Characterization of band offset in α-(AlxGa1-x)2O3/ α-Ga2O3 heterostructures
Gallium Oxide is a promising material for power device applications. We focused on corundum structured gallium oxide (α-Ga<sub>2</sub>O<sub>3</sub>) and α-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub>/ α-Ga<sub>2</sub>O<sub>3</sub> heterostructure devices. We prepared α-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub> alloy and these laminate structures on c-plane sapphire substrates. The band offset of the α-Ga<sub>2</sub>O<sub>3</sub>/α-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub> heterostructure was measured by X-ray photoelectron spectroscopy (XPS). The band alignment was estimated to be type I with very narrow valence-band offset energy.
Quasiparticle band offset at the (001) interface and band gaps in ultrathin superlattices of GaAs-AlAs heterojunctions.
A newly developed first-principles quasiparticle theory is used to calculate the band offset at the (001) interface and band gaps in 1{times}1 and 2{times}2 superlattices of GaAs-AlAs heterojunctions. We find a sizable many-body contribution to the valence-band offset which is dominated by the many-body corrections to bulk GaAs and AlAs quasiparticle energies. The resultant offset {Delta}{ital E}{sub {ital v}}=0.53{plus minus}0.05 eV is in good agreement with the recent experimental values of 0.50--0.56 eV. Our calculated direct band gaps for ultrathin superlattices are also in good agreement with experiment. The {ital X}{sub 1{ital c}}-derived state at point {bar {Gamma}}, is however, above the {Gamma}{sub 1{ital c}}-derived state for both the 1{times}1 and 2{times}2 lattices, contrary to results obtained under the virtual-crystal approximation (a limiting case for the Kronig-Penny model) and some previous local-density-approximation (corrected) calculations. The differences are explained in terms of atomic-scale localizations and many-body effects. Oscillator strengths and the effects of disorder on the spectra are discussed.
Oxygen Sensitivity in Gallium Oxide Thin Films and Single Crystals at High Temperatures
In this paper, the oxygen sensitivity of gallium oxide thin films and single crystals at high temperatures is presented. To investigate the oxygen sensing mechanism at high temperature, we used sputtered β-Ga2O3 thin films and β-Ga2O3 single crystals with different electrode geometries. For β-Ga2O3 single crystals: a response time of about 10 s was achieved, while for β-Ga2O3 thin-film this was about 11 s. For single crystal samples the response time does not depend on the type of electrode. This can be explained by the combination of a greater influence of surface effects and smaller influence of bulk effects.