1. A process control system for a wafer fabrication facility, the system comprising: a database for storing raw wafer manufacturing data; a data mining module for processing the raw wafer manufacturing data to select a subset of data therefrom using knowledge-based data scoping, statistics-based data filtering, and effect-based data clustering; and a feature tracking module associated with the data mining module and comprising a process model configured to model a wafer fabrication process using the selected data received from the data mining module, wherein the process model includes a plurality of sensitivity coefficients associated with the selected data that are dynamically tuned to meet real-time production circumstances, the feature tracking module being configured to generate prediction and control data with the process model; wherein the prediction and control data are used to control future processes in the wafer fabrication facility.