This application is a National Stage Application of International Application No. PCT/KR2016/014329 filed on Dec. 7, 2016, which claims priority to and the benefit of Korean Patent Application No. 10-2015-0173536 filed in the Korean Intellectual Property Office on Dec. 7, 2015, both of which are incorporated herein in their entirety by reference for all purposes as if fully set forth herein.

TECHNICAL FIELD

The present specification relates to a conductive structure, a method of manufacturing the same, and an electrode including the conductive structure.

BACKGROUND ART

A liquid crystal display is the most important display device recently used in a multimedia society, and is widely used in a mobile phone, a monitor for a computer, a notebook computer, and a television. The liquid crystal display device has a twisted nematic (TN) mode in which a liquid crystal layer including nematic liquid crystals arranged in a twist form is interposed between two sheets of orthogonal polarizing plates, and then an electric field is applied in a vertical direction to a substrate. In the TN mode scheme, the liquid crystals are aligned in the vertical direction to the substrate when the liquid crystal display device displays a black color, so that double refraction is generated by liquid crystal molecules in an oblique viewing angle, and light leaks.

In order to solve the viewing angle problem of the TN mode scheme, an in-plane switching (IPS) mode in which two electrodes are formed on one substrate, and a director of the liquid crystal is adjusted with a lateral electric field generated between the two electrodes is introduced. That is, the liquid crystal display device of the IPS mode scheme is also called an in-plane switching liquid crystal display or a lateral electric field scheme liquid crystal display, and the electrodes are disposed on the same plane within a cell in which the liquid crystals are disposed, so that the liquid crystals are not aligned in a vertical direction, but are aligned to be parallel to a surface in a transverse direction of the electrode.

However, the IPS mode scheme may have a problem in that it is difficult to implement a high image quality by high light reflectance of a pixel electrode and a common electrode.

DETAILED DESCRIPTION OF THE INVENTION

Technical Problem

The present specification provides a conductive structure which is capable of implementing a display having a high image quality.

Technical Solution

An exemplary embodiment of the present specification provides a conductive structure including: a substrate; a metal layer provided on the substrate; and a light reflection reducing layer provided on at least one surface of the metal layer, in which the light reflection reducing layer includes an oxide, a nitride, or an oxynitride of metals including one, or two or more of Al, Mo, Ti, Zr, Y, Si, Ag, Ni, Mn, Nb, Au, Cr and Co; Zn; and Cu.

An exemplary embodiment of the present specification provides a method of manufacturing the conductive structure.

The method includes: preparing a substrate; forming a metal layer on the substrate; and forming a light reflection reducing layer on the metal layer, in which the light reflection reducing layer includes an oxide, a nitride, or an oxynitride of metals including one, or two or more of Al, Mo, Ti, Zr, Y, Si, Ag, Ni, Mn, Nb, Au, Cr and Co; Zn; and Cu.

An exemplary embodiment of the present specification provides an electrode including the conductive structure.

An exemplary embodiment of the present specification provides a display device including the electrode.

Advantageous Effects

The conductive structure according to the exemplary embodiment of the present specification may implement low light reflectance by controlling light reflectance of the metal layer.

The conductive structure according to the exemplary embodiment of the present specification may include a conductive line having a micro line width and low light reflectance, thereby implementing high visibility.

The conductive structure according to the exemplary embodiment of the present specification may minimize a decrease in electric conductivity of the conductive structure according to a process environment when being applied to an electronic device, such as a display device.

