1. A method, comprising: determining an interconnect object in a layout of a circuit design to be created with a manufacturing process, the interconnect object including one or more drawn edges; by a computing device, determining a generated contour object using a contour generation of the interconnect object based on processing variation factors for the manufacturing process, the generated contour object including one or more contoured edges that are contoured based on the processing variation factors; determining a plurality of segments in the generated contour object, wherein the dimensions of the segments are determined based on one or more deviations between the drawn edges of the interconnect objects and the contoured edges of the contour object; and outputting the plurality of segments.