ULTRAVIOLET RADIATION CURABLE ACRYLATE PRESSURE-SENSITIVE ADHESIVE COMPOSITIONSCrosslinked networks of (meth)acrylate (co)polymers, and a method of making the networks, are provided in which a photoiniferter-derived homopolymer, random copolymer or block copolymer is dissolved in a compatible monomer mixture along with a radiation-sensitive photoinitiator and crosslinker. The polymer-monomer mixture is coated onto a suitable web and cured via ultraviolet radiation to yield a crosslinked network resulting from polymerization of monomers along with incorporation of the active photoiniferter polymer. The networks exhibit excellent adhesive properties. When the photoiniferter polymer is a homopolymer, a random copolymer or an AB-type diblock copolymer, a pressure-sensitive adhesive results. When the photoiniferter polymer is a homopolymer or a random copolymer, the resulting adhesive exhibits excellent vibration-damping characteristics. When the photoiniferter polymer is an ABA-type triblock copolymer, a structural adhesive is obtained.A radiation curable pressure sensitive adhesive composition comprising: (a) 100 parts by weight of free radically (co)polymerizable monomer comprising:(i) about 80 to about 100 parts by weight of (meth)acrylic acid ester(s) of monohydric alcohol(s), wherein said monohydric alcohol(s) comprise an average of about 1 to about 12 carbon atoms; and (ϋ) about 0 to about 20 parts by weight of monoethylenically unsaturated polar monomer(s) which are copolymerizable with the (meth)acrylic acid ester(s);(b) about 10 to about 100 parts by weight of a photoiniferter polymer selected from the group consisting of I(BT)n wherein n is an integer of 1 to 2, 1(BAT)n wherein n is an integer of 1, and mixtures thereof, whereinB comprises a polymer block having a Tg of between about -70°C and about 0°C wherein the polymer block B comprises polymerizable monoethylenically-unsaturated monomer(s);A comprises a polymer block having a Tg of between about +30°C and about +160°C wherein the polymer block A comprises polymerizable monoethylenically-unsaturated monomer(s);I represents a free-radical initiator portion of an iniferter of the formula ICr)n, whereinT represents the terminator portion of said iniferter; and I(T)n is capable upon being subjected to an appropriate energy source of forming free radicals I(-)„ and nT« wherein I* is a highly reactive free radical capable of initiating free radical polymerization, and T* is a less reactive free radical which is generally much less capable of initiating free radical polymerization than I* but will rejoin with I(> upon termination of said energy source;(c) about 0.1 to about 5 parts by weight of a radiation-activatable crosslinking agent based upon the total weight of (a) plus (b); and(d) about 0.01 to about 5 parts by weight of a photoinitiator based upon the weight of (a). 2. A radiation curable vibration damping composition comprising: (a) 100 parts by weight of free-radically (co)porymerizable monomer comprising:(i) about 80 to about 100 parts by weight of (meth)acrylic acid ester(s) of monohydric alcohol(s), wherein the monohydric alcohol(s) comprise an average of about 1 to about 12 carbon atoms;(ϋ) about 0 to about 20 parts by weight of monoethylenically unsaturated polar monomer(s) that are copolymerizable with the (meth)acrylic acid ester(s); (b) about 10 to about 100 parts by weight of a photoiniferter polymer selected from the group consisting of I(BT)n, and mixtures thereof, wherein n is an integer of 1 to 2;B comprises a polymer block having a Tg of between about -70°C and about -15 °C, and a number average molecular weight ranging from about 20,000 to about 50,000, wherein polymer block B comprises polymerizable monoethylenically-unsaturated monomer(s);I represents a free-radical initiator portion of an iniferter of the formula I(T)n, wherein T represents the terminator portion of the iniferter; andI(T)n is capable upon being subjected to an appropriate energy source of forming free radicals I( • )n and nT • wherein I • is a highly reactive free radical capable of initiating free radical polymerization, and T • is a less reactive free radical which is generally much less capable of initiating free radical polymerization than I - but will rejoin with l(- upon termination of the energy source;(c) about 0.1 to about 5 parts by weight of a radiation-activatable crosslinking agent based upon the total weight of (a) plus (b); and (d) about 0.01 to about 5 parts by weight of a photoinitiator based upon the weight of (a). 3. A radiation curable structural adhesive composition comprising: (a) 100 parts by weight of free radically (co)polymerizable monomer comprising:(i) about 80 to about 100 parts by weight of (meth)acrylic acid ester(s) of monohydric alcohol(s), wherein the monohydric alcohol(s) comprise an average of about 1 to about 12 carbon atoms; and(ii) about 0 to about 20 parts by weight of monoethylenically unsaturated polar monomer(s) that are copolymerizable with the (meth)acrylic acid ester(s); (b) about 10 to about 100 parts by weight of a photoiniferter polymer selected from the group consisting of I(BAT)n, and mixtures thereof wherein n is an integer of 2;B comprises a polymer block having a Te of between about 0°C and about -70°C, wherein polymer block B comprises polymerizable monoethylenically-unsaturated monomer(s);A comprises a polymer block having a Ts of about 30°C to about 160°C wherein polymer block A comprises polymerizable monoethylenically-unsaturated monomer(s); I represents a free-radical initiator portion of an iniferter of the formula I(T)n, whereinT represents the terminator portion of said iniferter; and ICQa is capable upon being subjected to an appropriate energy source of forming free radicals IC*),, and nT« wherein I- is a highly reactive free radical capable of initiating free radical polymerization, and T* is a less reactive free radical which is generally much less capable of initiating free radical polymerization than I- but will rej...
