1. A method for processing image data in a lithography manufacturing process, comprising: providing a parallel imaging writer system, wherein the parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, and wherein each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens, wherein each SLM imaging unit is individually controlled; receiving a mask data pattern to be written to a substrate; processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate; identifying one or more objects in an area of the substrate to be imaged by corresponding SLMs; selecting evaluation points along edges of the one or more objects; configuring the parallel imaging writer system to image the one or more objects using the evaluations points; and performing multiple exposures to image the one or more objects in the area of the substrate by controlling the plurality of SLMs to write the plurality of partitioned mask data patterns in parallel.