The design of a dynamic simulation system of a liquid chemical filling process
The flow sheet and operation principle of a liquid filling process was briefly discussed, and the dynamic simulation mathematic models of the filling process were developed in detail using the mass balance equations, gas state equations and historical process data. Based on the intelligent process control (IPC) simulation mode, the overall structure and the development scheme of the filling process simulation system was designed. A dynamic simulation system of the filling process was successfully developed, by taking a typical SCADA (supervisory control and data acquisition) configuration software named Century Star as GUI (graphical user interface) development platform, and integrating with a DLL (dynamic link library) function program to perform the calculation of the simulation models programmed using Visual C++. The development of the simulation GUI included the design and Command Language programming of simulated process flow sheet diagrams, simulation command buttons and their displaying diagrams, and the operation and parameters adjustment diagrams of all kinds of manipulators in the process flow sheets. The overall simulation operation of the filling process was fairly good achieved. Then some comprehensive and systematic simulation tests of the filling process were carried out. The simulation results show that the simulation system could satisfy the filling process research and design requirements very well, and the main process operation parameters were optimized through these simulation tests.
3D Simulation System for Filling Lines Based on Object-Oriented Technology
：The requirements needed in designing of filling lines are discussed and the framework for 3D simulation system is presented. The modeling based on object-oriented technology and 3D graphics is introduced. An application based on the OpenGL and VC++ to simulate the process of beer filling lines is given.
A reduced-basis discretization method for chemical vapor deposition reactor simulation
A computational technique for producing reduced-order models of distributed parameter systems is developed in the context of a tungsten chemical vapor deposition (CVD) simulation problem. The reduced-order simulations are formulated in terms of a reduced-basis Galerkin projection of the CVD system thermal dynamics model, where the trial functions are defined globally over the spatial domain and the entire processing cycle, reducing the simulation problem to the solution of a relatively small number of nonlinear algebraic equations. The biorthogonal, reduced basis is computed using the Karhunen-Loeve decomposition, where the two-point spatial and temporal correlation functions are determined from an eigenfunction expansion solution to a linearized approximation of the nonlinear CVD system. A subset of the parameters in the linearized system are represented as random variables so that the reduced basis remains accurate as the parameters are changed in simulations performed using the reduced model. We find that the number of floating point operations required for the generating the reduced basis and the subsequent full-Galerkin discretization of the nonlinear system is one order of magnitude less than the computational effort required for direct, semidiscrete Galerkin projection simulations of the CVD system model.