the first resist, such that the first resist fills into the first imprinting feature on the first template; and moving a second squeegee roller onto the second web to push the second template into the second resist, such that the second resist fills into the second imprinting feature on the second template. The first squeegee roller and the second squeegee roller can be positioned opposite to each other during moving the first squeegee and the second squeegee together.

The method can further include: bringing the first press dome into contact with the first template and bringing the second press dome into contact with the second template; and making a correction for alignment of the first template and the second template. The second press dome can include a glass dome or an annular ring vacuum chuck. The first press dome can include a glass dome or an annular ring vacuum chuck. Unloading the substrate can include: pulling the first web away from one of the first rollers and pulling the second web away from one of the second rollers to separate the first template and the second template from the substrate.

In some cases, the substrate is rigid, and feeding the substrate includes presenting the substrate by gripping an edge of the substrate using a holder. In some cases, the substrate is flexible, and feeding the substrate includes drawing the substrate from a roll of blank substrates. The method can further include: after the substrate is separated from the first template, applying a first protective film onto the cured first resist on the first side of the substrate; and after the substrate is separated from the second template, applying a second protective film onto the cured second resist on the second side of the substrate. The method can further include rolling the substrate with the cured first resist on the first side and the cured second resist on the second side over a roller.

A sixth aspect of the present disclosure features a double-sided imprinting method including: drawing a first web along a first roller and a second roller, the first web comprising a first template having a first imprinting feature; drawing a second web along a third roller and a fourth roller, the second web comprising a second template having a second imprinting feature, the first roller and the third roller being positioned opposite to each other and defining a nip; aligning reference marks for the first template and the second template; dispensing first resist on one of a first side of the substrate and the first template; dispensing second resist on one of a second side of the substrate and the second template; simultaneously drawing the first template and the second template into the nip and feeding the substrate into the nip with the first imprinting feature facing the first side of the substrate and the second imprinting feature facing the second side of the substrate, such that the first resist is pressed by the first roller into the first imprinting feature on the first side of the substrate and the second resist is pressed by the third roller into the second imprinting feature on the second side of the substrate; curing the first resist and the second resist, such that the cured first resist has a first imprinted feature corresponding to the first imprinting feature on the first side of the substrate and the cured second resist has a second imprinted feature corresponding to the second imprinting feature on the second side of the substrate; and unloading the substrate with the first imprinted feature on the first side and the second imprinted feature on the second side.

In some cases, unloading the substrate includes pulling the first web away from the second roller and the second web away from the fourth roller to separate the first template and the second template from the substrate. In some cases, unloading the substrate includes reversely drawing the first web from the first roller and the second web from the third roller and retracting the substrate to separate the first template and the second template from the substrate.

A seventh aspect of the present disclosure features a system for double-sided imprinting, including: first rollers configured to move a first web including a first template having a first imprinting feature; second rollers configured to move a second web including a second template having a second imprinting feature; one or more dispensers configured to dispense resist; a locating system configured to locate reference marks on the first web and the second web for aligning the first template and the second template; a light source configured to cure the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on a first side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on a second side of the substrate; and a moving system configured to feed in the substrate between the first template and the second template and unload the substrate with the first imprinted feature on the first side and the second imprinted feature on the second side. The dispensers can be configured to dispense the first resist on one of the first side of a substrate and the first template and the second resist on one of the second side of the substrate and the second template.

In some implementations, one of the first rollers and one of the second rollers are positioned opposite to each other and define a nip, and the moving system is configured to feed the substrate into the nip when the first template and the second template are drawn into the nip with the first imprinting feature facing the first side of the substrate and the second imprinting feature facing the second side of the substrate, such that the first resist is pressed by the first roller into the first imprinting feature on the first side of the substrate and the second resist is pressed by the third roller into the second imprinting feature on the second side of the substrate.

In some cases, the first web is pulled away from another one of the first rollers and the second web is pulled away from another one of the second rollers that is positioned opposite to the one of the first rollers, such that the substrate is separated from the first template and the second template. In some cases, the moving system is configured to retract the substrate to separate from the first template and the second template when the subs first web and the second web are reversely drawn away from the one of the first rollers and the one of the second rollers, respectively.

In some implementations, the system further includes a pressing system configured to press the first template and the second template onto the substrate, such that the first resist fills into the first imprinting feature of the first template on the first side of the substrate and the second resist fills into the second imprinting feature of the second template on the second side of the substrate.

In some examples, the pressing system includes a first press dome configured to be applied on the first template. The first press dome can include a glass dome or an annular ring vacuum chuck. In some examples, the pressing system includes a second press dome configured to be applied on the second template. The second press dome can include a glass dome or an annular ring vacuum chuck. The system can further include a correction system configured to make a correction for alignment of the first template and the second template when the first press dome is pressed onto contact with the first template and the second press dome is pressed onto contact with the second template.

In some implementations, the system includes a first squeegee roller configured to be moved onto the first web to push the first template into the first resist, such that the first resist fills into the first imprinting feature on the first template; and a second squeegee roller configured to be moved onto the second web to push the second template into the second resist, such that the second resist fills into the second imprinting feature on the second template. The first squeegee roller and the second squeegee roller can be positioned opposite to each other during moving the first squeegee and the second squeegee together.

In some cases, the moving system includes a holder configured to grip an edge of the substrate. In some cases, the system includes a roller of blank substrates, and the moving system is configured to rotate the roller to feed the substrate.

In some implementations, the system further includes a first roller of first protective film configured to be applied onto the cured first resist on the first side of the substrate and a second roller of second protective film configured to be applied on the cured second resist on the second side of the substrate. The system can further include a roller configured to be rotated to receive the substrate with the cured first resist on the first side and the cured second resist on the second side.

The details of one or more disclosed implementations are set forth in the accompanying drawings and the description below. Other features, aspects, and advantages will become apparent from the description, the drawings and the claims.

