Materials outgassing rate decay in vacuum at isothermal conditions
As a laboratory for scientific research, the International Space Station has been in Low Earth Orbit for over 17 years and is planned to be on-orbit for another 10 years. The ISS has been maintaining a relatively pristine contamination environment for science payloads. Materials outgassing induced contamination is currently the dominant source for sensitive surfaces on ISS and modelling the outgassing rate decay over a 20 to 30 year period is challenging. Using ASTM E 1559 rate data, materials outgassing is described herein as a diffusion-reaction process with the interface playing a key role. The observation of -1/2 (diffusion) or non-integers (reaction limited) as rate decay exponents for common ISS materials indicate classical reaction kinetics is unsatisfactory in modelling materials outgassing. Nonrandomness of reactant concentrations at the interface is the source of this deviation from classical reaction kinetics. A t-1/2 decay is adopted as the result of the correlation of the contaminant layer thicknesses and composition on returned ISS hardware, the existence of high outgassing silicone exhibiting near diffusion limited decay, the confirmation of nondepleted material after ten years in Low Earth Orbit, and a potential slowdown of long term materials outgassing kinetics due to silicone contaminants at the interface.
Monte Carlo Simulation of Surface Adsorption-Diffusion-Reaction Kinetics
A surface adsorption−diffusion−reaction model is proposed and tested by Monte Carlo simulations. The solvent shell effect is considered as a geometric constraint and the Langmuir adsorption mechanism is also incorporated. An anomalous power law of t1/2 is obtained for the amount of material removed from the surface vs time. The result agrees well with etching experiments of SAM on a silica surface. We conclude that the unusual power law results from an interplay of vacancy growth and fusion at the surface.
New Low-Profile Applicators for Local Heating of Tissues
A new type of low-profile applicator is described giving efficient power transfer to tissue with low leakage. It consists of a resonant element spaced from a ground plane by low-loss material having high relative permittivity and some relative permeability. This combination is covered by similar material which can be placed in direct contact with the tissue to be heated, or separated from it by a water bolus as required. Laboratory measurements using phantom materials show that these applicators are well matched and produce well defined and relatively uniform heating profiles. Applicators having maximum dimensions of 3-15 cm covering the frequency range 1000-100 MHz, respectively, are described. Penetration depths of at least 4 cm at 100-200 MHz are achieved. Tests on anesthetised pigs and some clinical assessment have confirmed the usefulness of this compact low-frequency type of applicator and have shown that performance compares favorably with that of other recently reported types. The design can be optimized for treatment of specific sites, and suitable choice of dimensions and electrical characteristics of the layer material allow the low-profile concept to be extended over a wide range of operating frequencies.