1. A method for pre-coloring IC layout data for a multiple patterning lithography process, comprising: generating a graphical IC layout file using a computing device, wherein the graphical IC layout comprises a plurality of IC shapes within SRAM data lines or oxide definition layers of an SRAM sense amplifier; pre-coloring selective IC shapes, using the computing device, to indicate that the pre-colored IC shapes are to be formed on a same mask of a multiple mask set used for the multiple patterning lithography process; and operating a decomposition algorithm that assigns two or more different colors to uncolored IC shapes, to indicate that different colored IC shapes are to be formed on different masks of the multiple mask set, without changing the pre-colored colors of the pre-colored IC shapes, using the computing device.