Rake angle measurement of inclined slotting cutter
This paper analyses the blade shape, the parameters of rake angle of slotting cutter. The theoretical analysis process of a novel rake angle error measurement is introduced, which is built on the theory that the rake face of the inclined slotting cutter is a flat surface. For the systematic errors is caused by inaccurate measurement, the paper give in-depth analysis in various situation. By testing in the GD40-type CNC Gear Measurement Center, the accuracy testing results validate the correctness of the method.
Research on the design and manufacturing of an outer cycloid slotting cutter
Outer cycloid gears are used widely in many instruments and machines. The outer cycloid slotting cutter is an important cutting tool used in the manufacturing of this type of gear. In the process of design, the ideal outer cycloid cutter is one where a cylindrical surface takes the tooth profile of the outer cycloid as the directrix. However, during the manufacturing process, it is used as a cutter and therefore a cutting edge is required. As a result, it will be seen that the processes of design and usage of the outer cycloid cutter are not the same. The range of the qualified length of tooth is deduced in this paper by using the mid-point and mid-line method. This paper also presents the associated outer cycloid slotting cutter design and manufacturing models so that the modelling accuracy and the necessary relief angles of the top cutting edge and side cutting edge can be ensured. This paper is intended as a reference to be used in the manufacture and application of this type of slotting cutter.
Anomalous Annealing Behavior of Arsenic Implanted Silicon as a Function of Dose and Energy
Anomalous annealing behavior of damage in As implanted Si has been investigated by channeling effect measurements. Room temperature As implants with doses from 1014 to 2 × 1016cm-2 at energies ranging from 50 to 250 keV into Si were annealed over the range of 600°C to 1100°C. Anneal temperatures ≥ 950°C reduce the disorder for ion doses of 0.5 to 1 × 1016 cm-2 at energies between 50 and 250 keV. Anomalously high residual disorder was found for the intermediate doses of 2 × 1014 to 2 × 10/cm2 implanted above 100 keV. For this intermediate dose, annealing of implants performed at liquid nitrogen temperatures did not show significant reduction in this damage. However implants at 200° to 300°C indicate a lower amount of damage compared to the room temperature implants.