1. A method of optimizing a lithographic process for imaging a pattern comprising a plurality of features onto a substrate using a lithographic apparatus, the lithographic apparatus having a controllable illumination system arranged to illuminate a patterning device with radiation and a controllable projection system arranged to project an image of the patterning device onto the substrate as a patterned beam of radiation, the method comprising: selecting a feature from the plurality of features; determining an illumination setting for the illumination system to optimize imaging of the selected feature; and determining a projection setting for the projection system to optimize imaging of the selected feature taking account of the illumination setting.