aspects of the present invention and certain features , advantages , and details thereof , are explained more fully below with reference to the non - limiting examples illustrated in the accompanying drawings . descriptions of well - known materials , fabrication tools , processing techniques , etc ., are omitted so as not to unnecessarily obscure the invention in detail . it should be understood , however , that the detailed description and the specific examples , while indicating aspects of the invention , are given by way of illustration only , and are not by way of limitation . various substitutions , modifications , additions , such as additional fabrication steps and / or additional layers of materials , and / or different arrangements of certain disclosed layers , within the spirit and / or scope of the underlying inventive concepts will be apparent to those skilled in the art from this disclosure . approximating language , as used herein throughout the specification and claims , may be applied to modify any quantitative representation that could permissibly vary without resulting in a change in the basic function to which it is related . accordingly , a value modified by a term or terms , such as “ about ,” is not limited to the precise value specified . in some instances , the approximating language may correspond to the precision of an instrument for measuring the value . the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention . as used herein , the singular forms “ a ”, “ an ” and “ the ” are intended to include the plural forms as well , unless the context clearly indicates otherwise . it will be further understood that the terms “ comprise ” ( and any form of comprise , such as “ comprises ” and “ comprising ”), “ have ” ( and any form of have , such as “ has ” and “ having ”), “ include ( and any form of include , such as “ includes ” and “ including ”), and “ contain ” ( and any form of contain , such as “ contains ” and “ containing ”) are open - ended linking verbs . as a result , a method or device that “ comprises ,” “ has ,” “ includes ” or “ contains ” one or more steps or elements possesses those one or more steps or elements , but is not limited to possessing only those one or more steps or elements . likewise , a step of a method or an element of a device that “ comprises ,” “ has ,” “ includes ” or “ contains ” one or more features possesses those one or more features , but is not limited to possessing only those one or more features . furthermore , a device or structure that is configured in a certain way is configured in at least that way , but may also be configured in ways that are not listed . as used herein , the terms “ may ” and “ may be ” indicate a possibility of an occurrence within a set of circumstances ; a possession of a specified property , characteristic or function ; and / or qualify another verb by expressing one or more of an ability , capability , or possibility associated with the qualified verb . accordingly , usage of “ may ” and “ may be ” indicates that a modified term is apparently appropriate , capable , or suitable for an indicated capacity , function , or usage , while taking into account that in some circumstances the modified term may sometimes not be appropriate , capable or suitable . for example , in some circumstances , an event or capacity can be expected , while in other circumstances the event or capacity cannot occur — this distinction is captured by the terms “ may ” and “ may be .” reference is made below to the drawings , which are not drawn to scale for ease of understanding , wherein the same reference numbers are used throughout different figures to designate the same or similar components . fig1 depicts a cross - section of one example of a semiconductor structure 100 , including trench 101 , patterned into a dielectric material 102 . although described with respect to a trench in this example , it will be understood that the method of the invention is applicable to other features in a semiconductor structure , effectively having walls and a bottom , so as to hold copper , such as , for example , vias and the like . thus , the term “ trench ” includes such other features . the dielectric material may include , for example , oxides , nitrides or oxynitrides , silicon dioxide ( sio 2 ), silicon nitride ( sin ) or silicon oxynitride ( sion ), or otherwise a low dielectric constant (“ low k ”) material having a dielectric constant less than about that of sio 2 ( k = 3 . 9 ). common low k materials include simple or complex compounds of si , o , n , c , h or halogens , either as dense or porous materials for example , bcb ( divinylsiloxane bisbenzocyclobutene ), and silicon - carbon - oxygen - hydrogen ( sicoh ) organic dielectrics . the dielectric material 102 may be deposited using conventional deposition processes , such as , for example , chemical vapor deposition ( cvd ), atomic layer deposition ( ald ), evaporation , sputtering or solution based techniques , such as spin - on coating . since copper has poor adhesion to the dielectric materials and can diffuse into the dielectric materials , a conventional barrier layer 104 of about 0 . 5 nm to about 10 nm thick may be deposited on the dielectric material to prohibit or minimize the diffusion of copper into the dielectric material 102 , by using conventional deposition processes , such as , for example , physical vapor deposition ( pvd ), chemical vapor deposition ( cvd ), pulsed cvd , plasma - enhanced cvd ( pecvd ), atomic layer deposition ( ald ), plasma - enhanced ald ( peald ) or sputtering methods . the thickness of the barrier layer 104 may be about 0 . 5 nanometers to about 10 nanometers and the materials may include , for example , tantalum based materials ( e . g ., tan , tac , tacn , tasin ), titanium based materials ( e . g ., tin , tic , ticn , tisin ), tungsten based materials ( e . g ., wn , wc , wcn ) or a combination thereof . in a specific example , tantalum nitride may be formed by sequentially exposing the substrate to pentakis ( dimethylamino ) tantalum ( pdmat ) and ammonia during an ald process or a pe - ald process . a liner material 106 for bonding with copper ( also known as “ adhesive liner ”) may be deposited over the barrier layer 104 using conventional techniques such as , for example , atomic layer deposition ( ald ), chemical vapor deposition ( cvd ), physical vapor deposition ( pvd ). in a preferred embodiment , the thickness of the liner 106 may be about 0 . 