referring now to the drawings in detail , and more particularly to fig1 the reference character 10 represents a processing module , which may stand alone or be easily combined or adjoined with other processing modules 10 to form a continuous low volume unit for processing photosensitive materials . processing module 10 includes : a container 11 ; an upturned entrance channel 100 ( described in the description of fig2 ); an entry transport roller assembly 12 ; transport roller assemblies 13 ; an exit transport roller assembly 15 ; an upturned exit channel 101 ( described in the description of fig2 ); high impingement slot nozzles 17a , 17b and 17c ; a drive 16 and a rotating assembly 18 , assembly 18 may be any known means for turning drive 16 , i . e ., a motor , a gear , a belt , a chain , etc . an access hole 61 is provided in container 11 . hole 61 is utilized for the interconnection of modules 10 . assemblies 12 , 13 and 15 are positioned within container 11 in the vicinity of the walls of container 11 and slot nozzles 17a , 17b and 17c are positioned within the vicinity of the walls of container 11 . drive 16 is connected to roller assemblies 12 , 13 and 15 and turning assembly 18 and assembly 16 is used to transmit the motion of assembly 18 to assemblies 12 , 13 and 15 . roller assemblies 12 , 13 , and 15 , and slot nozzles 17a , 17b and 17c may be easily inserted into or removed from container 11 . roller assembly 13 includes : a top roller 22 ; a bottom roller 23 ; tension springs 62 , which holds top roller 22 in compression with respect to bottom roller 23 ; a bearing bracket 26 ; and a channel section 24 . a narrow channel opening 25 exists within section 24 . opening 25 on the entrance side of section 24 may be the same size and shape as opening 25 on the exit side of section 24 . opening 25 on the entrance side of section 24 may also be relieved , tapered or larger than the exit side of section 24 to accommodate rigidity variations of various types of photosensitive material 21 . channel opening 25 forms a portion of processing channel 25 . rollers 22 and 23 may be drive or driven rollers and rollers 22 and 23 are connected to bracket 26 . rollers 22 and 23 are rotated by intermeshing gears 28 . photosensitive material 21 is transported in either direction a or direction b automatically through processing channel 25 by roller assemblies 12 , 13 and 15 . photosensitive material 21 may be in a cut sheet or roll format or photosensitive material 21 may be simultaneously in a roll and simultaneously in a cut sheet format . photosensitive material 21 may contain an emulsion on either or both of its surfaces . when cover 20 is placed on container 11 a light tight enclosure is formed . thus , module 10 with its associated recirculation system 60 , which is described in the description of fig5 will be a stand alone light tight module that is capable of processing photosensitive material , i . e ., a monobath . when two or more modules 10 are combined a multi - stage continuous processing unit may be formed . the combination of one or more modules 10 will be more fully set forth in the description of fig6 . fig2 is a partially cut away section of module 10 of fig1 . assemblies 12 , 13 and 15 , nozzles 17a , 17b and 17c and backing plate 9 are designed in a manner to minimize the amount of processing solution that is contained in processing channel 25 , vessel 11 , recirculation system 60 ( fig5 ) and gaps 49a , 49b , 49c and 49d . at the entrance of module 10 , an upturned channel 100 forms the entrance to processing channel 25 . at the exit of module 10 , an upturned channel 101 forms the exit to processing channel 25 . assembly 12 is similar to assembly 13 . assembly 12 includes : a top roller 30 ; a bottom roller 31 ; tension springs 62 ( not shown ) which holds top roller 30 to bottom roller 31 ; a bearing bracket 26 ; and a channel section 24 . a portion of narrow processing channel 25 is formed by channel section 24 . rollers 30 and 31 may be drive or driven rollers and rollers 30 and 31 are connected to bracket 26 . assembly 15 is similar to assembly 13 , except that assembly 15 has an additional two rollers 130 and 131 , which operate in the same manner as rollers 32 and 33 . assembly 15 includes : a top roller 32 ; a bottom roller 33 ; tension springs 62 ( not shown ); a top roller 130 ; a bottom roller 131 ; a bearing bracket 26 ; a channel section 24 . a portion of narrow processing channel 25 exists within section 24 . channel section 24 forms a portion of processing channel 25 . rollers 32 , 33 , 130 and 131 may be drive or driven rollers and rollers 32 , 33 , 130 and 131 are connected to bracket 26 . backing plate 9 and slot nozzles 17a , 17b and 17c are affixed to container 11 . the embodiment shown in fig2 will be used when photosensitive material 21 has an emulsion on one of its surfaces . the emulsion side of material 21 will face slot nozzles 17a , 17b and 17c . material 21 enters channel 25 between rollers 30 and 31 and moves past backing plate 9 and nozzle 17a . then material 21 moves between rollers 22 and 23 and moves past backing plates 9 and nozzles 17b and 17c . at this point material 21 will move between rollers 32 and 33 , and move between rollers 130 and 131 and exit processing channel 25 . conduit 48a connects gap 49a , via port 44a to recirculation system 60 via port 44 ( fig5 ), which is more fully described in the description of fig5 and conduit 48b connects gap 49b , via port 45a to recirculation system 60 via port 45 ( fig5 ). conduit 48c connects gap 49c , via port 46a to recirculation system 60 via port 46 ( fig5 ) and conduit 48d connects gap 49d , via port 47a to recirculation system 60 via port 47 ( fig5 ). slot nozzle 17a is connected to recirculation system 60 via conduit 50a and inlet port 41a via port 44 ( fig5 ) and slot nozzle 17b is connected to recirculation system 60 via conduit 50b and inlet port 42a via inlet port 42 ( fig5 ). conduit 50c connects nozzle 17c , via inlet port 43a to recirculation system 60 via port 43 ( fig5 ). sensor 52 is connected to container 11 and sensor 52 is used to maintain a processing solution level 235 relative to conduit 51 . excess processing solution may be removed by overflow conduit 51 . textured surface 200 or 205 is affixed to the surface of backing plate 9 that faces processing channel 25 and to the surface of slot nozzles 17a , 17b and 17c that faces processing channel 25 . fig3 is a partially cut away drawing of an alternate embodiment of module 10 of fig2 in which material 21 has an emulsion on one surface and nozzles 17d , 17e and 17f are on the top portion of container 11 . assemblies 12 , 13 and 15 , nozzles 17d , 17e and 17f and backing plate 9 are designed in a manner to minimize the amount of processing solution that is contained in processing channel 25 and gaps 49e , 49f , 49g and 49h . at the entrance of module 10 , an upturned channel 100 forms the entrance to processing channel 25 . at the exit of module 10 , an upturned channel 101 forms the exit to processing channel 25 . assembly 12 is similar to assembly 13 . assembly 12 includes : a top roller 30 ; a bottom roller 31 ; tension springs 62 ( not shown ) which holds top roller 30 in compression with respect to bottom roller 31 , a bearing bracket 26 ; and a channel section 24 . a portion of narrow channel opening 25 exists within section 24 . channel section 24 forms a portion of processing channel 25 . rollers 30 and 31 may be drive or driven rollers and rollers 30 and 31 are connected to bracket 26 . assembly 15 is similar to assembly 13 , except that assembly 15 has an additional two rollers 130 and 131 that operate in the same manner as rollers 32 and 33 . assembly 15 includes : a top roller 32 ; a bottom roller 33 ; a tension spring 62 ( not shown ); a top roller 130 ; a bottom roller 131 ; a bearing bracket 26 ; and a channel section 24 . a portion of narrow processing channel 25 exits within section 24 . channel section 24 forms a portion of processing channel 25 . rollers 32 , 33 , 130 and 131 may be drive or driven rollers and rollers 32 , 33 , 130 and 131 are connected to bracket 26 . backing plate 9 and slot nozzles 17d , 17e and 17f are affixed to container 11 . the embodiment shown in fig3 will be used when photosensitive material 21 has an emulsion on one of its surfaces . the emulsion side of material 21 will face slot nozzles 17d , 17e and 17f . material 21 enters channel 25 between rollers 30 and 31 and moves past backing plate 9 and nozzle 17d . then material 21 moves between rollers 22 and 23 and moves past backing plates 9 and nozzles 17e and 17f . at this point material 21 will move between rollers 32 and 33 and move