1. A method for correcting a layout with a pitch change section, comprising: preparing a pattern layout disposed to cause line-and-space type first patterns disposed at a first pitch and line-and-space type second patterns disposed at a second pitch to be connected respectively in a pitch change section; obtaining a profile distribution data of a pattern image by performing a pattern transfer simulation on the pattern layout by using a computer; extracting the profile distribution of the pattern image for the first pattern at any one measuring point within the pitch change section and another reference point outside of the pitch change section from the profile distribution data of the pattern image by using a computer; extracting a difference between the profile distribution at the measuring point and the profile distribution at the reference point; modifying the pattern layout by adding and reducing a line width of a space part of the first pattern within the pitch change section to compensate the difference between the profile distributions; extracting the profile distribution of the pattern image for the first pattern part in which the line width is changed by performing a second pattern transfer simulation on the modified pattern layout by using a computer; and determining whether an additional line-width correction of the first pattern part is performed or not by confirming whether the profile distribution of the pattern image for the extracted first pattern part exists within an allowable range.