page_title: Chalcogenide chemical vapour deposition
section_title: Sulfide based thin films
hierarchical_section_title: Chalcogenide chemical vapour deposition / Sulfide based thin films
caption_attribution_description: English: GeS CVD setup
context_page_description: Chalcogenide chemical vapour deposition is a proposed technology for depositing thin films of chalcogenides, i.e. materials derived from sulfides, selenides, and tellurides. Conventional CVD can be used to deposit films of most metals, many non-metallic elements as well as a large number of compounds including carbides, nitrides, oxides. CVD can be used to synthesize chalcogenide glasses.
context_section_description: The fabrication of chalcogenide thin films is a topic of research. For example, routes to germanium disulfide films could entail germanium chloride and hydrogen sulphide:
  GeCl₄ (g) +  2 H₂S(g)   →   GeS₂(s)  +  4 HCl (g)
  
  Alternatively via plasma enhanced CVD there is the reaction GeH₄/H₂S.
caption: Germanium sulfide CVD setup[5]
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