1. An assembly for inspecting wafers or other flat objects, each of said objects having an object surface, the assembly comprising an object carrier for receiving one of said objects; a camera assembly with a camera having a plurality of detector elements for taking an image of at least a portion of said object surface during an exposure time; a driving assembly for generating a continuous relative movement without interruption between said camera assembly and said object wherein said relative movement causes a movement blur of said image during said exposure time; an illumination assembly for continuously illuminating said object, means controlling said illuminance at a constant value, a shutter for limiting said exposure time, means for performing an analysis of said image are provided, said means defining a movement blur which is acceptable for said analysis of said image; wherein said exposure time is smaller than a time causing said acceptable movement blur, and wherein an area is attributed to each of said detector elements which is a portion of said object surface imaged on said detector element and wherein said exposure time is smaller than a time necessary for said relative movement along less than 5 lengths of said area imaged on one of said detector elements, preferably less than twice of said length of said area imaged on one of said detector elements and even more preferably less than one length of said area imaged on one of said detector elements.