1. A reticle comprising: a device pattern formed in an exposure area; and evaluation patterns formed in an area different from said exposure area, for evaluating transferability onto a transfer target of any defect in said exposure area, wherein said evaluation patterns have a different shape than said device pattern, wherein said evaluation patterns includes a defect, and wherein a plurality of said evaluation patterns are provided corresponding to types of defects possibly generated in said exposure area, and are arranged by types of said defect.