1. An exposure apparatus for forming a desired pattern by exposing a sensitive material coated on a substrate, comprising: a first optical system for transferring a first pattern by exposing the sensitive material; a second optical system for transferring a second pattern by exposing the sensitive material, the desired pattern being expressed as a synthesized pattern consisting of the first and second pattern; and a controller for adjusting an exposure position of the second pattern, based on a latent image of the first pattern formed in the sensitive material.