Research on Template-Based Parameterized Structure Design for Drawing Dies
The structure design of drawing dies is a very compLicated and knowledge-intensive process. This paper describes a template-based parametric design system for drawing dies which adopt template as the die design knowledge base and instantiate it to complete the design of the main components of drawing die. Some key technologies such as the template technology, the parameterization technology and the top-down assembly design technique have been studied. The template for drawing dies is defined by using the "top skeleton" assembly structure, and the associative geometry-driven design and parameter-driven design of dies structure is reaLized by adopting WAVE technique and parameterized design method. The design process of template-based drawing dies structure is estabLished and the rapid design of structure is implemented by applying UG secondary development. At last, effectiveness of our method is verified by some examples.
A knowledge-based parametric design system for drawing dies
The design of drawing dies is a very complex and knowledge-intensive process. This paper describes a knowledge-based parametric design system for drawing dies which requires only a minimum set of parameters to be set before it is able to complete the design of the main components of a die, such as upper dies, lower dies, and blank holders. This minimum set of parameters includes blank sizes, die faces, punch open lines, drawing strokes, and press data. This design system implemented on top of the Pro/E CAD software consists of a drawing die knowledge base, a subcomponent inferencer, a dimension calculator, a subcomponent generator, a system coordinator, and a user interface. We use the design of drawing dies for inner wheel house as a concrete example to show that our system can greatly improve the design quality while reducing the development time and cost.
Submicron polymer structures with X-ray lithography and hot embossing
This article describes the process chain for replication of submicron structures with varying aspect ratios (AR) up to 6 in polymethylmethacrylate (PMMA) by hot embossing to show the capability of the entire LIGA process to fabricate structures with these dimensions. Therefore a 4.7 μm thick layer of MicroChem 950k PMMA A11 resist was spin-coated on a 2.3 μm Ti/TiOx membrane. It was patterned with X-ray lithography at the electron storage ring ANKA (2.5 GeV and λc ≈ 0.4 nm) at a dose of 4 kJ/cm3 using a Si3N4 membrane mask with 2 μm thick gold-absorbers. The samples were developed in GG/BDG and resulted in AR of 6–14. Subsequent nickel plating at 52°C resulted in a 200 μm thick nickel tool of 100 mm diameter, which was used to replicate slit-nozzles and columns in PMMA. Closely packed submicron cavities with AR 6 in the nickel shim were filled to 60% during hot embossing.