1. A method for evaluating a mask, the method comprises the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition windows such that the multiple CD measurements windows do not overlap the multiple pattern recognition windows; wherein each CD measurement target window and an associated pattern recognition window are positioned within a measurement area that is scan-able without introducing a substantial mechanical movement; performing multiple critical dimension measurements of multiple patterns of an object being manufactured by exposing the mask to radiation; wherein the performing comprises using at least one CD measurement target window and at least one pattern recognition window; and evaluating the mask