the present invention comprises a process of constructing a cuvette window for a microsampling device for the measurement of biological materials from biological fluids . the microsampling device is preferably fabricated from a silicon wafer and is generally described in u . s . pat . no . 5 , 801 , 057 , by smart et al , the subject matter of which is hereby incorporated by reference in its entirety into this disclosure . the present invention has a transparent window on the silicon wafer to facilitate optical readouts of the specimen within the cuvette . optical quality silicon nitride film is deposited on the silicon wafer and silicon removed such that a portion of the film is exposed on both sides . the microsampling device or microsampler has a very fine , short needle through which blood or other body fluids can be drawn into a small sampling chamber or microcuvette . preferably , the microcuvette has a volume of less than one microliter . the microcuvette has at least one optical window and a vent to allow air to escape as the microcuvette fills when blood or other fluids are drawn in through the needle . the needle preferably has an outer diameter of 100 to 200 micrometers . the microsampler is constructed using well - established silicon microfabrication technology which has been in wide use for decades for the manufacture of electronic integrated circuits and more recently has been extended to micromechanical devices . the microsampler is made by a series of very precise photolithographic , etching and very precise microdeposition steps performed on a silicon wafer . a large number of the present microsampling device can be made at the same time on a single wafer , followed by dicing to separate the individual devices , each of which is commonly referred to as a die or chip in the microelectronics industry . the cuvette window comprises a silicon nitride film formed on the microsampler chamber of the microsampler device with the window being exposed on two surfaces . the method of construction comprises providing a silicon wafer having a top surface and a bottom surface , etching a patterned depression in the top surface of the silicon wafer thereby defining the microsampler chamber , depositing a silicon nitride film on the top surface of the silicon wafer , and etching a patterned depression in the bottom surface of the silicon wafer such that at least a portion of the silicon nitride film deposited in the microsampler chamber becomes exposed on both surfaces . the stages or steps of the cuvette window fabrication process are illustrated in fig1 a - 1 d , and are described in further detail below . the microsampling device may have one or two cuvette windows , depending on the detection method used . a two window device suitable is for analyze detection using transmittance photometry can be fabricated from two wafers where the cuvettes and windows are bonded together in registration . alternately , the second window can be provided separately in the device holder . a microsampling device with only one cuvette window is used where the methods of choice for the detection of the analyte may be fluorescence , luminescence , or reflectance photometry . in this case , a blank silicon wafer is bonded to the wafer containing the cuvettes and windows , and the individual devices then separated . in the present example , a silicon wafer about 500 micrometers thick having one surface polished forms silicon substrate 10 a of the microsampling device as illustrated in fig1 a . silicon wafers of this type are commercially available and are commonly used in the integrated circuit industry in thickness of 500 to 1000 micrometers . silicon substrate 10 a is first patterned and plasma etched on the top polished surface to form the vent , cuvette , and needle bore pattern required for operation of the microsampling device . fig1 b illustrates the microsampler chamber or cuvette in silicon substrate 10 b subsequent to the plasma etching . as illustrated in fig1 c , low stress silicon nitride film 12 c is then deposited onto the top surface of silicon substrate 10 c . the silicon nitride film has a thickness of approximately 0 . 01 to 5 micrometers . as illustrated in fig1 d , the bottom of the silicon wafer is then etched with a potassium hydroxide wet etchant to remove silicon and expose the bottom of the silicon nitride window . it will be apparent to those skilled in the art that the objects of this invention have been achieved as described hereinbefore by providing a silicon nitride cuvette window for a microsampling device . the silicon nitride window provides at least three advantages . first , the cuvette window can be fabricated by standard semiconductor processing methods . second , the cuvette window is substantially transparent in the desired wavelengths . finally , the cuvette window withstands normal handling in course of using the microsampling device . the foregoing description of the preferred embodiments of the subject invention have been presented for purposes of illustration and description and for a better understanding of the invention . it is not intended to be exhaustive nor to limit the invention to the precise form disclosed . modifications and variations are possible without departing from the concept of the invention . for example , additional coatings , such as antireflection coatings , can be added on top of the silicon nitride window to improve optical properties . therefore , the scope of the invention is to be determined by the terminology of the following claims and the legal equivalents thereof .