1. A method for detecting the risk of non-cathode arcing in a physical vapor deposition chamber utilized for depositing metal on a substrate, the method comprising the steps of: monitoring a supply voltage and a supply current to a physical vapor deposition chamber for depositing metal on a substrate; generating a set of cathode arcing event data for each of a plurality of substrates processed in the physical vapor deposition chamber; computing a parameter for each of the plurality of substrates based on the set of cathode arcing event data for each substrate; and, determining the potential risk of non-cathode arcing based on the parameter.