Destruction of the resins structure due to heating
This article considers a polymer composition based on acetone-formaldehyde (AFR) resin, which is used to reduce water influx into the well bore during the repair insulation work. Pumping into the well bore a composition, based on AFR resin, results in self-heating that causes destruction of its own structure and, therefore, the damage of the polymer blend structure. The purpose of the present article is to find the causes of AFR resin self-heating when injected into the well bore as part of the composite mixture that leads to the destruction of its structure. Author considers exothermic reaction between AFR resin and aqueous solution of sodium hydroxide during the curing of the polymer composition. The features of the given polymer structure are studied as well. The need for further studies of the resin structure is substantiated. Based on the study conducted, five possible reasons of the AFR resin self-heating, leading to destruction of resin structure, are revealed. Recommended practices that may decrease self-heating of the AFR resin are offered.
Equipment for paraffin removal from oil pipelines in order to ensure energy saving in Arctic conditions
The paper describes a new method for solving one of the global problems – paraffin rempval from pipelines. The problem is relevant for all oil producing and transporting companies of the Russian Federation and other countries. The method for solving these problems has several advantages, including duration of the overhaul period, high removal efficiency and profitability due to the use of fuel cells. The methodallows for maintaning a constant temperatures equal to the melting point of paraffin.
Submicron polymer structures with X-ray lithography and hot embossing
This article describes the process chain for replication of submicron structures with varying aspect ratios (AR) up to 6 in polymethylmethacrylate (PMMA) by hot embossing to show the capability of the entire LIGA process to fabricate structures with these dimensions. Therefore a 4.7 μm thick layer of MicroChem 950k PMMA A11 resist was spin-coated on a 2.3 μm Ti/TiOx membrane. It was patterned with X-ray lithography at the electron storage ring ANKA (2.5 GeV and λc ≈ 0.4 nm) at a dose of 4 kJ/cm3 using a Si3N4 membrane mask with 2 μm thick gold-absorbers. The samples were developed in GG/BDG and resulted in AR of 6–14. Subsequent nickel plating at 52°C resulted in a 200 μm thick nickel tool of 100 mm diameter, which was used to replicate slit-nozzles and columns in PMMA. Closely packed submicron cavities with AR 6 in the nickel shim were filled to 60% during hot embossing.