fig1 shows a treatment chamber 10 of the invention positioned on a bed 12 through coupling portions 14 , 16 . the coupling portion 16 is in operative connection with a suitable motor or actuator disposed in a housing 18 . the motor or actuator is coupled to the treatment chamber 10 so that , in operation , the treatment chamber 10 may be rotated at a desired rotational speed . the treatment chamber 10 is a three - part modular arrangement comprising a central drum 20 and first and second frusto - conical sections 22 , 24 . the first frusto - conical section 22 is in contact with the receiving portion 16 , and second frusto - conical section 24 is in contact with the receiving portion 14 so as to allow the treatment chamber 10 to be rotated . the drum 20 and first and second frusto - conical sections 22 , 24 can be formed from any suitable material , such as stainless steel . fig2 and 3 show the internal arrangement of the drum 20 in more detail . in particular , the drum 20 comprises a cylindrical portion 26 and first and second circular end plates 28 , 30 . the first end plate 28 is in communication with the first frusto - conical section 22 and the second end plate 30 is in communication with the second frusto - conical section 24 . a plurality of electrodes 32 project out of the first end plate 28 into the interior of the drum 20 . the electrodes 28 are radially disposed around the longitudinal axis of the drum 20 in a circular pattern . as shown in fig3 , the electrodes are equally spaced , although it is not critical that this is so . the electrodes 28 are arranged towards the circumferential edge of the first end plate 28 . as explained in more detail below , this arrangement is preferred in order to provide agitation of particles which are disposed in the treatment chamber in order to undergo plasma treatment . in the embodiment shown in the figures , an arrangement of twelve electrodes project into the treatment chamber . however , a greater or a lesser number of electrodes might be used . in general , it is envisaged that between three and twenty electrodes will be suitable for most applications . however , a smaller number of electrodes or a larger number of electrodes might be used . the skilled reader will be able to readily determine the number of electrodes and the shape of the electrodes which are suitable for any given application . in the embodiment shown in the figures , the electrodes 32 are formed from an electrically conductive material such as stainless steel . isolator sleeves 34 formed from an electrically insulating material such as ceramic are disposed at both ends of each electrode 32 . the sleeves may be coatings on the electrodes . the electrodes should generally be arranged to project a significant way into the chamber . it is possible in other embodiments for them to extend between the end plates . the active plasma producing areas of the electrodes may be coated with a conductive ceramic coating such as boron silicate glass . this can act to reduce unwanted sputtering . the supply and removal of gases to and from the treatment chamber 10 will now be described with particular reference to fig4 a , 4b and 5 which show a gas inlet module 38 ( also shown in fig3 ) which is in gas conducting connection with a plurality of gas inlet lines 40 . each gas inlet line 40 is connected to an electrode 32 . each electrode 32 is hollow , having an internal gas conducting conduit ( not shown ) leading to a gas outlet aperture at the distal end of each electrode 32 ( not shown ). the gas inlet module 38 is housed in the first frusto - conical section 22 , and is supplied with the gases to be used during plasma processing from one or more external gas supply sources ( not shown ). the supply of gas can be controlled using known means such as mass flow controllers . the first end plate 28 has an exhaust port 42 formed therein . as shown in fig4 b and 5 , a filter 44 is disposed in the exhaust port 42 . the exhaust port 42 is in connection with a pumping arrangement ( not shown ) which is used to create a vacuum in the treatment chamber and to pump away process gases in a manner which is well - known to the skilled reader . rotatable drum chambers are available commercially and may be adapted in order to produce apparatus of the invention . for example , a rotating drum plasma reactor is produced commercially by diener electronic gmbh & amp ; co . kg , d - 72224 ebhausen , germany having the product name “ tetra 500 ”®. this apparatus may be adapted in accordance with the invention , for example by providing the plurality of electrodes described above . in use , a charge of the particles to be processed is disposed on the floor of the drum 20 . the chamber is evacuated to a desired baseline pressure , and the process gas or gases are introduced into the treatment chamber 20 through the electrodes 32 . the treatment chamber 10 is rotated at a desired rotational speed . a plasma is generated at each electrode 32 in order to initiate processing of the particles . during the processing of the particles , the electrodes 32 are rotating , and this acts to continuously agitate the charge of particles in the treatment chamber . the particles may be physically transported through this agitation , for example through sideways displacement of the particles , or by way of the particles being thrown upwards the interior of the chamber . the scoops 36 can significantly assist in the process . in the embodiment shown in fig1 to 5 , glow discharge plasmas are formed at each electrode 32 . rf power is applied to electrode 32 . a convenient rf frequency such as 13 . 