Polarized photocathodes make the grade
Future linear colliders will require high levels of performance from their electron sources. A group at SLAC has recently tested a structure that substantially exceeds current collider polarized electron source pulse-profile requirements.
Surface charge limit in NEA superlattice photocathodes of polarized electron source
The “surface charge limit (SCL)” phenomenon in negative electron affinity (NEA) photocathodes with GaAs–AlGaAs superlattice and InGaAs–AlGaAs strained-layer superlattice structures has been investigated systematically using a 70 keV polarized electron gun and a nanosecond multi-bunch laser. The space-charge-limited beam with multi-bunch structure (1.6 A peak current, 12 ns bunch width and 15 or 25 ns bunch separation) could be produced from the superlattice photocathodes without suffering the SCL phenomenon. From the experimental results, it has been confirmed that the SCL phenomenon is governed by two physical mechanisms at the NEA surface region, the tunneling of conduction electrons against the surface potential barrier (escaping process) and that of valence holes against the surface band bending barrier (recombination process); these effects can be enhanced using the superlattice structure and heavy p-doping at the surface, respectively. We conclude that a superlattice with heavily p-doped surface is the best photocathode for producing the multi-bunch electron beam required for future linear colliders.
Strain dependence of spin polarization of photoelectrons from a thin GaAs layer
Abstract We studied the strain dependence of the spin polarization of photoelectrons from a thin GaAs epilayer which was strained by a lattice mismatched GaP x As 1− x buffer substrate. The polarizations were measured for seven samples with different residual strains between 0.34% and 0.80%. Our result shows the clear dependence of the polarization on the residual strain in this strain region. The maximum polarization attained by each sample increases gradually from 67% up to 87% with an increase of the residual strain which corresponds to that of the band splitting from 22 to 52 meV. A brief discussion about this behavior is given.