referring initially to fig1 and 2 , a method of fabricating at least one lens according to an embodiment is now described . the method 100 includes step 102 of depositing a layered structure on a base material and coating the layered structure with a deformable surface coating . the layered structure includes layers of different refractive index . fig2 ( a ) shows an example of such a base material 202 , a layered structure 204 and deformable surface coating 206 . the deformable surface coating 206 may include a polymeric material that is curable using uv radiation . the deformable surface coating 206 typically is single layered , but may alternatively also include a plurality of layers . for clarity fig2 illustrates processing steps of the fabrication of one lens only . in this embodiment the layered structure 204 includes three layers but it is to be appreciated that in variations of this embodiment the layered structure 204 may have any suitable number of layers . further , the layers of the layered structure 204 may , in variations of this embodiment , not necessarily have differing refractive indices . step 104 imprints a structure into the deformable surface coating . the structure has steps and has a shape that is associated with a shape of the at least one lens . in this embodiment the shape is associated with that of an array of lenses . each lens of the lens array is in this example a fresnel lens having stacks of aligned concentric ring - shaped layers . step 106 selects a thickness of the layers of the layered structure and / or a height of the steps of the imprinted structure . the selection is made so that , if the imprinted structure and a portion of the layered structure is etched away and steps are etched in the layered structure , the etched steps have a height that corresponds to the layer thickness of the layered structure . fig2 ( b ) shows a stamp 208 which imprints a structure 210 into the deformable surface coating 206 . the structure 210 is in this simplified illustration associated with the structure of only one lens of the array . the structure 210 that is imprinted into the deformable surface coating 206 has steps 212 . after the imprinting the stamp 208 is removed leaving the structure 210 exposed . the structure 210 is then cured using uv radiation . step 108 uses an anisotropic etch process to etch the imprinted structure and a region of the layered structure which removes the imprinted structure and a portion of the layered structure 204 . for example , the anisotropic etching may be conducted using a directional physical etching processes such as ion beam etching ( also referred to as ion milling ) or anisotropic reactive ion etching ( rie ). it is to be appreciated , however , that alternatively any other suitable etching process may be used which may not necessarily be anisotropic . for example , a chemical etching process may be used . many chemical etching processes are known and the person skilled in the art will appreciate that the suitability of a particular chemical etching process depends on the material of the layer layered structure and dimensions and shape of the lenses that are etched into the layered structure . in a variation of this embodiment the shape of the structure may be selected so that only a portion of the lens is formed in the layered structure . in this case the etching typically does not remove the entire imprinted structure but a portion of the imprinted structure remains and forms a part of the lens array . fig2 ( d ) shows a cross - sectional view of one fresnel lens which is exemplary for the lenses of the lens array . the shown fresnel lens 216 includes stacks 218 of concentric - rings . in this embodiment each stack 218 includes three concentric rings 220 , 222 and 224 which are formed from respective layers of the layered structure 204 . in this example the materials of the layered structure 204 are selected so that the layer 220 has a refractive index that is lower than that of the layer 222 . further , the materials of the layered structure 204 are selected so that the layer 222 has a refractive index that is lower than that of the layer 224 . the method 100 has the advantage that a lens having aligned layers , such as stacks 220 , 222 and 224 , or an array of such lenses can be fabricated in a simplified manner . the combination of imprinting the structure 210 into the deformable material 206 and the subsequent etching make it possible to fabricate a lens having such aligned layers without separate processing steps in which the layers are aligned relatively to each other . the method 100 further includes the step 110 of fabricating a display which includes fabricating the array of fresnel lenses as described above . it is to be appreciated by the person skilled in the art that the fabricated lens array may be incorporated into many types of displays . once the array has been fabricated , known fabrication steps may follow to fabricate the display . further , it is to be appreciated that the display may include an array of the lens 216 which are fabricated in accordance with an embodiment of the method 100 . the base material 202 may be formed from a hard material but typically is formed from a flexible material such as a polymeric material that is optically transmissive . the concentric rings 220 , 222 and 224 are also composed of optically transmissive polymeric materials and have respective refractive indices as described above . the method 100 is described in the context of fabrication of a lens array . it is to be appreciated by the person skilled in the art , however , that a variation of the method 100 may be not necessarily fabricate a lens array , but may fabricate a plurality of lenses which may form any suitable arrangement . further , the arrangement may include any number of lenses and in one specific variation of the method 100 only one lens may be fabricated . referring now to fig3 and 4 , a method of fabricating at least one lens according to a further embodiment is now described . method 400 includes step 402 of depositing an electrically insulating layer on a conducting base material and an electrically conductive layer on the electrically insulating layer . in this embodiment the electrically insulating layer is composed of silica or another suitable insulating material and the electrically conductive layers are metallic . step 404 coats the exposed electrically conductive layer with a deformable surface coating . again , the deformable surface coating may include a polymeric material that is curable using uv radiation . step 406 imprints a structure into the deformable surface coating . the imprinted structure is then cured using uv radiation . in this embodiment the structure has a shape that is associated with that of an array of electron lenses and electron emitters . each lens of the array is in this example an electrostatic electron lens having respective electrodes . it is to be appreciated that in variations of this embodiment the structure may only be associated with the shape of the electron lenses and not with the shape of the electron emitters . for example , a variation of the method 400 may only fabricate the electron lenses and the electron emitters may be fabricated separately . fig3 ( a ) shows the conductive base material 302 coated with electrically insulating layer 303 , electrically conductive layer 304 and a surface coating of deformable material 306 . fig3 ( b ) shows a stamp 308 during the process of imprinting the structure 310 and 311 into the deformable material 306 . the stamp 308 is removed after imprinting the structure 310 . fig3 ( c ) shows the base material 302 with the layers 303 and 304 after the stamp 308 has been removed and the structure 310 and 311 is exposed . step 408 etches the imprinted structure and a region of the layers and the base material to form the array of electrodes in the electrically conductive layer and corresponding electron emitters in the base material . in this embodiment the etching is anisotropic and is performed in the same manner as described above in the context of method 100 . fig3 ( d ) show a cross - sectional representation of the formed electron lens array 314 . the lens array 314 includes conductive base material 318 in which electron emitters 320 were formed , insulating layers 322 and conductive layers 324 which form electrodes of each electron lens . in this embodiment the insulating layers 322 and the conductive layers 324 form concentric rings positioned around respective electron emitters 320 . the array of electron lenses 314 may include a few electron lenses , but typically includes a relatively large number of electron lenses such as more than 1000 electron lenses . the method 400 is described in the context of fabrication of a lens array . it is to be appreciated by the person skilled in the art , however , that a variation of the method 400 may be not necessarily fabricate a lens array , but may fabricate a plurality of lenses which may form any suitable arrangement . further , the arrangement may include any number of lenses , with or without electron emitters , and in one specific variation of the method 400 only one lens may be fabricated . although the embodiments have been described with reference to particular examples , it is to be appreciated by those skilled in the art that the embodiments may take other forms . for example , the fresnel lens array may be formed from a material other than a polymeric material . further , the fresnel lens array may include any number of concentric rings each being formed from a stack of aligned layers . each concentric ring may also be formed from only one layer . in addition , it is to be appreciated that only one specific design of the electron lens array has been described and various other designs may be fabricated in variations of the method 400 .