1. A method for predicting performance of an integrated circuit device, comprising: receiving in a computing device measured values for a plurality of electrical test parameters associated with integrated circuit devices on at least one wafer measured prior to completion of the at least one wafer; predicting values of the electrical test parameters in the computing device based on a measured value of at least one physical characteristic of a feature formed on the at least one wafer; comparing the measured values in the computing device to the predicted values to generate residual values associated with the electrical test parameters, the residual values reflecting a difference between the predicted values and the measured values; and generating at least one performance metric associated with the devices in the computing device based on the residual values.