1. A computer-implemented method for binning defects detected on a wafer, comprising: using a computer to perform the following steps of: comparing portions of design data proximate positions of the defects in design data space, wherein dimensions of the portions are determined based, at least in part, on positions of the defects reported by an inspection system used to detect the defects, coordinate inaccuracy of the inspection system, one or more attributes of the design data, defect size, defect size error of the inspection system, or some combination thereof; determining if the design data in the portions is at least similar based on results of said comparing; binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar; and storing results of said binning in a storage medium.