1. A semiconductor circuit pattern measuring apparatus comprising: a receiver which receives a semiconductor circuit pattern image transmitted from a photographic device; a multiple resolution image generating unit which applies a plurality of noise removing filters to the semiconductor circuit pattern image received by the receiver and generate a multiple resolution image; a multiple resolution differential image generating unit which generates a multiple resolution differential image from a difference of images between hierarchies of the multiple resolution image; and a contour extracting unit which extracts a contour of the semiconductor circuit pattern based on an intensity signal of the semiconductor circuit pattern image, wherein the contour extracting unit calculates an intensity signal level upon extracting a contour of the semiconductor circuit pattern from the multiple resolution image by using an image signal of the multiple resolution differential image, and extracts a contour of the semiconductor circuit pattern based on the calculated intensity signal level.