1. A mask pattern for imaging a marker structure on a substrate with a lithographic apparatus, the marker structure being configured to indicate a position, the mask pattern comprising a plurality of constituent parts to define the marker structure, wherein each of the constituent parts includes a plurality of segments arranged in a direction substantially perpendicular to a scanning direction of the lithographic projection, and wherein the segments of the constituent parts have substantially the same shape, and wherein each segment has substantially the same size as a device feature to be imaged onto the substrate.