CROSS-REFERENCE TO RELATED APPLICATION(S)

This application claims priority to and benefits of Korean Patent Application No. 10-2020-0014935 under 35 U.S.C. § 119, filed in the Korean Intellectual Property Office on Feb. 7, 2020, the entire contents of which are herein incorporated by reference.

BACKGROUND

1. Technical Field

The disclosure relates to a manufacturing apparatus and a manufacturing method using the same.

2. Description of the Related Art

A pixel driving circuit of a display device includes a thin film transistor using silicon. As silicon forming the thin film transistor, amorphous silicon or polycrystalline silicon may be used.

An amorphous silicon thin film transistor (a-Si TFT) used in the pixel driving circuit may have a low electron mobility of 1 cm2/Vs or less because a semiconductor active layer constituting the source, drain and channel may be formed of amorphous silicon. Accordingly, recently, the amorphous silicon TFT has tended to be replaced by a polycrystalline silicon TFT (poly-Si TFT). The polycrystalline silicon TFT may have higher electron mobility and superior stability to light irradiation than the amorphous silicon TFT. Thus, the polycrystalline silicon TFT may be suitable for use as an active layer for driving and/or switching thin film transistors in a display device.

Polycrystalline silicon can be manufactured by various methods, which may be largely classified into a method of directly depositing polycrystalline silicon and a method of depositing amorphous silicon and then crystallizing it. In the method of depositing an amorphous silicon thin film and then crystallizing it, the amorphous silicon thin film may be crystallized by a laser beam irradiation method, a heating method or the like.

It is to be understood that this background of the technology section is, in part, intended to provide useful background for understanding the technology. However, this background of the technology section may also include ideas, concepts, or recognitions that were not part of what was known or appreciated by those skilled in the pertinent art prior to a corresponding effective filing date of the subject matter disclosed herein.

SUMMARY

Aspects of the disclosure provide a manufacturing apparatus capable of improving the efficiency of a process by controlling foreign matter in a chamber and a manufacturing method using the same.

However, embodiments of the disclosure are not restricted to those set forth herein. The above and other embodiments of the disclosure will become more apparent to one of ordinary skill in the art to which the disclosure pertains by referencing the detailed description of the disclosure given below.

An embodiment of a manufacturing apparatus may include a chamber, and a stage disposed in the chamber, the stage including an upper surface on which a target substrate is disposed, a lower surface opposite to the upper surface, a first side surface extending between the upper surface and the lower surface in a first direction, and a second side surface extending between the upper surface and the lower surface in a second direction perpendicular to the first direction. The first side surface may be in a round shape, and at least a portion of the first side surface may be convex toward an outside of the stage.

A slope of a tangent line at an arbitrary point on the first side surface may vary as the arbitrary point moves in the second direction.

An angle between the tangent line and the upper surface at the arbitrary point may increase as the arbitrary point becomes closer to the upper surface in the second direction.

The first side surface may be in a round shape at a portion where the upper surface and the first side surface meet, and an edge may be formed at a portion where the upper surface and the second side surface meet.

An angle between the upper surface and the first side surface may be greater than an angle between the upper surface and the second side surface.

The angle between the upper surface and the second side surface may be a right angle.

The at least a portion of the first side surface may constitute a portion of a circumference of a circle, and a radius of curvature of the circle may be about 25 mm or more.

The stage may further include a third side surface extending between the upper surface and the lower surface in the first direction, the third side surface being opposite to the first side surface, and the third side surface may be in a round shape, and at least a portion of the third side surface may be convex toward an outside of the stage.

The first side surface may be in a round shape at a portion where the third side surface and the upper surface meet.

The first side surface and the third side surface may have a same shape and may be symmetrical with each other.

The second side surface may be in a round shape, and at least a portion of the second side surface may be convex toward an outside of the stage.

The first side surface may be in a round shape at a portion where the first side surface and the upper surface meet, and the second side surface may be in a round shape at a portion where the second side surface and the upper surface meet.

The first side surface may include a first region extended to the upper surface and having in a round shape, and a second region extended to the lower surface and having in a flat shape, and the first region may be in a round shape at a portion where the first region and the upper surface are connected and at a portion where the first region and the second region meet.

The manufacturing apparatus may further include a laser module that irradiates a laser beam toward the target substrate.

An embodiment of a manufacturing method may include disposing a target substrate on a stage inside a chamber, moving the stage, and irradiating a laser beam onto a surface of the target substrate. The stage may include an upper surface on which the target substrate is mounted, a lower surface opposite to the upper surface, a first side surface extending between the upper surface and the lower surface in a first direction, and a second side surface extending between the upper surface and the lower surface in a second direction perpendicular to the first direction. The first side surface may be in a round shape, and at least a portion of the first side surface may be convex toward an outside of the stage.

The target substrate may include an amorphous silicon thin film disposed on the target substrate.

The manufacturing method may further include after the irradiating of the laser beam, crystallizing at least a portion of the amorphous silicon thin film into crystalline silicon.

A slope of a tangent line at an arbitrary point on the first side surface may vary as the arbitrary point moves in the second direction, and an angle between the tangent line and the upper surface at the arbitrary point may increase as the arbitrary point becomes closer to the upper surface in the second direction.

The first side surface may be in a round shape at a portion where the upper surface and the first side surface meet, and an edge may be at a portion where the upper surface and the second side surface meet.

An angle between the upper surface and the first side surface at a portion where the upper surface and the first side surface meet may be greater than an angle between the upper surface and the second side surface at a portion where the upper surface and the second side surface meet.

According to embodiments of the disclosure, it may be possible to provide a manufacturing apparatus capable of improving the efficiency of a process by controlling foreign matter in a chamber and a manufacturing method using the same.

The effects of the disclosure are not limited to the aforementioned effects, and various other effects are included in the specification.

