1. A method for localization and resolvability of an integrated circuit comprising: selecting one or more electrical stimuli to be applied to a device under test such that the electrical stimuli are chosen to provide a baseline image and a distinguishing image effect as a result of the chosen stimuli when applied to the device under test; applying the one or more electrical stimuli to the device under test; measuring emissions from the device under test to provide a measurement data set from the one or more electrical stimuli using one or more measurement tools for collecting the baseline image and the distinguishing image effect, said measuring comprising dividing a field of view in a photon emission image into regions of interest; and analyzing the measurement data set using a processor to localize and evaluate circuit structures by comparing the baseline image and the distinguishing image effect, comprising calculating figure of merit for each region of interest that represents a degree of switching activity in the respective region of interest, wherein analyzing the measurement data set repeats selecting one or more electrical stimuli, applying the one or more electrical stimuli to the device under test, and measuring emissions from the device under test on a finer grained image.