1. A method for detecting a misalignment of an object in a processing system, comprising: obtaining a first image of a semiconductor processing object; obtaining a second image of the semiconductor processing object subsequent to obtaining the first image; determining first values associated with pixels in at least one region of the first image; determining second values associated with pixels in a least one region of the second image; calculating at least one of: a center of gravity value of the pixels in the at least one region of the first image; and an average weight of the pixels in the at least one region of the first image; detecting a misalignment of the semiconductor processing object based on at least one of: the calculated center of gravity; and the calculated average weight of the pixels in the at least one region of the first image; and comparing the second values associated with pixels in the at least one region of the second image to the first values associated with pixels in the at least one region of the first image, wherein the detecting a misalignment of the semiconductor processing object is further based on the comparison of the second values and the first values in the at least one region between the first image and the second image.