1. A method of fabricating a CMOS imager on an integrated circuit with non-volatile memory comprising: fabricating an array of non-volatile memory cells; fabricating a light blocking and patterned electrically conductive layer over the array of non-volatile memory cells such that the light blocking and patterned electrically conductive layer blocks light from the array of non-volatile memory cells and provides electrical interconnects on the integrated circuit; fabricating the CMOS imager for defining an image in response to received light; and fabricating a frame memory for storing the image from the CMOS imager.