Changes in the serial resistance Of a- Si, a-/μc-Si and mono-crystalline PV modules during the year
The changes in the serial resistance Rs of amorphous (a- Si) and amorphous/microcrystalline (a-/μc-Si) tandem silicon-based solar cells is a criterion to analyze the process of light -induced degradation and thermal healing of defects described by the Staebler - Wronski effect. Measurements under laboratory conditions show that the serial resistance increases during the light-induced degradation. Our annual measurement of a- Si, a-/μc-Si and mono-crystalline (c-Si) solar cells under field test conditions will verify this and it will improve the possibility of predicting the behavior of thin-film silicon photovoltaic cells. For a year, the complete current-voltage curve was measured every minute, recorded and analyzed. This data has been transferred into the equivalent circuit diagram for solar cells.
Study of forward I‐V plot for Schottky diodes with high series resistance
The current‐voltage characteristics for Schottky barrier diodes with series resistance are discussed. It is shown that by using Norde’s function F(V)=V/2−(kT/q)ln(I/SAT2) at two different temperatures, barrier height, n‐value or ideality factor, and series resistance can be determined even in the case 1
Properties of glow-discharge deposited amorphous germanium and silicon
Abstract Films of silicon and germanium are deposited on glass using the radio-frequency glow-discharge decomposition of silane and germane gases respectively. When grown on a substrate at room temperature the films are amorphous, with a short range order of about 20 A. The resistivities of these films, as deposited, are typically 108Ω cm for silicon and 7 × 103 Ω cm for germanium, measured at 294°K. Thermal activation energies for conduction decrease continuously below the deposition temperature, and at low temperatures germanium follows the relation log ’ = A/T 1 4 , where A is a constant. This would seem to indicate that a hopping process in an impurity band is responsible for conduction at low temperatures. Photoconductivity has been observed in silicon but not in germanium. The threshold energy for this effect decreases with increasing deposition or annealing temperatures. This is also true of the high temperature thermal activation energy. It is suggested that this is due to the de-localisation of states in the valence and conduction bands as the short range order increases. The optical absorption coefficients of germanium and silicon have an exponential dependence on photon energy and the considerable absorption below the fundamental absorption edge of the crystalline form may indicate the presence of localised states in the band gap.