1. A method for performing a photolithography process, the method comprising: providing a reticle on a projection apparatus, the reticle having a test pattern defined thereon, the test pattern including a plurality of one-dimensional structures and a plurality of two-dimensional structures, the test pattern having at least one two-dimensional structure that includes a dense region, an isolated region, and a linear region; transferring the test pattern defined on the reticle to at least one area on a wafer; and focusing the projection apparatus on the test pattern transferred on the wafer during a photolithography process for process monitoring.