referring to the figures by the characters of reference , there is shown in fig1 a block diagram of a helium pressure controller 10 that may be found in an automatic pressure controller system as used in a semiconductor wafer processing system . there is an electronic control unit , “ ecu ” 12 having a memory 14 ; a proportional - integral - derivative controller , “ pid ” 16 ; a pid algorithm 18 stored in the memory 14 ; and the filter 20 of the present invention . connected to or controlled by the ecu 12 are a process control algorithm 22 , an alarm controller 24 , a source of helium gas , 26 , and a pump 28 . a power supply 30 supplies a plurality of voltages to the ecu 12 . a pressure set - point control 32 is an input to the pid controller 16 . the ecu 12 has a microprocessor 34 including a memory 14 for storing and accessing several algorithms 18 , 22 for controlling the processing in a process chamber 36 . the power supply 30 supplies a plurality of regulated dc voltages to operate the ecu 12 in general and the pid controller 16 in particular . a source of helium gas 26 is used to provide the backside helium gas that is used in the process chamber 36 to maintain the temperature on the wafers as shown in u . s . pat . no . 5 , 753 , 566 issued to hwang on may 19 , 1998 and assigned to a common assignee . the hot backside helium instead of room temperature helium ( which is not used to remove the heat of the wafer ) is used to provide heat to the work - piece and to preserve the heat of the work - piece at a certain level that is critical for uniformity during an etchback ( eb ) process for a spin - on - glass ( sog ) layer . the hot backside helium protects the lower electrode , now shown , in the process chamber 36 from damage by the etching process . the entirety of this u . s . pat . no . 5 , 753 , 566 , is incorporated herein by reference . the pump 28 is operatively connected to the source of helium gas 26 and is operated under control of the ecu 12 . a sensor , not shown , is connected to the pump 28 for indicating the flow of the helium through the pump . the pump 28 supplies the helium gas at its output that is operatively connected to a wafer - processing chamber 36 for operating as illustrated in u . s . pat . no . 5 , 753 , 566 . located within the ecu 12 is a pid helium pressure controller 16 . the pid controller 16 is operatively connected to at least two of the voltage inputs , + 15 volts and − 15 volts and is operative for controlling the flow of the helium gas 38 from the pump 28 . as illustrated in fig2 the pid controller 16 is a control module in the ecu 12 responsive to the flow of helium from the source of helium gas 26 to the helium gas input to the process chamber 36 . the pid controller 16 responds to the pid algorithm 18 and to the sensor output from the pump 28 to generate a helium flow reading . the output of the pid controller 16 is an op amp 38 that is responsive to the flow of helium gas 38 for generating a helium flow pulsed signal 40 . the helium flow pulsed signal 40 is operatively connected to the pump 28 causing the pump to operate . the output of the op amp 38 is connected to the filter 20 that is responsive to the helium flow pulsed signal 40 . as illustrated in fig3 the output of the op amp 38 is a spiked signal 42 that responds to any change in the in the pulsed output signal 40 or to any noise that is caused in the system by rf magnet turn , poor system or component grounding . these will trigger signal spiking on the helium flow pulsed signal 40 . of concern , as illustrated in fig3 are spikes 44 , 46 that are approximately 100 ms in width and have an amplitude that exceeds a threshold 48 that is 5 standard cubic centimeters / minute , “ sccm ”. if the spikes 44 , 46 are substantially longer in time , such as a spike from an amplitude found at the beginning of a pulse control signal , the filter 12 does not act these upon . therefore the filter 12 reduces the amplitude , the sccm height , of the pulsed signal that has a time duration less than a predetermined time value and is non - responsive to all other pulsed signals . the output of the filter 12 is applied to the alarm control unit 24 that is responsive to the filtered helium flow signal for generating an alarm signal 52 when the flow of helium gas 38 has at least one measurable transient pulse signal greater than a first amplitude 48 and with a time period greater that the predetermined value and less than a much longer second value . one function of the alarm signal 52 is to apply to the process control algorithm 22 and is adaptable to interrupt the wafer fabricating process . this alarm signal 52 is identified as a “ back - side helium ” alarm signal . other conditions that can generate the back - side helium alarm signal 52 are noise on the regulated voltages that are applied to the pid controller 16 . another is a deviation in the helium supply pressure . still others are noise on the pressure set point 32 , the pressure reading 54 , or the pid controller 16 not being optimized . all of these have as a result a helium flow reading spike 44 , 46 . if the spike 44 , 46 can be filtered out 56 , 58 as shown in fig4 the system will be more robust and the instances of potential wafer damage will decrease significantly . as illustrated in fig4 the filter 12 is an r - c filter having an in - circuit or series resistor 60 and a shunting capacitor 62 to ground . the value of the resistor 60 in the preferred embodiment is 10k and the value of the shunting capacitor 62 is twenty - two microfarads . these values are suitable for 100 milliseconds / 5 sccm of noise and can filter noise up to 500 milliseconds / 5 sccm . other changes in the system to reduce noise and “ false ” back / side helium alarm signals include the installation of magnetic resistors in the appropriate places in the control circuit ; enhance the grounding of the control circuits by adding grounding cable ; and isolate the signals by the use of faraday shields . the pid controller 16 has an adjustable pressure set point responsive to the pressure set point signal 32 . as previously stated it has a bias voltage input , + 15 , − 15 from the plurality of voltage inputs to the ecu 12 . it has a helium pressure output signal 54 and a helium flow pulsed output signal 40 that are connected to the filter 12 . while the present invention has been described in an illustrative manner , it should be understood that the terminology used is intended to be in a nature of words of description rather than of limitation . furthermore , while the present invention has been described in terms of a preferred embodiment , it is to be appreciated that those skilled in the art will readily apply these teachings to other possible variations of the inventions . accordingly , various changes and modifications may be made to the illustrative embodiment without departing from the spirit or scope of the invention . it is intended that the scope of the invention not be limited in any way to the illustrative embodiment shown and described but that the invention be limited only by claims appended hereto . the embodiment of the invention in which an exclusive property or privilege is claimed are defined as follows .