new anti - reflective or fill compositions having improved flow properties are provided . the compositions comprise a styrene - allyl alcohol polymer and preferably at least one other polymer in addition to the styrene - allyl alcohol polymer . the inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process . the inventive compositions can also be applied to substrates to form anti - reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing .