1. A method of performing optical proximity correction on a target geometry to determine a reticle geometry of a patterning tool, the method comprising: shifting at least one evaluation point of a plurality of pre-defined evaluation points positioned on a target geometry to an associated point on a predicted image that is predicted to be generated in an optical proximity correction simulation of the target geometry; and performing an optical proximity correction operation for determining a reticle geometry for a patterning tool, the associated point on the predicted image being used as an evaluation point of the optical proximity correction operation.