the present invention is applied to the microstructure of an object , e . g ., a semiconductor wafer having a fine structure of convex and concave portions on its surface , and a substrate made of a metal , plastic or ceramic which forms or remains continuous or non - continuous layer of materials different therefrom . first , said remover used in this invention is described . it includes carbon dioxide , an additive for removing the residues , an inhibitor for suppressing residues and a co - solvent for dissolving said additive and said inhibitor in said carbon dioxide at a pressurized fluid condition . the pressurized carbon dioxide has a high dispersion rate and enables the dissolved residues to disperse therein . if carbon dioxide is converted to a supercritical condition , it penetrates into fine pattern portions of the object more effectively . by this feature , the additive is conveyed into pores or concave portions on a surface of the object due to the low viscosity of carbon dioxide . the carbon dioxide is pressurized to 5 mpa or more , but not less than 7 . 1 mpa at a temperature of 31 ° c . to convert the carbon dioxide to a supercritical fluid condition . although any additives that can remove residues from microstructures could be used , it is preferred in the present invention to use quaternaryammoniumfluorides because of their effective cleaning ability . the preferred fluoride compounds includes at least one element selected from the group consisting of tetramethylammoniumfluoride , tetraethylammoniumfluoride , tetrapropylammoniumfluoride , tetrabutylammoniumfluoride , cholinefluoride . among these compounds , tetramethylammoniumfluoride ( tmaf ) is the most preferable one . if the concentration of the additive is too low , cleaning of residues is not sufficient the lower limit of the additive is 0 . 001 wt %, preferably 0 . 005 wt %, and more preferably 0 . 01 wt %. however , when the concentration is more than 0 . 1 wt %, low - k materials are damaged because of excessive etching of low - k materials . thus , the upper range of the additive is 0 . 1 wt %, preferably 0 . 05 wt %, and more preferably 0 . 03 wt %. the remover in the present invention also includespolyhydric alcohol . polyhydric alcohol act as an inhibitor that protects the low - k materials from the significant damage from the additives such as fluorides . during inventors &# 39 ; studies , after some cleaning tests of microstructures containing of low - k films , there were some liquid - like residues . these ‘ liquid like residues ’ were recognized as byproducts originated from etching reactions between some of the compounds in the remover and a part of low - k materials . such byproducts could not be removed and appeared as liquid - like residues because such products from low - k materials were not easily dissolved into supercritical carbon dioxide . by further investigations , it was found that the amount of such liquid - like residues could be reduced when polyhydric alcohols were used as a component of said remover . therefore , the present invention , the remover includes polyhydric alcohols as an inhibitor to protect low - k materials from the damage . although the mechanism of the protection of low - k by polyhydric alcohol is still under investigations , polyhydric alcohol might adsorb on the surface of the low - k materials and protect the surface from the attack of the chemicals . polyhydric alcohols may be dihydric alcohol such as ethyleneglycol , propyleneglycol , trimethyleneglycol , diethyleneglycol , dipropyleneglycol , 1 , 2 - , 1 , 3 -, 1 , 4 - or 2 , 3 - butanediol , pentamehyleneglycol , hexyleneglycol , octyleneglycol or trihydric alcohols such as glycerin , trimethylolpropanae , 1 , 2 , 6 - hexanetriol , and tetrahydric alcohols such as pentaelythritol . also , polyethyleneglycol or polypropyleneglycol may be used . among , these compounds , dihydric alcohols are preferable and ethyleneglycol and propyleneglycol are more preferable . if the concentration of the polyhydric alcohols is too low , the protection of the low - k is not sufficient and amount of liquid - like residues increases . the lower range of the polyhydric alcohols is 0 . 005 wt %, preferably 0 . 007 wt %, and more preferably 0 . 01 wt %. however , when the concentration is higher than 0 . 1 wt %, the efficiency of the protection is saturated . thus , the upper range of the polyhydric alocholos is 0 . 1 wt %, preferably 0 . 07 wt %, and more preferably 0 . 