Use of cosmetics by Danish women
acrylic compound such as trimethyl propane trimethacrylate (TPC). This is of considerable significance since TPC may cause allergic contact dermatitis in ultraviolet cured printing inks (Nethercott 1978). Finally, Chung & Giles (1977) showed that guinea pigs could be strongly sensitized to methyl-, ethyland n-butyl methacrylate in ethanol or olive oil by the topical route, or in saline by the intradermal route. For elicitation of skin reactions, topical challenge with the compounds in olive oil or intradermal challenge with saline as the solvent was necessary. All sensitized animals responded strongly not only to the inducting methacrylate but also to the other methacrylates, showing that mutual cross-sensitivity had occurred. They concluded by stating that, "Since methyl methacrylate has been reported to be a potent sensitizer in humans, the guinea pig model described here may be useful for screening products before marketing."
Course of hand dermatitis in hospital Workers
The occurrence and course of hand dermatitis in hospital workers was studied on the basis of the patient register of an occupational specialist and by a clinical follow‐up study. About 1% of all the hospital workers had had dermatitis, cleaners, kitchen workers and nurses most frequently. 54% of the patients who were clinically studied had suffered from periodic symptoms and 35% had current hand dermatitis. Those who had previous or present atopic dermatitis had most frequently developed dermatitis during the first year of their service. An atopic constitution seemed to predispose to the development of permanent or periodic hand dermatitis. The patients with sensitivity to nickel or fragrances had relapses in the majority of cases.
Submicron polymer structures with X-ray lithography and hot embossing
This article describes the process chain for replication of submicron structures with varying aspect ratios (AR) up to 6 in polymethylmethacrylate (PMMA) by hot embossing to show the capability of the entire LIGA process to fabricate structures with these dimensions. Therefore a 4.7 μm thick layer of MicroChem 950k PMMA A11 resist was spin-coated on a 2.3 μm Ti/TiOx membrane. It was patterned with X-ray lithography at the electron storage ring ANKA (2.5 GeV and λc ≈ 0.4 nm) at a dose of 4 kJ/cm3 using a Si3N4 membrane mask with 2 μm thick gold-absorbers. The samples were developed in GG/BDG and resulted in AR of 6–14. Subsequent nickel plating at 52°C resulted in a 200 μm thick nickel tool of 100 mm diameter, which was used to replicate slit-nozzles and columns in PMMA. Closely packed submicron cavities with AR 6 in the nickel shim were filled to 60% during hot embossing.