Material removal in the optical polishing of hydrophilic polymer materials
The optical polishing of hydrophilic polymer materials is a complex process that requires a comprehensive setting of various operating parameters. Based on a series of experimental investigations and dimensional analysis, this paper presents a simple empirical equation to evaluate material removal in the polishing of optical spherical surfaces of hydrophilic polymer materials. It is shown that the polishing load applied governs the material removal, the relative sliding velocity and the sliding distance between the workpiece and polishing tool surfaces. The equation also offers a good reference for the setting of the polishing variables. # 2000 Elsevier Science S.A. All rights reserved.
Fine line-width black matrix of a color filter by an advanced polishing method
Based on the high resolution and high aperture ratio needed for a liquid crystal display (LCD), we introduced advanced color filter polishing technology for processing a fine line-width black matrix (BM) for a color filter. A dimensional compensation method for the pattern-size design of photo-masks, according to the characteristics of the colorant resists, was described to rectify the line-width variation caused by the proximity aligner, the most popular exposure machine in color filter manufacturing. In this paper, we introduce color filter polishing and photo-mask compensation technologies into the present color filter process flows and equipment to meet the requirement for fine line-width BM to increase the aperture ratio of LCDs and to achieve a real color filter sample with 5.8 µm line-width BM.
International cosmetic ingredient dictionary and handbook
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