The effectiveness of low-emissivity coating on a polymer film
This work describes the effectiveness of low-emissivity (low-E) coating on the polymer film with TiO2/ZnO:Ga/Ag/ZnO:Ga/TiO2 structure and the results of heat monitoring. The characteristics of the coating which determine the reduction of heat loss by the low-E coating are given. Also the results of efficiency calculations for low-E coating are presented, such as resistance to heat transfer, heat savings when installing low-E coating on the polymer film, etc. The heat monitoring is carried out to determine the effectiveness of low-E coating. The results of heat monitoring illustrate the effectiveness of low-E coating.
Durability of Ag based low‐emissivity coatings
Films of ZnO/Ag/Sn/ZnO deposited by dc magnetron sputtering are being widely used as ‘‘heat mirror’’ films in architectural applications. The long‐term durability of these films has been studied through accelerated weathering and exposure to controlled atmospheres of C12, H2S, and moisture. After accelerated exposure, films were analyzed by ultraviolet–visible–near infrared and far infrared spectroscopy, Auger depth profiling, and scanning electron microscopy. No significant changes were seen in transmittance or infrared reflectivity. No interdiffusion of layers was seen in Auger profiling.
The effects of surface and interface scattering on the electrical resistivity of Cu/Ag double-layered thin films
Abstract The total electrical resistivity of the Cu Ag double-layered thin films is studied as a function of the temperature. The effects of very thin silver top layers of 1.5–3.5 nm thickness, deposited onto copper base layers of 16.6–26.3 nm thickness, on the resistivity of the Cu Ag double-layered films is investigated. It is observed that the deposition of the top layers causes deviation from Matthiessen's rule and an increase in the resistivity of the double-layered films in comparison with those of the uncovered copper base films. Our analysis has shown that these observed effects are caused by an increased surface scattering contribution which corresponds to the increased values of the surface roughness parameters and the interface scattering cannot be responsible for this observed resistivity increase in the double-layered films, the base layers of which have a thickness greater than 16.6 nm.