CMOS device having Schottky diode for latch-up prevention
BACKGROUND OF THE INVENTION 
     The present invention relates to a CMOS device, and more specifically to a CMOS device improved in withstanding latch-up. 
     In the structure of a CMOS, there are formed parasitic pnp and npn transistors which tend to interact and cause latch-up. 
     FIGS. 11 and 12 show one conventional CMOS device (U.S. Pat. No. 4,209,713, or Denshi-Tsushin-Gakkai-Ronbunshi, &#39;78/2 vol. J61-CN02). 
     An n-channel MOSFET (nMOS) 7 is formed in a p well 2 which is formed in a main surface of an n-type silicon substrate 1, and a p-channel MOSFET (pMOS) 13 is formed directly in the n substrate 1. The nMOS 7 is constituted by a pair of an n +  source region 3 and an n +  drain region 4 which are both formed in the p well 2, and a gate electrode 5 formed on a gate insulating layer (not shown). A well contact region 6 of the p +  type is formed to connect together the source region 3 of the nMOS 7 and the well region 2 which serves as a substrate region of the nMOS 7. The pMOS 13 is constituted by a pair of a p +  source region 8 and a p +  drain region 9 which are both formed directly in the n substrate 1, and a gate electrode 11 formed on a gate insulating layer (not shown). A substrate contact region 12 of the n +  type is formed to connect together the source region 8 of the pMOS 13 and the substrate 1 which serves as a substrate region of the pMOS 13. 
     The nMOS 7 and pMOS 13 are interconnected to form a CMOS inverter. The gate electrodes 5 and 11 of both devices 7 and 13 are connected together and connected to an input terminal 14. The drain regions 4 and 9 are connected together, and connected to an output terminal 15. A supply terminal 16 of a supply voltage Vdd is connected to the source region 8 of the pMOS 13, and a low potential terminal 17 of a potential Vss is connected to the source region 3 of the nMOS 7. 
     In the CMOS device having such a structure, there are formed parasitic pnp transistors Q 1  and Q 3 , and parasitic npn transistors Q 2  and Q 4 , as shown in FIGS. 11 and 12. These parasitic bipolar transistors Q 1  -Q 4  are interconnected, and form a pnpn thyristor structure. 
     In FIG. 12, Rn 1  is a base resistance of the transistor Q 1 , Rn 3  is a base resistance of the transistor Q 3 , and Rp is a base resistance of the transistor Q 4 . 
     When a positive surge voltage equal to or greater than the supply voltage Vdd enters through the output terminal 15, the CMOS device falls into latch-up in the following manner. This surge voltage causes a base current Ib 1  to flow between the base and emitter of the transistor Q 1 , and accordingly a collector current Ic 1  =Ib 1  ×Hfe 1  (where Hfe 1  is the current gain of the transistor Q 1 ) flows through the base resistance Rp into the low potential terminal 17. 
     When the voltage drop developed across the base resistance Rp by the collector current Ic 1  becomes equal to or greater than a base threshold voltage Vbth 4  (Ic 1  ×Rp≧0.6 V), then a base current Ib 4  flows into the transistor Q 4 , which accordingly draws in a collector current Ic 4  =Ib 4  ×Hfe 4  (where Hfe 4  is the current gain of the transistor Q 4 ) from the supply terminal 16 through the base resistance Rn 3  of the transistor Q 3 . 
     This collector current Ic 4  generates a voltage drop Ic 4  ×Rn 3  across the resistance Rn 3 . When this voltage drop becomes equal to or greater than a base threshold voltage Vbth 3  (approximately equal to 0.6 V) of the transistor Q 3 , then a current Ib 3  flows through the base of the transistor Q 3 , and the transistor Q 3  turns on. Accordingly, a collector current Ic 3  =Ib 3  ×Hfe 3  (where Hfe 3  is the current gain of the transistor Q 3 ) flows into the transistor Q 4  and its base resistance Rp. 
     In this way, both the pnp transistor Q 3  and the npn transistor Q 4  are turned on, and the pnpn thyristor structure formed by both transistors Q 3  and Q 4  is brought into the latch-up state, which persists until the power supply is cut off. 
