  Single phase nano and micro crystalline silicon films deposited using SiF4/H2plasma at different H2 dilution levels were studied at initial and terminalstages of film growth with spectroscopic ellipsometry (SE), Raman scattering(RS) and atomic force microscopy (AFM). The analysis of data obtained from SEelucidates the microstructural evolution with film growth in terms of thechanges in crystallite sizes and their volume fractions, crystalliteconglomeration and film morphology. The effect of H2 dilution on filmmicrostructure and morphology, and the corroborative findings from AFM studiesare discussed. Our SE results evince two distinct mean sizes of crystallites inthe material after a certain stage of film growth. The analysis of Ramanscattering data for such films has been done using a bimodal size distributionof crystallite grains, which yields more accurate and physically rationalmicrostructural picture of the material.
Single phase nano and micro crystalline silicon films deposited using SiF4/H2 plasma at different H2 dilution levels were studied at initial and terminal stages of film growth with spectroscopic ellipsometry (SE), Raman scattering (RS) and atomic force microscopy (AFM). The analysis of data obtained from SE elucidates the microstructural evolution with film growth in terms of the changes in crystallite sizes and their volume fractions, crystallite conglomeration and film morphology.