a particular place, at a particular time,” Ms. Novick said. “But this was an incredible treasure trove.”

The nearly 15-minute scene, edited by Erik Ewers, draws on a number of sources, including a black-and-white battle film held at the Vietnam Film Institute in Hanoi, color home movies taken by an American officer and the filmmakers’ interviews with three people who were there: an American Marine, a South Vietnamese marine and a Viet Cong officer.When a semiconductor device or the like is to be produced, in order to transfer a pattern of a reticle as a mask to each shot region on a wafer (or glass plate or the like) as a substrate on which a photoresist is applied, a projection exposing apparatus such as a stepper is used. In the projection exposing apparatus, image forming characteristics of a projection optical system are gradually varied due to variation in exposure dose of exposure light and variation in ambient atmospheric pressure. Hence, in order to always maintain the image forming characteristics in a desired condition, the projection exposing apparatus includes an image forming characteristic correcting mechanism which corrects the image forming characteristics by controlling a position of a partial optical member constituting the