1. An image evaluation apparatus configured to find an exposure condition of a semiconductor pattern from an image shot with an electron beam, comprising: a storage unit that stores a model indicating a relationship between a feature amount that is obtained by creating three or more outlines from a SEM image and an exposure condition, and outline creation parameter information to create three or more outlines corresponding to the model; a controller, configured to: create three or more outlines from a SEM image using the outline creation parameter information; find a plurality of feature amounts through measurement, in a region including a part of the pattern, of dimensions between corresponding points of the three or more outlines and a base pattern stored beforehand that has the same edges as those of the three or more outlines; substitute the plurality of feature amounts obtained through the measurement into a model that is an arithmetic equation indicating a relationship between the plurality of feature amounts, weight coefficients for the respective feature amounts, and an exposure condition; and find a corresponding exposure condition.