between rollers 130 and 131 and exit processing channel 25 . conduit 48e connects gap 49e , via port 44b to recirculation system 60 via port 44 ( fig5 ) and conduit 48f connects gap 49f , via port 45b to recirculation system 60 via port 45 ( fig5 ). conduit 48g connects gap 49g , via port 46b to recirculation system 60 via port 46 ( fig5 ) and conduit 48h connects gap 49h , via port 47b to recirculation system 60 via port 47 ( fig5 ). slot nozzle 17d is connected to recirculation system 60 via conduit 50d and inlet port 4lb via inlet 41 ( fig5 ) and slot nozzle 17e is connected to recirculation system 60 via conduit 50e and inlet port 42b via port 42 ( fig5 ). conduit 50f connects nozzle 17f , via inlet port 43b to recirculation system 60 via port 43 ( fig5 ). sensor 52 is connected to container 11 and sensor 52 is used to maintain a processing solution level 235 relative to conduit 51 . excess processing solution may be removed by overflow conduit 51 . textured surface 200 or 205 is affixed to the surface of backing plate 9 that faces processing channel 25 and to the surface of slot nozzles 17d , 17e and 17f that faces processing channel 25 . fig4 is a partially cut away drawing of an alternate embodiment of module 10 of fig2 in which material 21 has an emulsion on both surfaces and nozzles 17g , 17h and 17i are on the top portion of container 11 facing one emulsion surface of material 21 and nozzles 17j , 17k , and 17l are on the bottom portion of container 11 facing the other emulsion surface of material 21 . assemblies 12 , 13 and 15 , nozzles 17g , 17h , 17i , 17j , 17k and 17l are designed in a manner to minimize the amount of processing solution that is contained in processing channel 25 and gaps 49i , 49j , 49k and 49l . at the entrance of module 10 , an upturned channel 100 forms the entrance to processing channel 25 . at the exit of module 10 , an upturned channel 101 forms the exit to processing channel 25 . assembly 12 includes : a top roller 30 ; a bottom roller 31 ; tension springs 62 ( not shown ) which holds top roller 30 in compression with respect to bottom roller 31 , a bearing bracket 26 ; and a channel section 24 . a portion of narrow processing channel 25 exists within section 24 . channel section 24 forms a portion of processing channel 25 . rollers 30 , 31 , 130 and 131 may be drive or driven rollers and rollers 30 , 31 , 130 and 131 are connected to bracket 26 . assembly 15 is similar to assembly 13 , except that assembly 15 has an additional two rollers 130 and 131 which operate in the same manner as rollers 32 and 33 . assembly 15 includes : a top roller 32 ; a bottom roller 33 ; tension springs 62 ( not shown ); a top roller 130 ; a bottom roller 131 ; a bearing bracket 26 ; and a channel section 24 . a portion of narrow processing channel 25 exists within section 24 . channel section 24 forms a portion of processing channel 25 . rollers 32 , 33 , 130 and 131 may be drive or driven rollers and rollers 32 , 33 , 130 and 131 are connected to bracket 26 . slot nozzles 17g , 17h and 17i are affixed to the upper portion of container 11 . slot nozzles 17j , 17k and 17l are affixed to the lower portion of container 11 . the embodiment shown in fig4 will be used when photosensitive material 21 has an emulsion on both of its two surfaces . one emulsion side of material 21 will face slot nozzles 17g , 17h and 17i and the other emulsion side of material 21 will face slot nozzles 17j , 17k and 17l . material 21 enters channel 25 between rollers 30 and 31 and moves past and nozzles 17g an 17j . then material 21 moves between rollers 22 and 23 and moves past nozzles 17h , 17k , 17i and 17l . at this point material 21 will move between rollers 32 and 33 and move between rollers 130 and 131 and exit processing channel 25 . conduit 48i connects gap 49i , via port 44c to recirculation system 60 via port 44 ( fig5 ) and conduit 48j connects gap 49k , via port 45c to recirculation system 60 via port 45 ( fig5 ). conduit 48k connects gap 49l , via port 46c to recirculation system 60 and conduit 48l connects gap 49j , via port 47c to recirculation system 60 via port 47 ( fig5 ). slot nozzle 17g is connected to recirculation system 60 via conduit 50g via port 41 ( fig5 ). slot nozzle 17h is connected to recirculation system 60 via conduit 50h and inlet port 62 via port 42 ( fig5 ). conduit 50i