1. A method for emulation of a photolithographic process for generating on a wafer an overall structure that is divided into at least two substructures on at least two masks, the method comprising: generating aerial images of the at least two substructures, at least one of the aerial images being captured with a mask inspection microscope; correcting, by using a processing unit, errors in the at least one aerial image captured with the mask inspection microscope; and overlaying the aerial images of the at least two substructures to form an overall aerial image of the overall structure.