Fabrication of micro-moiré gratings on a strain sensor structure for deformation analysis with micro-moiré technique
In this study, the electron beam lithography technique is applied to fabricate moire grating on the tiny structure of a strain gauge sensor. The grating fabrication technique is discussed in detail. The grating pattern is controlled by a pattern generator, which makes it possible to write a graph in the assigned region of the resist using the electron beam, and as a result a moire grating is left on the surface of the sample. By the aid of the fabricated grating with electron moire technique under the scanning electron microscope (SEM), the residual deformation of strain gauge sensor is measured after a direct voltage is imposed to it. The successful results verify the feasibility of the moire grating fabrication using electron beam lithography, and the grating has a good potential for further application.