Spectrophotometric determination of tellurium in trace quantities by use of an ion-association complex.
The formation of an ion-association complex by the interaction of iodotellurate(IV) with cetyltrimethylammonium bromide is used as the basis of an extractive procedure to determine tellurium in the range 2.5-12.5 mug in a final aqueous phase volume of 20 ml. The method is simple, reliable and sensitive. Selectivity is achieved by separation of tellurium on aluminium hydroxide as collector.
Chemisches Verhalten und Bestimmung kleiner Tellur-Mengen
Abstract1. Normally, there will be no losses of tellurium during dissolution and decomposition steps. Decompositions should not be performed in metallic crucibles, as tellurium will be retained partly within the crucible. Dry ashing in air and sublimation of ammonium salts cause severe losses of tellurium. 2.Separation of tellurium by precipitation with H3PO2 solution is not quantitative; losses cannot be neglected at concentrations <1 μg Te/ml.Enrichment of tellurium by coprecipitation can be obtained preferably with iron hydroxide, elemental arsenium, and selenium.Tellurium(IV) can be extracted from aqueous solutions by many different organic solvents, but distribution coefficients decrease with decreasing tellurium concentration. Systems containing iodide and tetraphenylphosphonium ions are preferable.No separation using ion-exchangers have been found satisfactory at low tellurium concentrations. Either separation from solution or elution from the exchanger were not quantitative. 3.Several photometric determination methods are sensitive, but rather strongly influenced by interferences. Polarographic determination can be performed in different basic solutions. Classical polarography gives sensitivities of ca. 1 μg Te(IV)/ml, but modern equipment should enable the determination of much lower concentrations.Atomic absorption is not so sensitive, but very selective and free from interferences.At present, the most sensitive determination of tellurium is by neutron activation; optical spectrography is less sensitive. Flame photometry shall be mentioned only [25].Zusammenfassung1. Beim Lösen und Aufschließen sind im allgemeinen keine Verluste an Tellur zu befürchten; allerdings sollen Schmelzaufschlüsse nicht in Metalltiegeln durchgeführt werden, da ein Teil des Tellurs im Tiegel zurückgehalten werden kann.Nur beim trockenen Veraschen an der Luft und beim Abrauchen von Ammoniumsalzen treten hohe Verluste auf. 2. Die Abtrennung von Tellurspuren durch Fällen mit H3PO2-Lösung ist nicht ganz vollständig; bei Konzentrationen unter etwa 1 μg Te/ml sind die Verluste nicht mehr zu vernachlässigen.Zum Anreichern durch Mitfällung sind vor allem Eisen(III)-hydroxid, elementares Arsen und Selen zu empfehlen.Tellur (IV) kann mit zahlreichen Reagentien und organischen Lösungsmitteln aus wäßrigen Lösungen ausgeschüttelt werden. Die Verteilungskoeffizienten nehmen jedoch in der Regel bei sehr kleinen Tellur-Konzentrationen ab. Besonders günstig sind Systeme mit Jodid- und Tetraphenylphosphoniumzugaben.Versuche mit Ionenaustauschern verliefen bei sehr kleinen Tellur-Konzentrationen sämtlich unbefriedigend; entweder war die Abtrennung aus Lösungen oder die Elution von der Säule unvollständig. 3. Die photometrischen Bestimmungsmethoden sind z.T. empfindlich, aber ziemlich störanfällig.Die polarographische Bestimmung kann in verschiedenen Grundlösungen durchgeführt werden; mit dem klassischen Polarographen werden im allgemeinen Empfindlichkeiten von etwa 1 μg Te(IV)/ml erreicht, mit moderneren Geräten sollten wesentlich empfindlichere Bestimmungen möglich sein.Die Bestimmung durch Atomabsorption ist etwas weniger empfindlich, aber sehr selektiv und wenig gestört.Als zur Zeit empfindlichste Bestimmungsmethode ist die Aktivierungsanalyse anzusehen; etwas unempfindlicher ist die spektrographische Methode. Die Flammenphotometrie sei nur erwähnt [25].
Enhancement of surface properties on Low Density Polyethylene packaging films using various fluorination routes
Nowadays, packaging market deployment requires an important attention. Influence of treatment with molecular (F2) or atomic (Fradical dot) fluorine on properties of Low Density Polyethylene (LDPE) films was investigated. The films were treated using direct fluorination conditions with F2 or a specific reagent XeF2, which releases atomic fluorine Fradical dot. Changes of LDPE chemical composition were investigated by FTIR and solid state NMR. Surface morphology was studied by several microscopy techniques (SEM and AFM). Finally to further characterize film properties after treatments, surface energy measurements and electron paramagnetic resonance (EPR) analyses were also carried out. An upper fluorinated layer, which contains mainly high amount of single bondCF2single bond, was formed during the direct fluorination conditions (F2). For the process performed with XeF2, specific groups single bondCHFsingle bond were detected not only on the polymer surface but also in the bulk. The final CHF/CF2 ratio depended on the fluorination route. Treatment with Fradical dot (originated from XeF2 decomposition) resulted in single bondCHFsingle bond groups in bulk prevailing formation whereas F2 formed mainly single bondCF2single bond groups. Regardless to the reactive species, radicals (dangling bonds) appeared during the fluorination and reacted with oxygen during the exposition to air after the treatment. Such a process resulted in oxygenated polar groups formation and consequently in the surface energy increase.