A study into the formation and characterisation of electroless nickel silicide for laser doped solar cells
In this paper we will study the formation and characteristics of nickel silicide compounds and the subsequent specific contact resistivity (Ω.cm2) during the formation of an ohmic contact in solar cells. Using Transmission Line Method (TLM) we will analyse the electrical characteristics of the formed nickel silicides at different sintering temperatures and durations. In each sintering condition tested, the relationship between the total resistance and the distance between the contact pads on the fabricated test structures is measured and graphed. From these graphs the contact resistance (Ω) and specific contact resistivity (Ω.cm2) of the metallisation stack is calculated and tabulated. We conclude the paper by showing the optimum sintering condition of 350°C for three minutes for laser doped solar cells which yields negligible contact resistance.
Compatibility of the alternative seed layer (ASL) process with mono-Si and poly-Si substrates patterned by laser or wet etching
An alternative seed layer (ASL) process is proposed in order to increase the efficiency of silicon solar cells by forming a low cost, front metal contact with reduced contact resistance and increased line conductivity and aspect ratio. A nickel seed layer is deposited directly on silicon to form a low resistivity nickel silicide (NiSi) ohmic contact and this contact is thickened by light induced plating (LIP) of nickel and copper. Unlike the traditional screen printing process currently used in industry, the ARC layer must be patterned to expose the silicon surface for nickel deposition. This paper investigates the compatibility of the ASL process with two different ARC patterning methods: 1) masking & wet chemical etching, and 2) laser ablation. In addition, the ASL process is demonstrated on both mono-crystalline and polycrystalline silicon substrates with ARC layers from different sources. The nickel seed layer and resulting NiSi layer are evaluated using scanning electron microscopy (SEM) with energy dispersive x-ray spectroscopy (EDS) and focused ion beam (FIB) cross section. X-ray photoelectron spectroscopy (XPS) is used to investigate the completeness of the ARC removal step. In addition, contact resistance testing will be performed to determine the quality of the ohmic contact formed from the ASL process. The importance of chemistry optimization in the development of a robust ASL process that is compatible with mono-Si and poly-Si substrates and exposed to two different ARC patterning methods will be discussed.
Use of laser scanning confocal microscopy for morphological taxonomy and the potential for digital type specimens (e-types)
The use of laser scanning confocal microscopy (LSCM) for creating taxonomic descriptions of copepods is investigated. A new technique is described, which employs a contour filter to process digital LSCM images, allowing taxonomic information to be quickly and accu- rately distilled into a simple illustration. LSCM allows the imaging of whole specimens, which can be rotated and viewed from any angle—a major benefit over light microscopy. Using this tech- nique, it is suggested that taxonomic descriptions can be rapidly produced in a fraction of the time required to produce similar descriptions using traditional light microscopy and hand drawing techniques. Good staining of specimens is, however, essential to produce accurate descriptions and more research is required in this area. The use of LSCM for morphological taxonomy shows great potential, not only for producing taxonomic descriptions, but also providing a comple - mentary adjunct to traditional type specimens in the form of 3D digital 'e-types' deposited in recognised international databases.