disclosed are a method and apparatus with several embodiments that use low output uv energy to create hydroxyl radicals on photocatalytic semiconductor coated surfaces in order to produce hydroxyl radicals to structurally eradicate contaminants impacting those surfaces . low wattage uva black - light white and black - light blue plasma lamps are used to activate photocatalytic semiconductor coatings on solid and mesh surfaces constructed of fluropolymers , of aluminum , of stainless steel , and coatings on the outer lamp wall of the uva lamp itself . the embodiments show that sufficient uva energy is being transmitted through solid lamp wall , through the photocatalytic semiconductor coating on the outer lamp wall , and through multiple layers of coated fluropolymer , aluminum , and stainless steel mesh to create hydroxyl radicals on the surfaces of downstream layers . the current carrying foundation materials , to include electro - conductive polymer , can be voltage charged to attract pathogens with natural cell surface charges to the coated eradication surfaces . the method and apparatus may be used to create radicals on eradication surfaces to structurally dismantle and destroy contaminant particles , including lethal virus , bacteria , mycotoxin , spores , odor molecules , allergens , smoke particles , and industrial pollutants .