Reducing parasitic capacitance of strained Si nano p-MOSFET by control of virtual substrate doping
Biaxially strained Si channel p-MOSFETs on virtual SiGe substrates suffer from a parasitic parallel channel in virtual substrate. This channel participates in current passing through the devices and increases parasitic capacitors which degrades the high frequency response. In this paper a new approach has been introduced to eliminate the channel which in turn reduces parasitic capacitors of the MOSFET. It is illustrated that, increasing virtual substrate doping, can reduce and finally eliminate this unintentional channel. In this work 2D simulation has been used to investigate the impact of the proposed method.