1. A method for performing regional phase unwrapping with pattern-assisted correction, comprising: acquiring a wrapped phase map of an interferogram, wherein an intensity map of the interferogram corresponds to a modulated representation of a wafer surface; applying a phase unwrapping procedure to the wrapped phase map to generate an unwrapped phase map, wherein the unwrapped phase map includes one or more phase discontinuities associated with phase unwrapping errors; defining one or more patterns in the unwrapped phase map, wherein the one or more patterns comprise two or more structures, wherein a portion of the unwrapped phase map associated with two or more structures of a same type is continuous across one or more borders separating the two or more structures; correcting the phase discontinuities in the unwrapped phase map based on the one or more patterns.