FIELD

The disclosure relates, in some embodiments, to cathodes for use with pulsed cathodic arc deposition. More specifically, but not exclusively, the disclosure relates to ceramic cathodes for forming diamond-like carbon films on devices such as the sliders of hard disk drives.

INTRODUCTION

Pulses cathodic arc deposition is a type of physical vapor deposition in which an electric arc vaporizes material such as graphite that is coated on a cathode structure. The vaporized material propagates to and condenses on a device or substrate to form a thin film. One type of film that can be formed via cathodic arc deposition is a diamond-like carbon (DLC) film, which may be formed, for example, on the sliders of hard disk drives (HDDs) or on other devices that benefit from an extremely hard and durable protective film or coating. It would be desirable to provide improved methods and apparatus for cathodic arc deposition for forming DLC films or other films or coatings.

SUMMARY

The following presents a simplified summary of some aspects of the disclosure to provide a basic understanding of such aspects. This summary is not an extensive overview of all contemplated features of the disclosure, and is intended neither to identify key or critical elements of all aspects of the disclosure nor to delineate the scope of any or all aspects of the disclosure. Its sole purpose is to present various concepts of some aspects of the disclosure in a simplified form as a prelude to the more detailed description that is presented later.

One embodiment of this disclosure provides a cathode structure for use in a deposition system, the cathode structure comprising: a ceramic structure; a first layer formed on the ceramic structure and comprising an electrically-conducting material that adheres to the ceramic structure; and a second layer formed on the first layer and comprising carbon.

Another embodiment of the disclosure provides a method for forming a film, the method comprising: passing an electrical current through a ceramic structure; passing the electrical current through a base layer formed on the ceramic structure and comprised of an electrically-conducting material that adheres to the ceramic structure; and passing the electrical current through an outer layer formed on the base layer and comprised of carbon to cause at least some of the carbon to be transferred to a device to form a film on the device.

Yet another embodiment of the disclosure includes a deposition apparatus comprising: an anode; a cathode comprising a ceramic structure, a first layer formed on the ceramic structure and comprised of an electrically-conducting material that adheres to the ceramic structure, and a second layer formed on the first layer and comprised of carbon; a power supply coupled to the cathode and configured to cause the cathode to generate a plasma that includes carbon particles; an electrode on which a device to receive a carbon film is mounted; a pulse generator connected with the electrode to apply a bias pulse; and a controller configured to control the power supply and the pulse generator.

