1. An apparatus to inspect a defect of a semiconductor device, comprising: an electron beam (e-beam) source generator configured to generate e-beams and focus the e-beams onto a semiconductor device; a signal processor configured to process a secondary electron signal generated by collision of the &beams with the semiconductor device; an image storage configured to multi-process the secondary electron signal, scan a pattern image in response to the secondary electron signal, and store scan information along with positional information on each of pattern images; and an image changer configured to calculate multiple signals and integrate each of the pattern images.