Exposure apparatuses are commonly used to transfer images from a reticle onto a substrate during the manufacturing and processing of liquid crystal displays (“LCDs”) and semiconductor wafers. There is a never ending desire to manufacture larger LCDs. Typically, larger masks are required to manufacture larger LCDs. Unfortunately, as the size of the masks utilized increases, so does the likelihood that the mask may be subject to a certain amount of sagging due to gravity in the middle region of the mask that is not directly supported. Accordingly, there is a need to develop a system whereby the potential sagging of the mask is minimized while inhibiting unwanted blocking of the pattern on the mask.