1. A method for fracturing or mask data preparation or proximity effect correction for character projection (CP) charged particle beam lithography comprising: inputting a set of patterns to be formed on a surface; inputting a set of available character projection (CP) characters on a stencil, the set comprising one or more curvilinear characters; determining a series of two or more shots of one or more curvilinear CP characters in the set of available CP characters, wherein the series of shots can form a continuous track on the surface, the track comprising a portion of a pattern in the set of patterns; and outputting the series of shots.