1. A method for detecting a risk of non-cathode arcing in a physical vapor deposition chamber utilized for depositing metal on a substrate, the method comprising the steps of: generating a set of cathode arcing event data for each of a plurality of substrates processed in the physical vapor deposition chamber; computing, by a computer, a parameter for each of the plurality of substrates based on the set of cathode arcing event data for each substrate; determining, by the computer, a moving average of the parameter; and determining the risk of non-cathode arcing based on the determined moving average of the parameter.