     A negative surge voltage equal to or lower than the low potential Vss also triggers latch-up when it is applied to the output terminal 15. In this case, a base current Ib 2  is caused to flow in the npn transistor Q 2 , and accordingly, a collector current Ic 2  flows into the transistor Q 2  through the base resistance Rn 3  of the transistor Q 3 . This collector current Ic 2  develops a voltage drop Ic 2  ×Rn 3  across the resistance Rn 3 . When this voltage drop becomes equal to or greater than the base threshold voltage Vbth 3  of the transistor Q 3 , the transistor Q 3  is turned on, and the collector current Ic 3  flows through the base resistance Rp of the transistor Q 4 . Therefore, the transistor Q 4  is also turned on when Ic 3  ×Rp becomes equal to or greater than Vbth 4 . In this way, the thyristor operation causes latch-up again. 
     Latch-up is very serious. Latch-up disables the CMOS from functioning properly. Furthermore, an excessive current flowing between the supply terminal 16 and the low potential terminal 17 due to latch-up damages the device when the power dissipation exceeds the allowable limit. 
     Positive or negative surge voltages entering via the input terminal 14 too can trigger latch-up of the CMOS. In general, the CMOS is provided with a voltage clamping circuit (not shown in FIG. 11) composed of diffused resistor and diffused diode, for the purpose of protecting the gate insulating layer from dielectric breakdown. The diffused regions of the voltage clamping circuit form pn junctions with the substrate, and these pn junctions form parasitic bipolar transistors. These parasitic bipolar transistors act and cause latch-up when an excessive surge is applied to the input terminal 14. 
     There are various measures for preventing latch-up. Typical examples are as follows: 
     (i) Prevention of external noise: Latch-up can be prevented by limiting the entry of external current noise into the device by the use of resistors or capacitors connected to the input or output terminal. 
     (ii) Prevention of the thyristor&#39;s turning on: The condition required to turn on the thyristor structure formed by the parasitic transistors Q 3  and Q 4  is given by Hfe 3  ×Hfe 4  ≧1. Therefore, the thyristor is prevented from turning on by designing the CMOS structure such that Hfe 3  ×Hfe 4  becomes smaller than one. 
     (iii) Limitation of current: In this measure, the current through the thyristor is limited below a holding current which is the minimum current required to maintain the thyristor in the on state after it is triggered into the on state. 
     (iv) Reduction of base resistances: Reduction of the base resistances Rn 3  and Rp of the transistors Q 3  and Q 4  causes reduction of the voltage drops developed across the resistances. Therefore, it becomes more difficult for the transistors Q 3  and Q 4  to turn on. 
     Among these measures, (i) and (iii) impose restraints on the output current and operating speed of the CMOS inverter. Therefore, the measures (ii) and (iv) are employed widely. 
     One conventional example is shown in FIGS. 13 and 14. The CMOS structure shown in FIG. 13 is almost the same as the CMOS structure of FIG. 11, but different in the following points. In the structure of FIG. 13, the distance d between the pMOS 13, and the p well 2 is increased to a value equal to or greater than about 200 micrometers. Therefore, in each of the parasitic pnp transistors Q 1  and Q 3 , the base width is increased, and accordingly, the current gain Hfe is decreased. Furthermore, an n +  -type substrate contact region 18 is formed in the n substrate 1 between the pMOS 13 and the nMOS 7, and a p +  -type well contact region 19 is formed in the p well 2 so as to surround the nMOS 7. With the contact regions 18 and 19, the base resistances Rn 1 , Rn 3  and Rp of the parasitic transistors Q 1 , Q 3  and Q 4  are reduced. 
     In this device, the p well region 2 is spaced far from the drain region 9. Therefore, most of the holes which are injected from the drain region 9 into the n substrate 1 because of the positive surge voltage applied to the output terminal 15, recombine with electrons and disappear in the n substrate 1. It is only a fraction of the injected holes which can flow into the p well region 2 as the collector current Ic 1  of the transistor Q 1 , and flow out through the base resistance Rp into the low potential terminal 17. 
     Furthermore, the base resistance Rp is reduced by the p +   well contact region 19. As a result, the voltage drop Ic 1  ×Rp is small, and the transistor Q 4  hardly turns on. 
     If the collector current Ic 1  increases, and the transistor Q 4  is turned on because of an increase of the voltage drop Ic 1  ×Rp, the collector current Ic 4  is supplied mostly from the substrate contact region 18, and the collector current Ic 4  coming from the substrate contact region 12 adjacent the source region 8 is very small. 
     The base resistance Rn 3  is reduced by the path of the n +  substrate contract region 18. Therefore, the transistor Q 4  is hardly turned on even if the collector current Ic 4  flows therethrough. 
     With this structure which makes it difficult for the parasitic thyristor to turn on, the CMOS device of FIG. 13 is improved in withstanding latch-up. 
