1. A method comprising: receiving a target pattern that is defined by a main pattern, a first cut pattern associated with a first mask, and a second cut pattern associated with a second mask, the first mask being different than the second mask; with a computing system, checking the target pattern for compliance with a first constraint associated with the first cut pattern; with the computing system, checking the target pattern for compliance with a second constraint associated with the second cut pattern; with the computing system, modifying the target pattern to create a modified target pattern in response to determining that a violation of either the first constraint or the second constraint is found during the checking; and fabricating, using the first mask and the second mask, an integrated circuit associated with the modified target pattern.