Glow Characterization in Low-Pressure Radio-Frequency $\hbox{CH}_{2} \hbox{F}_{2}$ and $\hbox{C}_{2}\hbox{H}_{2}\hbox{F}_{4}$  Plasma Deposition Systems
The glow characteristics and deposited film structures of fluorocarbon monomers in radio-frequency glow discharges are investigated using CH<sub>2</sub>F<sub>2</sub> and C<sub>2</sub>H<sub>2</sub>F<sub>4</sub>, which were compared to hydrocarbon monomer such as CH<sub>4</sub>. The glow was characterized and investigated by optical photography, optical emission spectroscopy, and Fourier transform infrared spectrometry. The glow differences were attributed to the nature of the luminous gas phase in respect to polymer-forming species.
Plasma Polymerization Behavior of Fluorocarbon Monomers in Low‐Pressure AF and RF Discharges
The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3 F 6, C 3 F 6 O, C 4 F 10 and C 2 F 4 H 2 , which were compared to hydrocarbons such as methane and butane. The plots of the normalized thickness growth rates of plasma polymers, GR/FM, versus the energy input composite parameters, W/FM, revealed the energy-deficient and monomer-deficient domains for each monomer, along with the critical energy input, (W/ FM) c , representing the transition between the two domains. The luminous gas phase in fluorocarbon discharges does not contain much polymer-forming species and thus, the monomer-deficient domain shifted to a much lower W/FM and GR/FM values than in the case of hydrocarbon systems. For hydrocarbon systems, deposition rates were greater in RF than in AF discharges, which is opposite to the situation observed for the fluorocarbon systems. These differences were attributed to the locations of the dissociation glows and to the nature of the luminous gas phase in respect to polymer-forming species.
Continuous calibration of a vacuum ultraviolet system from 65 to 125 nm by a cascade arc and comparison with the calibrated line radiation of a hollow cathode.
A high-power stationary helium cascade arc has been developed as a standard source for continuum radiation in the VUV spectral range from 65 to 125 nm. The calibration of the VUV system response was based on the calculated and measured continuum radiation of a 2-mmphi pure He arc. Diagnostics of the arc plasma in partial thermal equilibrium yielded the electron density and the temperature that were inserted in the calculations of the continuous radiation. The results were compared with the helium, argon, and krypton radiation lines of a high-current hollow cathode lamp. This lamp was built according to the construction drawings of a hollow cathode, which was calibrated by means of the electron synchrotron radiation at the Physikalisch Technische Bundesanstalt Berlin.