     However, the CMOS device of FIG. 13 is disadvantageous in that the chip size and the fabricating cost are increased by the necessity for increasing the distance d between the pMOS 13 and the p well 2 beyond 200 micrometers. 
     FIGS. 15 and 16 show another conventional CMOS device. The CMOS structure of FIG. 15 is the same as that of FIG. 13 except that the device of FIG. 15 is further provided with a p-type hole collector region 21 in the n substrate 1 between the pMOS 13 and the n +  substrate contact region 18. The hole collector region 21 is connected with the low potential terminal 17 of Vss, and therefore, serves as a collector of the pnp transistor Q 1 , as shown in FIG. 16. 
     When a positive surge equal to or greater than Vdd enters the device from the output terminal, the hole collector region 21 collects the holes injected from the drain region 9 of the pMOS 13 into the n substrate 1, and leads them to the low potential point of Vss. By so doing, the hole collector region 21 reduces the collector current Ic 1  of the transistor Q 1  flowing into the p well region 2 to a very low value. 
     In the CMOS structure of FIG. 15, the capability of withstanding latch-up is improved with the hole collector region 21 instead of increasing the distance d between the pMOS 13 and the p well 2, and hence without the necessity of increasing the chip size too much. 
     However, the CMOS structure of FIG. 15 requires not only the hole collector region 21, but also a metal lead connecting the hole collector region 21 to the low potential Vss, and a metal lead connecting the substrate contact region 18 to the supply voltage Vdd both of which must be formed on the top side of the semiconductor substrate 1. Therefore, the actual layout is considerably complicated, and reduction in chip size is not so easy. 
     Recently, there has been proposed a MOS device having a Schottky source-drain structure. This structure eliminates the possibility of injection of the minority carriers at least in principle, so that the device is more resistant to latch-up. However, this structure introduces an undesired offset voltage, and decreases the transconductance gm by increasing the source resistance. 
     SUMMARY OF THE INVENTION 
     It is an object of the present invention to provide a CMOS device which is improved in capability of withstanding latch-up with a relatively simple structure suitable for chip size reduction. 
     According to the present invention, a CMOS device comprises an n-type substrate region and a p-type substrate region which are both formed in a monolithic semiconductor substrate body, a p-type pair of source and drain regions formed in the n-type substrate region to form a p-channel MOSFET with a first insulated gate, n-type source and drain regions formed in the p-type substrate region to form an n-channel MOSFET with a second insulated gate, and a metal electrode joined with the n-type substrate region to form a Schottky barrier junction for collecting minority carriers in the n-type substrate region. The Schottky barrier junction is located between the p-type pair and the n-type pair. 
    
    
     BRIEF DESCRIPTION OF THE DRAWINGS 
     FIG. 1 is a vertical section showing a CMOS device of a first embodiment of the present invention. 
     FIG. 2 is a diagram of an equivalent circuit showing an arrangement of parasitic transistors formed in the device of FIG. 1. 
     FIG. 3 is a vertical section showing a CMOS device of a second embodiment of the present invention. 
     FIGS. 4A and 4B are vertical sections showing modifications of a Schottky junction structure of FIG. 1. 
     FIG. 5 is a vertical section showing a CMOS device of a third embodiment of the present invention. 
     FIG. 6 is a vertical section showing a CMOS device of a fourth embodiment of the present invention. 
     FIGS. 7A, 7B and 7C are vertical sections showing various modifications of the Schottky junction structure of the present invention. 
     FIG. 8A is a vertical section showing a main portion of a CMOS device of a fifth embodiment of the present invention. 
     FIG. 8B is a vertical section similar to FIG. 8A, but showing a modification. 
     FIG. 9 is a vertical section showing a portion of a CMOS device of a sixth embodiment. 
     FIGS. 10A and 10B are energy band diagrams for a Schottky barrier junction under different bias conditions. 
     FIG. 11 is a vertical section showing a first conventional CMOS device. 
     FIG. 12 is a diagram of an equivalent circuit for the conventional device of FIG. 11. 
     FIGS. 13 and 14 are a vertical section and an equivalent circuit diagram showing a second conventional CMOS device. 
     FIGS. 15 and 16 are a vertical section and an equivalent circuit diagram showing a third conventional CMOS device. 
    
    
     DETAILED DESCRIPTION OF THE INVENTION 
     A first embodiment of the present invention is shown in FIGS. 1 and 2. 
