1. An apparatus for creating an imaging recipe to observe, by using a scanning electron microscope, a semiconductor pattern formed on a sample, the apparatus comprising: a CAD data file within which is input and stored CAD data that contains layout information of the pattern formed on the sample, the CAD data being in the form of segment information represented by X and Y coordinates of apexes of the pattern and layer information; a CAD image creation unit which creates a CAD image by converting the stored CAD data within the CAD data file into an image format; and an imaging recipe creation device which creates the imaging recipe by using the CAD image created by the CAD image creation unit.