Enhanced contamination control methods in advanced wafer processing
Semiconductor manufacturing is a highly complex process, with a high need for process control, but equally important are effective methods for contamination control. Methods for detection of airborne and surface molecular contaminants were enhanced to meet the increasing requirements for future More Moore and More than Moore applications. Improved qualitative and quantitative contamination analysis methods of organic and inorganic compounds allow exact monitoring of contamination in front- as well as back-end processes. By the use of state-of-the-art analytical systems combined with validated analytical procedures and advanced sample preparation techniques contamination analytical results with higher reproducibility and reliability are being ensured.
Contamination Control for Wafer Container Used within 300 mm Manufacturing for Power Microelectronics
This paper gives an overview about all activities performed within a common project between industrial and academic partners to define clean room concepts for the first worldwide high volume semiconductor front end facility IFD for 300 mm power semiconductors. The investigation within this study is the base for the 300 mm container strategy resulting in new innovative manufacturing and automation concepts.
The guaianolides of ambrosia cumanensis HBK : The structures of cumambrins A and B☆
Abstract Cumambrins A and B isolated from Ambrosia cumanensis HBK were shown to be guaianolides with structures Ia and Ib.