1. A foreign matter inspection apparatus for inspecting existence of foreign matters on a surface of an inspected object from a reception intensity of reflected or scattered beams from said inspected object by irradiating optical beams to the surface of said inspected object, comprising: a device for collecting a first image datum of an alignment mark formed on the surface of said inspected object; a device for registering a second image datum of a template; a first data processor for normalizing said first image datum, calculating a first edge intensity waveform representing a change of contrasting-density of said normalized first image datum, and executing a first correction of said first edge intensity waveform on the basis of a first coefficient; a second data processor for normalizing said second image datum, calculating a second edge intensity waveform representing a change of contrasting-density of said normalized second image datum, and executing a second correction of said second edge intensity waveform on the basis of a second coefficient; and a third data processor for executing a pattern-matching between an image of the inspected object and the template on the basis of the corrected first edge intensity waveform for the normalized first image datum and the corrected second edge intensity waveform for the normalized second image datum.