1. A method comprising: fabricating an image sensor up to, but not including, a first metallization layer, wherein the image sensor includes a light sensitive element configured to receive light from a light-incident side of the image sensor; fabricating a micro-lens on a pre-metal dielectric layer; depositing a metal layer of a reflective material on the micro-lens and pre-metal dielectric layer; covering the metal layer with photoresist; patterning the photoresist to remove the photoresist from all areas except the surface of the micro-lens, wherein the metal layer is exposed in areas where the photoresist is removed; etching the exposed metal layer away to form a micro-mirror, wherein the light sensitive element is disposed between the light incident side of the image sensor and the micro-minor; removing remaining photoresist; and covering the micro-minor with a layer of dielectric material.