1. Field of the Invention
The invention relates generally to reticle management and operation for advanced technology IC foundry It is more particularly to provide not only a hardware (3 in 1 N2 e-Cabinet), but also management systems and methods to preserve MASK at a specific environment (For example: N2 gas), and charge the gas into the carrier more conveniently and efficiently, and also equip with real time information for reticle dispatching.
2. Description of the Related Art
Photolithography is an important technology in semiconductor manufacturing. The number of reticles (masks) used in photolithography corresponds to the complexity of a manufacturing process. Photolithography affects structures of semiconductor devices, such as patterns of layers and doped regions, and determines the functional effectiveness thereof. Since photolithography is complicated, photolithography apparatus, such as scanners, performing the photolithography can create a bottleneck in the manufacturing process.
Each photolithography apparatus may have a rack for reticle storage. Due to quality concern, most of PSM reticles required storage in an inert gas such as nitrogen environment, to avoid precipitation thereon, which will impact wafer quality and increase reticle repairing opportunities that kill production cycle time and tool efficiency. FIG. 1 illustrates conventional reticle management. As shown in FIG. 1, scanners (102, 104, 106 and 108) generally use a reticle stocker 120. The reticle stocker 120 is required to store the MASK in wafer fabrication clean room for manufacturing. The reticle stocker 120 is a self-contained, clean environment electronic closet in which reticles can be stored and from which reticles can be retrieved. Additionally, the reticle stocker 120 provides an inert gas environment in which reticles of critical layers are prior to use for processing.
Generally, the reticle stocker is at a specific location which operators must move to get reticles for operation, a time-consuming and inconvenient system. The cost for reticle stocker is expensive, making it impractical to provide multiple reticle stockers in a factory. Additionally, since the reticle stocker has limited space for racks charging inert gas simultaneously, most racks must wait, thereby increasing lost time of scanners, and decreasing equipment availability and throughput of the manufacturing processes.