systems and methods are described for improved yield and line width performance for liquid polymers and other materials . a method for minimizing precipitation of developing reactant by lowering a sudden change in ph includes : developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid ; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in ph ; and then rinsing the polymer with a charge of another fluid . an apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes : a nozzle including : a developer manifold adapted to supply a developer fluid ; a plurality of developer fluid conduits coupled to the developer manifold ; a rinse manifold adapted to supply a rinse fluid ; and a plurality of rinse fluid conduits coupled to the developer manifold . the developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold . the systems and methods provide advantages including improve yield via reduced process - induced defect and partial counts , and improved critical dimension control capability .