1. A computerized method for aligning a solar wafer for fabrication, comprising: receiving from a first image capturing device, by a computing device, a first image of a first portion of a solar wafer, wherein the solar wafer comprises a set of fiducial patterns, wherein a pose of each fiducial pattern is defined by a specification for the wafer; receiving from a second image capturing device, by the computing device, a second image of a second portion of the solar wafer, wherein an image capturing device transform defines a first relationship between the first image capturing device and the second image capturing device; identifying, by the computing device, a first fiducial pattern in the first image and a second fiducial pattern in the second image, based on: the image capturing device transform; a fiducial transform that defines, based on the specification, a second relationship between the first fiducial pattern and the second fiducial pattern; and a threshold value configured to identify low contrast fiducial patterns on solar wafers; and determining, by the computing device, an alignment of the solar wafer based on the identified first fiducial pattern and second fiducial pattern.