connects nozzle 17i , via inlet port 63 to recirculation system 60 via port 43 ( fig5 ). slot nozzle 17j is connected to recirculation system 60 via conduit 50j and inlet port 41c via port 41 ( fig5 ) and slot nozzle 17k is connected to recirculation system 60 via conduit 50k and inlet port 42c via port 42 ( fig5 ). slot nozzle 17l is connected to recirculation system 60 via conduit 50l and inlet port 43c via port 43 ( fig5 ). sensor 52 is connected to container 11 and sensor 52 is used to maintain a level of processing solution relative to conduit 51 . excess processing solution may be removed by overflow conduit 51 . material 21 enters upturned channel entrance 100 , then passes through channel section 24 of channel 25 between rollers 30 and 31 and moves past nozzles 17g and 17j . then material 21 moves between rollers 22 and 23 and moves past nozzles 17h and 17k , 17l and 17i . at this point material 21 will move between rollers 32 and 33 and exit processing channel 25 . conduit 48i connects gap 49i , via port 44c to recirculation system 60 via port 44 ( fig5 ) and conduit 48j connects gap 49k , via port 45c to recirculation system 60 via port 45 ( fig5 ). conduit 48k connects gap 49l , via port 46c to recirculation system 60 via port 46 ( fig5 ) and conduit 48l connects gap 49j , via port 47c to recirculation system 60 via port 47 ( fig5 ). sensor 52 is connected to container 11 and sensor 52 is used to maintain a processing solution level 235 relative to conduit 51 . excess processing solution may be removed by overflow conduit 51 . textured surface 200 or 205 is affixed to the surface of slot nozzles 17g , 17h , 17i , 17j , 17k and 17l that face processing channel 25 . fig5 is a schematic drawing of processing solution recirculation system 60 of the apparatus of this invention . module 10 is designed in a manner to minimize the volume of channel 25 . the outlets 44 , 45 , 46 and 47 of module 10 are connected to recirculating pump 80 via conduit 85 . recirculating pump 80 is connected to manifold 64 via conduit 63 and manifold 64 is coupled to filter 65 via conduit 66 . filter 65 is connected to heat exchanger 86 and heat exchanger 86 is connected to channel 25 via conduit 4 . heat exchanger 86 is also connected to control logic 67 via wire 68 . control logic 67 is connected to heat exchanger 86 via wire 70 and sensor 52 is connected to control logic 67 via wire 71 . metering pumps 72 , 73 and 74 are respectively connected to manifold 64 via conduits 75 , 76 and 77 . the photographic processing chemicals that comprise the photographic solution are placed in metering pumps 72 , 73 and 74 . pumps 72 , 73 and 74 are used to place the correct amount of chemicals in manifold 64 , when photosensitive material sensor 210 senses that material 21 ( fig1 ) is entering channel 25 , sensor 210 transmits a signal to pumps 72 , 73 and 74 via line 211 and control logic 67 . manifold 64 introduces the photographic processing solution into conduit 66 . the photographic processing solution flows into filter 65 via conduit 66 . filter 65 removes contaminants and debris that may be contained in the photographic processing solution . after the photographic processing solution has been filtered , the solution enters heat exchanger 86 . sensor 52 senses the solution level and sensor 8 senses the temperature of the solution and respectively transmits the solution level and temperature of the solution to control logic 67 via wires 71 and 7 . for example , control logic 67 is the series cn 310 solid state temperature controller manufactured by omega engineering , inc . of 1 omega drive , stamford , conn . 06907 . logic 67 compares the solution temperature sensed by sensor 8 and the temperature that exchanger 86 transmitted to logic 67 via wire 70 . logic 67 will inform exchanger 86 to add or remove heat from the solution . thus , logic 67 and heat exchanger 86 modify the temperature of the solution and maintain the solution temperature at the desired level . sensor 52 senses the solution level in channel 25 and transmits the sensed solution level to control logic 67 via wire 71 . logic 67 compares the solution level sensed by sensor 52 via wire 71 to the solution level set in logic 67 . logic 67 will inform pumps 72 , 73 and 74 via wire 83 to add additional solution if the solution level is low . once the solution