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Second Chinese Plant Completed in Shanghai to Step up Production in China
September 27, 2006 - With a Size 3.5 Times Larger than the First Plant, the New Facility Is Expected to Contribute to the Increase of Items Produced by the Company's Chinese Plants. The New Plant Also Aims at Growing into a Central Technology and Design Facility.
The 2006 Masao Horiba Awards: Announcement of Prizewinners/Awards Ceremony to Be Held on October 17
August 22, 2006 - Awards to Encourage Research Outside Company in Analysis and Measurement Technology
Proposal of a New Thin-film Forming Technique Applicable to Materials for Next-generation Electronic Devices Successful Development of the Flashing Spray CVD Process
June 5, 2006 - Fusion of Technologies Developed by Doshisha University and Horiba Group
Joint Development by Keio University and HORIBA Makes Possible Preprocessing for Electron Microscopes in Only 10 Seconds
April 10, 2006 - HORIBA, Ltd. (Head Office: Kyoto; President Atsushi Horiba) and Keio University (led by Professor Kenichi Shimizu) have collaborated to develop the world's first device capable of preparing the surface of specimens for electron...
The First Non-American to Receive the Prize and Be Inducted into the Hall of Fame HORIBA's Founder, Masao Horiba Receives Analytical Chemistry Prize
March 14, 2006 - The Pittcon Heritage Award and Pittcon Hall of Fame
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