1. A method for determining adjusted parameters for an interconnect simulation; the method comprising: determining an interconnect object in a layout of an integrated circuit design to be created with a manufacturing process; determining a generated contour object using a contour generation of the interconnect object based on processing variation factors for the manufacturing process; and determining a plurality of segments in the generated contour object based on processing variation factors simulated in the generated contour object; and outputting an adjusted width and an adjusted length for each of the plurality of segments of the generated contour object.