Determination of gallium by anodic stripping square-wave voltammetry Detection of a GaZn intermetallic compound and its destruction by Sb in an NaSCNNaClO(4) supporting electrolyte.
Reproducibility for successive determinations with a hanging mercury drop electrode is assessed in relation to solution stirring, drop size and back-diffusion to the mercury thread. The effect of experimental parameters such as drop size, deposition time and gallium concentration on the observed stripping current is investigated. The interference of zinc present in a 0.5M NaSCN + 4.2M NaClO(4) supporting electrolyte on the gallium detection limit and calibration plots is described. Formation of an intermetallic compound with a Zn:Ga ratio of 2:3 and its destruction by co-deposition of zinc with Sb are reported. A detection limit of 10(-8)M gallium was obtained in the presence of 10(-5)M Sb(III).
Electrochemical study of gallium(III) with l-glutamine at the dropping mercury electrode
Gallium complexes of l-glutamine have been studied polarographically in aqueous media. The reduction was found to be irreversible and diffusion controlled in the presence of 0.1 M KNO3 and 0.002% Triton-x-100. The values of kinetic parameters, transfer coefficient (αn), and formal rate constant ($$ k_{{{\text{f}},{\text{h}}}}^{0} $$) of the electrode reactions were calculated by Koutecky's method. The stability constants and composition of the gallium(III)-l-glutamine complexes were evaluated with the help of the Deford-Hume method. The values of stability constants of 1:1, 1:2, and 1:3 gallium(III)-l-glutamine complexes are 1.35, 6.5, and 1,350 at 30 °C, respectively. The values of thermodynamic parameters, the free energy of activation, the enthalpy of activation, and the entropy of activation have been determined at 30 °C. The formation of the metal complexes has been found to be non-spontaneous, endothermic in nature, and entropically favorable at higher temperature.Graphical Abstract
Submicron polymer structures with X-ray lithography and hot embossing
This article describes the process chain for replication of submicron structures with varying aspect ratios (AR) up to 6 in polymethylmethacrylate (PMMA) by hot embossing to show the capability of the entire LIGA process to fabricate structures with these dimensions. Therefore a 4.7 μm thick layer of MicroChem 950k PMMA A11 resist was spin-coated on a 2.3 μm Ti/TiOx membrane. It was patterned with X-ray lithography at the electron storage ring ANKA (2.5 GeV and λc ≈ 0.4 nm) at a dose of 4 kJ/cm3 using a Si3N4 membrane mask with 2 μm thick gold-absorbers. The samples were developed in GG/BDG and resulted in AR of 6–14. Subsequent nickel plating at 52°C resulted in a 200 μm thick nickel tool of 100 mm diameter, which was used to replicate slit-nozzles and columns in PMMA. Closely packed submicron cavities with AR 6 in the nickel shim were filled to 60% during hot embossing.