1. A method for reference image contour generation, comprising: generating, by a processor in response to instructions stored on a non-transitory computer readable medium, a scanned image contour pattern, wherein generating the scanned image contour pattern comprises: generating a mask pattern based on design target information; generating a reference image based on a simulation of photolithographic effects on the mask pattern; generating a reference image contour pattern based on edge detection in the reference image; and generating the scanned image contour pattern as a function of the reference image contour pattern and a scanned image of an integrated circuit by: dividing the scanned image contour pattern and the reference image contour pattern into corresponding sectors; and comparing the scanned image contour pattern to the reference image contour pattern within each sector.