Characterization of lithographically printed resistive strain gauges
This paper reports progress in sensor fabrication by the conductive lithographic film (CLF) printing process. Work describing strain-sensitive structures manufactured using a modified printing process and conductive inks is addressed. The performance of a "single-ink" strain-sensitive structure when printed on six alternative substrates (GlossArt, PolyArt, Teslin, Mylar C, Melinex, and Kapton) is analyzed. Though not intending to compete with conventional gauges in high-tolerance measurement, the structures exhibit properties that indicate suitability for novel applications.
Lithographic film circuits – a review
Conductive lithographic films (CLF) are an emerging fabrication process for electronic interconnect and a range of passive component structures. This paper reviews the manufacture, properties and applications of CLF conductors, and discusses other lithographically deposited electronic materials including resistive, dielectric and ferrite films. Recent developments in CLF technology, including multilayer structures and concurrent printing of interconnect with printed passive components, are presented.
Traceability strategy for gear-pitch-measuring instruments: development and calibration of a multiball artifact
There is a strong demand to ensure the traceability of gear-measuring instruments (GMIs). We propose a multiball artifact (MBA) for the evaluation of pitch-measuring accuracy. The aim of the MBA is to transfer the minimum uncertainty from a calibrated value at the National Metrology Institute of Japan (NMIJ) to a measured value of GMIs at a shop floor. The MBA is composed of equally spaced high-accuracy balls around an axis. The pitch-measuring accuracy of GMIs is evaluated by measuring the angular pitch deviation of the balls instead of the angular pitch deviation of a gear. We calibrated the angular pitch deviation using a coordinate measuring instrument (CMM) at the NMIJ and adapting a multiple-orientation technique. We proposed a calibration strategy of the angular pitch deviation. The calibration value of the pitch deviation for the MBA at the NMIJ was obtained with a measurement uncertainty (U95) of 0.2 µm. We evaluated the pitch-measuring accuracy of a GMI using the calibrated MBA. Each value of U95 for the cumulative and single pitch deviations for the left and right flanks was less than or equal to 0.5 µm. The small uncertainty was transferred from the NMIJ to the GMI.