1. A pattern matching method for use in manufacturing a semiconductor memory device, the method comprising: extracting a scanning electron microscope (SEM) image and a graphic data system (GDS) image to perform pattern matching; performing a two-dimensional Fourier transform (FFT) for the extracted GDS image and analyzing a low spatial frequency; and limiting an X/Y range for pattern matching when the analyzed low spatial frequency is compared to a predetermined threshold value and is smaller than the threshold value, and then performing the pattern matching between the extracted SEM image and the GDS image.