Gate-tunable and high responsivity graphene phototransistors on undoped semiconductor substrates
Due to its high charge carrier mobility, broadband light absorption, and ultrafast carrier dynamics, graphene is a promising material for the development of high-performance photodetectors. Graphene-based photodetectors have been demonstrated to date using monolayer graphene operating in conjunction with either metals or semiconductors. Most graphene devices are fabricated on doped Si substrates with SiO2 dielectric used for back gating. Here, we demonstrate photodetection in graphene field effect phototransistors fabricated on undoped semiconductor (SiC) substrates. The photodetection mechanism relies on the high sensitivity of the graphene conductivity to the local change of the electric field that can result from the photo-excited charge carriers produced in the back-gated semiconductor substrate. We also modeled the device and simulated its operation using the finite element method to validate the existence of the field induced photoresponse mechanism and study its properties. Our graphene phototransistor possesses a room-temperature photoresponsivity as high as ~ 7.4 A/W, higher than the required photoresponsivity (1 A/W) in most practical applications. The light power-dependent photocurrent and photoresponsivity can be tuned by the source-drain bias voltage and back-gate voltage. Graphene phototransistors based on this simple and generic architecture can be fabricated by depositing graphene on a variety of undoped substrates, and are attractive for many applications in which photodetection or radiation detection is sought.