1. A method for manufacturing a dichroic filter detector array, comprising the steps of: a. cleaning a wafer, b. applying a photoresist to said wafer; c. masking pre-selected areas of said photoresist; d. developing unmasked areas of said photoresist to create a pre-selected space e. over-developing said photoresist layer to form an undercut in said photoresist layer and to expose a predetermined section of said wafer; f. depositing dichroic filter material on said predetermined section of said wafer; g. removing said photoresist, h. repeating the foregoing steps to deposit a predetermined number of dichroic filters on said wafer in a predetermined array; and, i. bonding said wafer on a linear detector with optically clear adhesive.