1. A method to facilitate pattern recognition between a first pattern and a second pattern, comprising the steps of: applying to the first pattern a substantially smooth deformation field having deformation coefficients to deform the first pattern and form a deformation component of the first pattern; aggregating the first pattern and the deformation component of the first pattern to define a first deformed pattern; and determining a minimum distance between the first deformed pattern and the second pattern relative to the deformation coefficients for the first pattern.