1. A method to enhance resolution in optical lithography via absorbance-modulation comprising: a. exposing an opaque absorbance modulation layer (AML) to a first waveform having wavelength, 8 1 , said exposure forming a first plurality of transparent regions in said opaque AML and a first pattern comprising a plurality of exposed regions in a photoresist layer; b. restoring said AML to original opaque state; c. exposing said restored AML to said first waveform having wavelength, 8 1 , said exposure forming a second plurality of transparent regions in said opaque AML and a second pattern comprising plurality of exposed regions in a photoresist layer, and said first and second pattern in said photoresist layer forming a final pattern with enhanced resolution and decreased spatial period than said first pattern.