1. A scanning electron microscope system, comprising: an acquiring means which, using a scanning electron microscope, acquires an image of a desired area of a sample provided with a pattern formed on a surface thereof; a calculating means which calculates a local projection waveform at each point, or at each representative point, on an edge of the pattern in the acquired image of the sample; a storing means which stores a library correlating a cross-sectional shape of the pattern of the sample and electron beam signal waveform information corresponding to the cross-sectional shape of the pattern of the sample; an estimating means which estimates a local cross-sectional shape of the pattern, using information stored in the library; a deciding means which decides a plurality of edge positions on the projection waveform, based on the local cross-sectional shape; a calculating means which calculates contour information, based on the plurality of edge positions; and a calculating means which calculates a dimensioned pattern, based on the contour information.