before describing several exemplary embodiments of the invention , it is to be understood that the invention is not limited to the details of construction or process steps set forth in the following description . the invention is capable of other embodiments and of being practiced or carried out in various ways . according to the present invention , optical isolators are provided which can be manufactured by using various methods to directly bond opposing surfaces of the components that comprise both polarization dependent and polarization independent optical isolators . as used herein , the terms “ direct bonding ” and “ direct bond ” means that bonding between two surfaces is achieved at the atomic or molecular level , no additional material exists between the bonding surfaces such as adhesives or epoxy , and the surfaces are bonded without the assistance of fusion of the surfaces by heating . as used herein , the terms “ fusion ” or “ fusion bonding ” refers to processes that involve heating the bonding surfaces and / or the material adjacent the bonding surfaces to the softening or deformation temperature of the articles bonded . the methods of the present invention do not involve the use of adhesives , epoxies or fusion bonding to bond the opposing surfaces together . instead , the present invention utilizes methods that involve forming a direct bond between the surfaces without high temperatures that soften the glass material to the point of deformation or can damage the faraday rotator material . the present invention provides bonding methods that provide an impermeable , optically clear seal , resulting in essentially zero distortion of the light passing between the interface of the bonded surfaces . these bonding methods include chemical bonding and vacuum bonding . the formation of a direct bond between the isolator components allows for an impermeable seal that has the same inherent physical properties as the bulk material surfaces being bonded . vacuum bonding involves bringing two clean surfaces into contact in a high vacuum , thus forming a bond . provided that the surfaces are flat and clean , a high vacuum removes adsorbed water and hydrocarbons from the surface while preventing the adsorption of such species . surfaces can be processed and cleaned before being placed in the vacuum , or cleaned in the vacuum via ion milling or other plasma techniques . within the microelectronics field , vacuum bonding has been developed for sealing of such materials as single crystal silicon , thermal oxide sio 2 grown on si , and various metals , as described in u . s . pat . no . 6 , 153 , 495 , the entire content of which is incorporated herein by reference . coefficient of thermal expansions ( cte ) mismatch between materials is not an issue because the process can be applied at room temperature . because polished wafers are thin and typically non - flat due to the twyman effect , special fixturing can be used to apply pressure evenly across the entire wafer surface to generate appropriate contact . another type of bonding process that may be utilized according to the present invention involves chemical bonding . the formation of a chemical bond between two glass or metal surfaces allows for an impermeable seal that has the same inherent physical properties as the bulk material being bonded . in literature , low - temperature bonding technology has been reported for bonding soda - lime - silicate glass and for crystalline quartz ( see , e . g ., a . sayah , d . solignac , t . cueni , “ development of novel low temperature bonding technologies for microchip chemical analysis applications ,” sensors and actuators , 84 ( 2000 ) pp . 103 - 108 and p . rangsten , o . vallin , k . hermansson , y . backlund , “ quartz - to - quartz direct bonding ,” j . electrochemical society , v . 146 , n . 3 , pp . 1104 - 1105 , 1999 ). both the sayah and rangsten references , the entire contents of which are incorporated herein by reference , disclose using acid cleaning techniques . another article , h . nakanishi , t . nishimoto , m . kani , t . saitoh , r . nakamura , t . yoshida , s . shoji , “ condition optimization , reliability evaluation of sio2 - sio2 hf bonding and its application for uv detection micro flow cell ,” sensors and actuators , v . 83 , pp . 136 - 141 , 2000 , the entire content of which is incorporated herein by reference , discloses low - temperature bonding of fused sio 2 by first contacting the bonding surfaces with hydrofluoric acid . according to one embodiment of the invention , functional groups are provided on opposing surfaces of the isolator components to be bonded . no adhesives , high temperature pre - treatment or caustic hydrofluoric acid treatments are required prior to bonding the opposing surfaces . in one embodiment of the invention , a surface treatment of a high ph base solution such as sodium hydroxide , potassium hydroxide or ammonium hydroxide is utilized to provide functional groups on the bonding surfaces of the isolator components . in a preferred embodiment , the surfaces are first cleaned using a detergent followed by rinsing with an acid solution such as a nitric acid solution to remove particulate contamination and soluble heavy metals