Structure of clean and arsenic-covered GaN(0 0 0 1) surfaces
Abstract The effect of trace arsenic on the growth and surface structure of GaN(0 0 0 1) has been studied. We find that a partial pressure of only 10 −9  Torr of arsenic during molecular beam epitaxial growth significantly modifies the growth kinetics. Such a small background pressure of arsenic leads to an arsenic-terminated surface displaying a 2×2 reconstruction during growth which is absent for the clean surface. First-principles theoretical calculations show that As-terminated surfaces are energetically more favorable than Ga-terminated surfaces for arsenic pressures of 10 −9  Torr, and structural models for the As-adatom 2×2 reconstruction are presented.
Reconstructions of GaN and InGaN surfaces
Abstract The reconstruction and growth kinetics of gallium nitride (0001) and (0001) surfaces are studied using scanning tunneling microscopy (STM), reflection high-energy electron diffraction (RHEED) and low-energy electron diffraction (LEED). Results for bare GaN surfaces are summarized, with particular attention paid to the “pseudo-1×1” reconstruction of the (0001) face. Changes in the surface structure and kinetic processes due to indium co-deposition during growth are discussed.
Anomalous Annealing Behavior of Arsenic Implanted Silicon as a Function of Dose and Energy
Anomalous annealing behavior of damage in As implanted Si has been investigated by channeling effect measurements. Room temperature As implants with doses from 1014 to 2 × 1016cm-2 at energies ranging from 50 to 250 keV into Si were annealed over the range of 600°C to 1100°C. Anneal temperatures ≥ 950°C reduce the disorder for ion doses of 0.5 to 1 × 1016 cm-2 at energies between 50 and 250 keV. Anomalously high residual disorder was found for the intermediate doses of 2 × 1014 to 2 × 10/cm2 implanted above 100 keV. For this intermediate dose, annealing of implants performed at liquid nitrogen temperatures did not show significant reduction in this damage. However implants at 200° to 300°C indicate a lower amount of damage compared to the room temperature implants.