1. A semiconductor circuit pattern measuring apparatus comprising: a receiver which receives a semiconductor circuit pattern image transmitted from a photographic device; a multiple resolution image generating unit which applies a plurality of noise removing filters to the semiconductor circuit pattern image received by the receiver to generate a multiple different resolution images; a multiple resolution differential image generating unit which generates a multiple resolution differential image from a difference of images between hierarchies of the multiple different resolution images; and a contour extracting unit which extracts a contour of a semiconductor circuit pattern based on an intensity signal of the semiconductor circuit pattern image, wherein the contour extracting unit calculates the intensity signal of the semiconductor circuit pattern image using an intensity signal of the multiple resolution differential image, wherein the contour extracting unit calculates a top peak in which the intensity signal of the multiple resolution differential image is maximized or a bottom peak in which the intensity signal of the multiple resolution differential image is minimized, and wherein the contour extracting unit calculates an inflection point near the top peak or the bottom peak as a middle point, normalizes the intensity signal of the multiple resolution differential image according to the top peak or the bottom peak and the middle point, and extracts the contour of the semiconductor circuit pattern at a position coordinate value corresponding to a specified intensity signal level from the normalized intensity signal.