1. A stencil mask for producing a desired image shape on a surface using particle beam lithography comprising: an aperture area comprising a plurality of open areas; and a shield area comprising an interstitial area between said plurality of open areas, wherein the union of the open areas and the shield area is approximately the desired image shape, and wherein the plurality of open areas, when exposed to a particle beam, is capable of projecting with one exposure shot the approximate desired image onto the surface, and wherein no more than three shield areas meet at any one apex of said plurality of open areas.