1. A method of fabricating a color filter layer, comprising: providing an active device array substrate having an opaque metal pattern formed thereon; forming a negative photoresist layer to cover the active device array substrate; performing a back-side exposure process to expose the negative photoresist layer using the opaque metal pattern as a mask; performing a development process such that the negative photoresist layer is transformed into a patterned negative photoresist layer; forming a black light-shielding layer on the active device array substrate to cover the patterned negative photoresist layer; removing the patterned negative photoresist layer and the black light-shielding layer located on the patterned negative photoresist layer, and defining a plurality of pixel regions in the black light-shielding layer; and forming a plurality of color filter patterns in the pixel regions.