1. A method of fabricating a CMOS imager on an integrated circuit with non-volatile memory comprising: fabricating an array of non-volatile memory cells; fabricating a patterned electrically conductive layer over the array of non-volatile memory cells to provide electrical interconnects on the integrated circuit; fabricating a light blocking layer over the array of non-volatile memory cells to block light from the array of non-volatile memory cells; and fabricating the CMOS imager for defining an image in response to received light.