Influence of crystalline surface quality on TlBr radiation detector performance
In this study, TlBr detectors were fabricated from crystals purified by the multipass zone refining and grown by the Bridgman method. Detectors were prepared using TlBr 0.3-mm-thick wafers, with surface submitted to different mechanical and chemical treatments. Optical microscopy and scanning electron microscopy evaluated the TlBr wafers surface quality. To analyze the surface quality influence in the detector response, systematic measurements of the pulse height spectra and energy resolution were carried out for each prepared radiation detector. The radiation response for these detectors was performed under /sup 241/Am gamma radiation excitation at room temperature. The influence of the surface quality of the TlBr wafer on its performance as a radiation detector was observed.
Purification and preparation of TlBr crystals for room temperature radiation detector applications
Thallium bromide (TlBr) is a semiconductor compound with a high atomic number and a wide bandgap, being a very promising material to be used as room temperature radiation detectors. In this work, commercial TlBr powder was used for growing crystals for detector applications. To reduce impurities, this material was purified by the zone refining technique. Trace impurities at ppb/ppm level were analyzed using inductively coupled plasma mass spectroscopy (ICP-MS). The efficiency of the purification was evaluated through studies of the decrease impurities concentrations in the TlBr powder and in the purified materials. The crystal quality was verified by X-ray diffraction (XRD). To evaluate the crystal as a semiconductor detector, systematic measurements of the transmittance, resistivity, and the radiation response (/sup 241/Am, /sup 57/Co, /sup 125/I, and /sup 133/Ba) gamma rays were carried out.
Photoreflectance characterization of vanadium-doped GaAs layers grown by metalorganic vapor phase epitaxy
Abstract We characterized the vanadium-doped (GaAs:V) layers grown on GaAs substrate by metalorganic vapor phase epitaxy. The conductivity of the samples is checked by the Hall effect measurements, and it is n type with electrons concentration ranging from 2×10 13 to 2×10 17  cm −3 . We used the photoreflectance technique (PR) to study the effect of vanadium doping on the optical properties of GaAs. Our experimental results show that the built-in electric field F and the broadening parameter Γ 0 increase with V-doping concentration. Furthermore, the temperature dependence of the built-in electric field and the broadening parameter of GaAs:V samples have been investigated by PR. It has been observed that these parameters increase with increasing temperature. The decrease of the built-in electric field with decreasing temperature is due to the photovoltage effect.We characterized the vanadium-doped GaAs (GaAs:V) layers grown on GaAs substrate by metalorganic vapor phase epitaxy.