filter media for liquid purification , which can remove metal compounds or metal ions containing in polishing or washing liquids such as alkali , acid solution or ultra - pure water used for silicon wafers of semiconductors . removal of metals from various kind of liquid such as inorganic chemicals , organic solvent , or industrial waste water are also the subject of the present invention . the filter media made of melt - blown nonwoven substrate comprising of aethylene / norbornene copolymer represented by the following formula and / or a polycyclic norbornene polymer represented by the following formulae ,, as raw material , wherein said ethylene / norbornene copolymer and said polycyclic norbornene polymer have a glass transition temperature selected in a range from 80 to 180 ° c . and melt volume rate of 30 cm 3 / 10 min or more , and wherein said melt - blown nonwoven substrate is constituted of fibers having an average fiber diameter ranging from 1 to 30 μm is applied . on such melt - blown nonwoven substrate , ion - exchangeable or chelate group is introduced through graft polymerization of vinyl monomer . and norbornene unit is chosen from 1 to 99 mole %]