1. A pattern measuring device comprising an arithmetic processing unit configured to measure a pattern formed on a sample on the basis of an image obtained with a charged particle beam device, wherein: the arithmetic processing unit, on the basis of signals obtained with the charged particle beam device, acquires or generates image data or contour line data on a plurality of circuit patterns created under different manufacturing conditions of a manufacturing apparatus, and generates reference data to be used for measurement of a circuit pattern from the image data or the contour line data.