page_title: Ion plating
hierarchical_section_title: Ion plating
caption_attribution_description: Scope and content: The original finding aid described this as: Capture Date: 1/29/1979 Photographer: MARTIN BROWN Keywords: Larsen Scan
context_page_description: Ion plating is a physical vapor deposition process that is sometimes called ion assisted deposition or ion vapor deposition and is a version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film. It is important that the bombardment be continuous between the cleaning and the deposition portions of the process to maintain an atomically clean interface.
context_section_description: Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film. It is important that the bombardment be continuous between the cleaning and the deposition portions of the process to maintain an atomically clean interface.
caption: Ion plated fasteners
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