Effect of Defect Bands on the Electrical Characteristics of Irradiated GaAs and
Proton bombarded p-Si and neutron irradiated n-GaAs have been studied by DLTS, current±voltage, and capacitance±voltage measurements in metal±semiconductor junctions. The junctions were prepared by evaporation of Al onto silicon and of gold onto GaAs. Both junctions exhibited defect bands after bombardment. The bombardment has shifted the Fermi-level pinning position, increased the ideality factor in both junctions, and also affected the temperature dependence of the ideality factor and that of the capacitance. The results show that the main effect of the radiation is the generation of laterally inhomogeneous defects near the semiconductor surface.
Effect of Defect Bands on the Electrical Characteristics of Irradiated GaAs and Si
Proton bombarded p-Si and neutron irradiated n-GaAs have been studied by DLTS, current–voltage, and capacitance–voltage measurements in metal–semiconductor junctions. The junctions were prepared by evaporation of Al onto silicon and of gold onto GaAs. Both junctions exhibited defect bands after bombardment. The bombardment has shifted the Fermi-level pinning position, increased the ideality factor in both junctions, and also affected the temperature dependence of the ideality factor and that of the capacitance. The results show that the main effect of the radiation is the generation of laterally inhomogeneous defects near the semiconductor surface.
Anomalous Annealing Behavior of Arsenic Implanted Silicon as a Function of Dose and Energy
Anomalous annealing behavior of damage in As implanted Si has been investigated by channeling effect measurements. Room temperature As implants with doses from 1014 to 2 × 1016cm-2 at energies ranging from 50 to 250 keV into Si were annealed over the range of 600°C to 1100°C. Anneal temperatures ≥ 950°C reduce the disorder for ion doses of 0.5 to 1 × 1016 cm-2 at energies between 50 and 250 keV. Anomalously high residual disorder was found for the intermediate doses of 2 × 1014 to 2 × 10/cm2 implanted above 100 keV. For this intermediate dose, annealing of implants performed at liquid nitrogen temperatures did not show significant reduction in this damage. However implants at 200° to 300°C indicate a lower amount of damage compared to the room temperature implants.