Atomic oxygen effects on boron nitride and silicon nitride: A comparison of ground based and space flight data
The effects of atomic oxygen on boron nitride (BN) and silicon nitride (Si3N4) were evaluated in a low Earth orbit (LEO) flight experiment and in a ground based simulation facility. In both the inflight and ground based experiments, these materials were coated on thin (approx. 250A) silver films, and the electrical resistance of the silver was measured in situ to detect any penetration of atomic oxygen through the BN and Si3N4 materials. In the presence of atomic oxygen, silver oxidizes to form silver oxide, which has a much higher electrical resistance than pure silver. Permeation of atomic oxygen through BN, as indicated by an increase in the electrical resistance of the silver underneath, was observed in both the inflight and ground based experiments. In contrast, no permeation of atomic oxygen through Si3N4 was observed in either the inflight or ground based experiments. The ground based results show good qualitative correlation with the LEO flight results, indicating that ground based facilities such as the one at Los Alamos National Lab can reproduce space flight data from LEO.
STS-8 atomic oxygen effects experiment
A flight experiment was performed on the eighth Space Shuttle mission to measure reaction of surfaces with atomic oxygen in the low earth orbital environment. More than 300 individual samples were exposed to ram (normal to surface) conditions for 41.75 hr leading to a total atomic oxygen fluence of 3.5 x 10 to the 20th atoms/sq cm. Reaction rates for surface recession measured primarily by mass change of several organic films were in the range of 3.0 x 10 to the -24th cu cm/atom, and less than 5 x 10 to the -26th cu cm/atom for Teflon. Effects of parameters such as temperature and solar radiation were assessed, as was the importance of atmospheric ionic species on surface recession. In an experiment performed on the fifth Space Shuttle flight, no temperature dependence of reaction rate for the organic films studied was found in the temperature range of 25 to 125 C. Preliminary findings indicate that the reactivity of organic films is not affected by temperature (in the range of 65 to 125 C), solar radiation, or ionic species. Significant surface morphology changes led to a carpet-like appearance also consistent with previous findings.
Results of apparent atomic oxygen reactions on Ag, C, and Os exposed during the Shuttle STS-4 orbits
Films selected for anticipated reaction with atomic oxygen, namely carbon, silver, and osmium, were exposed during the Shuttle STS-4 mission. A silver film 225 ± 5 nm thick was converted to a transparent blue-green interference film 355 ± 5 nm thick. Both carbon and osmium films 10-30 nm thick apparently formed volatile oxides and disappeared, except where well shielded. A calculated total of approximately 7 × 1019 oxygen atoms per cm² struck the surfaces, which could have removed on the order of 3 µm of material if only 10% reacted. The absence of apparent effects on adjacent thin and thick gold films is offered as evidence that sputtering is not responsible.