Metal Gate Recessed Access Device (RAD) for DRAM Scaling
A functional DRAM with higher data retention characteristics than a planar access device has been demonstrated, using a metal gate recessed access device (RAD). Chemical vapor deposition (CVD) and atomic layer deposition (ALD) were used to deposit titanium nitride (TiN) and tantalum nitride (TaN), respectively. CVD TiN and ALD TaN-CVD TiN laminate gate stacks were integrated with a RAD module. ALD TaN-CVD TiN laminate gates showed enhanced drive current (IDS), higher transconductance (GM), higher mobility (¿EFF) and reduced off current (IOFF) characteristics compared to CVD TiN gates. Device characteristics and reliability data for both the planar devices and RADs are presented. The ALD TaN-CVD TiN laminate metal gate RAD showed much improved data retention characteristics compared to a conventional planar device with a poly silicon gate. The optimum thickness of ALD TaN in the laminate stack is discussed.
Atomic layer deposition of TaN and Ta3N5 using pentakis(dimethylamino)tantalum and either ammonia or monomethylhydrazine
Abstract TaN x thin films were grown at temperatures ranging from 200 to 375 °C using atomic layer deposition (ALD). Pentakis(dimethylamino)tantalum (PDMAT) was used as a tantalum source with either ammonia or monomethylhydrazine (MMH) as a nitrogen co-reactant. Self-limiting behaviour was observed for both ammonia and MMH processes, with growth rates of 0.6 and 0.4 A/cycle, respectively at 300 °C. Films deposited using ammonia were found to have a mono-nitride stoichiometry with resistivities as low as 70 mΩ cm. In contrast, films deposited using MMH were found to be nitrogen rich Ta 3 N 5 with high resistivities. A Quartz Crystal Microbalance (QCM) was used to measure mass gain and loss during the cyclic ALD processes and the data was used in combination with medium energy ion scattering (MEIS) to elucidate the PDMAT absorption mechanisms.
Semiautomated quantification of the fibrous tissue response to complex three-dimensional filamentous scaffolds using digital image analysis.
Fibrosis represents a relevant response to the implantation of biomaterials, which occurs not only at the tissue-material interface (fibrotic encapsulation) but also within the void fraction of complex three-dimensional (3D) biomaterial constructions (fibrotic ingrowth). Usual evaluation of the biocompatibility mostly depicts fibrosis at the interface of the biomaterial using semiquantitative scores. Here, the relations between encapsulation and infiltrating fibrotic growth are poorly represented. Virtual pathology and digital image analysis provide new strategies to assess fibrosis in a more differentiated way. In this study, we adopted a method previously used to quantify fibrosis in visceral organs to the quantification of fibrosis to 3D biomaterials. In a proof-of-concept study, we transferred the "Collagen Proportionate Area" (CPA) analysis from hepatology to the field of biomaterials. As one task of an experimental animal study, we used CPA analysis to quantify the fibrotic ingrowth into a filamentous scaffold after subcutaneous implantation. We were able to demonstrate that the application of the CPA analysis is well suited as an additional fibrosis evaluation strategy for new biomaterial constructions. The CPA method can contribute to a better understanding of the fibrotic interactions between 3D scaffolds and the host tissue responses.