8:DyaK2MXmtFKktbc%3D]; Bibcode number [1995Sci...268.1466M] 10.1126/science.268.5216.1466View ArticleGoogle Scholar
- Ono S, Saito M, Asoh H: Electrochim. Acta. 2005, 51: 827. COI number [1:CAS:528:DC%2BD2MXhtFGhtrvJ] 10.1016/j.electacta.2005.05.058View ArticleGoogle Scholar
- Redon R, Vazquez-Olmos A, Mata-Zamora ME, Ordonez-Medrano A, Rivera-Torres F, Saniger JM: Rev. Adv. Mater. Sci.. 2006, 11: 79. Google Scholar
- Stura E, Bruzzese D, Valerio F, Grasso V, Perlo P, Nicolini C: Biosens. Bioel.. 2007, 23: 655. COI number [1:CAS:528:DC%2BD2sXhtlWksb%2FO] 10.1016/j.bios.2007.07.011View ArticleGoogle Scholar
- Thompson GE: Thin Solid Films. 1997, 297: 192. ; COI number [1:CAS:528:DyaK2sXktVGit7k%3D]; Bibcode number [1997TSF...297..192T] 10.1016/S0040-6090(96)09440-0View ArticleGoogle Scholar
- Liao CL, Chu CW, Fung KZ, Leu IC: J. Alloy Compd.. 2007, 441: L1. COI number [1:CAS:528:DC%2BD2sXmsFCitbY%3D] 10.1016/j.jallcom.2006.09.084View ArticleGoogle Scholar
- Li Y, Ling ZY, Chen SS, Wang JC: Nanotechnology. 2008, 19: 225604. Bibcode number [2008Nanot..19v5604L] Bibcode number [2008Nanot..19v5604L] 10.1088/0957-4484/19/22/225604View ArticleGoogle Scholar
- Chen W, Wu J-S, Xia X-H: ACS Nano. 2008, 2: 959. COI number [1:CAS:528:DC%2BD1cXksl2gurc%3D] 10.1021/nn700389jView ArticleGoogle Scholar
- Yang P, An M, Su C, Wang F: Electrochim. Acta. 2008, 54: 763. COI number [1:CAS:528:DC%2BD1cXht1GrurrJ] 10.1016/j.electacta.2008.06.064View ArticleGoogle Scholar
- Sui YC, Saniger JM: Mater. Lett.. 2001, 48: 127. COI number [1:CAS:528:DC%2BD3MXisVWhtb8%3D] 10.1016/S0167-577X(00)00292-5View ArticleGoogle Scholar
- Zhou J-H, He J-P, Zhao G-W, Zhang C-X, Zhao J-S, Hu H-P: Trans. Nonferrous Met. Soc. China. 2007, 17: 82. COI number [1:CAS:528:DC%2BD2sXksFKrtLo%3D] 10.1016/S1003-6326(07)60052-1View ArticleGoogle Scholar
- Tsuya N, Tokushima T, Shiraki M, Wakui Y, Saito Y, Nakamura H, Hayano S, Furugori A, Tanaka M: IEEE Trans. Magn.. 1986, 22: 1140. Bibcode number [1986ITM....22.1140T] Bibcode number [1986ITM....22.1140T] 10.1109/TMAG.1986.1064316View ArticleGoogle Scholar
- Bao X, Li F, Metzger RM: J. Appl. Phys.. 1996, 79: 4866. ; COI number [1:CAS:528:DyaK28XivVWisbg%3D]; Bibcode number [1996JAP....79.4866B] 10.1063/1.361635View ArticleGoogle Scholar
- Diggle JW, Downie TC, Goulding CW: Chem. Rev.. 1969, 69: 365. COI number [1:CAS:528:DyaF1MXks1entbY%3D] 10.1021/cr60259a005View ArticleGoogle Scholar
- Martin CR: Chem. Mater.. 1996, 8: 1739. COI number [1:CAS:528:DyaK28XkslKqu7c%3D] 10.1021/cm960166sView ArticleGoogle Scholar
- Lohrengel M: Mater. Sci. Eng. Rep.. 1993, 11: 243. 10.1016/0927-796X(93)90005-NView ArticleGoogle Scholar
- Li F, Zhang L, Metzger RM: Chem. Mater.. 1998, 10: 2470. COI number [1:CAS:528:DyaK1cXltVGmt78%3D] 10.1021/cm980163aView ArticleGoogle Scholar
- Nakao M, Oku S, Tamamura T, Yasui K, Masuda H: Jpn J. Appl. Phys.. 1999, 38: 1052. ; COI number [1:CAS:528:DyaK1MXitFKmu7k%3D]; Bibcode number [1999JaJAP..38.1052N] 10.1143/JJAP.38.1052View ArticleGoogle Scholar
- Li A-P, Müller F, Birner A, Nielsch K, Gösele U: Adv. Mater.. 1999, 11: 483. COI number [1:CAS:528:DyaK1MXjtFejsbg%3D] 10.1002/(SICI)1521-4095(199904)11:6<483::AID-ADMA483>3.0.CO;2-IView ArticleGoogle Scholar
- Müller F, Birner A, Schilling J, Li AP, Nielsch K, Gösele U, Lehmann V: Microsyst. Technol.. 2002, 8: 7. 10.1007/s00542-002-0047-3View ArticleGoogle Scholar
- Sauer G, Brehm G, Schneider S, Nielsch K, Wehrspohn RB, Choi J, Hofmeister H, Gösele U: J. Appl. Phys.. 2002, 91: 3243. ; COI number [1:CAS:528:DC%2BD38Xhs1agsr4%3D]; Bibcode number [2002JAP....91.3243S] 10.1063/1.1435830View ArticleGoogle Scholar
- Bocchetta P, Sunseri C, Chiavarotti G, Di Quarto F: Electrochim. Acta. 2003, 48: 3175. COI number [1:CAS:528:DC%2BD3sXmsVSnt7g%3D] 10.1016/S0013-4686(03)00348-7View ArticleGoogle Scholar
- Mozalev A, Magaino S, Imai H: Electrochim. Acta. 2001, 46: 2825. COI number [1:CAS:528:DC%2BD3MXjvVOqs78%3D] 10.1016/S0013-4686(01)00497-2View ArticleGoogle Scholar
- Li F, Metzger RM: J. Appl. Phys.. 1997, 81: 3806. ; COI number [1:CAS:528:DyaK2sXivVCitLw%3D]; Bib