Fabrication of organic emissive thin films by mist deposition method and evaluation of substrate temperature dependence
Mist deposition method has the advantage of low-cost and energy-saving for the fabrication of organic thin films. We fabricated thin films of organic emissive materials, tris (8-hydroxyquinoline) (Alq3) and rhodamine 6G by the mist deposition method using ultrasonic transducer. The thicknesses of them clearly depend on the substrate temperature during the mist deposition by the boiling point of the solvent. The PL spectra clearly demonstrated that the thin films of Alq3 and rhodamine 6G were successfully fabricated.
Heteroepitaxy of Corundum-Structured α-Ga2O3 Thin Films on α-Al2O3 Substrates by Ultrasonic Mist Chemical Vapor Deposition
Ga2O3 thin films of the α-phase, that is, the corundum structure (in the trigonal system), have been epitaxially obtained on sapphire (α-Al2O3) substrates, in contrast to the strong tendency of Ga2O3 to assume a heterogeneous crystal structure, that is, the β-gallia structure (in the monoclinic system) on sapphire. This result is advantageous for high-quality films and is due to the growth by mist chemical vapor deposition (CVD) at low temperatures of 430–470 °C. The α-Ga2O3 films have narrow full-widths at half maximum (FWHMs) in their X-ray diffraction rocking curves, for example, about 60 arcsec. The root mean square (RMS) roughness of the surface was as small as 1 nm. The optical band gap energy obtained was 5.3 eV, and the films were almost completely transparent in the near-ultraviolet and visible regions. The epitaxial growth of α-Ga2O3 films on sapphire is beneficial for the fabrication of oxide optical and electronic devices.
Erratum: “Linear Source Ultrasonic Spray Chemical Vapor Deposition Method for Fabrication of ZnMgO Films and Ultraviolet Photodetectors”
A linear-source ultrasonic spray chemical vapor deposition method has been developed and applied to fabricate ZnMgO ternary alloy thin films on glass substrates. A water solution of zinc acetate and magnesium acetate was ultrasonically atomized to form aerosol particles of water containing the sources, and then they were supplied onto the heated substrate by a nitrogen carrier gas through a nozzle with a linear aperture to form ZnMgO films. The source concentration ratios in the water solution successfully controlled the solid composition and hence raised the band gap of ZnMgO up to 3.75 eV, keeping the optical transmission higher than 90% for the visible-light region. An UV photodetector fabricated using the ZnMgO film showed the photoresponsivity to be as high as a few A/W, suggesting that this simple and cost-effective technique is promising for fabricating ZnMgO films for various applications.