1. An apparatus for patterning a workpiece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, comprising: a source emitting electromagnetic radiation onto an object plane, an SLM comprising a plurality of on-off object pixels, adapted to receive and modulating said electromagnetic radiation at said object plane in accordance to an input pattern description and to relay said electromagnetic radiation toward said workpiece, a synchronizer to synchronize the motion of the workpiece relative to a relayed pattern description from said SLM onto said workpiece, and an image-deflecting element arranged between said SLM and said workpiece adapted to deflect said relayed pattern description, wherein at least two pattern descriptions on said SLM are at least partly overlapping on the workpiece.