     The basic structure of the CMOS device of the first embodiment is the same as the conventional structure of FIG. 11, as shown in FIG. 1 by using the same reference numerals. The CMOS structure of the first embodiment is further provided with an n +  -type substrate contact region 18, a p +  -type well contact region 19, and a metal electrode 22. The substrate contact region 18 is formed in the n substrate 1 between the pMOS 13 and the nMOS 7 formed in the p well region 2, like the region 18 of the conventional device of FIG. 13. The well contact region 19 is formed in the p well 2 in such a manner as to surround the nMOS 7, like the region 19 of the conventional device of FIG. 13. 
     The metal electrode 22 is formed on the n +  -type substrate contact region 18. The area of the metal electrode 22 is greater than the area of the substrate contact region 18. The metal electrode 22 covers the substrate contact region 18, and a peripheral portion of the metal electrode 22 extends beyond the substrate contact region 18. The peripheral portion of the metal electrode 22 is joined with the n-type substrate 1, and a Schottky barrier junction 23 is formed around the substrate contact region 18 by contact between the metal electrode 22 and the n-type substrate 1. 
     In this embodiment, the metal electrode 22 is made of Aluminum which is capable of forming a Schottky junction with an n-type Si. Accordingly, A1 interconnection metal is used as the metal electrode 22, and the Schottky junction 23 is formed by an Al-nSi junction. 
     In this embodiment, the supply voltage Vdd is applied to the metal electrode 22. 
     A central portion of the metal electrode 22 is in ohmic contact with the highly doped n +  -type substrate contact region 18. 
     It is possible to form the Schottky diode 23 of this embodiment by using the contact hole opening step and the metallization step of the usual CMOS fabrication process without need for an additional step. At the contact hole opening step, a contact hole is opened in an SiO 2  layer (not shown) formed on the semiconductor surface, to expose the n +  substrate contact region 18 and the surrounding area. Then, the A1 interconnection layer is deposited and patterned in the usual manner at the metallization step. 
     The CMOS device of this first embodiment is operated as follows: 
     The supply voltage Vdd is applied to the metal electrode 22, and the supply voltage Vdd is further applied to the n substrate region 1 through the n +  substrate contact region 18. Therefore, the Schottky diode 23 is in the condition in which neither a forward bias nor a reverse bias is applied. 
     In general, a Schottky diode is in an equilibrium state when no external bias voltage is applied. In this state, positively ionized n-type impurity atoms are distributed in the n-type semiconductor side as positive space charges, and electrons are distributed in the metal side as negative surface charges. These charges produce an electric field across the interface pointing from the semiconductor side to the metal side, so that motion of electrons is prevented, and equilibrium is reached. 
     The barrier height φms of the Schottky junction is lower than that of a pn semiconductor-semiconductor junction. 
     FIGS. 10A and 10B show changes in energy levels when a reverse bias voltage and a forward bias voltage are applied to the Schottky junction. 
     When a reverse bias is applied, as shown in FIG. 10A, the barrier height is increased by an amount corresponding to the reverse bias voltage. Therefore, motion of electrons from the n-type semiconductor to the metal becomes less probable, and holes (minority carriers) in the n semiconductor flow out into the metal side. 
     When the Schottky junction is forward biased, the barrier height as viewed from the n semiconductor side toward the metal side is lowered as shown in FIG. 10B, and electrons cross the junction from the n semiconductor side to the metal side. However, holes are not injected from the metal to the n semiconductor because there are no holes in the metal side. 
     In the CMOS device of FIG. 1, when a positive surge voltage exceeding the supply voltage Vdd enters the device via the output terminal 15, holes are injected from the drain region 9 of the pMOS 13 into the n substrate region 1. However, the holes diffusing in the n substrate region 1 near the Schottky junction 23 are absorbed into the Schottky junction 23 whose barrier height is low and which has electrons distributed in the metal electrode 22 as the negative surface charges. This absorption causes a decrease in the collector current Ic 1  of the transistor Q 1  flowing into the p well region 2. 
     The function of the Schottky junction 23 is similar to that of the hole collector region 21 of the third conventional device shown in FIG. 15. However, the Schottky junction 23 and the n +  substrate contact region 18 are connected to the supply voltage Vdd via the common metal electrode 22, whereas, in the conventional device of FIG. 15, the hole collector region 21 is connected to the low potential Vss, and the substrate contact region 18 is connected to the supply voltage Vdd. Therefore, the structure of the first embodiment can simplify the layout and interconnections. 
