1. A method for correcting a mask pattern, comprising: accessing a record associated with an uncorrected pattern, the uncorrected pattern comprising a plurality of segments, the record associating each segment with a correction grid of a plurality of correction grids, each correction grid comprising a plurality of points; selecting a segment; determining an optimal correction for the segment; determining a correction grid associated with the segment; and snapping the segment to a subset of points of the associated correction grid, the subset of points proximate to the optimal correction, to form a corrected pattern of a mask pattern.