respectively . according to one embodiment of the invention , the surfaces to be bonded are contacted with a high ph solution , rinsed , pressed into contact and gradually heated to the desired temperature , preferably to a temperature below the curie temperature of the faraday rotator material , which is typically known from the material specifications . it is preferable to use a “ clean ” heat source that does not introduce contaminants or byproducts to interfere with bonding . such heat sources include , but are not limited to , induction heating , microwave heating , radio frequency ( rf ) heating and electric resistance heating . to enhance bonding , it is preferred that the surfaces are flat ; surface conformity can be determined by performing a preliminary cleaning and pressing , into contact , of the dried surfaces , so as to observe the degree of interference fringes . resulting interference fringes can be measured according to techniques known in the art and interpreted to determine matching flatness . also , an optical flat or interferometer can be used to evaluate individual surface flatness . preferably , the bonding process of the present invention consists of machining each isolator surface to be sealed to an appropriate flatness . particularly preferred flatness levels are less than about 1 micron and roughness levels of less than about 2 . 0 nm rms . after polishing , each surface is preferably cleaned with an appropriate cleaning process such as first using a detergent , followed by soaking in a low ph acidic solution , and finally soaking in a high ph basic solution to generate a clean surface . in embodiments in which the isolator surfaces contain silicon , such cleaning and soaking will provide silicic acid - like , for example , ≡ si — oh , ═ si —( oh ) 2 , — si —( oh ) 3 and — o — si —( oh ) 3 ) terminated surface groups . compared with bonding systems that utilize only a low ph treatment and rely on hydroxyl terminated surface groups , it is believed the present invention provides more robust bonding between silicon - containing articles for several reasons . while not wishing to be bound by theory , it is believed that larger silicic acid - like termination groups allow bonding ( both hydrogen and covalent ) to occur between surface groups that extend further away from the surface . larger surface terminated groups such as ═ si —( oh ) 2 , — si —( oh ) 3 , and — o — si —( oh ) 3 extend further from the surface than — si — oh , and these larger groups are more susceptible to steric movement which promotes better bonding between surfaces including these larger groups . additionally , each surface can be considerably rougher and still generate bonding due to the length in which the ═ si —( oh ) 2 , — si —( oh ) 3 , and — o — si —( oh ) 3 termination groups extend from the surface . in a preferred embodiment , the surfaces are assembled without drying . a low to moderate load ( as low as 1 psi ) is then applied as the surfaces are heated to less than 200 ° c ., for example , between 100 - 200 ° c . and preferably below 100 ° c . so that adsorbed water evaporates and silicic acid - like surface groups condense to form a covalently - bonded interface . according to certain embodiments of the invention , as noted above , it is desirable to provide bonding surfaces that are flat . it is preferred to have surfaces finished to 5 micron flatness or better , and preferably 1 micron flatness or better , on the surfaces to be bonded . additional information on a preferred embodiment of chemically bonding glass surfaces may be found in copending u . s . patent application entitled , “ direct bonding of articles containing silicon ,” commonly assigned to the assignee of the present patent application and naming robert sabia as inventor , the entire contents of which are incorporated herein by reference . however , the present invention is not limited to the chemical bonding methods disclosed in the copending patent application , and other chemical bonding techniques and vacuum bonding can be utilized in accordance with the present invention provided they are compatible with the materials that make up the isolator components . in addition , bonding in certain embodiments of the present invention may be enhanced by including lithium on at least one of the bonding surfaces . additional information on the incorporation of lithium in or on bonding surfaces may be found in copending and commonly assigned u . s . patent application entitled , “ direct bonding methods using lithium ,” and naming robert sabia , larry mann and dennis smith as inventors . the various embodiments of the present invention relate to optical isolators and a method for manufacturing polarization dependent and independent isolators by sealing surfaces into contact without an air gap or the use of an adhesive . according to one embodiment , polarization dependent isolators cores ( i . e ., sandwich - type structures with the faraday rotator in the middle ) are manufactured by sealing a polarizer such as polarcor ™ glass to a faraday rotator such as yttrium ion garnet ( yig ) or bismuth iron garnet ( big ) to manufacture polarization dependent isolators . in other embodiments , isolator cores are provided that include a faraday rotator bonded to single a polarizer or beam splitting element by chemical bonding . referring to fig1 a , a polarization dependent isolator core 10 is shown , which includes a pair of polarizers 12 , 14 sandwiched to a faraday rotator 16 . the polarizers 12 , 14 are bonded to the faraday rotator by vacuum bonding or chemical bonding techniques as described above . if non - latching garnet material is used for the faraday rotator , one way of biasing the material involves inserting the isolator core into a magnet 18 as shown in fig1 . other known method of biasing the non - latching material may be used . if a latching garnet material is used for the faraday rotator 16 , magnet 18 is not required to bias the faraday rotator 16 . in an alternative embodiment shown in fig1 b , polarization independent isolator cores 20 can be manufactured by sandwiching a faraday rotator 26 between a pair of beam splitters 22 , 24 . typically , the beam splitters 22 , 24 comprise a birefringent material such as single crystal rutile or yttrium vandanate in the form of a plate or wedge , but other types of beam splitters may be used in accordance with the invention . typically , polarization independent isolators also include a half wave plate 25 disposed between faraday rotator 26 and beam splitter 24 . the adjacent surfaces that make up the isolator core are bonded together using chemical or vacuum bonding techniques as described above . as in the previously described embodiment , if non - latching materials are used to form the faraday rotator 26 , the isolator core 20 is inserted in a magnet 28 . however , if latching garnet is used to form the faraday rotator , the magnet can be eliminated . in an alternative embodiment of the optical isolator not shown ), the optical isolator can include , bonded to the exposed end of the polarizers or beam splitters , an optical lens . it is contemplated that either one or both of the polarizers or beam splitters can include a bonded lens . as in the previously described embodiment , the adjacent surfaces of the polarizer or beam splitter and the lens are bonded together using chemical or vacuum bonding techniques as described above . the function of the lens bonded to the polarizer or beam splitter is to assist in collimating the signal through the optical isolator and or assist in focusing the signal that is emitted from the optical isolator . preferably , the type of lens that can be utilized for this application includes , but is not limited to , gradient index ( grin ) lenses . fig2 - 4 show an example of a manufacturing process that can be used to produce isolators in accordance with various embodiments of the present invention . as shown in fig2 sheets of material that are used to manufacture the individual layers of the optical isolator core are processed and polished to an appropriate flatness to enhance chemical or vacuum bonding . the bonding surfaces preferably should have a flatness of less than 1 micron . as shown in fig2 a sheet of faraday rotator material sheet 38 is sandwiched between pair of polarizer or beam splitter material sheets 32 , 34 . the faraday rotator sheet 38 includes bonding surfaces 37 , 39 , that are polished to an appropriate flatness . beam splitter or polarizer sheet 32 includes bonding surfaces 31 , and 33 . the bonding surfaces 31 and 33 are polished to an appropriate flatness . the bonding surfaces 31 , 33 , 37 , 39 of each of the sheets are then cleaned and prepared for either vacuum or chemical bonding . if chemical bonding is used , a preferred cleaning solution for chemical bonding the sheets is ammonium hydroxide . the sheets 32 , 38 , 34 are then stacked so that bonding surfaces 31 and 37 are in contact and bonding surfaces 39 and 33 are in contact to form an isolator core sheet 40 . the bonded sheets may be moderately heated to a temperature below the curie temperature of the faraday rotator material to enhance the bonding . after the sheets are bonded into a core sheet 40 , the sheet may be diced into a plurality of isolator cores 50 as shown in fig4 each of cores 50 comprised the sheet materials 32 , 34 , and 38 . thereafter , the isolator cores 50 can be processed according to techniques known in the art . it will be understood that the sheets of material 32 , 38 and 34 may be coated with antireflective coating , in which case , the outer layer of the antireflective coating on each sheet will comprise the bonding surface . because of refractive index difference between the materials that comprise the isolator core materials ( e . g ., 1 . 510 for polarcor ™ and 2 . 