05 wt %. as the pressurzed carbon dioxide is not enough by itself to dissolve additives and inhibitors such as tmaf and polyhydric alcohols , the present invention uses co - solvent to dissolve them into carbon dioxide . the co - solvent of the present invention is a compound having an affinity to both carbon dioxide and the additive . such a co - solvent dissolves or disperses the additive homogeneously in the pressurized carbon dioxidein fluid condition . although any co - solvent is used if it can make additives and polyhydric alcohols soluble into pressurized carbon dioxide , alcohols are preferable . the alcohol may be any alcohol , e . g . ethanol , methanol , n - propanol , iso - propanol , n - butanol , iso - butanol , diethyleneglycolmonomethyleter , diethyleneglycolmonoethyleter , and hexafluoro isopropanol . among these alcohols , methanol ethanol and iso - propanol are preferable because they act as a good co - solvent to wide range of compounds . the kind and amount of the co - solvent are selected depending on the kind and amount of the additive to carbon dioxide . the amount of the co - solvent is preferably five times or more than that of the additive because the remover easily becomes homogeneous and transparent . alternatively , the remover may include the co - solvent in a range of 1 wt . % to 50 wt . %. if more than 50 wt . % of the co - solvent is added , the penetration rate of the remover decreases due to less amount of carbon dioxide . it is prefrable to use a remover including carbon dioxide , alcohol as the co - solvent , quaternaryammoniumfluoride and / or quaternaryammoniumhydroxide as the additive because these additives are well dissolved in carbon dioxide by alcohol and are cq philic . when tmaf is used as an additive , tmaf should be initially dissolved into said co - solvent because tmaf is a sold at ambient temperature . at this time , solvents such as dimethylacetamide ( dmac ) or de - ionized water ( diw ) could be added to help tmaf to be dissolved into carbon dioxide more easily . the amount of such solvents is preferably less than 20 times of tmaf . especially , a concentration of diw should be minimized because of the damages to the low - k materials . the practical procedure will be described using drawings . in the below description , components of remover other than carbon dioxide , a mixture of additives , inhibitors , co - solvents is simply called ‘ cleaning reagents ’. fig1 shows a simplified schematic drawing of an apparatus use for removing residues according to the present invention . in the figure , 1 is a carbon dioxide cylinder , 2 is a high pressure pump for carbon dioxide , 3 is a storage tank of cleaning reagents , 4 is a pump for cleaning reagents , 5 is a valve , 6 is a storage tank for rinse reagents , 7 is a pump for rinse reagents , 8 is a valve , 9 is a high pressure vessel , and 10 is a thermostat . firstly , the microstructures , for example , semiconductor wafer having residues on its surface is introduced to and placed in a high pressure vessel 9 , then carbon dioxide is supplied from a carbon dioxide cylinder 1 to the high pressure vessel 9 by a high pressure pump 2 . the high pressure vessel 9 is thermostated at a specific temperature by a thermostat 10 in order to maintain the pressurized carbon dioxide in the high pressure vessel 9 at the supercritical condition . high pressure vessel 9 can be replaced by that having heating unit . cleaning reagents are supplied to the high pressure vessel 9 from tanks 3 by high pressure pumps 4 . cleaning step starts at the time when the cleaning reagents are fed from tank 3 to the high pressure vessel 9 . the feed of the carbon dioxide and cleaning reagents may be continuous or batch - like . the removing process is performed at a temperature in the range from 31 ° c . to 120 ° c ., and at a pressure ranged from 5 m pa to 30 m pa , preferably , from 7 . 1 m pa to 20 m pa . the time required for removing the residues depends on the size of the object , the kind and amount of the residues , which is usually in the range from a minute to several ten minutes . after a cleaning step , a rinse step follows . residues removed from surface during the cleaning step remains in the vessel 9 after the cleaning step finishes . if pure carbon dioxide is fed into such conditions , some portion of residues will deposit on the surface of the objects . therefore , after the cleaning step , the first rinse step with the mixture of carbon dioxide and rinse agents is applied . after this first rinse step , the second rinse step with pure carbon dioxide is applied . preferable rinse agents used in the first rinse step are those that can remove liquid - like residues . after inventors &# 39 ; investigations , compounds having specific dielectric constant similar to water are effective for this purpose . since the specific dielectric constant of water is 78 at 25 ° c . under atmospheric pressure , compounds having specific dielectric constant not smaller than 78 are used . the reason why the required specific dielectric constants are similar to that of water is that the liquid - like residues as byproducts of low - k etching have high polarity , resulting in the high affinity to the polar solvents . on the other hand , polyhydric alcohols are required in the present invention as described in the previous section . however , if the amount of the cleaning reagents is small enough to suppress the by - production due to damages of low - k materials , rinse agent having specific dielectric constant not smaller than 78 may be used with a relative longer treatment time without any addition of polyhydric alcohols in the cleaning step . however , in order to minimize the process time of the first rinse step ( for example , 5 min . or less ), it is preferable to minimize the by - production of liquid - like residues with addition of polyhydric alcohols . practically , the first rinse step can be done by stopping the feed of the cleaning reagents by the valve 5 , followed by feed of