1. A pattern inspection apparatus comprising: an optical image acquisition unit including an illumination optical system, a table, a magnifying optical system, and a sensor, and configured to acquire a plurality of optical images regarding a plurality of dies of a target object to be inspected on which the plurality of dies having a same pattern formed therein is arranged; a sub-optical image division unit configured by a circuit or a computer, to divide an optical image of the plurality of optical images regarding a die of the plurality of dies positioned in a non-resolved pattern region into a plurality of sub-optical images using non-resolved pattern region information for recognizing the non-resolved pattern region in which a non-resolved pattern that is not resolved is formed; a first comparison unit configured by a circuit or the computer, to compare the plurality of sub-optical images divided from the optical image of the same die regarding the non-resolved pattern region pixel by pixel; and a second comparison unit configured by a circuit or the computer, to compare optical images of the plurality of optical images regarding different dies of the plurality of dies pixel by pixel.