Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool
A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.
Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review
As one of the most advanced and precise equipment in the world, a photolithography scanner is able to fabricate nanometer‐scale devices on a chip. To realize such a small dimension, the optical system is the fundamental, but the mechanical system often becomes the bottleneck. In the photolithography, the exposure is a dynamic process. The accuracy and precision of the movement are determined by the mechanical system, which is even more difficult to control compared with the optical system. In the mechanical system, there are four crucial components: the reticle and wafer stages, the linear motor, the metrology system, and the control system. They work together to secure the reticle and substrate locating at the correct position, which determines the overlay and alignment performance in the lithography. In this paper, the principles of these components are reviewed, and the development history of the mechanical system is introduced.
Characterization of ceramic composite membrane filters for hot gas cleaning
Abstract Novel composite ceramic membrane filters suitable for hot gas cleaning operations have been prepared from fly ash and titania particles on stainless steel woven mesh substrates. Both membranes had a structure like a solid packed bed with a thickness of less than 100 μm. In the domain of laminar flow, significant differences in the pressure drop between experimental results and those predicted from the Kozeny-Carman relationship were found, particularly for flow through the titania membrane. Membrane filters with extremely small pores such as the titania membrane are greatly affected by slip up to 80% in permeability at elevated temperatures. Efficiencies of filtration of typical coal fired power station exhaust fly ashes were found to be greater than 909% for both titania and ash membranes, whilst there was greater variation in the pressure drops in the ash membrane than in the titania at typical gas flows.