1. A pattern specification method for specifying a drawn microscopic pattern, comprising the steps of: creating a first pattern in which process shift information is reflected on a pattern expressed by design data; enlarging the drawn pattern; performing pattern matching between the first pattern which corresponds to the pattern to-be-specified or a pattern which include the first pattern and patterns surrounding the first pattern and the enlarged pattern or an enlarged pattern which include the enlarged pattern and enlarged patterns surrounding the enlarged pattern; and outputting an enlarged pattern which matches or most matches in the pattern matching.