Simulations of consecutive diffusion process
Process simulation based on virtual reality can comprehensively present the real process on the computer. It can play an important role in the development and manufacturing field of diffusion furnace. This paper researches the establishment of consecutive diffusion process and the key techniques of process simulation. In the process of creating process simulation, V code would be created to control motion of each part. A simulation that reflects on the real process could be acquired with this research. This process simulation not only shortens the development time of diffusion furnace, but also makes designer have a perspective to the defects of product in the design process. It promotes the effective of design, and reduces changes in later period of design.
Implementation of MIMO R2R control regulation on furnaces processes
With geometries scaling down and the considerable multiplication of process recipes used in production for the same furnace, it becomes more and more difficult and hard to tune all process recipes correctly to achieve target deposition thickness performances. In this paper diffusion furnace recipes control using run to run (R2R) will be presented and described. The goal is to be able to control all furnace recipes using transfer models and corrective factors
Development of Diffusion/Oxidation Process Control Management System
This paper presents a semiconductor diffusion/oxidation production process control management system.The system comprises the lower control unit and the upper management computer.The lower control unit achieves the control of temperature,gas flow and push-pull boat based on the diffusion/oxidation process.The upper management computer achieves diffusion/oxidation process management,analysis,and the exchange of information with the lower control unit.