The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-Enhanced Chemical Vapor Deposition
George Tecos, Western Michigan University
Dr. Asghar Kayani
Dr. Muracidhar Ghantsala
Dr. Paul Pancella
Masters Thesis-Campus Only
Various deposition parameters have been adopted to deposit carbon-based thin films on silicon substrates via Plasma-Enhanced Chemical Vapor Deposition (PECVD) with a Radio-Frequency Plasma. We seek a recipe and formulation for carbon film deposition by varying the ratios of input gases and substrate temperature, with the goal of observing these effects on the deposited carbon film. Characterization of the samples was carried out through various procedures, including the Ion Beam Analysis (IBA) techniques: Rutherford/Non-Rutherford Backscattering Spectrometry (RBS/NRBS), Elastic Recoil Detection Analysis (ERDA), and Raman Spectroscopy. This data was analyzed to determine the purity, quality, elemental composition, and interface integrity of each respective sample. We conclude that the films deposited on Si substrates are polymer-like carbon films with 30-35 at% C and 65-70 at% H. The interface between the film and substrate was found to be abrupt. The effect of substrate temperature on the microstructure of the deposited films was found to be inconclusive. This study will lay the basis for future explorations into Western Michigan University produced CVD carbon-based films, and investigate the properties of these unique and profitable materials.
Tecos, George, "The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-Enhanced Chemical Vapor Deposition" (2011). Master's Theses. 4320.