hereinafter , single - walled carbon nanotube saturable absorber production via a multi - vacuum filtration method will be described in detail with reference to the accompanying drawings . fig1 and 2 are schematic diagrams showing the single - walled carbon nanotube saturable absorber production via a multi - vacuum filtration method according to an exemplary embodiment of the present invention . as shown in fig1 and 2 , the single - walled carbon nanotube saturable absorber production via a multi - vacuum filtration method according to the exemplary embodiment of the present invention is configured to include filling a carbon nanotube mixed solution 200 in which a carbon nanotube solution and distilled water are mixed in a vacuum chamber 100 installed with a membrane filter 20 and filtering the solution to deposit a carbon nanotube thin film 10 on the membrane filter 20 ( s 10 ); separating the membrane filter 20 including the carbon nanotube thin film 10 deposited thereon from the vacuum chamber 100 to dry the membrane filter 20 ( s 20 ); floating the membrane filter 20 including the carbon nanotube thin film 10 deposited thereon on an etchant 400 and dissolving the membrane filter 20 to thereby remove the membrane filter 20 ( s 30 ); diluting the etchant 400 to replace the etchant 400 with distilled water 500 and then sinking a lower polymer film 30 under the carbon nanotube thin film ( s 40 ); removing the distilled water 500 while adjusting a position of the lower polymer film 30 to deposit the carbon nanotube thin film 10 on the lower polymer film 30 ( s 50 ); and coating an upper polymer film 40 on the carbon nanotube thin film 10 deposited on the lower polymer film 30 ( s 60 ). first , s 10 is a step of allowing a single - walled carbon nanotube ( hereinafter , referred to as the carbon nanotube ) to form a uniform layer . to this end , the membrane filter 20 made of porous cellulose is installed in the vacuum chamber 100 , and distilled water is fully filled therein . the individualized carbon nanotube solution is dropped in the vacuum chamber 100 fully filled with the distilled water and captured on the membrane filter 20 while being continuously circulated by applying vacuum , such that the carbon nanotube thin film 10 is deposited on the membrane filter 20 . in this case , a filter having a pore smaller than a length of the carbon nanotube needs to be used as the membrane filter 20 . further , in s 10 , the carbon nanotube thin film 10 may be deposited on the membrane filter 20 by preparing the carbon nanotube mixed solution 200 at a low concentration and passing the solution through the membrane filter 20 several times . that is , as shown in fig1 , a process of filtering the carbon nanotube mixed solution 200 uniformly dispersed in the distilled water to allow the carbon nanotube to be uniformly distributed on the membrane filter 20 is performed several times at a low concentration , such that the carbon nanotube does not aggregate , thereby making it possible to uniformly producing the carbon nanotube thin film 10 . in addition , the carbon nanotube thin film 10 is cured through the separating of the membrane filter 20 including the carbon nanotube thin film 10 deposited thereon from the vacuum chamber 100 to dry the membrane filter 20 ( s 20 ). in this case , it is preferable that the membrane filter 20 including the carbon nanotube thin film 10 deposited thereon is dried at room temperature for 10 minutes or more . fig2 is a schematic diagram showing a process of forming a polymer layer on a lower surface of the carbon nanotube thin film according to the exemplary embodiment of the present invention and corresponds to processes of s 30 to s 50 . then , in s 30 , the membrane filter 20 including the carbon nanotube thin film 10 deposited thereon is floated on the etchant 400 filled in a petri dish 300 , such that the membrane filter 20 was dissolved and removed . that is , when the membrane filter 20 is maintained at a state in which it contact the etchant 400 to thereby be floated by surface tension for 10 minutes , the membrane filter 20 is sufficiently dissolved and removed , such that only the carbon nanotube thin film 10 is floated on the etchant 400 . here , the etchant 400 may be 3m naoh solution , and a preferable concentration thereof is 10 wt . %. further , in s 40 , the etchant 400 is diluted with distilled water in a state in which the carbon nanotube thin film 10 is floated on the etchant 400 as described above to allow the etchant to be completely replaced with the distilled water 500 , and the lower polymer film 30 is sunk under the carbon nanotube thin film 10 , such that the lower polymer film 30 is positioned on a bottom of the petri dish 300 . in this case , the lower polymer film 30 may be made of polydimethylsiloxane , wherein since polydimethylsiloxane , which is silicon rubber or silicon resin , is a flexible material , it is easy to input the lower polymer film between the carbon nanotube thin film 10 and the petri dish 300 to