Cytotoxicity Evaluation of Anatase and Rutile TiO2 Thin Films on CHO K1 Cells in Vitro
Cytotoxicity of titanium dioxide (TiO2) thin films on Chinese hamster ovary (CHO K1) cells was evaluated after 24, 48 and 72 h of culture. The TiO2 thin films were deposited using direct current magnetron sputtering. These films were post deposition annealed at different temperatures (300, 500 and 800 degC) toward the anatase to rutile phase transformation. The root mean square (RMS) surface roughness of TiO2 films went from 2.8 to 8.08 nm when the annealing temperature was increased from 300 to 800 degC. Field emission scanning electron microscopy (FESEM) results showed that the TiO2 films' thickness values fell within the nanometer range (290 310 nm) Based on the results of the tetrazolium dye and trypan blue assays, we found that TiO2 thin films showed no cytotoxicity after the aforementioned culture times at which cell viability was greater than 98% Independently of the annealing temperature of the TiO2 thin films, the number of CHO K1 cells on the control substrate and on all TiO2 thin films was greater after 48 or 72 h than it was after 24 h; the highest cell survival rate was observed in TiO2 films annealed at 800 degC. These results indicate that TiO2 thin films do not affect mitochondrial function and proliferation of CHO K1 cells, and back up the use of TiO2 thin films in biomedical science.
Materials