1. An apparatus comprising: a photon emitter configured to emit photons onto a surface of an article; a photon detector configured to receive photons scattered from surface features of the article; a mapping means configured to generate a map of surface features of the article and locations associated therewith, wherein the map generation is based on information received from the photon detector, and wherein the map is generated as the article moves through a production line; subsequent to the map generation, reflective surfaces configured to direct photons from the photon emitter onto specific location of the surface of the article based on the map and further based on selection of the specific location thereof; and a processor configured to further analyze features at the specific location of the map based on reflected photons scattered from the article and captured by the photon detector in response to the reflective surfaces directing photons from the photon emitter onto specific location of the surface, wherein the further analysis occurs as the article moves through the production line.