1. An exposure method comprising the steps of: acquiring information of an alignment mark formed on an object to be exposed, by changing a value of a device parameter, the information being used for an alignment between a reticle and the object, the reticle forming a circuit pattern to be transferred to the object, and the value being able to be set in an exposure apparatus; determining the value of the device parameter of the exposure apparatus based on the information acquired in said acquiring step; and transferring the pattern onto the object using the exposure apparatus that sets the value of the device parameter, which has been determined.