The effect of an electromagnetic peening process on mumetal properties
Peening processes are widely used in the industries to enhance the performance of the most solicited parts of mechanical pieces. Actual processes, like shot peening and low plasticity burnishing, are quite limited to a small depth of treatment circa 1 mm at maximum. A new process is developed based on pulsed electromagnetic fields. This method allows a better depth of treatment up to 5 mm and it can be easily monitored. A prototype was developed using a pulse current generator and specifically designed inductor. This prototype was used on mumetal for the preliminary tests. Indeed, its maximal permeability and coercivity are highly impacted by the presence of stresses. Using specifics sensors, some changes occur after treatment on mumetal samples and can be observed.
Numerical simulation of electromagnetic surface treatment
Surface treatment methods, such as shot peening or laser shock peening, are generally used to introduce superficial compressive residual stresses in mechanical parts. These processes are carried out during the manufacturing steps or for the purpose of repairing. The compressive residual stresses prevent the initiation and growth of cracks and thus improve the fatigue life of mechanical components. Electromagnetic pulse peening (EMP) is an innovative process that could be used to introduce compressive residual stresses in conductive materials. It acts by generating a high transient electromagnetic field near the working surface. In this paper, the EMP process is presented and a sequentially coupled electromagnetic and mechanical model is developed for its simulation. This 2D axisymmetric model is set up with the commercial finite element software SYSWELD. After description and validation, the numerical model is used to simulate a case of introducing residual stresses of compression in a nickel-based alloy ...
Traceability strategy for gear-pitch-measuring instruments: development and calibration of a multiball artifact
There is a strong demand to ensure the traceability of gear-measuring instruments (GMIs). We propose a multiball artifact (MBA) for the evaluation of pitch-measuring accuracy. The aim of the MBA is to transfer the minimum uncertainty from a calibrated value at the National Metrology Institute of Japan (NMIJ) to a measured value of GMIs at a shop floor. The MBA is composed of equally spaced high-accuracy balls around an axis. The pitch-measuring accuracy of GMIs is evaluated by measuring the angular pitch deviation of the balls instead of the angular pitch deviation of a gear. We calibrated the angular pitch deviation using a coordinate measuring instrument (CMM) at the NMIJ and adapting a multiple-orientation technique. We proposed a calibration strategy of the angular pitch deviation. The calibration value of the pitch deviation for the MBA at the NMIJ was obtained with a measurement uncertainty (U95) of 0.2 µm. We evaluated the pitch-measuring accuracy of a GMI using the calibrated MBA. Each value of U95 for the cumulative and single pitch deviations for the left and right flanks was less than or equal to 0.5 µm. The small uncertainty was transferred from the NMIJ to the GMI.