1. A method of manufacturing a reticle for use in photolithography, comprising: creating a first database of data representing coordinates, regions and process execution conditions for a plurality of pattern images to be transcribed onto different types of semiconductor products using a plurality of reticles in a photolithographic process, and classifying the data of said first database according to groups of similar types of the products; creating a second database of data, representing process marks and boundaries of scribe lanes of the reticles, corresponding to each of the product groups; for a selected product, inputting reference coordinates of the plurality of image patterns to be transcribed onto the selected product to extract from the second database the process marks and the scribe lane boundaries of reticles to be used for transcribing the image patterns onto the selected product; determining at least one set of reference coordinates correlating each of the plurality of image patterns of the selected product with the corresponding scribe lane region boundaries extracted from the second database; and designing and forming a reticle by batch-processing of the coordinates of the process mark.