1. A method for creating writing data used for electron beam lithography of a character projection type, comprising: judging whether a resizing process should be performed to a figure cell in device pattern data in a cell-based design, the figure cell including a cell layout frame and a pattern in the cell layout frame; performing the resizing process based on a relationship between the cell layout frame and the pattern in the cell layout frame, and a resizing quantity of the resize process, when the judging step determines that the resizing process should be performed; creating a character pattern cutting frame from the cell layout frame; and extracting a figure within the character pattern cutting frame as a character pattern.