1. A computer implemented method comprising: identifying a layout design for a mask; partitioning the layout design into a plurality of layout sections; selecting a reference point in each of the layout sections; identifying layout sections that have similar geometric shapes relative to the reference point; consolidating the plurality of layout sections into a plurality of pattern groups based upon the identified layout sections that have similar geometric shapes; identifying (a) an optical lithographic system, (b) a set of optical lithographic tolerance parameters, and (c) a representative layout section for each of the pattern groups; using a computer system to generate a simulated printed image corresponding to each of the representative layout sections using the optical lithographical system; determining which of the simulated printed images do not fall within the optical lithographic tolerance parameters; optimizing the layout design of the mask by modifying the layout sections whose simulated images do not fall within the optical lithographic tolerance parameters such that the mask falls within the image tolerance parameters; and fabricating the mask according to the optimized layout design.