RELATED APPLICATIONS

The present application is the U.S. national phase entry of the international application PCT/CN2018/077547, with an international filing date of Feb. 28, 2018, which claims the benefit of Chinese Patent Application No. 201710623150.1, filed on Jul. 27, 2017, the entire disclosures of which are incorporated herein by reference.

TECHNICAL FIELD

The present disclosure relates to the field of display technology, and particularly to a 3D display device and a manufacturing method thereof.

BACKGROUND

In a conventional 3D display device, 3D display is realized by using a grating and a display panel, thereby providing a desired visual experience.

SUMMARY

According to an embodiment of the present disclosure, a 3D display device is provided. The 3D display device includes: a first substrate; a second substrate disposed opposite to the first substrate; a black matrix; and a grating. The black matrix and the grating are disposed on a side of the first substrate facing away from the second substrate; the black matrix and the grating are disposed in a same layer; and a side of the first substrate where the black matrix and the grating are located is a light exit side of the 3D display device.

Optionally, in some embodiments, the second substrate is an array substrate, a color filter is disposed on the second substrate, and a side of the first substrate facing the second substrate is not provided with a black matrix.

Optionally, in some embodiments, the grating includes a plurality of shielding portions disposed in parallel with each other, and two side edges of each shielding portion are respectively in contact with the black matrix.

Optionally, in some embodiments, the second substrate includes a plurality of sub-pixels, and a crosstalk region between adjacent sub-pixels.

Optionally, in some embodiments, the black matrix, the shielding portion, the sub-pixel, and the crosstalk region satisfy the following relationship:
m=c×k/2;
a+2m=(p+c)×k;

m is a line width of the black matrix, c is a line width of the crosstalk region, k is a shrinkage ratio, a is a line width of the shielding portion, and p is a line width of the sub-pixel.

Optionally, in some embodiments, the line width of the black matrix is about 4.996 μm, the line width of the crosstalk region is about 5 μm, the shrinkage ratio is about 0.9993, the line width of the shielding portion is about 49.964 μm, and the line width of the sub-pixel is about 50 μm.

Optionally, in some embodiments, a material of the grating is same to a material of the black matrix.

Optionally, in some embodiments, the grating and the black matrix are formed integrally.

Optionally, in some embodiments, the black matrix and the grating are formed on a surface of the first substrate facing away from the second substrate.

Optionally, in some embodiments, the 3D display device further includes: a third substrate attached to the surface of the first substrate facing away from the second substrate; the black matrix and the grating are formed on a surface of the third substrate facing away from the second substrate.

Optionally, in some embodiments, the 3D display device further includes: a film substrate attached to the surface of the first substrate facing away from the second substrate; the black matrix and the grating are formed on a surface of the film substrate facing away from the second substrate.

According to another embodiment of the present disclosure, a method for manufacturing the 3D display device according to the above mentioned embodiments is provided. The method includes: providing a first substrate and a second substrate opposite to the first substrate; and forming a black matrix and a grating on a side of the first substrate facing away from the second substrate. The black matrix and the grating are disposed in a same layer; and a side of the first substrate where the black matrix and the grating are located is a light exit side of the 3D display device.

Optionally, in some embodiments, the step of forming a black matrix and a grating on a side of the first substrate facing away from the second substrate includes: forming the black matrix and the grating on a surface of the first substrate facing away from the second substrate by a patterning process.

Optionally, in some embodiments, the step of forming a black matrix and a grating on a side of the first substrate facing away from the second substrate includes: forming the black matrix and the grating on a surface of a third substrate by a patterning process; and attaching the third substrate to the first substrate. The black matrix and the grating are located on a surface of the third substrate facing away from the second substrate.

Optionally, in some embodiments, the step of forming a black matrix and a grating on a side of the first substrate facing away from the second substrate includes: forming the black matrix and the grating on a surface of a film substrate by a patterning process; and attaching the film substrate to the first substrate. The black matrix and the grating are located on a surface of the film substrate facing away from the second substrate.

