1. An exposure apparatus for exposing a shot region on a substrate, the exposure apparatus comprising: a stage configured to hold the substrate and to be movable; a projection optical system configured to project light onto the substrate; a measuring device configured to measure a position of a partial region of a surface of the substrate with respect to a direction of an optical axis of the projection optical system; and a controller configured to cause the measuring device to measure the position with respect to each of a plurality of measurement points of each of a plurality of shot regions, to determine a global shape of the surface based on the measured positions, to calculate a correction value with respect to each of the plurality of measurement points based on the determined global shape, and to move the stage based on measurement values corrected using the respective correction values corresponding to the respective measurement points, wherein the controller is configured to select a portion of the plurality of measurement points based on reproducibility of the measured positions corresponding to the respective measurement points, and to calculate the correction values such that a weight for the measured positions of the selected portion is greater than a weight for those of the other measurement points.