1. A computer-implemented method for determining a position of inspection data in design data space, comprising: aligning data acquired by an inspection system for alignment sites on a wafer with data for predetermined alignment sites; determining positions of the alignment sites on the wafer in design data space based on positions of the predetermined alignment sites in the design data space; and determining a position of inspection data acquired for the wafer by the inspection system in the design data space based on the positions of the alignment sites on the wafer in the design data space.