carbon dioxide and rinse reagents to the high pressure vessel 9 to get rid of the contents of vessel 9 . a flow meter 12 may be used to control the flow rate . during the first rinse step , it is preferable to decrease the feed rate of rinse reagents gradually or in a stepwise manner with valve 8 to replace the contents by pure carbon dioxide , followed by the second rinse step with pure carbon dioxide . fluid evacuated from the cleaning step and the first rinse step can be recycled and reused by the separation into gaseous carbon dioxide and liquid fractions by a carbon dioxide recycle process , for example , including a liquid gas separator . after the second rinse step , by releasing pressure with a pressure control valve 11 , carbon dioxide vaporize to gaseous phase . therefore , microstructures such as semiconductor wafers can be dried without any water mark and any destructions of the pattern . hereinafter , the present invention is described with reference to experiments . although the present invention has been fully described by way of example with reference to the accompanying drawings , it is to be understood that various changes and modifications will be apparent to those skilled in the art . therefore , unless otherwise such changes and modifications depart from the scope of the present invention , they should be construed as being included therein . at first , in order to investigate the degree of the damage of cleaning reagent to the low - k materials , etch rate measurements of low - k films were carried out . low - k films were prepared on the silicon wafer by coating the materials consisting of organic silicon followed by heating and drying . the film thickness of the low - k films was about 5000 å and k - value was in the range of 2 to 3 . using cleaning tools shown in the fig1 a wafer coated by the low - k film was set into the high pressure vessel 9 . after closing the cover of the vessel 9 , carbon dioxide was introduced from carbon dioxide cylinder 1 through the pump 2 . the temperature of the vessel 9 was maintained at 50 ° c . with a thermostat 10 and the pressure was controlled by the control valve 11 . after the pressure reached 15 mpa , cleaning reagents were fed into the vessel 9 from the storage tank 4 through the pump 4 . after a 10 minute - treatment , 5 minutes of the first rinse step was applied , followed by 10 minutes of the second rinse step with a pure carbon dioxide . a rinse reagent used in the first rinse step was 0 . 5wt % of de - ionized water , 4 . 5 wt % of ethanol and 95 wt % of carbon dioxide . after the second rinse step , the pressure was released by the pressure control valve 11 and wafer was taken to be provided for further evaluation . etch rates ( å / min ) were calculated by the difference in the film thickness before and after the treatment divided by the 10 min . film thickness was measured by an optical measurement tool . the results are shown in table 1 . tmaf : tetramethylammoniumfluoride , dmac : dimethylacetamide , diw : de - ionized water , eg : ethyleneglycol , pg : propyleneglycol , etoh : ethanol in the same manner described in the example 1 , wafers coated by the low - k film were prepared . after line and space patterns ( 180 nm width ) were processed by the lithography on the surface , ordinary etching by fluorocarbon gases and ashing by oxygen plasma . after one minute cleaning with cleaning reagents listed in the table 2 under the same condition as the example 1 , five minute or ten minute of the first rinse step using components listed in table 2 , followed by ten minutes of the second rinse step with a pure carbon dioxide . the first rinse reagents used were 0 . 5 wt % of listed components , 4 . 5 wt % of ethanol and 95 wt % of carbon dioxide . after the release of the pressure by opening the pressure control valve 11 , the imated wafer was taken and provided for the evaluation . the cleaning performance was evaluated by the observation of a scanning electron microscope ( sem ) with amplitude of 50000 . the performance was checked both residues on the surface of the line and the liquid - like residues . the criteria used for investigation was as follows ; good : amount of residues was less than 1 area % on the patterned side of the wafer . ng ( not good : amount of residues was more than 1 area %. tmaf : tetramethylammoniumfluoride , dmac : dimethylacetamide , h 2 o : water ( ε = 78 ), diw : de - ionized water , eg : ethyleneglycol , pg : propyleneglycol , etoh : ethanol , fa : formamide ( ε = 111 ), mf : methylformamide ( ε = 182 ), dmf : dimethylformamide ( ε = 36 . 7 ), meoh : methanol ( ε = 42 ), ac : acetone ( ε = 21 ) according to the cleaning process described in the present invention , low - k materials that are easily damaged by the cleaning reagents could be protected by the use of the cleaning reagents including inhibitors such as polyhydric alcohols added into carbon dioxide . besides , residues produced because of the damages of low - k materials by the cleaning reagents could be removed by a suitable selection of the rinse reagents . therefore , the cleaning process described in the present invention provide one of the optimized cleaning processes applicable to the microstructure such as semiconductor wafers .