Spatial-frequency response of holographic gratings photodeposited from inorganic colloids.
Surface photodeposition is a photon-assisted process by which thin films are formed on substrates immersed in colloid solutions. We experimentally evaluate the resolution capabilities of the photodeposition process with amorphous selenium colloids by recording holographic gratings at different spatial frequencies, up to 2200 lines/mm. The experimental diffraction efficiencies are analyzed in terms of a theoretical model, which relates the spatial-frequency response to optical recording parameters and colloid particle sizes. The maximal experimental diffraction efficiency reaches 13% with a spatial frequency of f = 1100 lines/mm. The diffraction efficiencies decrease monotonically with spatial frequency, and drop to half of the maximal diffraction efficiency at f ≈ 1500 lines/mm. These resolution capabilities are achieved with colloid particle sizes extending up to 80 nm. The theoretical derivation indicates that to obtain spatial frequencies above 3000 lines/mm, one should restrict the colloid particle size to a(max) ≤ 30 nm.
Diffractive optical elements written by photodeposition
Abstract In this work direct laser writing of diffractive optical elements (DOE) by photodeposition (PD) of amorphous selenium (a-Se) from colloid solutions has been investigated. We used a computer controlled laser scanner for patterning thin film micro-profiles creating thus planar optical elements by direct beam writing on surfaces immersed in a liquid phase PD cell. The laser employed was an argon ion laser at 488 nm wavelength, with powers up to 55 mW, for writing typically 25–250 μm wide lines of 200 nm thickness at rates of about 150 μm/s. Various elements made of photodeposited thin films on polymethyl-methacrylate (PMMA) substrates were produced for prototyping microlenses, linear grating arrays, cylindrical and circular profiled DOE patterns.
Laser photodeposition of metal films with microscopic features
Metal deposits with features smaller than 2 μm have been produced by the uv laser‐induced photodissociation of organometallic compounds. Such laser‐induced heterogeneous photochemical processes may have application in several areas of microelectronics including metallization, etching, and growth of semiconductor films.