1. A method for correcting a mask, wherein a pattern for position alignment with a defect region is extracted from a high-resolution image for a region including the defect taken with an atomic force microscope for a region where the shape could not accurately be understood by a mask defect repairing apparatus employing an ion beam because of charging up, a pattern for position alignment with the shape of the extracted defect region is converted to a shape format for a mask defect repairing apparatus employing an ion beam and taken in, the extracted position alignment pattern is combined with a position alignment pattern for a secondary charged particle image for a region including the defect, and the extracted defect region is repaired using an ion beam.