1. A method for creating a photolithographic component, comprising: determining a target pattern for a circuit layout, the target pattern comprising target features; identifying a set of periodic target features within the target pattern; calculating a relationship between feature and pitch for the set of periodic target features; and using a computer system to define a mask pattern from the target pattern using the relationship, wherein the mask pattern has a set of periodic mask features configured to result in projection of a first subset of the set of periodic target features when exposed to a first light source configuration that induces a first phase effect, and configured to result in projection of a second subset of the set of periodic target features when exposed to a second light source configuration that induces a second phase effect.