a method of forming a thin film on a substrate to fabricate a microelectronic device , a microelectronic device comprising a thin film deposited according to the method , and a system comprising the microelectronic device . the thin film may include on of a low k thin film , a thin film comprising photoresist , and a sacrificial polymer . the method comprises dispersing a precursor preparation into a spray of charged droplets through subjecting the liquid precursor preparation to electrostatic forces ; directing the charged droplets to move toward the substrate ; and allowing the charged droplets to generate a beam of gas - phase ions as the charged droplets move toward the substrate . the method further includes directing the gas - phase ions to impinge upon the substrate to deposit the thin film thereon to yield a deposited thin film on the substrate .