1. Pattern inspection equipment comprising: a measured data generation unit for generating measured data from patterns that have been delineated on a sample according to design data; and a reference data generation unit for generating reference data used to inspect the patterns, the reference data generation unit having: a multi-valued pattern development circuit for developing the design data into gradational data expressed in multiple gradation levels; a fine adjustment circuit for finely adjusting pattern edges in the multi-level gradational data; and a fault decision circuit for comparing the measured data with the reference data.