1. A method comprising: fabricating an image sensor up to, but not including, a first metallization layer; fabricating a micro-lens on a pre-metal dielectric layer; depositing a metal layer of a reflective material on the micro-lens and pre-metal dielectric layer; covering the metal layer with photoresist; patterning the photoresist to remove the photoresist from all areas except the surface of the micro-lens; etching exposed metal layer away; removing remaining photoresist; and covering the micro-mirror with a layer of dielectric material.