Glow Characterization in Low-Pressure Radio-Frequency $\hbox{CH}_{2} \hbox{F}_{2}$ and $\hbox{C}_{2}\hbox{H}_{2}\hbox{F}_{4}$  Plasma Deposition Systems
The glow characteristics and deposited film structures of fluorocarbon monomers in radio-frequency glow discharges are investigated using CH<sub>2</sub>F<sub>2</sub> and C<sub>2</sub>H<sub>2</sub>F<sub>4</sub>, which were compared to hydrocarbon monomer such as CH<sub>4</sub>. The glow was characterized and investigated by optical photography, optical emission spectroscopy, and Fourier transform infrared spectrometry. The glow differences were attributed to the nature of the luminous gas phase in respect to polymer-forming species.
Deposition behavior in a low-temperature cascade arc torch (CAT) polymerization process
Two kinds of hydrocarbon type monomers and three kinds of organosilicons were polymerized by a low-temperature cascade arc argon plasma torch. Their deposition behaviors were studied as a function of experimental parameters and monomer elemental compositions. It was found that the normalized deposition rate (DR), expressed as deposition yield of DR/(FM) was determined by a composite operational parameter, W * (FM) c /(FM) where W is the power input, and (FM) c and (FM) m are the mass flow rates of carrier gases and monomers, respectively. Experimental results indicated that the deposition yield is highly dependent on the elementary compositions of monomers. Optical emission spectroscopy study on the argon plasma torch showed that the emission intensity of excited argon neutrals was proportional to the value of the parameter W * (FM) c . These results further certified that excited argon neutrals are the main energy carriers from the cascade arc column to activate monomers in the argon plasma torch.
Corrosion protection of ion vapor deposition (IVD) Al-coated Al alloys by low-temperature plasma interface engineering: Part II. DC cathodic polymerization under conditions of IVD (without using anode assembly)
Abstract DC cathodic polymerizations of trimethylsilane (TMS) were carried out in a bell-jar reactor without using an anode assembly, i.e., under the conditions similar to ion vapor deposition (IVD) operation. In order to initiate the DC glow discharge, a negative potential was applied to IVD Al-coated aluminum panels, the cathode, and grounded reactor wall, the anode. TMS plasma coatings obtained under such operation was studied in terms of refractive indices, linear polarization resistance, and adhesion performance to subsequent spray paint primers. Experimental results indicated that the TMS plasma coatings obtained without anode assembly have similar coating characteristics to those obtained by anode magnetron plasmas as used in Part I of this series, which showed excellent corrosion protection of IVD Al-coated aluminum alloys. As a result, the plasma interface engineered coating systems of IVD/plasma polymer/non-chromated primer obtained under such operation showed excellent corrosion protection of IVD Al-coated aluminum alloys, which outperformed the chromate conversion-coated IVD controls after 4 weeks of SO 2 and 12 weeks prohesion salt spray tests.