1. An exposure apparatus for performing a scan exposure for each shot region on a substrate, the exposure apparatus comprising: a control unit configured to: calculate a target exposure amount distribution within a target shot region by performing function approximation using the target exposure amount at a position in the target shot region and a target exposure amount at a position in an adjacent shot region adjacent to the target shot region; and perform a scan exposure for the target shot region while controlling an exposure amount to obtain the calculated target exposure amount distribution as an exposure amount distribution within the target shot region.