Thin film silicon alloys with enhanced stability made by PECVD and HWCVD for multibandgap solar cells
This paper presents the development of high deposition rate protocrystalline Si:H and /spl mu/c-Si:H as obtained by hot wire chemical vapor deposition (HWCVD, or catalytic CVD) and very high frequency plasma enhanced CVD (VHF PECVD) and protocrystalline SiGe:H as obtained by conventional PECVD. Using the latter two low bandgap materials as absorber layer, it is feasible to obtain stable devices showing virtually no light-induced changes in fill factor. We have obtained stable proto-SiGe:H cells using high H/sub 2/ dilution. A disadvantage, however, is the very low deposition rate for proto-SiGe:H (/spl sim/0.6 /spl Aring//s). By HWCVD, much higher deposition rates have been achieved for silicon-based thin films (both proto-Si:H and pc-Si:H). During the last few years, improved control of parameters is also obtained in HWCVD, which presently makes this method interesting for reducing the production cost of thin film solar cells. Recently, we have demonstrated that protocrystalline Si:H can be obtained from undiluted silane at 250 /spl deg/C in HWCVD at a high deposition rate of 1 nm/s. The light induced degradation in single junction n-i-p cells is less than 10%. Here, we also present for the first time p-i-n cells on commercial SnO/sub 2/:F with proto-Si intrinsic layers deposited at rates up to 3 nm/s, with again remarkable stability. Further, HWCVD microcrystalline materials with a crystalline fraction V/sub f/ of /spl sim/50% possess excellent electronic quality: the dangling bond density extracted from computer simulations, is only 2 /spl times/ 10/sub 15/ cm/sup -3/ and therefore we could obtain fill factors of 0.77 and 0.75 in dual-junction stacked /spl mu/c-Si:H//spl mu/c-Si:H cells, and proto-Si:H//spl mu/c-Si:H 'micromorph' n-i-p type solar cells, respectively. Both VHF PECVD /spl mu/c-Si:H made in the high pressure depletion regime and HWCVD /spl mu/c-Si:H have excellent potential for multibandgap solar cells.
Highly stable hydrogenated amorphous silicon germanium solar cells
This article shows an optimized a-SiGe:H material that behaves highly stable in solar cells. The a-SiGe:H material is deposited by PECVD with high hydrogen dilution, near the microcrystalline deposition regime. We made various a-SiGe:H single solar cells to optimize the device design. The band gap in the central part of the cell is 1.53 eV. The hydrogen bonding configuration in the a-SiGe:H material suggests the presence of voids, however, the material has no noticeable sign of crystallinity. Light soaking experiments showed that the present single junction a-SiGe:H solar cells are highly stable. After one hour of light soaking, a slight improvement in fill factor is observed and an improvement in carrier collection in the red region is evident from spectral response. The stable a-SiGe:H material is incorporated as the bottom cell of a-Si:H/a-SiGe:H tandem solar cells. Unlike the single junction cell, this tandem cell slightly degrades under light soaking. This is solely the result of degradation of the a-Si:H top layer.
Kinetics of Light-Induced Degradation of a-Si:H Solar Cells Compared to I-Layer Films
We report the CPM defect density of a-Si:H material and the performance characteristics of pin solar cells during high-intensity light-soaking. In one group of experiments we compared the effects of soaking with monochromatic light from a Kr + laser to white light from a Xe arc lamp. The effects are identical for the same electron-hole pair generation rate. In a second group of experiments we light-soaked at the two different temperatures of 50°C and 90°C. At 90°C the defect density saturates at a lower value than at 50°C, and correspondingly the cell performance parameters saturate at higher values.