1. Field
Apparatuses consistent with example embodiments relate to a plasma monitoring apparatus and a plasma processing apparatus including the same.
2. Description Of Related Art
In the related art, a semiconductor device is manufactured through a plurality of unit processes including, for example, a deposition process using plasma, an etching process, and the like. In accordance with the miniaturization of semiconductor devices and high degree of integration of semiconductor products, the effects of a non-uniform distribution of plasma to the properties of semiconductor devices are increased.