     In the conventional device of FIG. 15, it is undesirable to connect the hole collector region 21 to the supply voltage Vdd because, when a negative surge voltage under Vss enters the device via the output terminal 15, a voltage drop developed near the n +  substrate contact region 18 causes the hole collector region 21 of the p-type to act as a source for injecting holes into the substrate 1, and accordingly the risk of latch-up is increased. 
     In contrast, the Schottky diode 23 is a majority carrier device in essence, and therefore there is no injection of holes into the n semiconductor substrate region 1. 
     When a negative surge voltage below Vss enters the device of the first embodiment via the output terminal 15, the npn transistor Q 2  may be turned on. However, the collector current Ic 2  of the transistor Q 2  is supplied from the n +  substrate contact region 18, and the collector current Ic 2  coming from the n +  substrate region 12 adjacent to the source region 8 is very low. Therefore, the pnp transistor Q 3  is restrained from turning on by decrease in the voltage drop near the source region 8, and the risk of latch-up is reduced. 
     If a greater negative surge voltage is applied, then the collector current Ic 2  of the transistor Q 2  increases, and the voltage drop near the n +  substrate contact region 18 increases, so that the Schottky junction 23 becomes forward-biased. However, the current flow in the Schottky diode is only by electrons (majority carriers), so that the forward-biased Schottky junction 23 acts as if it were an extension of the n +   substrate contact region 18. Therefore, the collector current Ic 2  is supplied in a larger amount from both the n +  substrate contact region 18 and the Schottky junction 23, and accordingly latch-up is prevented. 
     In this way, the Schottky junction 23 serves, on one hand, for collecting holes (minority carriers), and serves, on the other hand, as a source for supplying collector currents to the parasitic transistors Q 2  and Q 4 . The Schottky junction 23, therefore, is effective against both the positive and negative surges. 
     A second embodiment of the present invention is shown in FIG. 3. In the second embodiment, a depression is formed in the main surface of the n semiconductor substrate 1, and the depression is filled with a metal 24 to form a Schottky junction 23. The depression can be formed easily by RIE (Reactive Ion Etching). The metal 24 in the depression constitutes an inner portion of the metal electrode 22. 
     The metal electrode 22 of the second embodiment is not enlarged beyond the n +  substrate contact region 18, and the inner portion 24 passes through the n +  substrate region 18, as shown in FIG. 3. 
     The Schottky junction structure of the second embodiment makes it possible to increase the interface area of the Schottky junction 23 without increasing the chip size. The Schottky junction 23 of the second embodiment can more efficiently absorb holes injected into the n substrate 1, and accordingly prevent latch-up more efficiently. 
     FIGS. 4A and 4B show two different modifications of the Schottky junction structure of FIG. 1. In the structure of FIG. 4A, the Schottky junction 23 is formed only on one side of the n +  substrate contact region 18. The structure of FIG. 4B has two or more n +  substrate contact regions 18, and a single metal electrode 22 which is formed over all of the substrate contact regions 18 so that there are formed one or more Schottky junctions 23 bounded between two of the substrate contact regions 18. The Schottky junction structures of FIGS. 4A and 4B act in a similar manner as in the first embodiment. 
     A third embodiment of the present invention is shown in FIG. 5. In the third embodiment, the metal electrode 22 is spaced apart from the n +  substrate contact region 18, so that the Schottky junction 23 formed by the metal electrode 22 and the n substrate 1 is apart from the substrate contact region 18. The metal electrode 22 is connected to the low potential Vss, instead of the supply voltage Vdd. 
     The Schottky junction 23 of the third embodiment is reverse-biased by a voltage (Vdd-Vss), so that a depletion layer 23a extends into the n substrate region 1. Therefore, the Schottky junction 23 of this embodiment extracts holes from the n substrate region 1 efficiently, and improves the capability of withstanding latch-up. 
     A fourth embodiment of the present invention is shown in FIG. 6. In the fourth embodiment, the metal electrode 22 is formed astride the boundary between the n substrate 1 and the p well 2. A first half of the metal electrode 22 is formed on the n substrate 1, and joined with the n substrate 1 to form a Schottky junction 23 which adjoins the p well 2. A second half of the metal electrode 22 is formed on the p well, and put in contact with the p +  well contact region 19. The metal electrode 22 is separated from the n +  substrate contact region 18, and connected to the low potential Vss. 
     In the fourth embodiment, the pn junction between the p well 2 and the n substrate 1, and the Schottky junction 23 are both reverse-biased by the voltage (Vdd-Vss), so that a depletion layer 23a extends in the n substrate 1 over a wide area covering both the Schottky junction, and the pn junction. 
