Broad visible spectral subwavelength polarizer with high extinction ratio using hyperbolic metamaterial
Wei Zhang, Xin Tan, Na Wu, Wenhao Li, Qingbin Jiao, and Shuo Yang
Wei Zhang, Xin Tan, Na Wu, Wenhao Li,* Qingbin Jiao, and Shuo Yang
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, No. 3888 Dong Nanhu Road, Changchun, Jilin, 130033, China
*Corresponding author: liwh@ciomp.ac.cn
W Zhang
X Tan
N Wu
W Li
Q Jiao
S Yang
Wei Zhang, Xin Tan, Na Wu, Wenhao Li, Qingbin Jiao, and Shuo Yang, "Broad visible spectral subwavelength polarizer with high extinction ratio using hyperbolic metamaterial," Opt. Express 27, 18399-18409 (2019)
Extinction ratios
Polarimetric imaging
Spatial frequency
Wire grid polarizers
Original Manuscript: April 8, 2019
A subwavelength polarizer with an extinction ratio greater than 50 dB in the visible region (exceeding 80 dB in the 500 to 800 nm wavelength region) is presented that uses hyperbolic metamaterial decorated on each side with a subwavelength grating. The approach is based on the spatial frequency filtering characteristics of the hyperbolic metamaterial with its alternating metal-dielectric nano-film, which enables squeezing of bulk plasmon polaritons to support transverse magnetic polarized light transmission in the high spatial wavevector modes while suppressing other polarization mode waves over the broad visible spectrum. The proposed method exhibits a more realizable fabrication process than that used for a subwavelength polarizer based on high-aspect-ratio grating for broad spectrum and high-extinction-ratio performance. The subwavelength polarizer in this work is potential for the high-sensitivity polarimetric imaging.
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Ahn, S. W.
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Baarstad, I.
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Chen, Y.
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Collins, R. T.
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Deng, X.
Deshpande, P.
Dolfi, D.
Doumuki, T.
Du, W.
Ekinci, Y.
Escuti, M.
Fang, N.
Fineschi, S.
Flammer, P. D.
Furtak, T. E.
Gaylord, T. K.
Gong, H.
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Grann, E. B.
Grisard, A.
Guo, L. J.
Han, Z.
Harrington, D.
Hollingsworth, R. E.
Huang, X.
Johnson, P. B.
Jones, J. C.
Kaspersen, P.
Kim, D.
Kim, J. S.
Kim, S. H.
Kong, W.
Lee, C.
Lee, H.
Lee, K. D.
Lee, S. H.
Lezec, H. J.
Li, T.
Li, X.
Liu, F.
Liu, K.
Liu, L.
Liu, Z.
Løke, T.
Luo, X.
Martino, A. D.
Matsumoto, S.
Mawet, D.
Meng, F.
Moharam, M. G.
Normandin, X.
Park, J. D.
Parrish, M.
Peltzer, J. J.
Pommet, D. A.
Riedi, J.
Sciortino, P.
Shao, J.
Shao, X.
Sigg, H.
Sim, E.
Snik, F.
Solak, H. H.
Sun, C.
Sun, D.
Tamada, H.
Tyo, J. S.
Walters, F.
Wang, C.
Wang, J. J.
Wang, R.
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ACS Appl. Mater. Interfaces (1)
J. Opt. Soc. Am. (1)
J. Opt. Soc. Am. A (1)
J. Phys. D Appl. Phys. (1)
Nano Lett. (1)
Nanoscale (1)
Fig. 1 Schematic of proposed subwavelength polarizer with high extinction ratio in the broadband visible region.
Fig. 2 (a) Schematic diagrams for the prospective processes of structure fabrication. (b) Cross-section of electric field intensity for the structure of lower grating incorporating HMM under the 365nm illumination in the process of fabricating the upper grating. The color bar is on logarithmic scale.
Fig. 3 Calculated real and imaginary parts of the longitudinal wavevector kz versus variant tangential wavevector kx in the proposed Ag/SiO2 multilayer-based hyperbolic metamaterial (HMM) at incident light wavelengths of 400 nm, 500 nm, 600 nm, 700 nm, 800 nm for (a) TE-polarized and (b) TM-polarized light. The inset in (a) shows the proposed HMM. The optical transmission function (OTF) distributions of the multilayer-based HMM structure on a logarithmic scale as a function of the normalized transverse wavevector kx/k0 and the free space wavelength λ0 are shown for (c) TE-polarized and (d) TM-polarized light illumination.
Fig. 4 Transmission amplitude ratio for the TM polarization and the TE polarization for the zeroth and ± 1st orders of the light diffracted from the upper grating with or without the HMM. The inset shows the structure of the upper grating when combined with the HMM on a glass substrate. The parameters are same as those used in Fig. 1.
Fig. 5 (a) Transmission efficiency of TM-polarized (red line) and TE-polarized (blue line) incident light and (b) extinction ratio as a function of incident wavelengths. The solid line represents the results for the designed structure; dashed lines show the results for the Al wire grid grating with period p = 170 nm and various values of groove depth h. (c) Intensity and phase distribution at the wavelengths of 532 nm and 632.8 nm under TM-polarized and TE-polarized light conditions. The scale bars represent 500 nm.
Fig. 6 (a) Calculated OTF distributions versus the normalized transverse wavevector kx/k0 and the thickness of the SiO2 layer in the multilayer structure. (b) OTF distribution for variant thickness of the Ag layer. When tuning the thickness, other parameters are kept unchanged. The illumination wavelength is 532nm. (c) Transmission efficiency of TM-polarized light and (e) extinction ratio of the proposed subwavelength polarizer as a function of the thickness of the SiO2 layer and the wavelength. (d)Transmission efficiency of TM-polarized light and (f) extinction ratio of the proposed subwavelength polarizer for variant thickness of the Ag layer. The magnitude of the extinction ratio is on the decibel scale.
Fig. 7 (a) Extinction ratio of the designed structure as a function of the number of pairs of SiO2/Ag layers and the wavelength. (b) Extinction ratio as a function of the grating period and wavelength. The magnitude of the extinction ratio is on the decibel scale.