1. A method of lithography by radiation of at least one pattern to be irradiated on a resined support comprising: generating, using a computer processor, a chosen point spread function for said radiation, and applying, using the computer processor, a chosen deconvolution procedure to said pattern to be irradiated by said point spread function, wherein said point spread function is chosen so as to model only the effects of forward scattering of said radiation and said deconvolution procedure is chosen from among the procedures modeling the interactions of said radiation with the resined support by a joint probability distribution of said interactions, wherein the joint probability distribution of said interactions is associated with a maximum likelihood of each source point of said radiation for all the image points of the pattern to be irradiated as part of the interactions.