1. An assembly for inspecting wafers or other flat objects, each of said objects having an object surface, the assembly comprising an object carrier for receiving one of said objects; a camera assembly with a camera having a plurality of detector elements for taking an image of at least a portion of said object surface during an exposure time; a driving assembly for generating a continuous relative movement without interruption between said camera assembly and said object wherein said relative movement causes a movement blur of said image during said exposure time; an illumination assembly for continuously illuminating said object, means controlling said illuminance at a constant value, a shutter for limiting said exposure time, means for performing an analysis of said image are provided, said means defining a movement blur which is acceptable for said analysis of said image; and wherein said exposure time is smaller than a time causing said acceptable movement blur.