The aim of this investigation is to study the performance of the new generation of the PVD coated grade and to map the influence of cutting conditions on the tool life in milling of ADI
The aim of this investigation is to study the performance of the new generation of the PVD coated grade and to map the influence of cutting conditions on the tool life in milling of ADI (Austempered Ductile Iron). The results show that chipping is the main wear mechanism which determines the tool life in dry condition and notch wear in wet condition for this application. This due to the different stress mechanisms and preexisting cracks in the coating. The wear development shows clearly that the new PVD coating (C20) has the best ability to delay the chipping growth. It was also found that a high content of Al in the new coating (C20) was especially favorable compared to a TiAlN multilayer with lower Al content (C30) or CVD coating. This is due to fine grains and low compressive stress level in the coating which increase the coating ability to withstand the mechanical and thermal impact. It was also found that the use of coolant decreases the tool life with 70-80% compare to dry milling. Keywords—Austempered Ductile Iron (ADI), coating, chipping, milling, tool performance.
Successfully Machining Austempered Ductile Iron (ADI)
Austempered Ductile Iron (ADI) is a relatively new material to the industrial marketplace. Many have tried to machine ADI as if it were steel, or as-cast Ductile Iron, and have been unsuccessful. Because of this, a myth has developed that ADI is not machinable. When the material properties and metal matrix of ADI are taken into consideration, ADI can be successfully machined.
Anomalous Annealing Behavior of Arsenic Implanted Silicon as a Function of Dose and Energy
Anomalous annealing behavior of damage in As implanted Si has been investigated by channeling effect measurements. Room temperature As implants with doses from 1014 to 2 × 1016cm-2 at energies ranging from 50 to 250 keV into Si were annealed over the range of 600°C to 1100°C. Anneal temperatures ≥ 950°C reduce the disorder for ion doses of 0.5 to 1 × 1016 cm-2 at energies between 50 and 250 keV. Anomalously high residual disorder was found for the intermediate doses of 2 × 1014 to 2 × 10/cm2 implanted above 100 keV. For this intermediate dose, annealing of implants performed at liquid nitrogen temperatures did not show significant reduction in this damage. However implants at 200° to 300°C indicate a lower amount of damage compared to the room temperature implants.