the composition of the amorphous alloy to be used to form the heat - generating resistor of the present invention is represented by : wherein x is selected such that the alloy may be amorphous , at the value x , for example , in the range of 10 to 70 atomic %, preferably 20 to 70 . on the other hand , y should be desirably made 5 to 30 atomic % and z 10 to 30 atomic %. m represents at least one selected from the group consisting of ti , zr , hf , nb , ta and w . that is , these elements may be used either singly or in a plural number thereof , as desired . the amorphous alloy film represented by the above compositional formula has high specific resistance , 150 - 300 μohm . cm , and excellent properties as the constituent material of the heat - generating resistor directly in contact with liquid such as heat resistance , corrosion resistance , mechanical strength , etc . for formation of the layer of the heat - generating resistor ( one shown by 208 in fig1 ) by use of the amorphous alloy film , conventional thin film deposition techniques , etc . may be applicable , but the sputtering method is suitable from the standpoint of obtaining readily a highly dense and strong amorphous alloy film . also , by heating the support during formation of the film to 100 ° to 200 ° c ., strong adhesive force can be obtained . the constitutions of the liquid jet recording head of the present invention are not limited to the constitution as shown in fig1 and fig2 but they may have any desired constitutions . for example , various protective layers as described above may be also used as provided on the heat - generating portion . also , in the liquid jet head of the present invention , the direction of ink supply to the heat generating portion of the liquid path may be substantially same as or different from ( e . g . forming substantially a right angle with ) the direction of ink discharge . further , in the liquid jet head of the present invention , the layer of heat generating resistor and the layer of electrode may be provided in a reverse ( upset ) arrangement . in addition , the liquid jet head may be of a so - called full line type which has discharge openings over the whole range of the recording width of receiving material . the present invention is described in more detail below by referring to examples and comparative examples . by use of an si wafer having an sio 2 film of 5 μm as the heat accumulating layer , lower layer 207 , provided on its surface by the heat oxidation treatment as support 206 , ta 50 ( fe 73 ni 10 cr 17 ) 50 was formed as the heat - generating resistor layer on the lower layer 207 at a support temperature of 100 ° c . according to the sputtering method to a film thickness of 2400 å , followed further by film formation of al layer with a thickness of 5000 å by sputtering . next , the al layer and the heat - generating resistor layer were subjected to patterning according to the photolithographic steps to a desired shape as shown in fig2 to form an electrothermal transducer having a heat - generating resistor 208 and a pair of electrodes 209 , 210 . further , on the electro - thermal transducer were spin coated photosensitive polyimide ( photoniece , produced by toray ) as the protective layers 213 , 214 , which were then subjected to patterning to a predetermined shape . on the plate - shaped substrate 202 provided with an electrothermal transducer as described above , a covering member of glass plate 203 having a groove to form the liquid path 204 was laminated through an epoxy type adhesive to obtain a liquid jet recording head having the constitution primarily as shown in fig1 and fig2 . a recording head was prepared in the same manner as in example 1 except for forming by sputtering ti 25 ( fe 73 ni 10 cr 17 ) 75 with a thickness of 2300 å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering zr 28 ( fe 73 ni 10 cr 17 ) 72 with a thickness of 2000å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering hf 28 ( fe 73 ni 10 cr 17 ) 72 with a thickness of 2100 å as the heat generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering nb 56 ( fe 68 ni 11 cr 21 ) 44 with a thickness of 2400 å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering w 31 ( fe 68 ni 11 cr 21 ) 69 with a thickness of 2100 å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering ta 32 ti 18 ( fe 73 ni 10 cr 17 ) 50 with a thickness of 1900 å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering nb 28 zr 20 ( fe 73 ni 10 cr 17 ) 52 with a thickness of 2200 å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering hf 35 w 22 ( fe 73 ni 10 cr 17 ) 43 with a thickness of 1800 å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering ta 40 ti 13 nb 11 ( fe 73 ni 10 cr 17 ) 36 with a thickness of 2000 å as the heat - generating resistor layer . a substrate for a liquid jet head and a liquid jet head formed by use of the substrate of the present invention was prepared in the same manner as in example 1 except for adding a step to form a protective layer of sio 2 on an electro - thermal transducer before providing the protective layers 213 , 214 . also in this example , the substrate for the liquid jet head and the liquid jet head formed by use of the substrate having various excellent properties such as durability etc . could be prepared . a substrate for liquid jet head and a liquid jet head formed by use of the substrate of the present invention was prepared in the same manner as in example 2 except for adding a step to form a protective layer of sin on an electro - thermal transducer before providing the protective layer 213 , 214 . also in this example , the substrate for the liquid jet head and the liquid jet head formed by use of the substrate having various excellent properties such as durability etc . could be prepared . a recording head was prepared in the same manner as in example 1 except for forming by sputtering hfb 2 with a thickness of 2500 å as the heat - generating resistor layer . a recording head was prepared in the same manner as in example 1 except for forming by sputtering ti 9 ( fe 73 ni 10 cr 17 ) 91 with a thickness of 2400 å as the heat - generating resistor layer . the film having this composition was analyzed by x - ray diffractometry to be a polycrystalline film . by use of the recording heads obtained in example 1 to 6 and comparative examples 1 , 2 respectively , recording was performed by use of ink for liquid jet recording under the following conditions for testing of its durability . recording conditions : with the driving pulse being made 2 khz , 5 μsec ., the applied energy was made 1 . 3 - fold of the liquid jet threshold value energy . fig3 shows the weibull plot of failure rate prepared from the results obtained . the time point when the resistance value of the heat - generating resistor exceeded 120 % of the initial value was deemed as failure . as is also apparent from fig3 the recording heads of the present invention of examples 1 to 6 were all found to have longer life relative to the recording head prepared in comparative examples 1 , 2 . furthermore , in the present invention , the liquid path of the liquid jet head may be formed by forming first a wall forming member of the liquid path by use of , for example , a photosensitive resin and then bonding a top plate to the wall forming member . fig4 is a schematic perspective view showing the appearance of a liquid jet apparatus equipped with the liquid jet head of the present invention . in fig4 is the apparatus body , 1100 a power switch , 1200 an operation panel . as described in detail above , the recording head formed by use of the substrate for liquid jet heads of the present invention , by use of an amorphous alloy film having the specific composition as the heat - generating resistor as described above , has sufficient durability , even when it is made a constitution having no protective film on the heat - generating resistor . thus , a recording head capable of effecting thermal conduction to liquid with good efficiency , which can be used with smaller power consumption and is excellent in durability can be provided by the present invention .