1. An exposure apparatus for sequentially performing exposure in each of a plurality of underlying shot regions formed on a substrate, the apparatus comprising: a controller configured to judge, for each of the plurality of shot regions, whether to perform one-shot exposure that exposes the shot region in one shot without dividing the shot region or divided exposure that divides the shot region into a plurality of partial regions and exposes each of the partial regions separately, based on information of respective shapes of the plurality of shot regions, determine a shape of each partial region in the shot region in which the divided exposure is to be performed, and control the exposure so as to perform the one-shot exposure or the divided exposure in each of the plurality of shot regions based on a result of the judgment and the determined shape of each partial region.