an improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided . broadly , the methods comprise plasma enhanced chemical vapor depositing a polymer on the substrate surfaces . the pecvd processes comprise providing a quantity of a polymer generated by introducing monomer vapors into a plasma state followed by polymerization thereof , with assistance of plasma energy , onto the surface of a substrate . the most preferred starting monomers are phenylacetylene , 4 - ethynyltoluene , and 1 - ethynyl - 2 - fluorobenzene . the inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron features . the process provides a much faster deposition rate than conventional chemical vapor deposition methods , is environmentally friendly , and is economical .