a method for depositing a film on a polymer substrate is disclosed . the method includes exposing a polymer substrate to a liquid comprising a first reactant to provide a plurality of reactive sites over the polymer substrate , wherein the first reactant comprises aluminum or boron ; and introducing a second reactant comprising silicon in a vapor form to said plurality of reactive sites that provide a catalytic growth of the film , wherein the growth of the film is self - limited in certain embodiments , the film can include silica , aluminum silicate , or borosilicate .