Argon may be used as the inert gas within Schlenk lines and gloveboxes.
Argon is preferred to less expensive nitrogen in cases where nitrogen may react with the reagents or apparatus.

Argon may be used as the carrier gas in gas chromatography and in electrospray ionization mass spectrometry; it is the gas of choice for the plasma used in ICP spectroscopy.
Argon is preferred for the sputter coating of specimens for scanning electron microscopy.
Argon gas is also commonly used for sputter deposition of thin films as in microelectronics and for wafer cleaning in microfabrication.
Argon may be used as the inert gas within Schlenk lines and gloveboxes. Argon is preferred to less expensive nitrogen in cases where nitrogen may react with the reagents or apparatus.
Argon may be used as the carrier gas in gas chromatography and in electrospray ionization mass spectrometry; it is the gas of choice for the plasma used in ICP spectroscopy. Argon is preferred for the sputter coating of specimens for scanning electron microscopy. Argon gas is also commonly used for sputter deposition of thin films as in microelectronics and for wafer cleaning in microfabrication.
Argon