allow the lower polymer film to be positioned on the bottom of the petri dish 300 as shown in fig2 . s 50 is a step of slowly removing the distilled water 500 while adjusting the position of the lower polymer film 30 so that the carbon nanotube thin film 10 is accurately deposited on the lower polymer film 30 to deposit the carbon nanotube thin film 10 on the lower polymer film 30 . s 60 is a step of picking out from the petri dish 300 in a state in which the carbon nanotube thin film is deposited on the lower polymer film 30 to coat an upper polymer film 40 on the carbon nanotube thin film 10 . that is , as shown in fig3 , in s 60 , the polymer films 30 and 40 are positioned on both surfaces of the carbon nanotube thin film 10 like a sandwich . in this case , the upper polymer film 40 may be coated using a spin coating method . the spin coating method is a method of disposing the lower polymer film 30 including the carbon nanotube thin film 10 deposited thereon on a spin coater , dropping a polymer solution onto the carbon nanotube thin film 10 , and then rapidly rotating the carbon nanotube thin film 10 to form a polymer thin film . the upper polymer film 40 may be formed on the carbon nanotube thin film 10 by the spin coating method . therefore , in the single - walled carbon nanotube saturable absorber production via a multi - vacuum filtration method according to the exemplary embodiment of the present invention , a surface of the carbon nanotube thin film may be uniformly formed unlike the composite type method and the spray type method , such that the carbon nanotube saturable absorber having a low scattering degree may be produced . in addition , the saturable absorber may be produced while adjusting the desired optical absorbance by a method of individually producing the carbon nanotube thin film several times and then overlapping the produced thin films . further , in light passing through the saturable absorber , absorption rate , a is changed as the following equation . in the equation , i indicates intensity of incident light pulse , α 0 and α ns indicate linear limits of saturable absorption and non - saturable absorption , respectively . further , i sat indicates saturation intensity . as may be seen by the equation , since the absorption rate of the saturable absorber is changed according to the intensity of the incident pulse , when pulse components generated in a cavity pass through the saturable absorber , only a component having a high pulse intensity may be selectively transmitted . optical pulses having a significantly short pulse width in a time axis may be generated by this phenomenon . to this end , production of uniform thin film type carbon nanotube film is necessary . the uniform thin film type carbon nanotube film may be produced by the method in fig1 , and the saturable absorber that is necessary for fiber type mode locked femtosecond laser oscillation may be produced by the single - walled carbon nanotube saturable absorber production via a multi - vacuum filtration method according to the present invention . further , fig6 is a photograph showing the single - walled carbon nanotube saturable absorber according to the exemplary embodiment of the present invention . the single - walled carbon nanotube saturable absorber according to the present invention is configured so that the carbon nanotube thin film 10 is positioned between the lower and upper polymer films 30 and 40 and formed at inner portions of the polymer films 30 and 40 as shown in fig6 . the single - walled carbon nanotube saturable absorber formed as described above is attached to a distal end of a fiber as shown in fig7 to serve as the saturable absorber , such that laser oscillation may be performed . the reason is that when the laser passes through the saturable absorber , instantly , optical loss is smaller than optical gain , such that the laser is oscillated as may be seen by fig4 . fig5 is a graph showing optical absorbance of the single - walled carbon nanotube saturable absorber according to the exemplary embodiment of the present invention at each wavelength . with the single - walled carbon nanotube saturable absorber production via a multi - vacuum filtration method according to the exemplary embodiment of the present invention , a surface of the carbon nanotube thin film may be uniformly formed unlike the composite type method and the spray type method , such that the carbon nanotube saturable absorber having a low scattering degree may be produced . in addition , the saturable absorber may be produced while adjusting the desired optical absorbance by a method of individually producing the carbon nanotube thin film several times and then overlapping the produced thin films . the present invention is not limited to the above - mentioned exemplary embodiments but may be variously applied , and may be variously modified by those skilled in the art to which the present invention pertains without departing from the gist of the present invention claimed in the claims .