1. A method of optimizing a design to be formed on a substrate, comprising the steps of: (a) approximating rounding of at least one corner of an image of the design; (b) generating a representation of the design further to the approximate rounding of the at least one corner; (c) generating an initial representation of a mask utilized to image the design based on the representation; and (d) performing Optical Proximity Correction (OPC) further to the initial representation of the mask.