TECHNICAL FIELD

The present invention relates to a reforming device and a reforming method for reforming the surface of a porous material, and to, for example, a technology for easily obtaining a reforming effect in a porous material.

BACKGROUND TECHNOLOGY

In a porous material applied in a variety of fields, it has been considered to improve various properties of a porous material by reforming the porous material so as to have hydrophilicity in accordance with a purpose.

For example, in case of a film-like or thin plate-shaped porous material (for example, a laminated film, a printed matter, a separation membrane for water treatment, or a filter), for example, the improvement of barrier properties, durability, wettability (adhesiveness) and the like has been required. In addition, in case of a porous material applied to a component member of, for example, an electric electronic equipment (for example, in case of a battery, a separator, an electrode and the like), for example, the improvement of electric characteristics and the like (in case of a battery, battery performance) has been required. In addition, in case of a porous material applied to the cultivation of a biomaterial of an artificial heart and the like (for example, a cell culture template), for example, the improvement of biocompatibility and the like has been required.

As a reforming method, a reforming method using corona discharge treatment, plasma treatment, UV ozone treatment and the like (for example, a method shown in a patent document 1, and hereinafter is simply referred to as “vapor-phase reforming method”), and a reforming method using liquid (hereinafter is referred to as “modifying liquid”) such as liquid chemicals (for example, a mixed acid) and ozone water (for example, a method shown in patent documents 2 and 3, and hereinafter is simply referred to as “liquid-phase reforming method”) can be cited.

PRIOR ART REFERENCES

Patent Documents

Patent Document 1: Japanese Patent 6057030

Patent Document 2: International Publication 2013/191052

Patent Document 3: International Publication 2014/203892

SUMMARY OF THE INVENTION

In case of the above-mentioned reforming methods, even if the outer-peripheral-side surface of a porous material can be reformed, for example, it is difficult to sufficiently reform the surface (hereinafter is simply referred to as “inner side surface”) of micropores (hereinafter is simply referred to as “internal through hole”) formed on the inner side of the porous material (for example, the reforming becomes difficult as the pore diameters of the internal through holes become smaller), and there is therefore a possibility that a reforming effect cannot be obtained.

In case of a liquid-phase reforming method, as compared with, for example, corona discharge treatment, plasma treatment and UV ozone treatment, although there is a possibility that the inner side surface can be reformed not a little (for example, the vicinity of the outer-peripheral-side surface in the inner side surface is reformed), post processing (for example, drying processing of the porous material and disposal processing of the modifying liquid) for removing modifying liquid which remains in the porous material is required. That is, in the reformation, there is a possibility that costs increase and work becomes complicated.

The present invention is made in consideration of such a technical problem, and an object of the present invention is to provide a reforming technique with which a reforming effect in the porous material can be obtained easier.

One aspect of the present invention is a reforming device for a porous material, the device including: a gas supply part which is provided on one end side of a chamber, and supplies an ozone gas and an unsaturated hydrocarbon gas into the chamber; a gas discharge part which is provided on the other end side of the chamber, and sucks the gas inside the chamber so as to discharge the gas to the outside of the chamber; and a support part which supports the porous material such that the porous material is interposed between the gas supply part and the gas discharge part inside the chamber.

The support part may be one which has a shape extending in a direction crossing the direction between the gas supply part and the gas discharge part, is provided with a plurality of through holes penetrating therethrough in the direction between the gas supply part and the gas discharge part, and is formed with, on a gas supply part side of the support part, a supporting surface for supporting the porous material.

The gas supply part may be one which is provided with a shower head formed with an injection port for injecting the unsaturated hydrocarbon gas into the chamber and an injection port for injecting the ozone gas into the chamber.

The internal pressure of the chamber is controlled to a pressure lower than the atmospheric pressure. The ozone concentration of the ozone gas supplied into the chamber is 20 volume % or higher.

Another aspect of the present invention is a reforming method of a porous material for reforming the outer peripheral side surface and the inner side surface of the porous material, the method including: supporting, inside a chamber, the porous material so as to be interposed between one end side and the other end side of the chamber; supplying an ozone gas and an unsaturated hydrocarbon gas into the chamber from a gas supply part provided on the one end side of the chamber; and sucking a gas inside the chamber by a gas discharge part provided on the other end side of the chamber so as to discharge the gas to the outside of the chamber. In addition, the ozone gas and the unsaturated hydrocarbon gas may be alternately supplied into the chamber.

According to the present invention as mentioned above, a reforming effect in the porous material can be obtained easier.