level is at the desired set point control logic 67 will inform pumps 72 , 73 and 74 to stop adding additional solution . any excess solution may either be pumped out of module 10 or removed through level drain overflow 84 via conduit 81 into container 82 . at this point the solution enters module 10 via inlets 41 , 42 and 43 . when module 10 contains too much solution the excess solution will be removed by overflow conduit 51 , drain overflow 84 and conduit 81 and flow into reservoir 82 . the solution level of reservoir 82 is monitored by sensor 212 . sensor 212 is connected to control logic 67 via line 213 . when sensor 212 senses the presence of solution in reservoir 82 , a signal is transmitted to logic 67 via line 213 and logic 67 enable pump 214 . thereupon pump 214 pumps solution into manifold 64 . when sensor 212 does not sense the presence of solution , pump 214 is disabled by the signal transmitted via line 213 and logic 67 . when solution in reservoir 82 reaches overflow 215 , the solution will be transmitted through conduit 216 into reservoir 217 . the remaining solution will circulate through channel 25 and reach outlet lines 44 , 45 , 46 and 47 . thereupon , the solution will pass from outlet lines 44 , 45 , 46 and 47 to conduit line 85 to recirculation pump 80 . the photographic solution contained in the apparatus of this invention , when exposed to the photosensitive material , will reach a seasoned state more rapidly than prior art systems , because the volume of the photographic processing solution is less . fig6 is a perspective drawing of textured fluid - bearing surface 200 which is affixed to backing plate 9 and / or slot nozzles 17a - 17l of fig2 . textured surface 200 is textured by any known process , e . g ., knurling , molded , edm electro - discharged machined or applied . knurls 202 are shown on surface 200 . the texturing and cantering improve the flow of processing solution between photosensitive material 21 and backing plate 9 and / or slot nozzles 17a - 17l . in addition to improving the flow of processing solution the texturing and cantering provide an improvement in the control over the direction of flow of the processing solution . this yields a bearing of fluid aiding photosensitive material transport through processing channel 25 and allows the gelatin on photosensitive material 21 to swell . it also allows for improved circulation of processing solution and makes it easier for contaminants and debris to escape direct and damaging contact with photosensitive material 21 . textured surface 200 and canted passageways 203 provide space between photosensitive material 21 and plates 9 and / or nozzles 17a - 17l to prevent contaminants and debris from scratching , abrading or pressure sensitizing photosensitive material 21 . fig7 is a perspective drawing of textured fluid - bearing surface 205 that is affixed to backing plate 9 and / or slot nozzles 17a - 17l of fig2 . textured surface 205 is textured by any known process , e . g ., knurling , molded , edm electro - discharged machined or applied . knurls 206 are shown on surface 205 . the texturing improves the flow of processing solution between photosensitive material 21 and backing plate 9 and / or slot nozzles 17a - 17l . in addition to improving the flow of processing solution the texturing provides control over the direction of flow of the processing solution . this yields a bearing of fluid aiding photosensitive material transport through processing channel 25 and allows the gelatin on photosensitive material 21 to swell . it also allows for improved circulation of processing solution and makes it easier for contaminants and debris to escape direct and damaging contact with photosensitive material 21 . textured surface 205 provides space between photosensitive material 21 and plates 9 and / or nozzles 17a - 17l to prevent contaminants and debris from scratching , abrading or pressure sensitizing photosensitive material 21 . the above specification describes a new and improved apparatus for processing photosensitive materials . it is realized that the above description may indicate to those skilled in the art additional ways in which the principles of this invention may be used without departing from the spirit . it is , therefore , intended that this invention be limited only by the scope of the appended claims .