56 mhz may be used . the electrodes 32 thereby act as working electrodes in a glow discharge system . a counter - electrode is provided , and conveniently this can be the inner surface of the drum 20 which might be coated with a conductive ceramic such as boron silicate glass . the rf power establishes a negative dc bias voltage on the electrodes 32 which thereby act as cathodes in the flow discharge system . it is also possible to use other methods to obtain glow discharge plasmas , such as through the application of a dc voltage through electrodes 32 . other forms of plasma might be utilised instead . localised plasmas are generated around each electrode 32 , but the process conditions are selected so that these plasmas are discrete and separated from one another . in this way , each electrode is surrounded with a plasma halo which contains clouds of energetic electrons , uv photons , ions and , typically , reactive neutral species . this rich plasma can be used to perform one or a number of useful particle treatment steps . the use of multiple electrodes increases the number of electron clouds and other useful species associated with the plasmas , and this has beneficial effect on processing efficiency . additionally , the use of the electrodes to agitate the particles to be treated can also have a beneficial effect on processing efficiency as well as improving the results achieved . the apparatus may be used to exfoliate particles of graphite to produce a graphene containing material . gnp may be produced in this way . this is achieved through exfoliation , and typically a high plasma power is utilised , at least in the initial stages of the process , to facilitate ion bombardment and ion intercalation of the target material . effective bombardment and intercalation causes layers of the target material such as graphite to exfoliate . without wishing to be limited by a particular theory or conjecture , it is believed that a result of this is that a nett negative charge is imparted onto the exfoliated layers so that they can push off from each other . this charge overcomes attractive van der waals &# 39 ; forces , thereby retarding the usual inclination of the particles produced by the exfoliation to reagglomerate . a plasma formed in oxygen is effective in producing exfoliation to provide graphene containing material such as gnp . the process can be used more generally to exfoliate and / or deagglomerate fibres and sheet material . an oxygen plasma is also an advantageous means of cleaning particles . nanoparticles such as cnts and gnps are conveniently cleaned by an oxygen plasma . representative but non - limiting process conditions are a temperature of less than 100 ° c . with a plasma power of 120 w for around thirty minutes at a pressure of 1 . 5 torr ( 200 pa ). the present inventors have recognised that the particles to be treated may contain defects , and also that processes such as cleaning can introduce further defects . very advantageously , it has been realised that effective repair of defects can be achieved through plasma processing using apparatus of the invention . effective repair can be achieved using a pecvd process involving a plasma in pure methane . representative conditions are a plasma power of 100 w and a chamber gas pressure of 0 . 2 torr ( 27 pa ). gnps of excellent crystallinity have been obtained following repair treatment in a methane plasma . the plasma process can be terminated with nitrogen prior to vacuum packing to preserve the cleanliness of the processed particles . experiments were performed on gnp . mined graphite from sri lanka was size reduced in a mechanical mill and introduced to a treatment chamber of the type shown in fig1 . an oxygen plasma was used to exfoliate layers from the graphite to produce gnp . the oxygen plasma also acted as a cleaning plasma and as a functionalising plasma . following the oxygen plasma treatment , the gnp was subjected to a methane treatment to repair defects in the gnp . fig6 a shows an electron microscope image of the gnp after cleaning and repair . fig6 b is an edx spectrum . table 1 shows the associated elemental analysis . the results indicate that graphene nanoplatelets of extremely high purity and crystallinity have been produced using the invention . the functionalisation with oxygen mainly produces — cooh functionalities , which are extremely dense on the gnp . although the gnp has been produced from mined graphite , there are no signs of mined contaminants such as metals , sand or chalk . this indicates that the cleaning part of the treatment cycle has worked extremely well . a further possibility when treating particles in accordance with the invention is to remove treated particles from the multi - electrode treatment chamber to a final stage treatment chamber using vacuum transfer or other appropriate means . the final treatment chamber may be used to facilitate high temperature processing which will provide additional treatment options , for example for decorating the particles with a desired material . the final stage treatment may be a microwave induced plasma treatment . in these embodiments , the final treatment chamber may have glass windows and an inner surface coated with a ceramic or glass . appropriate wave guides would be used to couple microwave energy into the chamber through the windows . the final treatment chamber can be configured to rotate in order to agitate the particles . in another alternative , a final treatment step such as this can be performed in the original treatment chamber . in these embodiments , the original treatment chamber is provided with microwave means to generate the microwave induced plasma . the multi - electrode array can be used for this purpose if the electrodes are made from suitable materials such as a conductive glass , for example boron silicates . a potential problem during processing is electrical shorting of the electrodes . this can be at least ameliorated by reducing the plasma power as the processing continues . the likelihood of shorting occurring increases if the material volume increases during processing which is likely to occur if deagglomeration and / or disaggregation occurs . one approach which may be adopted is to reduce the plasma power as the volume of the treated particles increases . for example , an inverse relationship between the volume of the treated particles and the applied plasma power , or another relationship determined by routine investigation may be followed .