1. A method of fabricating a circuit structure feature, the fabricating comprising: providing a circuit structure layer over a substrate and at least one etch layer over the circuit structure layer; forming a pattern in the at least one etch layer wherein forming comprises patterning at least one primary pattern feature having at least one primary pattern feature dimension and at least one assist pattern feature having at least one assist pattern feature dimension, where the primary pattern feature dimension is greater than the assist pattern feature dimension; reducing the at least one primary pattern feature dimension and closing the assist pattern feature to form an etch pattern; etching the circuit structure feature using the etch pattern.