35 for bismuth iron garnet ), an antireflective ( ar ) coating in most cases must exist at the interface between the isolator components . thus , in practice , bonding is actually performed between an ar coated surface of one component ( either the rotator or beam splitter or rotator or polarizer ), between two ar coated surfaces wherein all adjoining surfaces have an ar coating , or between two surfaces where one surface has a full ( complete ) ar coating and the second surface has a sio 2 surface coating that does not by itself act to limit reflectance but rather assists in bonding . these sandwich structures can also be manufactured to produce multistage isolation by having multiple faraday rotator layers , with specific application to high powered lasers . without intending to limit the invention in any manner , the present invention will be more fully described by the following examples . this example demonstrates that polarcor ™ polarizing glass sheets available from corning , inc . can be bonded together and survive dicing without delamination of the sheets . two polarcor ™ glass sheets previously polished to less than 1 micron flatness are coated with ar coating [ sio 2 — zro 2 — sio 2 ] were pretreated with lithium metal by thermal evaporation under vacuum and heat treated at 200 ° c . for 24 hours . the sheets were cleaned with a detergent solution ( microclean ca0 5 ), rinsed in water and soaked in 10 volume % nitric acid solution for 1 hour . the acid - soaked samples were rinsed in water and then soaked in a 15 volume % ammonium hydroxide solution for 1 hour . the samples were rinsed again , and the bonding surfaces were maintained in a wet condition and bonded under about 10 pounds per square inch pressure and a bonding temperature of 75 ° c . for 24 hours . the bonded sheets were diced into 2 mm strips , and the sheets did not delaminate during the dicing operation . this example demonstrates that isolator cores comprising polarcor ™ glass sheets sandwiched together with a faraday rotator material sheet can be bonded together and diced into isolator cores without delamination . two polarcor ™ glass sheets previously polished to less than 1 micron flatness and ar coated were pretreated by coating with lithium metal by thermal evaporation under vacuum and heat treated at 200 ° c . for 24 hours . the lithium coated polarcor ™ sheets along with a flat , ar - coated bismuth iron garnet ( big , purchased from mgc ) sheet were cleaned with a detergent solution ( microclean ca05 ), rinsed in water and soaked in 10 volume % nitric acid solution for 1 hour . the acid - soaked samples were rinsed in water and then soaked in a 15 volume % ammonium hydroxide solution for 1 hour . the samples were rinsed again , and the bonding surfaces were maintained in a wet condition , stacked so that the polaror ™ sheets sandwiched the faraday rotator sheet , and bonded under about 10 pounds per square inch pressure and a bonding temperature of 115 ° c . for 24 hours . the bonded sheets were diced into 2 mm × 2 mm core structures of the type shown in fig4 and the sheets did not delaminate during the dicing operation . the present invention is directed to isolator structures and sealing or bond processes that result in a chemical bond or vacuum bond without the use of an adhesive , epoxy or an air gap between applicable surfaces . the seal or bond can be achieved at temperatures at or below 100 ° c ., thus making the process applicable for latched and unlatched garnets . as is known in the art , heating of garnet materials above their curie temperatures should be avoided because the properties of the material are destroyed by heating above the curie temperature . a seal or bond can be achieved for a multi - layered core structure where alternating layers of a polarizer and a faraday rotator are assembled for high power laser applications ( i . e ., multistage isolation with 2 , 3 , 4 , or more faraday rotators in series with a polarizer for each rotator . this sealing or bonding process of the present invention can be utilized for assembly of glass , crystalline , and anti - reflectance coated surfaces to each other . isolators that have components ( e . g ., polarizers , rotators , half wave plates ) independently mounted with air gaps require anti - reflectance ( ar ) coatings to prevent back reflection at each surface due to differences in refractive index between each material and air . similar differences exist for bonded interfaces due to the difference in refractive index between the two materials . thus , interfaces between such materials may require ar coatings . typical ar coatings include a base - layer material used primarily for adhesion ( example : sio 2 for ar coating of glass surfaces ), followed by a material which differs significantly in refractive index from the part being coated ( examples : zro 2 , al 2 o 3 , nb 2 o 3 , etc . ), and a sio 2 outer layer . in preferred embodiments , an outer layer including silicon such as sio 2 is preferred to facilitate bonding . in some embodiments , an anti - reflective coating is included on one of the bonding surfaces , and the other bonding surface , that forms a bond interface , includes a silicon - containing coating such as silica coating to facilitate bonding . differences in cte between the coatings and the coated material can result in a somewhat stressed ar coating . accordingly , those of skill in the art will appreciate that coating designs including a number of alternating layers should account for refractive index differences for two materials and differences in cte . it will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention . thus , it is intended that the present invention cover modifications and variations of this invention provided they come within the scope of the appended claims and their equivalents .