Anomalous Displacement in Osmium-Substituted Beryllium
Experimental evidence has been obtained, by the ion-beam channeling technique, that an osmium atom introduced into beryllium metal occupies positions displaced from a regular substitutional lattice site. The anomalous displacement is found to persist after annealing to a temperature above that at which impurity diffusion occurs. Of the several heavy-metal impurities in beryllium which have been previously studied, osmium is unique in this respect.