1. A computer-implemented method for reviewing a potential defect on a substrate, the method comprising: determining a margin of error for a previous defect detection; obtaining an image using a charged-particle apparatus of an area which has a field of view that is at least ten times larger than the margin of error for the previous defect detection, said area containing the potential defect; and determining at least three segments within the image, wherein the three segments are transformably identical to each other, and wherein one of the segments includes the potential defect.