Wafer Inspection System: Calibration and Measurement
Wafer surface scanners are widely used in semiconductor industries to detect particle contamination on wafers. The performance characteristics of a PMS SAS-3600 wafer surface scanner have been evaluated using ideal polystyrene latex (PSL). It was also used to measure irregularly shaped silicon particles. Three sizes of PSL spheres (0.199μm, 0.3μm, and 0.426μm) were used to study the sizing accuracy and counting efficiency of this wafer scanner. The results show that this scanner sizes 0.199μm and 0.3μm PSL reasonably accurate. But it cannot size 0.426μm PSL very well. The background noise lever was so high that this scanner could not measure particles near its nominal lower detection limit: 0.1μm. It over-counted Si particles by 28%. An electrostatic enhanced wafer deposition chamber was used to prepare the test wafers. Both the theoretical calculations and experimental results show that electrostatic force increases the deposition velocity by 2 orders of magnitudes for particles smaller than 1μm. The sedimentation is the dominant mechanism for particles larger than 1μm.
Contamination-Free Manufacturing for Semiconductors and Other Precision Products
National Technology Roadmap for Semiconductors - basis and alignment off-wafer measurement of contaminants on-wafer measurement of molecular contaminants transport and deposition of aerosol particles particulate deposition in liquid systems deposition of molecular contaminants in gaseous environments contamination removal from surfaces deposition of metallic contaminants from liquids and their removal sources of contamination and their control.
Kant's 'Religion within the Boundaries of Mere Reason'
Preface 1. Context 2. Overview of Themes 3. Reading the Text Prefaces to the First and Second Editions Part I of the Religion Part II of the Religion Part III of the Religion Part IV of the Religion 4. Reception and Influence 5. Guide for Further Reading Bibliography Index