Field
The present disclosure generally relates to methods for processing a substrate, and more specifically to methods for cleaning a substrate.
Description of the Related Art
Epitaxial growth technology is widely applied in manufacturing of semiconductor devices, display devices, and other devices. Typically, when epitaxial growth technology is used to form an epitaxial layer on a semiconductor substrate, the crystalline orientation of the epitaxial layer is almost the same as that of the semiconductor substrate. Before the epitaxial layer is deposited on the substrate, a surface cleaning process is typically performed to remove native oxides and/or other impurities from the deposition surface, e.g., surface of the semiconductor substrate. The surface cleaning process is typically employed to increase the quality of the epitaxial layer being formed. However, current cleaning processes may not be suitable for reliable fabrication of next-generation devices.
Accordingly, there is a need in the art for improved methods for cleaning a substrate.