1. A pattern forming method of forming a desired pattern on a sensitive material coated on a substrate, comprising: a first step of transferring a first pattern by exposing the sensitive material; a second step of transferring a second pattern by exposing the sensitive material, the desired pattern being expressed as a synthesize pattern consisting of the first and second pattern; and a third step of adjusting an exposure position of the second pattern, based on a latent image of the first pattern formed in the sensitive material.