자외 방사선 경화가능한 감압성 아크릴레이트 접착제 조성물본 발명의 (메트)아크릴레이트 (공)중합체와 교차 결합된 네트윅 및 그 네트윅을 제조하는 방법은 방사선-민감성 광개시제 및 교차 결합제와 함께 상용 가능한 단량체 혼합물내에 용해된 포토이니퍼터-유도된 단독 중합체, 랜덤 공중합체 또는 블록 공중합체에서 제공된다. 적당한 웹상에 피복되고 자외 방사선에 의해 경화된 중합체-단량체 혼합물은 활성 포토이너퍼터 중합체의 혼합과 함께 단량체 중합의 경과인 교차 결합된 네트윅을 형성한다. 그 네트윅은 뛰어난 접착 특성을 나타낸다. 포토이니퍼터 중합체 단독중합체, 랜덤 공중합체 또는 AB-유형 디블록 공중합체인 경우, 감압성 접착제로 귀결된다. 포토이너퍼터 중합체가 단독 중합체 또는 랜덤 공중합체일 경우, 결과적으로 생성되는 접착제는 뛰어난 진동 감폭 특성을 나타낸다. 포토이너퍼터 중합체 가 ABA-유형 트리 블록 공중합체일 경우, 구조물 접착제가 수득된다.(a)(ⅰ)평균 약 1내지 약 12개의 탄소 원자를 포함하는 1가 알콜(들)의 (메트)아크릴산 에스테르(들) 약 80내지 약 100중량부 및 (ⅱ) (메트)아크릴산 에스테르(들)과 공중합 가능한 단일 에틸렌계-불포화 된 극성 단량체(들) 약 0내지 약 20중량부를 포함하는 유리 라디칼성 (공)중합 가능한 단량체 100중량부 (b) n이 정수 1내지 2인 일반식 I(BT)n, n이 정수 1인 일반식 I(BAT)n, 및 이들의 혼합물로 구성되는 군에서 선택한 포토이니퍼터(photoiniferter) 중합체 약 10내지 약 100중량부(여기에서, B는 Tg가 약 -70℃내지 약 0℃인 중합체 블록을 포함하고, 여기서 중합체 블록 B는 중합가능한 단일 에틸렌계-불포화된 단량체(들)을 포함하며 A는 Tg가 약 +30 내지 약 +160℃인 중합체 블록을 포함하고, 여기서 중합체 블록 A는 중합가능한 단일 에틸렌계-불포화된 단량체(들)을 포함하며 Ⅰ는 일반식 I(T)n의 이니퍼터의 유리 라디칼 개시제 부분을 나타내고; T는 상기 이니퍼터의 정지제 부분을 나타내고 I(T)n은 유리라디칼 I(.)n및 nT.를 형성하는 적당한 에너지 원하에 둘수 있고 여기서, I.는 유리라디칼 중합을 개시할 수 있는 반응성이 큰 유리 라디칼이며 T.일반적으로 I.보다 유리라디칼 중합을 개시할 수있는 능력이 휠씬 약할 수 있지만 상기 에너지 원의 정지시I(.)n과 재결합할 반응성이 낮은 유리라디칼이다) (c) (a)+(b)의 총중량에 기준하여 방사선 활성화 가능한 교차결합제 약 0.1내지 약 5중량부 및 (d)(a) 의 중량에 기준하여 광개시제 약 0.01내지 약 5중량부를 포함하는 방사선 경화 가능한 감압성 접착제 조성물.