Enhanced Plasma Uniformity in RF Plasma With Side Multihole
Capacitively coupled plasma source with side multihole is studied. Due to the hollow cathode effect at the multihole, edge plasma density is strongly increased and thus, plasma uniformity is significantly enhanced.
Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias
Electromagnetic effects such as the skin effect, standing wave effect, and edge effect have been mainly studied in large-area, high-frequency gas discharges. In this study, we show that the skin effect can be a major factor of plasma uniformity in a high-density plasma, even if the discharge regime is in a small electrode area and under moderate excitation frequency. When a radio frequency (RF) bias power was applied to an inductively coupled plasma (ICP), the plasma density near the radial edge was largely increased and the plasma uniformity was significantly enhanced in the high-density plasma regime. This change could be understood by considering the enhanced electric field in the radial edge, the so-called skin effect. The time-dependent behavior of the plasma density and electron temperature by the bias power was also studied. When the RF bias power was applied to the ICP, the electron temperature abruptly increased due to electron heating, while variations of plasma density depending on the radial position were observed with the RF bias power in the high-density plasma of the ICP.
Atomistic simulation of energy and temperature effects in the deposition and implantation of amorphous carbon thin films
Molecular dynamics simulations of carbon deposition and implantation are performed using the newly developed environment dependent interaction potential. Three scenarios are considered: room temperature deposition, post-deposition implantation and high temperature substrate heating. The room temperature depositions exhibit the characteristic energy dependence observed experimentally and shows that tetrahedral amorphous carbon forms at energies well below the subplantation threshold. In agreement with the experiment, implantation results in graphitisation and stress reduction and the critical dose for maximal change are well predicted. Simulations of ex-situ and in-situ heating investigate kinetic effects and thermal stability respectively, with the latter revealing an unexpected epitaxial growth mode.