Optical factors in the photoemission of thin films.
Expressions are derived for the dependence of the photoemission from thin films deposited on transparent substrates on the direction of illumination, as determined by optical factors alone. For normal incidence, the photoemission of very thin-film transparent photocathodes may be expected to be about 1.4 times as great for illumination from the glass side as for illumination from the vacuum side. Furthermore, if the index of refraction of the film is large compared with that of the substrate, the ratio, for natural light, is also almost independent of the angle of incidence for a wide angular range. For thicker films, both the optical constants of the film and the mean depth of origin of the photoelectrons play an important role. However, for strongly absorbing as well as nearly transparent photoemissive films, substantially higher photocurrent should be obtainable from a photoemissive film of optimum thickness illuminated through the substrate than for a thick film with similar optical constants illuminated from the vacuum side. An assumed simple proportionality between optical stimulus, here given by the square of the field intensity within the photosensitive film, and photoexcitation implies that the photoeffect studied is a volume effect and not dependent on the direction of the electric vector within the film.
Enhanced photocathode performance through optimization of film thickness and substrate
It is shown that the efficiency of photoelectron emission may be enhanced, several-fold, through optimization of photocathode film thickness and appropriate substrate configuration. Such an enhancement is based on a careful consideration of wave interference effects in the film and the consequent modulation of the absorption profiles and electron emission probabilities. The inadequacy of the well-known Lambert-Beer law for modeling photon absorption in thin films is also discussed.
The MR-TOF-MS isobar separator for the TITAN facility at TRIUMF
At TRIUMF’s Ion Trap for Atomic and Nuclear Science (TITAN) a multiple-reflection time-of-flight mass spectrometer (MR-TOF-MS) will extend TITAN’s capabilities and facilitate mass measurements and in-trap decay spectroscopy of exotic nuclei that so far have not been possible due to strong isobaric contamination. This MR-TOF-MS will also enable mass measurements of very short-lived nuclides (half-life > 1 ms) that are produced in very low quantities (a few detected ions overall). In order to allow the installation of an MR-TOF-MS in the restricted space on the platform, on which the TITAN facility is located, novel mass spectrometric methods have been developed. Transport, cooling and distribution of the ions inside the device is done using a buffer gas-filled RFQ-based ion beam switchyard. Mass selection is achieved using a dynamic retrapping technique after time-of-flight analysis in an electrostatic isochronous reflector system. Only due to the combination of these novel methods the realization of an MR-TOF-MS based isobar separator at TITAN has become possible. The device has been built, commissioned off-line and is currently under installation at TITAN.