Two-phase model of damage to absorbing films by high–power optical pulses
A quantitative two-phase model is developed to analyze the contribution made by the mechanism of displacement of the melt to the damage to thin absorbing films. This contribution is considered as a function of the main characteristics of the process which are the radiation parameters, properties of the film and substrate materials and their adhesion, surface tension and viscosity of the film, and also thermophysical and optical properties, thickness of the film, and size of the exposed area.