1. A method for performing design layout, comprising: receiving an initial design layout of an electrical component, the initial design layout comprising a first pattern for forming a first set of one or more polygons and associated with a mandrel pattern process that utilizes a first pattern mask and a second pattern for forming a second set of one or more polygons and associated with a passive fill pattern process that utilizes a second pattern mask different than the first pattern mask; generating an initial cut pattern for the initial design layout based upon the first pattern and the second pattern; responsive to identifying a design rule violation associated with the initial cut pattern, modifying the initial design layout to generate a modified initial design layout, comprising applying a passive pattern addition to a first polygon of the second set; generating an updated cut pattern based upon the modified initial design layout; and applying the updated cut pattern to the modified initial design layout to generate a second design layout, at least some of the method implemented at least in part via a processing unit.