1. A method for designing a mask set, comprising: arranging an imprint-alignment mark in a region other than a chip region in an imprint shot formed in a template, the imprint-alignment mark being used for alignment during an imprint; setting a shape of the imprint shot based on an arrangement position of the imprint-alignment mark; and arranging another pattern in a region where the region is other than the chip region in the imprint shot and the imprint-alignment mark is not arranged, the other pattern being used in a process other than the imprint.