1. A simultaneous projection feature analysis apparatus comprising: first multiplying means for optically multiplying an input image to form a plurality of optical pattern images of a substantially identical shape, said first multiplying means comprising a first projection lens and first lens array; different types of means for detecting different types of one-dimensional projection intensity distributions in a plurality of directions from the plurality of optical pattern images; a vector display for causing the different types of one-dimensional projection intensity distributions to correspond to a vector and displaying predetermined optical pattern images at positions corresponding to magnitudes of vector components of the vector; different types of reference masks having reference patterns to be matched with the predetermined optical pattern images; second multiplying means for multiplying the predetermined optical pattern image displayed on the vector display to form a plurality of optical pattern images of a substantially identical shape near said different types of reference masks, said second multiplying means comprising a second projection lens and second lens array; and photodetecting means for detecting lights derived from matching between the optical pattern images formed by said second multiplying means and the reference patterns through said different types of reference masks.