novel photoresist materials , which can be photolithographically processed in biocompatible conditions are presented in this invention . suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described . the processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins . the preferred resist materials are based on acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group .