This application claims priority to Korean Patent Application No. 10-2019-0087824, filed on Jul. 19, 2019, and all the benefits accruing therefrom under 35 U.S.C. § 119, the entire contents of which are hereby incorporated by reference.

BACKGROUND

(1) Field

The present disclosure relates to a display device and a method of fabricating the same. In particular, the present disclosure relates to a display device, which can reduce or effectively prevent damage to a pixel definition layer and can be fabricated with a reduced cost.

(2) Description of the Related Art

Electronic products, such as a smart phone, a digital camera, a notebook computer, a navigation system, and a smart television have a display device which is used to display an image to a user. The display device generates an image and provides the image to a user through a screen.

An organic light emitting display device as one of the display devices, displays an image using an emission element which emits light when electrons and holes are recombined. The organic light emitting display device does not require an additional light source, unlike the liquid crystal display device, and has an excellent brightness property and a relatively wide viewing angle property. In addition, the organic light emitting display device has good technical advantages such as a relatively fast response speed and a relatively low power consumption property.

SUMMARY

An embodiment of the invention provides a display device, which reduces or effectively prevents damage to the pixel definition layer during manufacturing of the display device and can be fabricated with a reduced cost.

According to an embodiment of the invention, a display device includes a substrate including a pixel region and a non-pixel region which is adjacent to the pixel region; a pixel definition layer corresponding to the non-pixel region, the pixel definition layer defining a pixel opening corresponding to the pixel region; an emission element in the pixel opening; a transistor in the non-pixel region, the transistor connected to the emission element; and a planarization insulating layer between the pixel definition layer and the transistor. In the non-pixel region, the planarization insulating layer defines a protruding portion which extends through the pixel definition layer to extend further from the substrate than the pixel definition layer.

According to an embodiment, a method of fabricating a display device includes providing a substrate including a pixel region, an emission element in the pixel region, a non-pixel region adjacent to the pixel region, and a transistor in the non-pixel region and connected to the emission element; providing a planarization insulating layer in the non-pixel region, the planarization insulating layer defining a protruding portion in the non-pixel region which extends further from the substrate than a remainder of the planarization insulating layer in the non-pixel region; providing a pixel definition layer in the pixel region and in the non-pixel region, the providing of the pixel defining layer including in the non-pixel region, removing a first removal portion of the pixel definition layer which corresponds to the protruding portion of the planarization insulating layer, and in the pixel region, removing a second removal portion of the pixel definition layer which corresponds to the emission element and is spaced apart from the first removal portion, to define a pixel opening in the pixel region; and providing the emission element in the pixel opening.

According to an embodiment, a display device includes a substrate including a pixel region and a non-pixel region which is adjacent to the pixel region; a transistor in the non-pixel region; a planarization insulating layer covering the transistor, the planarization insulating layer defining in the non-pixel region, a protruding portion extended further from the substrate than a remainder of the planarization insulating layer, where in the non-pixel region, a width of the protruding portion defined by the planarization insulating layer is smaller than a width of the non-pixel region; a pixel definition layer in the non-pixel region, the pixel definition layer defining a pixel opening corresponding to the pixel region; and an emission element in the pixel opening and connected to the transistor.

