1. A PSL method for enhancing wafer or mask defect review and classification comprising the steps of: performing image processing on a scanned defect image retrieved a scanned defect image file; aligning the scanned defect image with a just-stored digitized defect image; matching the scanned defect image with a just-stored digitized defect image; and classifying the scanned defect image according to a classification method selected from the group of self-acting and manual.