1. A computer-implemented method for determining a model for predicting printability of reticle features on a wafer, comprising: generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions; determining one or more characteristics of the reticle features of the simulated images; comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process; and selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.