Actinic defect counting statistics over 1-cm2 area of EUVL mask blank
As a continuation of comparison experiments between EUV inspection and visible inspection of defects on EUVL mask blanks, we report on the result of an experiment where the EUV defect inspection tool is used to perform at-wavelength defect counting over 1 cm2 of EUVL mask blank. Initial EUV inspection found five defects over the scanned area and the subsequent optical scattering inspection was able to detect all of the five defects. Therefore, if there are any defects that are only detectable by EUV inspection, the density is lower than the order of unity per cm2. An upgrade path to substantially increase the overall throughput of the EUV inspection system is also identified in the manuscript.
Actinic EUVL mask blank defect inspection system
Recent experimental results from an actinic EUVL mask blank defect inspection system are presented. Bright-field and dark-field scans from various programmed defect samples are reported. Our results show that the current system can detect defects as small as 0.2 micrometers . Substrate roughness is identified as the limitation to the detection sensitivity. A preliminary defect counting experiment is reported and future improvements for practical defect counting are discussed.
Simulation Analysis of Local Heat Treatment Formability of an Aerospace Aluminum Alloy Frame Parts
Wang Zhijian1,a, Guo Fangyu1,b, Shang Xiaofeng1,c, Song Hongwu2,d, Wang Ling3,e and Wang Jiale1,f 1School of Mechatronics Engineering, Shenyang Aerospace University, Shenyang 110136, China 2Institute of Metal Research, Chinese Academy of Science, Shenyang 110016, China 3Shenyang aircraft industry company, Shenyang 110134, China aWangzhijian1974@sina.com, b1486121506@qq.com, c1009074102@qq.com dhwsong@imr.ac.cn, ew_ling2008@aliyun.com, f1591897439@qq.com