1. One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising: determining predicted print errors for two or more via-type features based on a predicted guiding pattern for the two or more via-type features, a target guiding pattern for the two or more via-type features, and correlation information between a plurality of guiding pattern parameters and location and size parameters for the two or more via-type features, wherein the predicted guiding pattern is derived based on an initial mask pattern for photomask fabrication and the correlation information comprises a template error enhancement factor (TEEF); and adjusting the initial mask pattern to generate a new mask pattern based on the predicted print errors for the two or more via-type features and the correlation information.