1. An exposure apparatus for sequentially performing exposure in each of a plurality of underlying shot regions formed on a substrate via a projection optical system that projects a reticle pattern onto the substrate, the apparatus comprising: a controller configured to control the exposure so as to perform one-shot exposure that exposes one shot region without dividing the one shot region and divided exposure that divides the one shot region into a plurality of partial regions and exposes each of the partial regions separately, wherein the controller is configured to determine, for each of the plurality of underlying shot regions, whether to perform the one-shot exposure or the divided exposure, based on information of respective shapes in a plane perpendicular to an optical axis of the projection optical system, of the plurality of underlying shot regions, and in a case where the divided exposure is determined to be performed, determine shapes of the plurality of partial regions in the one shot region in which the divided exposure is to be performed, and control the exposure so as to perform the divided exposure in each of the partial regions based on the determined shape of each partial region.