1. A set of reticles, wherein each reticle in said set of reticles comprises an alignment structure pattern at a same relative location, each alignment structure pattern comprising a set of gratings including process segmentations, said process segmentations having a reticle segmentation pitch p within each grating of said set of gratings, wherein a relative position of said alignment structure pattern in an (i+1)-st reticle is laterally offset by a distance of 1/n times said reticle segmentation pitch p in a direction of said reticle segmentation pitch p relative to a corresponding alignment structure pattern in an i-th reticle for each i between and including 1 and (n−1), wherein n is a total number of reticles in said set of reticles.