<story><title>ASML EUV lithography machine could keep Moore’s Law on track</title><url>https://spectrum.ieee.org/high-na-euv</url></story><parent_chain></parent_chain><comment><author>esperent</author><text>&amp;gt; &lt;i&gt;EUV necessitates an entirely new way to generate light. It’s a remarkably complex process that involves hitting molten tin droplets in midflight with a powerful CO2 laser. The laser vaporizes the tin into a plasma, emitting a spectrum of photonic energy. From this spectrum, the EUV optics harvest the required 13.5-nm wavelength and direct it through a series of mirrors before it is reflected off a patterned mask to project that pattern onto the wafer&lt;/i&gt;&lt;p&gt;This is incredible and feels like the most sci-fi sentence I&amp;#x27;ve read in a long time.&lt;p&gt;It&amp;#x27;s unbelievable to think that this works, not just in a lab, but in commercial systems that will produce hundreds of chip wafers an hour (&amp;gt;100 anyway, they didn&amp;#x27;t clarify further).</text></comment>
<story><title>ASML EUV lithography machine could keep Moore’s Law on track</title><url>https://spectrum.ieee.org/high-na-euv</url></story><parent_chain></parent_chain><comment><author>martin_drapeau</author><text>I worked at Imec back in 2005 alongside the teams installing and researching the first EUV machines from ASML. Never thought they’d get it to work given the technological challenges. Laser-pulsed tin plasma, mirrors instead of lenses and vacuum exposure just to name a few!
Glad they got it working so we can print smaller at scale.</text></comment>