( ( ( ( Silicides ( are ( ( formed ( at ( ( the ( ( interface ( by ( solid state ) ) ) ( chemical reaction ) ) ) ( of ( the ( deposited metal ) ) ) ) ) ) ( with ( ( Si atoms ) ( of ( the substrate ) ) ) ) ) ) ) and ) ( they ( can ( be ( ( metallic or ) semiconducting ) ) ) ) ) . )
(ROOT (S (S (NP (NNS Silicides)) (VP (VBP are) (VP (VBN formed) (PP (IN at) (NP (NP (DT the) (ADJP (JJ interface) (PP (IN by) (NP (JJ solid) (NN state)))) (NN chemical) (NN reaction)) (PP (IN of) (NP (DT the) (JJ deposited) (NN metal))))) (PP (IN with) (NP (NP (NNP Si) (NNS atoms)) (PP (IN of) (NP (DT the) (NN substrate)))))))) (CC and) (S (NP (PRP they)) (VP (MD can) (VP (VB be) (ADJP (JJ metallic) (CC or) (JJ semiconducting))))) (. .)))
Silicides are formed at the interface by solid state chemical reaction of the deposited metal with Si atoms of the substrate and they can be metallic or semiconducting.
(ROOT (S (NP (JJ Metallic) (NNS solids)) (VP (VBP are) (VP (VBN composed) (ADVP (RB entirely)) (PP (IN of) (NP (JJ metallic) (NNS atoms))))) (. .)))