Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool
A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.
Positioning performance of a maglev fine positioning system
A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) research tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development experience. System enhancements, implemented on a second generation design for an ARPA National Center for Advanced Information Component Manufacturing (NCAICM) project, introduced active structural control for the levitated structure of the system. Magnetic levitation (maglev) is emerging as an important technology for wafer positioning systems in advanced lithography applications. The advantages of maglev stem from the absence of physical contact. The resulting lack of friction enables accurate, fast positioning. Maglev systems are mechanically simple, accomplishing full six degree-of-freedom suspension and control with a minimum of moving parts. Power-efficient designs, which reduce the possibility of thermal distortion of the platen, are achievable. Manufacturing throughput will be improved in future systems with the addition of active structural control of the positioning stages. This paper describes the design, implementation, and functional capability of the maglev fine positioning system. Specifics regarding performance design goals and test results are presented.
Reflection mask technology for x‐ray projection lithography
We report the first demonstration of the fabrication and characterization of soft x‐ray reflecting masks suitable for x‐ray projection lithography. We have patterned efficient (R>50%) normal‐incidence x‐ray mirrors to produce reflecting masks with measured x‐ray contrasts>500:1 over a sufficiently wide spectral range. Calculations indicate that masks on silicon substrates are thermally stable for a production‐type lithographic facility.