printing plates having a photoresist layer thereon that can be exposed by a computer controller laser have improved sensitivity and do not require a photomask step . we have found photoresists that include a film forming polymer , an organo azide and a photosensitive dye that absorbs light at the frequency of the patterning laser and converts it to heat energy . the heat energy in turn elevates the temperature of the organo azide above its dissociation temperature , destroying the azide in areas exposed to the light source , and solubilizing those regions . a post pattern exposure flood exposure with ultraviolet light hardens the unexposed resist , improving its resistance to etch solvents .