1. A drawing apparatus which performs drawing on a substrate with a charged particle beam based on drawing data generated from pattern data representing a circuit pattern to be drawn on the substrate, and mark data representing a mark to be drawn on the substrate, the apparatus comprising: an obtaining unit configured to obtain information associated with a positioning accuracy of the charged particle beam relative to the substrate; a determination unit configured to determine a drawing region for the mark based on the obtained information; and a generation unit configured to generate the drawing data by combining the pattern data and the mark data such that the mark is drawn in the determined drawing region.