1. A multi-beam patterning system comprising: an imaging sub-system, the imaging sub-system having at least a detector; a multi-beam patterning tool including three or more beams configured to produce a pattern having a plurality of features, wherein a first beam produces a first feature of the pattern, a second beam produces a second feature of the pattern, and at least a third beam produces at least a third feature of the pattern, wherein the plurality of features have one or more feature parameters, wherein the one or more feature parameters include a selected distance between the plurality of features; and a pattern correction controller communicatively coupled to the imaging sub-system and the multi-beam patterning tool, the pattern correction controller configured to execute a set of program instructions maintained in memory, the set of program instructions configured to cause a processor of the pattern correction controller to: acquire a standard associated with a pattern produced by the multi-beam patterning tool, the standard including a nominal standard distance between the plurality of features of the pattern; receive image data associated with at least a portion of an image of the pattern produced by the multi-beam patterning tool, the image data including a plurality of imaged distances between the plurality of features of the pattern; identify one or more irregularities by comparing the nominal standard distance and the plurality of imaged distances, the plurality of imaged distances including a first imaged distance and at least a second imaged distance adjacent to the first imaged distance, the first imaged distance and the at least the second imaged distance being different than the nominal standard distance; and adjust one or more beams of the multi-beam patterning tool to correct the identified one or more irregularities by comparing at least one of the first imaged distance or the at least the second imaged distance to the nominal standard distance.