1. A method for processing image data in a lithography manufacturing process, comprising: providing a parallel imaging writer system, wherein the parallel imaging writer system includes a plurality of multiple charged-particle beam (MCB) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate; processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate; identifying one or more objects in an area of the substrate to be imaged by corresponding MCB imaging units; and performing multiple exposures to image the one or more objects in the area of the substrate by controlling the plurality of MCB imaging units to write the plurality of partitioned mask data patterns in parallel, wherein performing multiple exposures to image the one or more objects further comprises: selectively exposing a first set of pixel locations using a first dose having a first electron energy level; and selectively exposing a second set of pixel locations using a second dose having a second electron energy level wherein the first set of pixel locations are exposed in a first scan direction; the second set of pixel locations are exposed in a second scan direction; wherein the first scan direction is different from the second scan direction; and wherein the first electron energy level is different from the second electron energy level.