1. A method, in a data processing system, for simultaneous photolithographic mask and target optimization (SMATO), the method comprising: generating, by a lithographic simulator, an image of a mask shape on a wafer thereby forming one or more lithographic contours; analytically evaluating, by a mask and target movement module, a direction for mask and target movement thereby forming a plurality of pairs of mask and target movements; identifying, by the mask and target movement module, a best pair of mask and target movements from the plurality of mask and target movements that minimizes a weighted cost function; and adjusting, by a shape adjustment module, at least one of a target shape or the mask shape based on the best pair of mask and target movements.