5 nanometers to about 10 nanometers . although the materials for the adhesive liner such as ruthenium ( ru ), an alloy of ruthenium , cobalt ( co ), an alloy of cobalt , titanium ( ti ), an alloy of titanium , tungsten ( w ), an alloy of tungsten , tantalum ( ta ) or an alloy of tantalum , palladium ( pd ), rhodium ( rh ) or silver ( ag ) may be used , ruthenium or an alloy of ruthenium are preferred because of the stronger bonding properties of ruthenium with copper . in a specific example , a ruthenium layer may be deposited by sequentially exposing the substrate to a ruthenium metalorganic precursor , such as , for example , ( 2 , 4 - dimethylpentadienyl ) ( ethylcyclopentadienyl ) ruthenium ( ru ( dmpd ) ( etcp )) and a reactant during a cvd , ald or pe - ald process . optionally , as depicted in fig2 , a smooth copper metal seed layer 108 , of a thickness of about 1 nanometer to about 50 nanometers , may be deposited over the adhesive liner 106 , for a subsequent copper electroplating process , using conventional deposition processes , such as an electrochemical plating ( ecp ) process or a pvd process . a bulk layer of copper 110 is then deposited , as depicted in fig3 , using conventional copper deposition methods such as , for example , electrochemical plating , copper physical vapor deposition method , or a copper dry reflow process . the voids embedded inside the copper are removed in a subsequent etching step , in accordance with aspects of the present invention . this deposition results in the trench being over - filled with copper . where copper electroplating is used , cathodic current is passed on the conductive copper seed layer or liner layer so the copper ions in the plating solution are deposited on the wafer surface as copper metal . alternatively , the feature can be filled by copper dry reflow process that deposits a thin layer of copper by pvd or plating , then the copper layer is exposed to a thermal treatment that causes a portion of copper on the bulk field to migrate into the feature areas . the steps are repeated a few times until the pattern trenches or vias are completely filled . as illustrated in fig4 , the excess copper is removed using , for example , chemical - mechanical polishing ( cmp ), stopping at the liner , barrier or the dielectric layer . the result is that the exposed surface 112 of the copper is substantially coplanar with the exposed upper surface 113 of the adhesive liner , barrier or dielectric material . as depicted in fig5 , the exposed upper surface of the copper is etched back , preferably using a controlled wet etching process , to remove a portion of the copper from the sidewalls ( i . e ., from the liner 106 lining sidewalls 120 ), while leaving a predetermined amount of copper 114 on the bottom of the recess ( i . e ., on the liner 106 lining the bottom 118 ) to initiate electroless copper growth upwards from the bottom . the conventional wet etch process may be performed using a variety of alkaline , acidic , oxidizer or mixtures thereof . examples of neutral or alkaline etchants include ammonium or alkali metal persulfate solutions , ferric chloride based solutions , and ammonium hydroxide based solutions that may be used for the anisotropic wet etch process . the acidic copper etchants may include , for example , hydrochloric acid or hydrogen peroxide - acid mixture . another example of wet recess is to oxidize the exposed copper ( by ammonium hydroxide and peroxide mixture , for example ), followed by acid treatment to dissolve the copper oxide ( by diluted citric acid , for example ). the predetermined amount of copper 114 on the bottom of the recess may be determined to be about 1 nanometer to about 20 nanometers , and may easily be calculated accurately depending on the depth of the recess and the etch rate of the wet chemicals used . as the anisotropic wet etch process progresses from the top of the recessed feature toward the bottom , the copper portion with the voids is removed from within the recessed feature , leaving the residual bottom copper that is free of voids , since pinch - off does not begin until after the predetermined amount of copper has been deposited . a bulk layer of copper 116 is deposited in the trench , as depicted in fig6 , over the predetermined amount of copper during a bottom - up , electroless deposition process . a “ bottom - up ” process or “ bottom up ” fill is used herein to describe the deposition or the formation of a metal on the bottom of an opening , a via or an aperture within a substrate and the continued process of depositing or forming metal from the bottom of the trench up to the top of the opening . a bottom - up fill forms no material or substantially no material on the sidewalls of the trench prior to the metal reaching that point in the trench . as a result , there is no competitive sidewall or top - down growth of copper in the trench , substantially reducing or eliminating the possibility of pinch - off and leading to a substantially or completely void free fill of the feature with bulk copper . the electroless deposition of copper may be performed using conventional techniques , for example , where the structure is immersed into an aqueous electroless copper bath . one example of such an electroless bath includes a copper source , copper complexing agent , reducing agent , inhibitor , optional additives and a ph adjusting agent . the deposition rate and deposit properties of the electroless copper deposition depend on variables such as agitation , the copper complexing agent , reducing agent , bath temperature and ph . in a typical example , a copper source is contained within the electroless copper solution and provides dissolved copper ions ( e . g ., cu 2 + or cu + ) that may be reductively plated or deposited onto the surface as metallic copper . the copper source includes water soluble copper precursors such as , copper sulfate ( cuso 4 ), copper chloride ( cucl 2 ), copper acetate (( ch 3 co 2 ) 2 cu ), copper acetylacetonate (( c 5 h 7 o 2 ) 2 cu ), derivatives thereof , hydrates thereof or combinations thereof . the electroless copper solution has at least one complexing agent or chelator to form complexes with copper ions while providing stability and control during the deposition process . typically , the complexing agent may have functional groups such as carboxylic acids , dicarboxylic acids , polycarboxylic acids , amino acids , amines , diamines or polyamines . specific examples of complexing agents may include ethylene diamine tetraacetic acid ( edta ), ethylene diamine ( eda ), citric acid , citrates , glyoxylates , glycine , amino acids , derivatives thereof , salts thereof or combinations thereof . while several aspects of the present invention have been described and depicted herein , alternative aspects may be effected by those skilled in the art to accomplish the same objectives . accordingly , it is intended by the appended claims to cover all such alternative aspects as fall within the true spirit and scope of the invention .