1. A selective high resolution imaging method for a charged particle beam apparatus, comprising: acquiring and displaying a sample area image of a sample at a first resolution on a display; scanning at least one exact region of interest in the sample area image defined by an arbitrary outline positioned on the sample area image, including receiving the arbitrary outline corresponding to the at least one exact region of interest in the sample area and receiving a second arbitrary outline corresponding to a second exact region of interest positioned on the sample area image, mapping the arbitrary outline to a coordinate system of the sample area impage, generating a raster pattern for directing a beam in response to the arbitrary outline, and rastering the beam at a position of the sample corresponding to the arbitrary outline and within an area defined by the arbitrary outline; acquiring an image of the at least one exact region of interest at a second resolution greater than the first resolution; overlaying the image of the at least one exact region of interest at the second resolution, over the arbitrary outline positioned on the sample area image; sectioning the sample to expose a new sample surface after acquiring and displaying the image of the at least one exact region of interest; scanning the at least one exact region of interest of the new sample surface, acquiring and displaying another image of the at least one exact region of interest of the new sample surface at a second resolution greater than the first resolution, wherein a sequence of sectioning, scanning, acquiring and displaying is executed iteratively until a request for a new sample area image at a first resolution is received.