Enhanced Plasma Uniformity in RF Plasma With Side Multihole
Capacitively coupled plasma source with side multihole is studied. Due to the hollow cathode effect at the multihole, edge plasma density is strongly increased and thus, plasma uniformity is significantly enhanced.
rf Electrode sheath formation near a concave electrode.
In this work we present experimental results concerning electrode sheath and ion flux formation near a concave electrode with the dimension of a cavity comparable to the electrode sheath length. It is shown that the secondary electron emission can play a crucial role in plasma molding over the electrode surface. It is also observed that plasma has a tendency to "self-leakage" in electrode cavities.
Optical emission spectroscopy of self-sustained magnetron sputtering
Abstract The results of plasma investigation during very high power magnetron sputtering processes are presented. Magnetron sputtering during both standard and self-sustained modes was investigated. Owing to very effective target cooling and appropriate magnetic field distribution, the high target power density could be reached (up to ∼1000 W/cm 2 , ∼1.5 A/cm 2 ). A copper target 50 mm in diameter and 7 mm in thickness was used during the experiments. Two modes of magnetron sputtering, i.e. standard and self-sustained, were investigated. Optical emission spectra were measured. The emission intensity of the Cu species as a function of target power density during both magnetron sputtering modes was observed. The spectra were observed in the 200–800 nm wavelength range. When target current rose, the emission intensity of copper ion lines increased and neutrals ones decreased.