1. An integrated circuit (IC) method comprising: providing, to a computer, an IC design layout including a pattern, the pattern including a first feature and a second feature; determining that the first feature has a first characteristic and that the second feature has a second characteristic; assigning, based on the determination, a first target point within the first feature and at a first distance away from a segment of the first feature and a second target point directly on a segment of the second feature; producing based on the assigned first and second target points, a first simulated contour of the pattern; reassigning, based on the first simulated contour of the pattern, the first target point at a second distance away from the segment of the first feature and the second target point directly on the segment of the second feature; producing, based on the first and second reassigned target points, a second simulated contour of the pattern; and after producing the second simulated contour of the pattern, producing a modified IC design layout.