Evaluation of plasma-sprayed CoS2 cathodes for thermal batteries
Conventional electroactive stack components in thermal batteries are constructed from pressed-powder parts. These include the anode, separator, and cathode pellets (discs). Pressing parts that are less than 0.010" thick is difficult. The use of plasma spray to deposit thin CoS/sub 2/ cathode films onto a stainless steel substrate was examined as an alternative to pressed-powder cathodes. The plasma-sprayed electrodes were tested in single cells under isothermal conditions and constant-current discharge over a temperature range of 400/spl deg/C to 550/spl deg/C using standard LiSi anodes and separators based on the LiCl-KCl eutectic. Similar tests were conducted with cells built with conventional pressed-powder cathodes, which were tested under the same conditions for comparative purposes. This paper presents the results of those tests.
, S + W 3 ZOO 0-2 % 2 LC Review of US Nanocorp @-SNL Joint Development of Thermal-Sprayed Thin-Film Cathodes for Thermal Batteries
Theuse of plasma spray to deposit thin metal-sulfide cathode films is described in this paper. Conventional electroactive stack components in thermal batteries are constructed from pressed-powder parts that are difficult to fabricate in large diameters in thicknesses <0.010”. Plasma-sprayed electrodes do not stier from this difficulty, allowing greater energy densities and specific energies to be realized. Various co-spraying agents have been found suitable for improving the mechanical as well as electrochemical properties of plasma-sprayed cathodes for thermal batteries. These electrodes genemlly show equal or improved performance over conventional pressed-powder electrodes. A number of areas for fbture growth and development of plasma;pray technology will be discussed.
Submicron polymer structures with X-ray lithography and hot embossing
This article describes the process chain for replication of submicron structures with varying aspect ratios (AR) up to 6 in polymethylmethacrylate (PMMA) by hot embossing to show the capability of the entire LIGA process to fabricate structures with these dimensions. Therefore a 4.7 μm thick layer of MicroChem 950k PMMA A11 resist was spin-coated on a 2.3 μm Ti/TiOx membrane. It was patterned with X-ray lithography at the electron storage ring ANKA (2.5 GeV and λc ≈ 0.4 nm) at a dose of 4 kJ/cm3 using a Si3N4 membrane mask with 2 μm thick gold-absorbers. The samples were developed in GG/BDG and resulted in AR of 6–14. Subsequent nickel plating at 52°C resulted in a 200 μm thick nickel tool of 100 mm diameter, which was used to replicate slit-nozzles and columns in PMMA. Closely packed submicron cavities with AR 6 in the nickel shim were filled to 60% during hot embossing.