methods and apparatuses for masking the edges of a substrate when performing direct or reverse gravure coating using a kiss - coat configuration , particularly useful for in - line coating of biaxially oriented polymeric films . the methods and apparatuses include a masking plate configured to prevent the edge of a portion of a substrate from contacting a gravure roll , the masking plate includes a top portion having a rockwell b hardness equal to or greater than 80 , and a thickness of between 0 . 03125 inches and 0 . 375 inches . this masking plate prevents build - up of coating on the edges of the substrate which otherwise can cause film orientation production instabilities such as film breaks , sticking to tenter clips , and / or edge trim recycling incompatibilities . the masking plate provides a masking method that is effective and durable , minimizing production downtime and maintenance .