1. An exposure apparatus configured to expose an image of a pattern of an original onto each of a plurality of shots as a plurality of transfer areas on a substrate, said exposure apparatus comprising: a stage configured to support and drive the substrate; a detector configured to detect an alignment mark provided to each of a plurality of sample shots allocated to the plurality of shots; and a controller configured to calculate a position of the alignment mark detected by the detector, to approximate a deformation of the substrate by using an approximation equation, to calculate a correction amount of each of the plurality of shots, and to control driving of the stage in exposing each shot based on a correction amount that is calculated, the approximation equation being defined as a sum of a first term representative of a deformation of an entire substrate, and at least one of a second term representative of a distortion of a shot arrangement and a third term representative of a shot shape.