CROSS-REFERENCE TO RELATED APPLICATION

The present application claims the priority of Chinese Patent Application No. 202010524964.1 filed to the CNIPA on Jun. 10, 2020, the entire content of which is hereby incorporated by reference.

TECHNICAL FIELD

The present disclosure relates to, but is not limited to, the technical field of display, in particular to a digital exposure control method and apparatus.

BACKGROUND

Lithography is often used in a manufacturing process of display devices. The traditional lithography is to transform a design layout pattern into a solid mask, then irradiate the precise mask with ultraviolet light, and the ultraviolet light through gaps of the mask pattern optically reacts with the photoresist, thus the pattern on the mask is fully transferred to a glass substrate. With the development of technology, a digital lithography process may also be used at present. The digital lithography process is to transform a design layout pattern into a virtual mask, and transfer a pattern on the virtual mask to a glass substrate by a digital exposure machine, which can greatly reduce the production cost.

SUMMARY

The following is a summary of subject matter described in detail herein. This summary is not intended to limit the protection scope of the claims.

In an aspect, an embodiment of the present disclosure provides a digital exposure control method, including: performing exposure of different types of functional areas of a substrate to be exposed through one or multiple full-page scans, wherein scan speeds for different types of functional areas of the substrate to be exposed are different.

In another aspect, an embodiment of the present disclosure provides a digital exposure control apparatus, including a memory and a processor, wherein a computer program is stored in the memory, and when the computer program is executed by the processor, the digital exposure control method described above is implemented.

In another aspect, an embodiment of the present disclosure provides a non-transitory computer readable storage medium storing a computer program. The digital exposure control method described above is implemented when the computer program is executed.

In another aspect, an embodiment of the present disclosure provides a digital exposure machine, including the above-mentioned digital exposure control apparatus, a platform for bearing a substrate to be exposed, and a scan part.

Other features and advantages of the present disclosure will be set forth in the following specification, and in part will become apparent from the specification, or be learned by practice of the present disclosure. Other advantages of the present disclosure may be achieved and obtained by the schemes described in the specification and drawings of the description.

Other aspects will become apparent after the drawings and the detailed description are read and understood.

