1. A method comprising: receiving a measurement model characterizing a response of a metrology system to a measurement of a metrology target, wherein the measurement model includes one or more parameters of interest characterizing the metrology target and one or more system parameters characterizing the metrology system; determining a set of known values associated with any of the one or more parameters of interest that span a desired process window associated with the metrology target; determining a set of perturbed synthetic measurement signals based on a set of simulations of the measurement model characterizing a set of measurements of the metrology target for each of the set of known values of any of the one or more parameters of interest and at least one perturbation signal; determining estimated values associated with each of the one or more parameters of interest based on the set of perturbed synthetic measurement signals; determining a metric indicative of a parameter tracking performance of the metrology system based on the estimated values associated with each of the one or more parameters of interest and the known values associated with each of the one or more parameters of interest; and storing the metric in a memory.