Diffusion of Particles Adsorbed on a Reconstructive Surface
The influence of surface reconstruction on diffusion of particles, adsorbed on the surface, is investigated in the framework of symmetrical four-position model. The analytical expressions for the free energy and chemical and jump diffusion coefficients are obtained assuming the lateral interaction between the particles is negligibly small. The coverage dependencies of the tracer, jump and chemical diffusion coefficients are calculated using the expressions and MC simulations. The results demonstrate clearly a drastic change of the behavior of all diffusion coefficients on the reconstructed surface.
Monte Carlo study of the W(001) surface reconstruction transition based on total-energy calculations.
We describe the extraction from local-density-approximation-based total-energy calculations of the potential governing the reconstruction of the W(001) surface and an extensive Monte Carlo simulation investigation thereof. Our study is successful in reproducing the qualitative features of this much-studied surface reconstruction, in particular confirming and fully characterizing its order-disorder character. We find and discuss a discrepancy with the measured transition temperature, concluding that it probably arises from remaining small inaccuracies in the total-energy calculations.
Anomalous Annealing Behavior of Arsenic Implanted Silicon as a Function of Dose and Energy
Anomalous annealing behavior of damage in As implanted Si has been investigated by channeling effect measurements. Room temperature As implants with doses from 1014 to 2 × 1016cm-2 at energies ranging from 50 to 250 keV into Si were annealed over the range of 600°C to 1100°C. Anneal temperatures ≥ 950°C reduce the disorder for ion doses of 0.5 to 1 × 1016 cm-2 at energies between 50 and 250 keV. Anomalously high residual disorder was found for the intermediate doses of 2 × 1014 to 2 × 10/cm2 implanted above 100 keV. For this intermediate dose, annealing of implants performed at liquid nitrogen temperatures did not show significant reduction in this damage. However implants at 200° to 300°C indicate a lower amount of damage compared to the room temperature implants.