     Therefore, holes injected into the n substrate region 1 by the positive surge voltage applied to the output terminal 15 flow into the depletion layer 23a, and go out into the metal electrode 22. 
     When the transistor Q 2  is turned on by the negative surge voltage applied to the output terminal 15, its collector current Ic 2  is supplied from the n +  substrate contact region 18, and the Schottky junction 23 becomes forward-biased with an increase of the collector current Ic 2 . Therefore, the Schottky junction 23 supplies the collector current Ic 2 , and further reduces the risk of latch-up. 
     The Schottky junction 23 of the fourth embodiment can be easily formed merely by modifying the pattern of the metal lead connecting the p +  well contact region 19 to the low potential Vss so that the metal lead extends beyond the p well 2, and overlaps the n substrate region 1. 
     FIGS. 7A, 7B and 7C show various modifications of the Schottky junction structure of the present invention. 
     In the structure of FIG. 7A, a p +  guard ring 25 is formed in the n substrate 1, and the Schottky junction 23 is formed in the guard ring 25. The guard ring 25 around the Schottky junction 23 improves the withstand voltage of the Schottky junction 23. 
     The Schottky junction structure of FIG. 7B is similar to that of the second embodiment shown in FIG. 3 in that the metal electrode 22 has an inner portion 24 in a depression formed in the n substrate 1. However, the metal electrode of FIG. 7B is connected to the low potential Vss, and separated from the n +  substrate contact region 18 as in the third embodiment. In the structure of FIG. 7B, the area of the Schottky junction 23 can be increased without increasing the area of the chip. 
     The structure of FIG. 7C is a variation of trench isolation. A depression is formed between the p well 2 and the n substrate 1, and an inner portion 24 of the metal electrode 22 is formed by filling the depression with a metal. Thus, the side of the p well 2 is separated from the n substrate region 1 by the inner portion 24 of the metal electrode 22. The Schottky junction 23 of FIG. 7C extends from the top surface of the n substrate 1 to the deepest end of the inner portion 24. In the structure of FIG. 7C, the interface of the Schottky junction 23 is enlarged, as compared with the structure of FIG. 6. 
     A fifth embodiment of the present invention is shown in FIG. 8A. In this embodiment, the present invention is applied to a so-called n-well CMOS. As shown in FIG. 8A, an n-type well 32 is formed in the main surface of a p-type Si substrate 31. The nMOS 7 is formed in the p-type substrate 31, and the pMOS 13 is formed in the n well 32. The metal electrode 22 is formed on the n well 32, and the Schottky junction 23 is formed by the n well 32 and the metal electrode 22. The Schottky junction structure of FIG. 8A is similar to the structure of FIG. 4A. 
     FIG. 8B shows a modification of the structure of FIG. 8A. The Schottky junction structure of FIG. 8B is similar to the structure of FIG. 7C, except that the n-type substrate region of the pMOS 13 is in the form of the n well 32 and the p substrate region of the nMOS 7 is in the form of the p substrate 31. 
     The Schottky junctions 23 of FIGS. 8A and 8B can absorb holes injected into the n well 32 in the same manner as in the preceding embodiments. 
     FIG. 9 shows a sixth embodiment in which the present invention is applied to a so-called dual-well CMOS. As shown in FIG. 9, an epitaxial substrate 33 has an n well 32 and a p well 34 which are both formed on a p +  underlying layer. The nMOS 7 is formed in the p well 34, and the pMOS 13 is formed in the n well 32. The Schottky junction structure of FIG. 9 is similar to that of FIG. 8B. The device of FIG. 9 further has a p +  -type guard ring adjoining the metal electrode 22. 
     The Schottky junction structures of FIGS. 7C, 8B and 9 are compatible with a trench isolation technique employed in D-RAMs of the megabit class, and the fabrication of these structures is relatively easy. 
     The conventional trench isolation structure using an insulating material in a depression does have the function of preventing diffusion of injected minority carriers, but it does not have the function of extracting injected minority carriers. In contrast, the Schottky junction structures of FIGS. 7C, 8B and 9 are capable of extracting injected minority carriers, so that both isolation and latch-up prevention are achieved simultaneously. 
     The CMOS structures according to the present invention can prevent latch-up not only when an excessive surge voltage enters via the output terminal, but they can also prevent latch-up when an excessive surge voltage enters via the input terminal or the output terminal arranged in an open drain configuration. It is possible to prevent latch-up caused through the input terminal or the output terminal in the open drain configuration more efficiently by slightly modifying the structure of each embodiment mentioned above.