1. A method for performing regional phase unwrapping with pattern-assisted correction, comprising: acquiring a wrapped phase map of an interferogram representative of a wafer surface; applying a phase unwrapping procedure to the wrapped phase map to generate an unwrapped phase map, wherein the unwrapped phase map includes one or more phase discontinuities associated with phase unwrapping errors; defining one or more patterns in the unwrapped phase map, wherein the one or more patterns comprise two or more structures, wherein defining the one or more patterns includes determining continuity conditions for the unwrapped phase map across one or more borders separating two or more structures of a same type; and correcting the phase discontinuities in the unwrapped phase map based on the continuity conditions for the one or more patterns.